JPH0467332A - Optical disk and its manufacture - Google Patents

Optical disk and its manufacture

Info

Publication number
JPH0467332A
JPH0467332A JP2173788A JP17378890A JPH0467332A JP H0467332 A JPH0467332 A JP H0467332A JP 2173788 A JP2173788 A JP 2173788A JP 17378890 A JP17378890 A JP 17378890A JP H0467332 A JPH0467332 A JP H0467332A
Authority
JP
Japan
Prior art keywords
film
stress
recording medium
optical recording
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2173788A
Other languages
Japanese (ja)
Inventor
Toshiyuki Shibata
柴田 俊幸
Hisao Arimune
久雄 有宗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2173788A priority Critical patent/JPH0467332A/en
Publication of JPH0467332A publication Critical patent/JPH0467332A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the warp of an optical disk by making stress of the film of synthetic resin for substrate protection smaller than that of the film of synthetic resin for protecting an optical recording medium film and cancelling the stress of the optical recording medium film by means of the difference of the stress of two films. CONSTITUTION:The protection films 6 and 8 composed of ultraviolet ray hardening resins are provided on the surface and back of the substrate 2 composed of the transparent synthetic resin. The protection film 6 is for protecting the optical recording medium film and the protection film 8 is for protecting the back of the substrate 2. They are manufacture by a spin coat and the like and a pull stress is given by using contraction at the time of hardening. The pull stress is made large in the protection film 6 and small in the protection film 8. The stress of the optical recording medium film 4 is cancelled by the difference of stress in the protection films 6 and 8. Thus, the warp of the optical disk can be prevented.

Description

【発明の詳細な説明】 [発明の利用分野] この発明は、光ディスクの反りの防止に関し、特に基板
の両面に設けた紫外線硬化樹脂等の合成樹脂膜に応力を
持たせて、反りを防止することに関する。
[Detailed Description of the Invention] [Field of Application of the Invention] This invention relates to the prevention of warping of optical discs, and in particular, to applying stress to synthetic resin films such as ultraviolet curing resin provided on both sides of a substrate to prevent warping. Regarding things.

[従来技術] 基板上に光記録媒体の膜を設けた光ディスクは、大容量
の次世代記録素子として注目されている。
[Prior Art] Optical disks in which a film of an optical recording medium is provided on a substrate are attracting attention as high-capacity next-generation recording elements.

光記録媒体には、GdDyFe等の材料を用い、レーザ
光による局所加熱下で磁場を加えて書き込み、カー効果
を用いて読み出すものや、レーザ光での局所加熱による
相転移を利用するもの等が有る。
Optical recording media include those that use materials such as GdDyFe, write by applying a magnetic field under local heating with laser light, and read out using the Kerr effect, and those that utilize phase transition due to local heating with laser light. Yes.

ガラス基板では量産性やコストに問題が生じるため、光
ディスクの基板には一般にポリカーボネートやアクリル
等の透明合成樹脂基板が用いられる。しかしながら、合
成樹脂基板では、光記録媒体膜の応力による反りが生じ
る。そしてこの反りは、光ディスクのトラッキングやフ
ォーカシングを困難にする。
Since glass substrates pose problems in mass production and cost, transparent synthetic resin substrates such as polycarbonate and acrylic are generally used as substrates for optical discs. However, with synthetic resin substrates, warping occurs due to stress in the optical recording medium film. This warping makes tracking and focusing of the optical disc difficult.

基板の反りを解消するため、以下の手法が提案されてい
る。
In order to eliminate the warpage of the substrate, the following methods have been proposed.

(1)  光記録媒体膜による反りを相殺するように、
予め反った基板を製造する。
(1) To offset the warpage caused by the optical recording medium film,
Manufacturing a pre-warped substrate.

(2)光記録媒体膜の成膜条件を選び、反りを防止する
(2) Select film forming conditions for the optical recording medium film to prevent warping.

(3)基板の裏面に、光記録媒体膜と同種の膜を形成し
、応力を相殺する(特開昭64−57.441号)。
(3) A film of the same type as the optical recording medium film is formed on the back surface of the substrate to offset stress (Japanese Patent Application Laid-open No. 57-441-1983).

第1の手法は基板の製造が困難で非現実的である。第2
の手法は、光記録媒体膜の応力が特性と密接な関係を持
つため、限界がある。第3の手法も、反りの解消のため
に、複雑な真空プロセスを用いて成膜を行わねばならず
、好ましいものではない。
The first method is difficult to manufacture and is impractical. Second
This method has limitations because the stress of the optical recording medium film is closely related to its characteristics. The third method is also not preferable because it requires a complicated vacuum process to form the film in order to eliminate warpage.

