JPS62113155A - Electrophotographic sensitive body - Google Patents

Electrophotographic sensitive body

Info

Publication number
JPS62113155A
JPS62113155A JP25404085A JP25404085A JPS62113155A JP S62113155 A JPS62113155 A JP S62113155A JP 25404085 A JP25404085 A JP 25404085A JP 25404085 A JP25404085 A JP 25404085A JP S62113155 A JPS62113155 A JP S62113155A
Authority
JP
Japan
Prior art keywords
layer
conductive substrate
sensitive body
photoreceptor
electrophotographic sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25404085A
Other languages
Japanese (ja)
Inventor
Koichi Aizawa
宏一 会沢
Toyoki Kazama
風間 豊喜
Kenichi Hara
健一 原
Toshiyuki Iijima
飯島 俊幸
Yukio Takano
幸雄 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP25404085A priority Critical patent/JPS62113155A/en
Publication of JPS62113155A publication Critical patent/JPS62113155A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08285Carbon-based
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214Silicon-based
    • G03G5/08221Silicon-based comprising one or two silicon based layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To obtain an a-Si type electrophotographic sensitive body superior in durability, printing resistance, and humidity resistance by coating the surface of an electrophotographic sensitive body having the a-Si type photosensitive layer with an a-C(H) film having an ESR spin density of 10<18>-10<19>cm<-3>. CONSTITUTION:The electrophotographic sensitive body is provided on a conductive substrate with an amorphous silicon (a-Si) type material, and further on this layer with the surface layer composed of amorphous carbon hydride {a-C(H)} having an electronic spin resonance density (ESR spin density) of 10<18>-10<19>cm<-3>. The photosensitive body is obtained by laminating on the conductive substrate 1, such as a stainless or aluminum plate, a blocking layer 2, the a-Si type photoconductive layer 3, a buffer layer 4, and the surface layer 5 made of a-C(H) or a-C(O, H), and the conductive substrate 1 may be of either cylindrical form or sheet, and a substrate prepared by subjecting the surface of a glass or resin plate to a treatment for giving electric conductivity may be used. The blocking layer 2 is used in order to block injection of electrostatic charge from the conductive substrate.

Description

【発明の詳細な説明】 〔発明の喘する技術分野〕 本発明は、光導電j#とじてアモルファスシリコンを用
いた電子写真感光体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an electrophotographic photoreceptor using amorphous silicon as a photoconductive material.

〔従来技術とその問題点〕[Prior art and its problems]

従来、電子写真感光体として例えずアモルファスSe、
またはアモルファスSeにAs 、 Te 、 Sbな
どの不純物をドープし光4ル曲材料を用いた感光体、あ
るいはZnOやCdSなどの光導電性材料を樹11「バ
インダーに分散させて用い7’c Ig光体などが使用
されている。しかしながら、これらの感光体は耐熱性、
環境汚染性、14械的強度の点で問題がある。
Conventionally, amorphous Se,
Alternatively, a photoreceptor made of amorphous Se doped with impurities such as As, Te, and Sb and used as a light-bending material, or a photoconductive material such as ZnO or CdS dispersed in a binder is used. Photoreceptors, etc. are used.However, these photoreceptors are heat resistant,
There are problems in terms of environmental pollution and mechanical strength.

近年、光導(性材料としてアモルファスシリコン(a 
−Si)を用いることによって、これら従来の(子写に
感光体の欠点を解決する技術が提案されている。蒸着あ
るいはスパッタリングによっテ作製されたa−8iは暗
所での比低抗が100・備と低く、また、光導電((が
啄めて小さいので電子写へ感光体用の光導(注材料とし
ては望ましくない。
In recent years, amorphous silicon (a
A technique has been proposed to solve the drawbacks of these conventional photoreceptors by using -Si). 100. In addition, the photoconductor (() is so small that it is not desirable as a light guide material for a photoreceptor (electrophotograph).

このよりなa−8iでは、5i−8i結合が切れたいわ
ゆるダングリングボンドが生成し、この欠陥に起因して
エネルギーギャップ内に多くの局在準位が存在する。こ
のために熱励起担体のホッピング伝導が生じて暗比抵抗
が小さく々す、また光)助起担本が局在準位に補導され
るために光導を性が悪くなっている。
In this twisted a-8i, a so-called dangling bond is generated in which the 5i-8i bond is broken, and many localized levels exist within the energy gap due to this defect. For this reason, hopping conduction of thermally excited carriers occurs and the dark specific resistance becomes small, and the optically assisted carriers are guided to localized levels, resulting in poor light guiding.

