JPH01119934A - Optical disk - Google Patents
Optical diskInfo
- Publication number
- JPH01119934A JPH01119934A JP62277339A JP27733987A JPH01119934A JP H01119934 A JPH01119934 A JP H01119934A JP 62277339 A JP62277339 A JP 62277339A JP 27733987 A JP27733987 A JP 27733987A JP H01119934 A JPH01119934 A JP H01119934A
- Authority
- JP
- Japan
- Prior art keywords
- light beam
- film
- transparent conductive
- irradiated
- plastic substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 229920005989 resin Polymers 0.000 claims abstract description 23
- 239000011347 resin Substances 0.000 claims abstract description 23
- 229920003023 plastic Polymers 0.000 claims abstract description 20
- 230000001681 protective effect Effects 0.000 claims abstract description 13
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 5
- 239000004416 thermosoftening plastic Substances 0.000 claims abstract 2
- 239000011248 coating agent Substances 0.000 abstract description 19
- 238000000576 coating method Methods 0.000 abstract description 19
- 239000004033 plastic Substances 0.000 abstract description 19
- 230000000694 effects Effects 0.000 abstract description 15
- 229920000728 polyester Polymers 0.000 abstract description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 abstract description 2
- 238000003848 UV Light-Curing Methods 0.000 abstract 3
- 238000006748 scratching Methods 0.000 abstract 2
- 230000002393 scratching effect Effects 0.000 abstract 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 description 6
- 229920005992 thermoplastic resin Polymers 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- -1 vinyl compound Chemical class 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910006853 SnOz Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光ビームの照射によって情報信号を再生でき
る光ディスクに係わり、特に、基板の保護膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an optical disc in which information signals can be reproduced by irradiation with a light beam, and particularly to a protective film for a substrate.
光ディスクの基板の材料としては、生産性、コストなど
の面から、−ａに、ＰＣ（ポリカーボネイト樹脂） 、
ＰＭＭＡ （ポリメチルメタクリレート樹脂）などの熱
可塑性樹脂が用いられている。From the viewpoint of productivity and cost, the materials for the substrate of the optical disc are PC (polycarbonate resin), PC (polycarbonate resin),
Thermoplastic resins such as PMMA (polymethyl methacrylate resin) are used.
このようなプラスチック材料からなるＭｔｔｆｉ、すな
わち、プラスチック基板の一方の面には情報信号を表わ
すピット列からなるトラックが形成されており、他方の
面から光ビームを照射してトラックを走査することによ
り、情報信号を再生することができる。Mttfi made of such a plastic material, that is, a plastic substrate, has a track consisting of a pit row representing an information signal formed on one side, and by scanning the track by irradiating a light beam from the other side. , the information signal can be reproduced.
かかる光ディスクにおいては、情報信号を良好に再生で
きるためには、プラスチック基板め光ビームが照射され
る面、すなわち光ビーム照射面が一様に平坦でかつ塵芥
などが付着しないことが必要である。In such an optical disc, in order to be able to reproduce information signals satisfactorily, it is necessary that the surface of the plastic substrate onto which the light beam is irradiated, that is, the light beam irradiation surface, be uniformly flat and free from dust and the like.
しかしながら、従来では、光ビーム照射面は露出されて
おり、このために、傷がついたり、塵芥などが付着しや
すかった。光ビーム照射面に傷がつくと、そこに照射さ
れる光ビームが乱反射され、再生情報信号にレベル変動
が生ずるし、塵芥などが付着したときにも、そこでの光
ビームの透過量が変化して再生情報信号にレベル変動が
生ずる。However, in the past, the light beam irradiation surface was exposed, which made it easy for it to be scratched and for dirt to adhere to it. If the light beam irradiation surface is scratched, the light beam irradiated thereon will be reflected diffusely, causing level fluctuations in the reproduced information signal, and if dust or other particles adhere to the surface, the amount of light beam transmitted there will change. This causes level fluctuations in the reproduced information signal.
