JPS62114439U - - Google Patents
Info
- Publication number
- JPS62114439U JPS62114439U JP149886U JP149886U JPS62114439U JP S62114439 U JPS62114439 U JP S62114439U JP 149886 U JP149886 U JP 149886U JP 149886 U JP149886 U JP 149886U JP S62114439 U JPS62114439 U JP S62114439U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- aperture
- rays
- mask
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- X-Ray Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986001498U JPH0322905Y2 (enExample) | 1986-01-08 | 1986-01-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986001498U JPH0322905Y2 (enExample) | 1986-01-08 | 1986-01-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62114439U true JPS62114439U (enExample) | 1987-07-21 |
| JPH0322905Y2 JPH0322905Y2 (enExample) | 1991-05-20 |
Family
ID=30779459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986001498U Expired JPH0322905Y2 (enExample) | 1986-01-08 | 1986-01-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322905Y2 (enExample) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62155516A (ja) * | 1985-12-27 | 1987-07-10 | Mitsubishi Electric Corp | X線露光装置 |
-
1986
- 1986-01-08 JP JP1986001498U patent/JPH0322905Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62155516A (ja) * | 1985-12-27 | 1987-07-10 | Mitsubishi Electric Corp | X線露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0322905Y2 (enExample) | 1991-05-20 |
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