(発明の課題] この発明の課題は、光ディスクの反りの防止に関する新
たな手法を提供し、基板の表裏両面に形成する合成樹脂
膜の応力を利用して、反りを防止することを課題とする
(Problem of the Invention) An object of the present invention is to provide a new method for preventing warpage of an optical disc, and to prevent warpage by utilizing the stress of a synthetic resin film formed on both the front and back surfaces of a substrate. .

[発明の構成と作用] この発明の光ディスクは、透明合成樹脂基板の1面に光
記録媒体膜とこの膜の保護用の合成樹脂膜とを設けると
共に、基板の裏面には基板保護用の合成樹脂膜を設けた
光ディスクにおいて、基板保護用の合成樹脂膜の応力を
、光記録媒体膜の保護用の合成樹脂膜の応力よりも小さ
くし、2つの膜の応力の差で、光記録媒体膜の応力を相
殺したことを特徴とする。
[Structure and operation of the invention] The optical disc of the present invention includes an optical recording medium film and a synthetic resin film for protecting the film on one side of a transparent synthetic resin substrate, and a synthetic resin film for protecting the substrate on the back side of the substrate. In an optical disk provided with a resin film, the stress of the synthetic resin film for protecting the substrate is made smaller than the stress of the synthetic resin film for protecting the optical recording medium film, and the stress difference between the two films is used to reduce the stress of the optical recording medium film. It is characterized by canceling out the stress of

このような光ディスクの製造には、例えば表裏両面の合
成樹脂膜を紫外線硬化樹脂のスピンコートで形成し、光
記録媒体膜側の紫外線硬化樹脂の硬化収縮率を反対面側
の紫外線硬化樹脂の硬化収縮率よりも大きくすれば良い
To manufacture such optical discs, for example, synthetic resin films on both the front and back sides are formed by spin coating with ultraviolet curable resin, and the curing shrinkage rate of the ultraviolet curable resin on the optical recording medium film side is adjusted by the curing shrinkage of the ultraviolet curable resin on the opposite side. It is sufficient if it is larger than the shrinkage rate.

合成樹脂基板に設けた光記録媒体膜は、圧縮応力を持つ
。この結果基板は、第1図に示すように、光記録媒体膜
側を凸面として反ろうとする。図において、2は透明合
成樹脂の基板、4は光記録媒体膜である。ここで基板2
の表裏に、紫外線硬化樹脂等の保護膜6,8を設ける。
The optical recording medium film provided on the synthetic resin substrate has compressive stress. As a result, the substrate tends to warp with the optical recording medium film side as a convex surface, as shown in FIG. In the figure, 2 is a transparent synthetic resin substrate, and 4 is an optical recording medium film. Here board 2
Protective films 6 and 8 made of ultraviolet curing resin or the like are provided on the front and back sides of the substrate.

保護膜6は光記録媒体膜4の保護用、保護膜8は基板2
の裏面の保護用である。保護膜6.8はスピンコート等
で製造し、硬化時の収縮を利用して、引張応力を持たせ
る。引張応力は保護膜6で大きく、保護膜8で小さくし
、光記録媒体膜4の応力を保護膜6゜8の応力の差で相
殺する。保護膜6.8に応力の差を持たせるには、例え
ば保護膜6に用いる樹脂の硬化収縮率を大きくし、保護
膜8に用いる樹脂の硬化収縮率を小さくすれば良い。
The protective film 6 is for protecting the optical recording medium film 4, and the protective film 8 is for protecting the substrate 2.
It is for protection of the back side of. The protective film 6.8 is manufactured by spin coating or the like, and is given tensile stress by utilizing shrinkage during curing. The tensile stress is large in the protective film 6 and small in the protective film 8, and the stress in the optical recording medium film 4 is offset by the difference in stress between the protective films 6.8. In order to provide the protective films 6.8 with a difference in stress, for example, the curing shrinkage rate of the resin used for the protective film 6 may be increased, and the curing shrinkage rate of the resin used for the protective film 8 may be decreased.