光ビーム照射面に塵芥などが付着したときにはこれらを
拭き取ればよいが、プラスチック基板は比較的柔らかい
ために、光ビーム照射面に傷がつきやすいし、また、光
ビーム照射面が帯電して塵芥がより付着しやすくなる。If dirt or debris adheres to the light beam irradiation surface, it can be wiped off, but since the plastic substrate is relatively soft, the light beam irradiation surface is easily scratched, and the light beam irradiation surface may be charged and dust may accumulate. It will stick more easily.
一方、プラスチック基板の光ビーム照射面側に保護膜を
設けることが知られている。その−例として、実開昭５
４ １７９１０４号公報においては、保護膜とし°ζシ
リコン化合物とビニール化合物との混合体とし、光ビー
ム照射面の防曇性、耐擦傷性を改善した光ディスクが開
示されている。On the other hand, it is known to provide a protective film on the side of the plastic substrate irradiated with the light beam. As an example,
No. 4,179,104 discloses an optical disk in which a mixture of a silicon compound and a vinyl compound is used as a protective film to improve the antifogging properties and scratch resistance of the surface irradiated with a light beam.
しかし、かかる混合体は熱硬化性ＩＪ１１であり、これ
を硬化させるためには数時間を要して光デ・１スクの生
産性に問題があるし、また、硬化温度が比較的高温であ
るために、プラスチック基板が熱変形してしまうという
問題がある。However, such a mixture is thermosetting IJ11, and it takes several hours to cure it, which poses a problem in the productivity of optical disks, and the curing temperature is relatively high. Therefore, there is a problem that the plastic substrate is thermally deformed.
これに対して、スパッタ法によって保ｒ１膜を形成し、
これに帯電防止効果をもたせることが考えられる。その
考えられる一例としては、Ｓ ｉ ＯｔやＳ ｉ Ｎに
帯電防止剤を混入することであり、他の例としては、Ｉ
ＴＯ（酸化インジュームすず）、Ｓ ｎ Ｏｚなどの無
機透明導電性化合物を用いることである。On the other hand, a protective r1 film was formed by sputtering,
It is conceivable to provide this with an antistatic effect. One possible example is to mix an antistatic agent into S i Ot or S i N, and another example is to mix I
The method is to use an inorganic transparent conductive compound such as TO (indium tin oxide) or SnOz.
しかしながら、保護膜に帯電防止剤を混入する場合には
、帯電防止効果を長期にわたって持続させることは困難
であり、また、高温高温条件下で被膜特性の劣化が生ず
るという問題があった。However, when an antistatic agent is mixed into the protective film, it is difficult to maintain the antistatic effect over a long period of time, and there are also problems in that the film properties deteriorate under high temperature conditions.
無機透明導電性化合物を保！！膜として用いろ場合には
、この保護膜の硬度に比べてプラスチック基板の硬度が
非常に低く、このために、保ｉｌ！膜とプラスチック基
板との密着性が非常に悪いという問題があった。Preserves inorganic transparent conductive compounds! ! When used as a film, the hardness of the plastic substrate is very low compared to the hardness of this protective film, and for this reason, it is difficult to maintain the protection. There was a problem in that the adhesion between the film and the plastic substrate was very poor.
本発明の目的は、かかる問題点を解消し、プラスチック
基板と保護膜との密着性を改善し、光ビーム照射面側で
優れた耐擦傷性、帯電防止効果を長期にわたって持続す
ることができるようにした光ディスクを提供することに
ある。The purpose of the present invention is to solve such problems, improve the adhesion between the plastic substrate and the protective film, and maintain excellent scratch resistance and antistatic effect on the light beam irradiated surface side for a long period of time. The objective is to provide optical discs that are made of
上記目的を達成するために、本発明は、熱可塑性プラス
チック基板の光ビーム照射面に、紫外線硬化樹脂被膜と
透明導電性被膜とからなる保護膜を設ける。In order to achieve the above object, the present invention provides a protective film made of an ultraviolet curable resin film and a transparent conductive film on the light beam irradiated surface of a thermoplastic plastic substrate.
