JPH0411337A - Optical disk - Google Patents
Optical diskInfo
- Publication number
- JPH0411337A JPH0411337A JP2113832A JP11383290A JPH0411337A JP H0411337 A JPH0411337 A JP H0411337A JP 2113832 A JP2113832 A JP 2113832A JP 11383290 A JP11383290 A JP 11383290A JP H0411337 A JPH0411337 A JP H0411337A
- Authority
- JP
- Japan
- Prior art keywords
- film
- antistatic
- laser light
- substrate
- optical disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 27
- 239000011347 resin Substances 0.000 claims abstract description 20
- 229920005989 resin Polymers 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000004033 plastic Substances 0.000 claims abstract description 15
- 229920003023 plastic Polymers 0.000 claims abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 11
- 239000000843 powder Substances 0.000 claims abstract description 7
- 239000002245 particle Substances 0.000 abstract description 7
- 230000008021 deposition Effects 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 9
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 6
- 238000002156 mixing Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
この発明は、光ディスクに関する。さらに詳しくは光デ
ィスク基板の表面処理に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application This invention relates to an optical disc. More specifically, the present invention relates to surface treatment of optical disc substrates.
(ロ)従来の技術
従来、光ディスクは、需要が高まるにつれ、稼動時の帯
電によりその表面に空中浮遊粒子が付着したり、取り扱
い時に生じる傷によりレーザーのトラックはずれやエラ
ーか発生し、ディスクの特性を劣化させ、光ディスクの
性能を充分に発揮出来ないという問題が生じている。そ
のため最近は、第2図に示すようにプラスチック製光デ
ィスク用基板lの一面上に光磁気記録膜2とこの上に記
録膜用保護膜3を形成し、次に他面(レーザー入射側の
面)にUV硬化性樹脂に界面活性剤を混合して得られる
帯電防止樹脂をスピンコード法等の方法で均一に塗布し
て表面処理@6を形成する対策かとられている。また、
ディスク表面の付着物を払拭する事により先ディスクの
性能劣化を防止する対策も行われている。(B) Conventional technology Conventionally, as the demand for optical disks increases, the electrostatic charge during operation causes airborne particles to adhere to the surface of the disk, and scratches caused during handling may cause laser track misalignment or errors, and the characteristics of the disk. The problem has arisen that the performance of the optical disc cannot be fully demonstrated due to the deterioration of the optical disc. Therefore, recently, as shown in Fig. 2, a magneto-optical recording film 2 and a protective film 3 for the recording film are formed on one surface of a plastic optical disk substrate l, and then the other surface (the surface on the laser incidence side) is formed. ), a countermeasure has been taken in which an antistatic resin obtained by mixing a UV curable resin with a surfactant is uniformly applied by a method such as a spin code method to form a surface treatment@6. Also,
Measures have also been taken to prevent the performance of the previous disk from deteriorating by wiping off the deposits on the surface of the disk.
(ハ)発明が解決しようとする課題
しかしながらUV硬化性樹脂等に界面活性剤を混合して
形成した帯電防止膜はUV硬化性樹脂に対して界面活性
剤の混合割合が多いと帯電防止効果は太きいが表面硬さ
が低下して表面に傷が付きやすくなり、他方界面活性剤
の混合割合か少ないと表面硬さは向上するが帯電防止効
果は小さくなり、帯電防止性能と表面硬さとを同時に満
足させることかできないという問題かあった。(c) Problems to be Solved by the Invention However, in the case of an antistatic film formed by mixing a surfactant with a UV curable resin, the antistatic effect will be poor if the mixing ratio of the surfactant to the UV curable resin is high. If the surfactant is too thick, the surface hardness will decrease and the surface will be more likely to be scratched.On the other hand, if the mixing ratio of surfactant is low, the surface hardness will improve but the antistatic effect will be small, and the antistatic performance and surface hardness will be reduced. The problem was that I could not satisfy them at the same time.