[実施例] 第1図に、実施例の基本的概念を示す。図において、2
はポリカーボネート樹脂等の合成樹脂の透明基板で、エ
ポキシ樹脂やポリエステル樹脂、あるいはアクリル樹脂
等でも良い。4は光記録媒体膜で、GdDyFe等の光
磁気記録媒体膜を2つの誘電体膜でサンドイッチし、そ
の上部に金属反射膜を積層したもの等を用いる。6は紫
外線硬化樹脂の保護膜で、光記録媒体膜4の保護に用い
る。
[Example] FIG. 1 shows the basic concept of the example. In the figure, 2
is a transparent substrate made of synthetic resin such as polycarbonate resin, and may also be made of epoxy resin, polyester resin, acrylic resin, or the like. Reference numeral 4 denotes an optical recording medium film, which is made by sandwiching a magneto-optical recording medium film such as GdDyFe between two dielectric films and laminating a metal reflective film on top thereof. Reference numeral 6 denotes a protective film made of ultraviolet curing resin, which is used to protect the optical recording medium film 4 .

8は、基板2の裏面を保護するための、紫外線硬化樹脂
の保護膜である。
8 is a protective film made of ultraviolet curing resin for protecting the back surface of the substrate 2.

光記録媒体膜4には、図の黒抜き矢印の向きの圧縮応力
が有り、基板2を図のように反らせようとする。圧縮応
力が有るのは、(1)  光記録媒体膜4の成膜時に圧
縮応力が発生することと、(2)光記録媒体膜4の特性
と圧縮応力とが関連し、圧縮応力の無い膜では記録特性
が低下すること、による。
The optical recording medium film 4 has a compressive stress in the direction of the black arrow in the figure, which tends to warp the substrate 2 as shown in the figure. The reason for the presence of compressive stress is that (1) compressive stress is generated during film formation of the optical recording medium film 4, and (2) the characteristics of the optical recording medium film 4 are related to the compressive stress. This is because recording characteristics deteriorate.

光記録媒体膜4の圧縮応力を、保護膜6,8の応力の差
で相殺する。即ち、保護膜の硬化時の収縮を利用し、保
護膜6,8に図の白抜き矢印の向きの応力を発生させる
。ここで保護膜6の硬化収縮率を大きくし、応力を大き
くする。−刃保護膜8の硬化収縮率を小さくし、応力を
小さくする。
The compressive stress of the optical recording medium film 4 is offset by the difference in stress between the protective films 6 and 8. That is, by utilizing the shrinkage of the protective film during curing, stress is generated in the protective films 6 and 8 in the direction of the white arrow in the figure. Here, the curing shrinkage rate of the protective film 6 is increased to increase the stress. - Reduce the curing shrinkage rate of the blade protective film 8 and reduce the stress.

そして2つの応力の差で光記録媒体膜4の応力を打ち消
し、基板の反りを防止する。なお保護膜6゜8の応力は
、硬化収縮率の他に膜厚の影響を受け、応力は膜厚に比
例する。そこで保護膜6,8の膜厚を調整して、応力の
差を制御することもできる。
The difference between the two stresses cancels out the stress in the optical recording medium film 4 and prevents the substrate from warping. The stress of the protective film 6.8 is affected by the film thickness in addition to the curing shrinkage rate, and the stress is proportional to the film thickness. Therefore, the difference in stress can be controlled by adjusting the thickness of the protective films 6 and 8.

熱翳珂 直径130市のポリカーボネート樹脂基板2を。hot shade A polycarbonate resin substrate 2 with a diameter of 130 mm.

用い、第2図に示す光ディスクを製造した。光記録媒体
膜4は、4室のマグネトロン・スパッタリング装置で成
膜した。最初に、非晶質イツトリウム・サイアロン膜1
0を920A厚に形成し、次いでGdDyFe系光磁気
記録膜12を200A厚に形成した。更にイツトリウム
・サイアロン膜14を300A厚に設け、金属A1反射
膜16を80OA厚に積層した。イツトリウム・サイア
ロンはSing 、Si○、Ce0z 、ZrO2、T
iO2、Bi2O2、ZnS、Sb2S3,513N4
等の材料に変えることができ、GdDyFeは、GdD
yFeCo。
Using this method, an optical disc shown in FIG. 2 was manufactured. The optical recording medium film 4 was formed using a four-chamber magnetron sputtering device. First, amorphous yttrium sialon film 1
0 was formed to a thickness of 920A, and then a GdDyFe-based magneto-optical recording film 12 was formed to a thickness of 200A. Further, a yttrium sialon film 14 was provided to a thickness of 300 Å, and a metal A1 reflective film 16 was laminated to a thickness of 80 Å. Yztrium Sialon is Sing, Si○, Ce0z, ZrO2, T
iO2, Bi2O2, ZnS, Sb2S3, 513N4
GdDyFe can be changed to other materials such as GdD
yFeCo.