以下、本発明の実施例を図面によって説明する。 Embodiments of the present invention will be described below with reference to the drawings.
図は本発明による光ディスクの一実施例を示す断面図で
あって、１はプラスチック基板、２′は紫外線硬化樹脂
被膜、３は透明導電性被膜である。The figure is a sectional view showing an embodiment of the optical disc according to the present invention, in which 1 is a plastic substrate, 2' is an ultraviolet curing resin coating, and 3 is a transparent conductive coating.
同図において、プラスチック基板ｌは、たとえばＰＣ，
ＰＭＭＡなどの熱可塑性樹脂からなり、その一方の面に
は、ピット列からなる渦巻状もしくは同心円状のトラッ
クが形成されている。プラスチック基板ｌの他方の面は
再生用の光ビームが照射される光ビーム照射面であり、
この光ビ、−ム照射面上に紫外線硬化樹脂被膜２が設け
られ、さらにその上に透明導電性被膜３が設けられてい
る。In the same figure, the plastic substrate l is, for example, a PC,
It is made of thermoplastic resin such as PMMA, and a spiral or concentric track consisting of pit rows is formed on one side. The other surface of the plastic substrate l is a light beam irradiation surface on which a reproduction light beam is irradiated,
An ultraviolet curing resin coating 2 is provided on the surface irradiated with this light beam, and a transparent conductive coating 3 is further provided thereon.
これら紫外線硬化樹脂被膜２と透明導電性被膜３とが光
ビーム照射面の保護膜を形成している。These ultraviolet curing resin film 2 and transparent conductive film 3 form a protective film for the light beam irradiated surface.
紫外線硬化樹脂被膜２は、たとえばポリエステル系、ポ
リウレタン系もしくはエポキシ系アクリレート樹脂など
の紫外線硬化樹脂からなり、熱可塑性樹脂からなるプラ
スチック基板との密着性に優れ、しかも硬度が非常に高
いことから、プラスチック基板１の光ビーム照射面側の
耐擦傷性を高めることになる。また、透明導電性被膜３
は、たとえばＩＴＯやＳｎＯ□などの無機導電性化合物
あるいは有機導電性化合物からなり、光ビーム照射面側
に帯電防止効果をもたせるものである。特に、無機導電
性化合物からなる透明導電性波Ｂ３は高硬度であり、紫
外線硬化樹脂被膜２が高硬度であることから、これとの
密着性が優れているし、これらの相乗効果によって光ビ
ーム照射面側の耐擦傷性がさらに向上する。The ultraviolet curable resin coating 2 is made of an ultraviolet curable resin such as polyester, polyurethane, or epoxy acrylate resin, and has excellent adhesion to a plastic substrate made of thermoplastic resin and has very high hardness. This increases the scratch resistance of the light beam irradiated surface of the substrate 1. In addition, the transparent conductive coating 3
is made of an inorganic conductive compound or an organic conductive compound such as ITO or SnO□, and has an antistatic effect on the surface irradiated with the light beam. In particular, since the transparent conductive wave B3 made of an inorganic conductive compound has high hardness and the ultraviolet curable resin coating 2 has high hardness, it has excellent adhesion with these, and due to the synergistic effect of these, the light beam The scratch resistance on the irradiated surface side is further improved.
次に、この光ディスクの製造方法の一具体例を説明する
。Next, a specific example of the method for manufacturing this optical disc will be described.
トラックが形成されたＰＣからなるプラスチック基板１
の光ビーム照射面にポリエステルアクリレート系の紫外
線硬化樹脂をスピンコード法によって塗布し、紫外線照
射によって硬化させて紫外線硬化被膜２を形成した。さ
らにその上に、スパッタ法によってＩＴＯからなる透明
導電性波ｓ３を形成した。Plastic substrate 1 made of PC with tracks formed on it
A polyester acrylate-based ultraviolet curable resin was coated on the light beam irradiated surface by a spin cord method and cured by ultraviolet irradiation to form an ultraviolet curable coating 2. Furthermore, transparent conductive waves s3 made of ITO were formed thereon by sputtering.