また、従来の光ディスクは、80℃、90%RH等の高
温高湿環境条件にさらすと、界面活性剤が表面ににしみ
出たり、あるいはにじみ出に界面活性剤に水分か付着し
て水滴が出来たりするので長期安定性に問題があった。Furthermore, when conventional optical discs are exposed to high temperature and high humidity environmental conditions such as 80°C and 90% RH, the surfactant oozes out onto the surface, or moisture adheres to the surfactant and forms water droplets. There was a problem with long-term stability.
酸化ンリコン系の帯電防止膜は、帯電防止性能か良好で
あり、膜そのものは硬いのであるか膜厚を厚く出来ない
為、軟質のプラスチック上に塗布すると表面硬さが充分
ではなく、また低温−一高温のサイクル試験を行うと表
面にクラックが生じるという問題がある。The antistatic film based on silicon oxide has good antistatic performance, but the film itself is hard and cannot be made thick, so when applied to soft plastics, the surface hardness is not sufficient, and it is difficult to resist at low temperatures. There is a problem in that cracks occur on the surface when a high temperature cycle test is performed.
この発明は、上記問題を解決するためになされたもので
あって、硬度が高くて傷か付きにくく、帯電が起こらな
い表面を有し、稼働時にレーザーのトラック外れやエラ
ーの発生のない光ディスクを提供しようとするものであ
る。This invention was made in order to solve the above problems, and provides an optical disc that has a surface that is highly hard, scratch resistant, and does not generate electrical charge, and that does not cause the laser to go off track or cause errors during operation. This is what we are trying to provide.
(ニ)課題を解決するにめの手段
この発明によれば、プラスチック製光ディスク用基板の
レーザー入射を意図する側の面に、レーザー光を通過し
うる表面硬質性膜と酸化シリコン系又は導電性粉末混合
樹脂系帯電防止性膜とが順に積層されてなる光ディスク
が提供される。(d) Means for Solving the Problems According to the present invention, a hard surface film that allows laser light to pass through and a silicon oxide-based or conductive film on the side of the plastic optical disc substrate intended for laser incidence. An optical disc is provided in which powder-mixed resin-based antistatic films are sequentially laminated.
上記プラスチック製光ディスク用基板は、プラスチック
製板状体又はその−面にレーザー光記録性の膜とその保
護膜が形成されたプラスチック板状体を用いることがで
きる。The plastic optical disk substrate may be a plastic plate or a plastic plate having a laser beam recordable film and a protective film formed on its surface.
上記プラスチック製板状体は、レーザー光透過性のプラ
スチックで構成することができ、例えばポリカーボネー
ト、ポリメチルメタクリレート、アモルファスポリオレ
フィン等から構成することができる。また、この寸法は
通常、直径80〜300 mm、厚さか1.2mmであ
る。上記レーザー光記録性の膜は、例えばA I N/
D y F e Co/AIN/Al5AIN/GdT
bFe/AIN/A1等の光磁気記録膜等を用いて形成
することかできる。上記保護膜は、例えばアクリルウレ
タン系UV硬化樹脂、アクリル系UV硬化樹脂等を用い
て形成することができる。The plastic plate can be made of laser-transmissive plastic, such as polycarbonate, polymethyl methacrylate, amorphous polyolefin, or the like. The dimensions are typically 80 to 300 mm in diameter and 1.2 mm in thickness. The above-mentioned laser light recordable film is, for example, A I N/
D y F e Co/AIN/Al5AIN/GdT
It can be formed using a magneto-optical recording film such as bFe/AIN/A1. The protective film can be formed using, for example, an acrylic urethane UV curable resin, an acrylic UV curable resin, or the like.