GdTbFe、TbFeCo、DyFeCo、GdTb
DyFe。
GdTbFe, TbFeCo, DyFeCo, GdTb
DyFe.

GdTbFeCo、TbDyFeCo、NdGdDyF
e。
GdTbFeCo, TbDyFeCo, NdGdDyF
e.

NdDyFeCo、NdGdDyFeCo等の材料に変
えることができる。金属反射層16には、AIに変えて
T1やCr等も用い得る。
Materials such as NdDyFeCo and NdGdDyFeCo can be used. For the metal reflective layer 16, T1, Cr, etc. may be used instead of AI.

基板2の表裏両面にスピンコートで、保護膜6゜8を設
けた。保護膜6,8の材料には紫外線硬化樹脂を用い、
保護膜6には硬化収縮率が11.4%の樹脂(輿脂A、
アクリル酸エステルポリマー系、大日本インキ化学工業
製の5DI7”5D17は商品名)を用いた。保護膜8
には硬化収縮率が7.6%の樹脂(櫃脂B、ウレタンア
クリレートとアクリル酸エステルポリマーとの共重合体
、大日本インキ化学工業製の“5D301″5D301
は商品名)を用いた。保護膜6.8の材料にはこれ以外
に、エポキシ系や、ポリエステル系、アクリル系等の紫
外線硬化樹脂等を用いることができる。また硬化収縮率
の小さな樹脂Bには、これ以外に例えば、大日本インキ
化学工業製のアクリル酸エステルポリマー系の“5DI
OI” (SDIOIは商品名)や、同じくアクリル酸
エステルポリマー系の“EX−3” (EX−3は商品
名)等が有る。
A protective film 6°8 was provided on both the front and back surfaces of the substrate 2 by spin coating. The protective films 6 and 8 are made of ultraviolet curing resin,
The protective film 6 is made of a resin with a curing shrinkage rate of 11.4% (Koshi A,
An acrylic acid ester polymer-based product (trade name: 5DI7"5D17 manufactured by Dainippon Ink and Chemicals) was used. Protective film 8
A resin with a curing shrinkage rate of 7.6% (Katsuo B, a copolymer of urethane acrylate and acrylic ester polymer, "5D301" 5D301 manufactured by Dainippon Ink and Chemicals) was used.
(trade name) was used. In addition to these materials, the protective film 6.8 may be made of ultraviolet curing resins such as epoxy, polyester, and acrylic resins. In addition, resin B with a small curing shrinkage rate may include, for example, acrylic ester polymer "5DI" manufactured by Dainippon Ink and Chemicals.
There are "OI" (SDIOI is a trade name) and "EX-3" (EX-3 is a trade name) which is also an acrylic acid ester polymer.

得られた光ディスクの種類と反り角を表1に示す。Table 1 shows the types and warp angles of the optical discs obtained.

表   l 熱! 保護膜6   保護膜8  反り角(mRad)
l   AX9μm   Bx5μm   2.52 
  AX5μm   Bx5μm   3.23   
BX5μm   Bx5μm   4.84   BX
5μm   AX5μm   7−55  ・・・ 0
μm  ・・・ 0μm  4.5* Aは収縮率11
.4(%cm/c+i)の樹脂を。
Table l Heat! Protective film 6 Protective film 8 Warp angle (mRad)
l AX9μm Bx5μm 2.52
AX5μm Bx5μm 3.23
BX5μm Bx5μm 4.84 BX
5μm AX5μm 7-55...0
μm...0μm 4.5* A is contraction rate 11
.. 4 (%cm/c+i) of resin.

Bは収縮率7.6(%am/Cm)の樹脂を示す。B indicates a resin with a shrinkage rate of 7.6 (%am/Cm).

表1から明らかなように、保護膜6の収縮率を大きく、
保護膜8の収縮率を小さくすると、光ディスクの反りを
小さくすることができる。これは保護膜6,8の応力の
差で、光記録媒体膜4の圧縮応力を相殺したことによる
。保護膜6の膜厚を太きくじ引張応力を大きくした試料
lでは、反り角は特に小さい。次に保護膜6.8の収縮
率を同じにした試料3では、反り角は保護膜6.8を設
けなかった試料4とほぼ等しい。また収縮率の関係を逆
にした試料3では、反り角は増大する。
As is clear from Table 1, the shrinkage rate of the protective film 6 is increased.
By reducing the shrinkage rate of the protective film 8, the warpage of the optical disc can be reduced. This is because the compressive stress of the optical recording medium film 4 is offset by the stress difference between the protective films 6 and 8. In sample 1 in which the protective film 6 was thicker and the tensile stress was increased, the warp angle was particularly small. Next, in sample 3 in which the protective film 6.8 had the same shrinkage rate, the warp angle was almost the same as in sample 4 in which the protective film 6.8 was not provided. In addition, in sample 3 in which the shrinkage rate relationship was reversed, the warp angle increased.