ここで、紫外線硬化樹脂波１ｆｆ２および透明導電性被
膜３の膜厚を種々異ならせ、夫々について密着性、耐擦
傷性およびプラスチック製布による５０００回の拭き取
り試験で生ずる帯電量の測定を行なった。この結果、紫
外線硬化樹脂被膜２の膜厚を０．５μｍより薄くすると
、充分な耐擦傷性が得られないし、１５μｍ以上とする
と、紫外線硬化樹脂被膜２にクラックが生じることがわ
かった。したがって、紫外線硬化樹脂被膜２の膜厚とし
ては、０．５〜１５μｍ、好ましくは１．０〜１０μｍ
に設定する必要がある。また、無機透明導電性被膜３の
膜厚を０．１μｍよりも薄くすると、充分な帯電防止効
果が得られないし、１．０μｍよりも厚い場合には、紫
外線硬化樹脂被膜２との密着性が充分でないということ
がわかった。したがって、無機透明導電性被膜３の膜厚
としては、０．１〜１．０μｍに設定する必要がある。Here, the film thicknesses of the ultraviolet curable resin wave 1ff2 and the transparent conductive film 3 were varied, and the adhesion, scratch resistance, and amount of charge generated in 5000 wiping tests with a plastic cloth were measured for each. As a result, it was found that if the thickness of the ultraviolet curable resin coating 2 is made thinner than 0.5 μm, sufficient scratch resistance cannot be obtained, and if the thickness is 15 μm or more, cracks occur in the ultraviolet curable resin coating 2. Therefore, the thickness of the ultraviolet curable resin coating 2 is 0.5 to 15 μm, preferably 1.0 to 10 μm.
It is necessary to set it to . Furthermore, if the thickness of the inorganic transparent conductive film 3 is made thinner than 0.1 μm, a sufficient antistatic effect cannot be obtained, and if it is thicker than 1.0 μm, the adhesion with the ultraviolet curable resin film 2 may deteriorate. It turns out it's not enough. Therefore, the thickness of the inorganic transparent conductive film 3 needs to be set to 0.1 to 1.0 μm.
さらに、６０’Ｃ，９０％ＲＨ，１０００時間の環境試
験を行なったところ、密着性、耐擦傷性、帯電防止効果
に変化は認められなかった。Furthermore, when an environmental test was conducted at 60'C, 90% RH, for 1000 hours, no change was observed in adhesion, scratch resistance, and antistatic effect.
以上のことは、紫外線硬化樹脂被膜２や無機透明導電性
被膜３に先に示した他の材料を用いても、はぼ同様の結
果が得られ、優れた密着性、耐擦傷性、帯電防止効果が
実現可能となった。The above shows that even if other materials shown above are used for the ultraviolet curable resin coating 2 and the inorganic transparent conductive coating 3, similar results can be obtained, with excellent adhesion, scratch resistance, and antistatic properties. The effect is now possible.
先に説明したように、熱可塑性樹脂によるプラスチック
基板に直接透明導電性被膜を形成する場合には、その膜
厚を０．５μｍ以上としなければ実用上充分な耐擦傷性
を得ることは困難であるが、この実施例の場合には、紫
外線硬化樹脂波１１！２、無機透明導電性被膜３とがと
もに高硬度であることから、これらの相乗効果により（
すなわち、これらの密着性が充分に高く、はぼ完全に一
体となることにより）、無機透明導電性被膜３の膜厚が
０．１μｍ程度でも、実用上問題のない耐擦傷性が得ら
れる。As explained earlier, when forming a transparent conductive film directly on a plastic substrate made of thermoplastic resin, it is difficult to obtain practically sufficient scratch resistance unless the film thickness is 0.5 μm or more. However, in the case of this example, since both the ultraviolet curing resin wave 11!2 and the inorganic transparent conductive coating 3 have high hardness, their synergistic effect causes (
That is, by having sufficiently high adhesion and being completely integrated), even if the thickness of the inorganic transparent conductive film 3 is about 0.1 μm, scratch resistance that does not cause any practical problems can be obtained.