この発明における表面硬質性膜は、上記基板のレーザー
先入射側の面に傷か発生しないようにするためのもので
あって、レーザー入射を意図する側の基板面に、通常鉛
筆硬さ88以上の膜を積層して用いることかできる。こ
の表面硬化性膜の積層は、例えばアクリルウレタン系U
V5F化樹脂、アクリル系UV5!化樹脂等を上記基板
面にスピンコード法等によって塗布し、硬化させて行う
ことができる。この膜の膜厚は、通常05〜10μmが
好ましい。膜厚が0,5μm以下では、基板表面の傷の
発生を防止することができないので好ましくない。20
μm超では膜質が不均一になるので好ましくない。The surface hardness film in this invention is intended to prevent scratches from occurring on the surface of the substrate on which the laser is incident, and usually has a pencil hardness of 88 or more on the surface of the substrate on which the laser is intended to enter. It is also possible to use a stack of films. The lamination of this surface-curing film is, for example, acrylic urethane-based U
V5F resin, acrylic UV5! This can be done by applying a chemical resin or the like to the surface of the substrate by a spin code method or the like and curing it. The thickness of this film is usually preferably 05 to 10 μm. If the film thickness is less than 0.5 μm, it is not preferable because scratches on the substrate surface cannot be prevented. 20
If it exceeds .mu.m, the film quality will become non-uniform, which is not preferable.
この発明における帯電防止膜は、基板(光ディスク)表
面に空中浮遊粒子の付着を防止するためのものであって
、帯電防止性と共に光透過性と耐久性を宵するものが適
しており、酸化シリコン系又は導電性粉末混合樹脂系帯
電防止性膜を上記表面硬質性膜の上に塗布し硬化させて
用いることができる。この膜厚は、通常0.01〜0.
2μmとするのが好ましい。上記酸化シリコン系帯電防
止性膜は、5i−0鎖状又はSiO網状の化合物を用い
ることができ、酸化ンリコンのコロイド液を塗布し乾燥
して作製することかできる。また、上記導電性粉末混合
樹脂系帯電防止性膜は、例えば平均粒径001〜0.4
μmの酸化錫、酸化インジウム、酸化アンチモン等の導
電性粉末を、例えばアクリルウレタン系UV硬化樹脂、
アクリル系UV硬化樹脂等の樹目旨と混合して塗布液を
作製し、この塗布液を上記表面硬質性膜の上に塗布し硬
化させて用いることができる。The antistatic film in this invention is intended to prevent airborne particles from adhering to the surface of the substrate (optical disk), and is suitably a film that has antistatic properties, light transmittance, and durability, and is made of silicon oxide. A conductive powder-based antistatic film or a conductive powder mixed resin-based antistatic film can be used by coating and curing the above-mentioned surface hard film. This film thickness is usually 0.01 to 0.
The thickness is preferably 2 μm. The silicon oxide antistatic film can be made of a 5i-0 chain or SiO network compound, and can be prepared by applying a colloidal solution of silicon oxide and drying it. Further, the conductive powder mixed resin antistatic film has an average particle size of 001 to 0.4, for example.
Conductive powder of μm tin oxide, indium oxide, antimony oxide, etc., for example, acrylic urethane UV curing resin,
It can be used by mixing it with a grain material such as an acrylic UV curable resin to prepare a coating liquid, and applying this coating liquid onto the above-mentioned surface hardening film and curing it.
(ホ)作用
表面硬質性膜でプラスチック製光ディスク用基板の表面
硬さの向上を行い、その上に形成した帯電防止性膜で空
中浮遊粒子の付着を防止する。このときプラスチック基
板の表面硬さは表面硬質性膜によって改善され、かつ帯
電防止効果は帯電防止性膜により達成出来るので従来の
界面活性剤系の帯電防止膜のように帯電防止性能と表面
硬さ向上性能が相反するということなく両方同時に改善
出来る。(e) The hard surface film improves the surface hardness of the plastic optical disk substrate, and the antistatic film formed thereon prevents airborne particles from adhering. At this time, the surface hardness of the plastic substrate is improved by the surface hardness film, and the antistatic effect can be achieved by the antistatic film. Both improvements can be made at the same time without conflicting performance improvements.
さらに本発明で使用する帯電防止性膜は、界面活性剤系
ではないので長期にわたり安定であり、また酸化ノリコ
ン系の帯電防止性膜を形成しr二場合にてもプラスチッ
ク基板と酸化シリコン系帯電防止性膜との間に表面硬質
性膜かあるので、表面硬質性膜が緩衝作用を行い低温−
一高温サイクルの熱衝撃に対してもクラックが発生しな
い。Furthermore, since the antistatic film used in the present invention is not surfactant-based, it is stable over a long period of time, and even if a silicon oxide-based antistatic film is formed on a plastic substrate and a silicon oxide-based antistatic film is used. Since there is a hard surface film between the protective film, the hard surface film acts as a buffer and protects against low temperatures.