第2図の光ディスクを2枚、光記録媒体膜4が向き合う
ように、ホットメルト接着剤18をロールコートして貼
り合わせ、第3図の光ディスクを得た。この光ディスク
の場合、ホットメルト接着剤18のなめ、反り角の初期
値は小さいが苛酷な環境にさらすと反りが戻ってしまう
。表2に、80℃、相対湿度85%の雰囲気で、100
0時間の耐久テストを行った際の結果を示す。
Two optical disks shown in FIG. 2 were bonded together by roll coating with hot melt adhesive 18 so that the optical recording medium films 4 faced each other to obtain the optical disk shown in FIG. 3. In the case of this optical disk, although the initial value of the curvature angle of the hot melt adhesive 18 is small, the curvature returns when exposed to a harsh environment. Table 2 shows that 100
The results of a 0-hour durability test are shown.

表2 1    1.5   2.0   発生せず2   
 1.3   2.1   発生せず3    1.4
   4.0   外周部に2個発生4    1.5
   6.2   外周部に8個発生本試料番号は、表
1の試料番号と同じ。
Table 2 1 1.5 2.0 Not occurred 2
1.3 2.1 Not occurred3 1.4
4.0 Two occur on the outer periphery 4 1.5
6.2 8 occurred on the outer periphery This sample number is the same as the sample number in Table 1.

第3図の試料では、ホットメルト接着剤18のため、反
り角の初期値は小さい。しかし耐久テストを行うと反り
角は元の傾向に戻り、保護膜6゜8の応力差で光記録媒
体膜4の応力を相殺していない試料3.4では、大きな
反りが発生する。これらの試料の場合、反りの発生は光
記録媒体膜4の耐久性にも影響し、試料3.4では耐久
テストの過程で腐食が発生している。
In the sample shown in FIG. 3, the initial value of the warp angle is small because of the hot melt adhesive 18. However, when a durability test is carried out, the warpage angle returns to its original tendency, and large warpage occurs in sample 3.4 in which the stress of the optical recording medium film 4 is not offset by the stress difference of the protective film 6°8. In the case of these samples, the occurrence of warpage also affects the durability of the optical recording medium film 4, and corrosion occurred in samples 3 and 4 during the durability test.

ここでは特定の実施例を説明したがこれに限るものでは
なく、例えば光記録媒体膜4には相転移型のもの等も用
い得る。また保護膜6,8には導電性セラミックの微粒
子等を混入し、保護II6゜8へのほこり等の付着を防
止するようにしても良い。
Although a specific embodiment has been described here, the present invention is not limited to this, and for example, a phase change type may also be used for the optical recording medium film 4. Further, fine conductive ceramic particles or the like may be mixed in the protective films 6 and 8 to prevent dust and the like from adhering to the protective films 6 and 8.

[発明の効果コ この発明では、光ディスクの反りを、基板の両面に設け
た保護膜の応力の差で防止する。また貼り合わせ型の光
ディスクの場合、反りを防止すると共に、光記録媒体膜
の腐食を防止し、光ディスクの耐久性を高める。
[Effects of the Invention] In this invention, warping of an optical disk is prevented by the difference in stress between the protective films provided on both sides of the substrate. In the case of a laminated optical disc, it prevents warping and corrosion of the optical recording medium film, increasing the durability of the optical disc.

第1図は実施例の光ディスクの断面図、第2図はその要
部拡大断面図、 第3図は変形例の断面図である。
FIG. 1 is a sectional view of an optical disk according to an embodiment, FIG. 2 is an enlarged sectional view of a main part thereof, and FIG. 3 is a sectional view of a modified example.

図において、 2 基板、      4 光記録媒体膜6 光記録媒
体膜用の紫外線硬化樹脂保護膜8 基板裏面の保護用の
紫外線効果樹脂保護膜。
In the figure, 2 substrate, 4 optical recording medium film 6, ultraviolet curable resin protective film for optical recording medium film 8, ultraviolet ray effect resin protective film for protecting the back surface of the substrate.