因みに、スパッタ法によって熱可塑性樹脂のプラスチッ
ク基板に直接ＩＴＯの透明導電性被膜を０．５μｍの膜
厚で形成する場合、これには１時間程度要することにな
る。これに対して、上記実施例の場合、紫外線硬化樹脂
被膜２は、その膜厚にほとんど関係なく、紫外線硬化樹
脂の塗布、硬化処理を含めて３分間程度で形成され、Ｉ
ＴＯの透明導電性被膜３のスパッタ法による形成時間は
、膜厚を０．１〜１．０μｍとして数分間〜数１０分間
を要するが、この膜厚を０．１μｍ程度とすれば、正味
１０分間〜ｌＯ数分間程度で保８を膜の形成が可能とな
る。このように、無機透明導電性被膜３の膜厚を帯電防
止効果が充分得られる範囲内で薄くすることにより、熱
可塑性樹脂のプラスチック基板に直接無機透明導電性被
膜を設けた光ディスクに比べ、上記実施例は生産性が大
幅に向上することになる。Incidentally, when forming a transparent conductive film of ITO with a thickness of 0.5 μm directly on a plastic substrate made of thermoplastic resin by sputtering, it takes about one hour. On the other hand, in the case of the above embodiment, the ultraviolet curable resin film 2 is formed in about 3 minutes, including the application and curing treatment of the ultraviolet curable resin, almost regardless of the film thickness.
The time required to form the TO transparent conductive film 3 by sputtering is several minutes to several tens of minutes, assuming a film thickness of 0.1 to 1.0 μm; however, if this film thickness is approximately 0.1 μm, a net It is possible to form a film of about 800 mL in about 10 minutes to several minutes. In this way, by reducing the thickness of the inorganic transparent conductive coating 3 within a range that provides a sufficient antistatic effect, the above-mentioned optical discs are improved compared to optical discs in which an inorganic transparent conductive coating is directly provided on a thermoplastic resin plastic substrate. In this embodiment, productivity will be significantly improved.
なお、有機導電性化合物も、たとえば、ポリピロールな
どのように硬度が比較的高いものを透明導電性被膜３の
材料に用いることにより、同様の効果が得られることは
いうまでもない。It goes without saying that similar effects can be obtained by using an organic conductive compound with relatively high hardness, such as polypyrrole, as the material for the transparent conductive film 3.
以上説明したように、本発明によれば、熱可塑性プラス
チック基板と保護膜との密着性が大幅に向上するととも
に、該保護膜によって光ビーム照射面側の耐擦傷性、帯
電防止効果を大幅に向上し、しかも、これら優れた密着
性、耐擦傷性、帯電防止効果が長期にわたって保持され
る。As explained above, according to the present invention, the adhesion between the thermoplastic plastic substrate and the protective film is significantly improved, and the protective film significantly improves the scratch resistance and antistatic effect on the light beam irradiated surface side. Furthermore, these excellent adhesion, scratch resistance, and antistatic effects are maintained over a long period of time.
図は本発明による光ディスクの一実施例を示す断面図で
ある。
１・・・・・・・・・熱可塑性のプラスチック基板、２
・・・・・・・・・紫外線硬化樹脂被膜、３・・・・・
・・・・透明導電性被膜。The figure is a sectional view showing an embodiment of an optical disc according to the present invention. 1......Thermoplastic plastic substrate, 2
・・・・・・・・・Ultraviolet curing resin coating, 3・・・・・・
...Transparent conductive film.