No cracks occur even under thermal shock during high-temperature cycles.
(へ)実施例 実施例1 以下図面を参照して本発明の詳細な説明する。(f) Example Example 1 The present invention will be described in detail below with reference to the drawings.
第1図に示すように、厚さ1.2xxのポリカーボネー
ト製光ディスク用基板1の1つの面に光磁気記録@2
(AIN/DyFeCo/AIN/AI)及びその上に
記録膜用保護膜3(アクリルウレタン系UV硬化樹脂)
を成膜する。As shown in Fig. 1, magneto-optical recording @ 2
(AIN/DyFeCo/AIN/AI) and a protective film 3 for recording film on it (acrylic urethane UV curing resin)
Deposit a film.
次に、光ディスク用基板1のもう1つの面上にアクリル
ウレタン系UV硬化性樹脂を塗布し、硬化させて5〜l
Oμmの厚さの表面硬質性膜4を形成し、この上にコル
コートP(コルコート株式会社製)を塗布し、硬化させ
て膜厚0.1μmの酸化ノリコン系帯電防止性膜を形成
し、光ディスクを作製する。Next, an acrylic urethane UV curable resin is applied on the other surface of the optical disc substrate 1 and cured for 5 to 10 liters.
A hard surface film 4 with a thickness of 0 μm is formed, and Colcoat P (manufactured by Colcoat Co., Ltd.) is applied thereon and cured to form a 0.1 μm thick antistatic film based on noricon oxide. Create.
実施例2
実施例1において、酸化ンリコン系帯電防止性膜の代わ
りに平均粒径0.2μmの酸化錫機す子をアクリルウレ
タン系のUV硬化樹脂に混入した塗布液を塗布し硬化さ
せて膜厚的2μmの帯電防止性膜を形成し、この他は実
施例1と同様にして光ディスクを作製する。Example 2 In Example 1, instead of the silicon oxide antistatic film, a coating solution containing tin oxide particles with an average particle size of 0.2 μm mixed in an acrylic urethane UV curing resin was applied and cured to form a film. An optical disc is produced in the same manner as in Example 1 except that an antistatic film with a thickness of 2 μm is formed.
比較例1
実施例1において、光ディスク用基板lのもう1つの面
上に、表面硬質性膜4とこの上に酸化ノリコン系の帯電
防止性膜5とを形成する代わりに、第2図に示すように
界面活性剤を混合したアクリルウレタン系UV硬化性樹
脂を塗布し、硬化させて帯電防止膜6を形成し、この他
は実施例1と同様にして光ディスクを作製する。Comparative Example 1 Instead of forming the surface hard film 4 on the other surface of the optical disc substrate 1 and the antistatic film 5 of oxidized noricon type antistatic film 5 on the other surface of the optical disc substrate l in Example 1, the film shown in FIG. 2 was used. An optical disk is produced in the same manner as in Example 1 except that an acrylic urethane UV curable resin mixed with a surfactant is applied and cured to form an antistatic film 6.
実施例1〜2及び比較例で作製した光ディスクに対して
表面硬さ(鉛筆硬さ)、表面抵抗率及びその経時変化を
求め第1表に示す。The surface hardness (pencil hardness), surface resistivity, and change over time of the optical disks prepared in Examples 1 and 2 and Comparative Example were determined and shown in Table 1.