Claims (2)

【特許請求の範囲】[Claims] (1)透明合成樹脂基板の1面に光記録媒体膜とこの膜
の保護用の合成樹脂膜とを設けると共に、基板の裏面に
は基板保護用の合成樹脂膜を設けた光ディスクにおいて
、 基板保護用の合成樹脂膜の応力を、光記録媒体膜の保護
用の合成樹脂膜の応力よりも小さくし、2つの膜の応力
の差で、光記録媒体膜の応力を相殺したことを特徴とす
る、光ディスク。
(1) In an optical disc in which an optical recording medium film and a synthetic resin film for protecting this film are provided on one side of a transparent synthetic resin substrate, and a synthetic resin film for protecting the substrate is provided on the back side of the substrate, the substrate is protected. The stress of the synthetic resin film for protection of the optical recording medium film is made smaller than the stress of the synthetic resin film for protecting the optical recording medium film, and the stress of the optical recording medium film is offset by the difference in stress between the two films. ,optical disk.
(2)透明合成樹脂基板の1面に光記録媒体膜を設ける
と共に、基板の表裏両面に紫外線硬化樹脂膜をスピンコ
ートする光ディスクの製造方法において、 光記録媒体膜側の紫外線硬化樹脂の硬化収縮率を、反対
面側の紫外線硬化樹脂の硬化収縮率よりも大きくしたこ
とを特徴とする、光ディスクの製造方法。
(2) In an optical disc manufacturing method in which an optical recording medium film is provided on one side of a transparent synthetic resin substrate and an ultraviolet curable resin film is spin-coated on both the front and back surfaces of the substrate, curing shrinkage of the ultraviolet curable resin on the optical recording medium film side. A method for manufacturing an optical disc, characterized in that the curing shrinkage rate of the ultraviolet curable resin on the opposite side is made larger than the curing shrinkage rate of the ultraviolet curing resin on the opposite side.
JP2173788A 1990-06-30 1990-06-30 Optical disk and its manufacture Pending JPH0467332A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2173788A JPH0467332A (en) 1990-06-30 1990-06-30 Optical disk and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2173788A JPH0467332A (en) 1990-06-30 1990-06-30 Optical disk and its manufacture

Publications (1)

Publication Number Publication Date
JPH0467332A true JPH0467332A (en) 1992-03-03

Family

ID=15967163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2173788A Pending JPH0467332A (en) 1990-06-30 1990-06-30 Optical disk and its manufacture

Country Status (1)

Country Link
JP (1) JPH0467332A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0918323A2 (en) * 1997-11-19 1999-05-26 Sharp Kabushiki Kaisha Optical disk
EP1031972A2 (en) * 1999-02-24 2000-08-30 Sharp Kabushiki Kaisha Optical information recording medium
WO2003017266A1 (en) * 2001-08-10 2003-02-27 Tdk Corporation Optical recording medium
JP2003059097A (en) * 2001-08-10 2003-02-28 Tdk Corp Optical recording medium
KR100444711B1 (en) * 2000-11-15 2004-08-16 샤프 가부시키가이샤 Optical Data Recording Medium
KR100858597B1 (en) * 2001-06-07 2008-09-17 마츠시타 덴끼 산교 가부시키가이샤 Optical information recording medium production method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0918323A2 (en) * 1997-11-19 1999-05-26 Sharp Kabushiki Kaisha Optical disk
EP0918323A3 (en) * 1997-11-19 2000-08-30 Sharp Kabushiki Kaisha Optical disk
US6128274A (en) * 1997-11-19 2000-10-03 Sharp Kabushiki Kaisha Optical recording disk capable of suppressing bimetallic effects caused by thermal expansion
EP1031972A2 (en) * 1999-02-24 2000-08-30 Sharp Kabushiki Kaisha Optical information recording medium
EP1031972A3 (en) * 1999-02-24 2002-10-16 Sharp Kabushiki Kaisha Optical information recording medium
US6657948B1 (en) * 1999-02-24 2003-12-02 Sharp Kabushiki Kaisha Optical information recording medium
KR100444711B1 (en) * 2000-11-15 2004-08-16 샤프 가부시키가이샤 Optical Data Recording Medium
KR100858597B1 (en) * 2001-06-07 2008-09-17 마츠시타 덴끼 산교 가부시키가이샤 Optical information recording medium production method
WO2003017266A1 (en) * 2001-08-10 2003-02-27 Tdk Corporation Optical recording medium
JP2003059097A (en) * 2001-08-10 2003-02-28 Tdk Corp Optical recording medium

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