Claims (1)
射面側に紫外線硬化樹脂被膜と透明導電性被膜とからな
る保護膜を設けたことを特徴とする光ディスク。An optical disc characterized in that a protective film consisting of an ultraviolet curable resin film and a transparent conductive film is provided on at least the light beam irradiation surface side of a thermoplastic transparent plastic substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62277339A JPH01119934A (en) | 1987-11-04 | 1987-11-04 | Optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62277339A JPH01119934A (en) | 1987-11-04 | 1987-11-04 | Optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01119934A true JPH01119934A (en) | 1989-05-12 |
Family
ID=17582148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62277339A Pending JPH01119934A (en) | 1987-11-04 | 1987-11-04 | Optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01119934A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03119530A (en) * | 1989-10-02 | 1991-05-21 | Hitachi Maxell Ltd | Optical information recording medium and production thereof |
| US5251202A (en) * | 1991-05-23 | 1993-10-05 | Ricoh Company, Ltd. | Optical information recording medium having multi-layered structures for preventing undesired reflection and electric charging |
| US5331625A (en) * | 1991-09-19 | 1994-07-19 | Sharp Kabushiki Kaisha | Optical disc with antistatic coating containing tin oxide and phosphorous |
| US5453975A (en) * | 1991-12-16 | 1995-09-26 | Sharp Kabushiki Kaisha | Optical disc with surface coating and manufacturing method therefor |
| US5529884A (en) * | 1994-12-09 | 1996-06-25 | Eastman Kodak Company | Backing layer for laser ablative imaging |
-
1987
- 1987-11-04 JP JP62277339A patent/JPH01119934A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03119530A (en) * | 1989-10-02 | 1991-05-21 | Hitachi Maxell Ltd | Optical information recording medium and production thereof |
| US5251202A (en) * | 1991-05-23 | 1993-10-05 | Ricoh Company, Ltd. | Optical information recording medium having multi-layered structures for preventing undesired reflection and electric charging |
| US5331625A (en) * | 1991-09-19 | 1994-07-19 | Sharp Kabushiki Kaisha | Optical disc with antistatic coating containing tin oxide and phosphorous |
| US5453975A (en) * | 1991-12-16 | 1995-09-26 | Sharp Kabushiki Kaisha | Optical disc with surface coating and manufacturing method therefor |
| US5529884A (en) * | 1994-12-09 | 1996-06-25 | Eastman Kodak Company | Backing layer for laser ablative imaging |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR0140534B1 (en) | Optical information recording media | |
| DE69922130D1 (en) | ULTRAVIOLET CURABLE COMPOSITION, OPTICAL PLATE AND METHOD FOR THE PRODUCTION THEREOF | |
| JPH01119934A (en) | Optical disk | |
| JPH05135408A (en) | Optical disk | |
| JP3086501B2 (en) | optical disk | |
| JP2540874B2 (en) | Optical recording medium | |
| JPS63188837A (en) | Optical disk | |
| JPS58196636A (en) | Recording and reproducing disk of digital signal | |
| JPS59198544A (en) | Optical information recording disc | |
| JPH0411337A (en) | Optical disk | |
| JPH06162565A (en) | Optical informaion recording medium | |
| JPH0474688A (en) | Optical recording medium | |
| JPH04212734A (en) | Optical disk and coating composition for optical disk | |
| JPS63251924A (en) | Disk and method for information recording | |
| JP3112467B2 (en) | Optical information recording medium | |
| JP2765858B2 (en) | Magnetic field modulation type disk | |
| JPH0395737A (en) | Optical information recording medium | |
| JPS6369048A (en) | Optical recording medium | |
| JP3272742B2 (en) | optical disk | |
| JPS6159641A (en) | Recording medium | |
| JPH04122689A (en) | Optical recording medium | |
| JP2973990B2 (en) | Manufacturing method of optical recording medium | |
| JPH02116034A (en) | Optical disk | |
| JPH0540962A (en) | Optical recording medium | |
| JPH05166326A (en) | Optical disk |