(以下余白) 第1表(Margin below) Table 1
第1図はこの発明の実施例で作製した先ディスクの説明
図、第2図は従来の光ディスクの説明図である。
ただし測定法は次の通りである。
鉛筆硬さ・・・・・・J I S K5400゜表面抵
抗率・・・・J I S K6911に準じる。
経時変化・・・・・高温高湿保持テスト(80°C19
0%RH1240時間)前後での表面観察。
この結果、実施例1及び2で得られた光ディスクは、表
面硬さと表面抵抗率で優れた性能を示し、その経時変化
もほとんど無いことが確認されに。
(ト)発明の効果
この発明によれば、表面硬さに優れると共に、帯電防止
性能が優れていて空中の微細粒子の付着カナく、かつ経
時変化がなく、稼動時にレーf−のトラック外れやエラ
ーの発生のないディスクを提供することが出来る。
l・・・・・プラスチック製光ディスク用基板、2・・
・・・・光磁気記録膜、3・・・・・記録膜用保護膜、
4 ・・・・表面硬質性膜、5−・・・帯電防止性膜。FIG. 1 is an explanatory diagram of a previous disc manufactured in an embodiment of the present invention, and FIG. 2 is an explanatory diagram of a conventional optical disc. However, the measurement method is as follows. Pencil hardness: JIS K5400 Surface resistivity: According to JIS K6911. Change over time...High temperature and high humidity retention test (80°C19
Surface observation before and after 0% RH (1240 hours). As a result, it was confirmed that the optical disks obtained in Examples 1 and 2 exhibited excellent performance in terms of surface hardness and surface resistivity, and showed almost no change over time. (G) Effects of the Invention According to the present invention, it has excellent surface hardness and antistatic performance, prevents the adhesion of fine particles in the air, and does not change over time, preventing the laser f- from going off track during operation. It is possible to provide error-free discs. l...Plastic optical disc substrate, 2...
... Magneto-optical recording film, 3... Protective film for recording film,
4...Hard surface film, 5-...Antistatic film.
Claims (1)
意図する側の面に、レーザー光を通過しうる表面硬質性
膜と酸化シリコン素系又は導電性粉末混合樹脂系帯電防
止性膜とが順に積層されてなる光ディスク。1. A hard surface film that allows laser light to pass through and an antistatic film based on silicon oxide or conductive powder mixed resin are laminated in this order on the side of the plastic optical disk substrate intended for laser incidence. An optical disc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2113832A JPH0411337A (en) | 1990-04-27 | 1990-04-27 | Optical disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2113832A JPH0411337A (en) | 1990-04-27 | 1990-04-27 | Optical disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0411337A true JPH0411337A (en) | 1992-01-16 |
Family
ID=14622163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2113832A Pending JPH0411337A (en) | 1990-04-27 | 1990-04-27 | Optical disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0411337A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04305830A (en) * | 1991-04-02 | 1992-10-28 | Kuraray Co Ltd | Optical information recording medium |
US7194988B2 (en) | 2004-11-16 | 2007-03-27 | Hitachi Koki Co., Ltd. | Combustion-type power tool |
US7484481B2 (en) | 2005-02-18 | 2009-02-03 | Hitachi Koki Co., Ltd. | Combustion-type power tool having switch protection arrangement |
US7815085B2 (en) | 2007-01-19 | 2010-10-19 | Hitachi Koki Co., Ltd. | Combustion type driving tool |
US7918373B2 (en) | 2006-03-08 | 2011-04-05 | Hitachi Koki Co., Ltd. | Combustion type power tool |
-
1990
- 1990-04-27 JP JP2113832A patent/JPH0411337A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04305830A (en) * | 1991-04-02 | 1992-10-28 | Kuraray Co Ltd | Optical information recording medium |
US5342669A (en) * | 1991-04-02 | 1994-08-30 | Kuraray Co., Ltd. | Optical information recording medium |
US7194988B2 (en) | 2004-11-16 | 2007-03-27 | Hitachi Koki Co., Ltd. | Combustion-type power tool |
US7484481B2 (en) | 2005-02-18 | 2009-02-03 | Hitachi Koki Co., Ltd. | Combustion-type power tool having switch protection arrangement |
US7918373B2 (en) | 2006-03-08 | 2011-04-05 | Hitachi Koki Co., Ltd. | Combustion type power tool |
US7815085B2 (en) | 2007-01-19 | 2010-10-19 | Hitachi Koki Co., Ltd. | Combustion type driving tool |
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