これに対してシランガス(S iH4)のグロ一枚1分
蝉またけ光CVDによって作製した水素化アモルファス
シリコン(a −St (H) )では上記欠陥を水素
原子(1()でFi 41 L、SiK Hを端金させ
ることによつてダングリングボンドの数を大幅に低減で
きるので光導電性が啄めて良好になり、pをおよび11
 rjliの価電子制御もoT能となったが、暗比抵抗
値は高々10〜10Ω・備であって電子写真感光体とし
て充分な10Ω・m以Eの暗比抵抗l1iiK対してま
だ低いつ 従ってこのよりなa −5i(H)からなる感光体は表
面電位の暗減衰速度が大きく初期帯電位が低い。
On the other hand, in hydrogenated amorphous silicon (a-St (H)) produced by photochemical CVD using silane gas (S iH4) for one minute, the above defects are replaced by hydrogen atoms (Fi41L, The number of dangling bonds can be greatly reduced by using SiK H as a metallurgy, which improves the photoconductivity and improves p and 11.
The valence electron control of rjli has also become OT, but the dark specific resistance value is at most 10 to 10 Ω·m, which is still low compared to the dark specific resistance l1iiK of 10 Ω·m or more, which is sufficient for an electrophotographic photoreceptor. A photoreceptor made of this a-5i (H) has a high dark decay rate of surface potential and a low initial charge potential.

そこで、このよりなa−8t(H)に(苛保持能を付与
するため、111う宋を適量ドープすることにより暗比
抵抗を100・副以上まで高め、カールノン方式による
精子プロセスに適用することを可能にしてAる。
Therefore, in order to impart caustic retention ability to this a-8t(H), we doped an appropriate amount of 111Usong to increase its dark resistivity to over 100%, and applied it to the sperm process using the Carlnon method. A by making it possible.

このようなa −Si (H)を表面とする感光体は初
切的には良好な画・象が得られるものの、長期間大気中
あるいは高湿中に保存しておいた漫画llj評価した場
合しばしば画1′J!不良を発生することが判明してい
る。また、多数回複写プロセスを経倹するとしだいに画
1ψぼけを生じてくることもわかっている。このような
劣化した感光体は特に高湿中において面1象ぼけを発生
しやすく、複写回数が増すと画11!ぼけを生じ始める
臨界湿度はしだいに下がるi1向があることが確かめら
れている。
Although a photoconductor with such a-Si (H) surface can produce good images initially, when evaluating manga that has been stored in the atmosphere or high humidity for a long period of time, Often picture 1'J! It has been found that defects occur. It is also known that as the copying process is repeated many times, image 1ψ blurring gradually occurs. Such a deteriorated photoreceptor is likely to cause image 11 blurring, especially in high humidity environments, and as the number of copies increases, image 11! It has been confirmed that there is an i1 direction in which the critical humidity at which blurring begins to gradually decrease.

上述のごと(、a −5i(H)を表面とする感光体は
長期にわたって大気や湿気にさらされることにより、あ
るいは複写プロセスにおけるコロナ放心などで生成され
る化学種(オゾン、窒素酸化物。
As mentioned above, photoreceptors with a-5i(H) surfaces are exposed to chemical species (ozone, nitrogen oxides, etc.) that are generated due to long-term exposure to the atmosphere or moisture, or due to corona loss during the copying process.

発生期酸素など)により、感光体最表面が影響を受けや
すく何らかの化学的な変質によって画1象不良を発生す
るものと考えられているが、その劣化メカニズムについ
てはこれまでにまだ十分な検討はなされていない。この
ような画像不良の発生を防止し耐刷性を向上するために
、a−8t(H)感光体の表面に保¥!i1−を設けて
化学的安定化を図る方法が試みられている。
It is believed that the outermost surface of the photoreceptor is susceptible to exposure to nascent oxygen (e.g., nascent oxygen) and that some kind of chemical deterioration causes image defects, but the mechanism of this deterioration has not yet been fully investigated. Not done. In order to prevent the occurrence of such image defects and improve printing durability, the surface of the a-8t(H) photoreceptor is coated with a coating. Attempts have been made to provide chemical stabilization by providing i1-.

例えば表面層m層として水素化アモルファス炭化シリ:
+7 (a −Sir Ct−x(H) + 0<X<
1 )あるいは水素化アモルファス窒素化シリコン(a
 −8ixNl−x (H) 、 0 < X < 1
 )を設けることによって感光体表面1−の複写プロセ
スあるいは環境雰囲気による劣化と防ぐ方法が団られて
いる(7%開昭57−115559号公@)。しかし、
表面保護層中の炭素濃度あるいは窒素41fを最適な値
に選べば耐刷性をかなり改良することができるが、高湿
度雰囲気中(RE(80琴以」での耐湿性を維持するこ
とができず、数万吹の複写プロセスを経験すると相対湿
度60%台で唾・象ぼけを発生し、これらの表面保護層
を付与しても耐刷II、flit湿性を大幅に向上する
ことができない状況にある。
For example, hydrogenated amorphous silica carbide as the surface layer m layer:
+7 (a −Sir Ct−x(H) + 0<X<
1) or hydrogenated amorphous silicon nitride (a
-8ixNl-x (H), 0 < X < 1
) has been proposed to prevent deterioration of the photoreceptor surface 1- due to the copying process or environmental atmosphere (7% Patent Publication No. 115559/1983). but,
If the carbon concentration or nitrogen 41f in the surface protective layer is selected to an optimal value, printing durability can be considerably improved, but it is not possible to maintain humidity resistance in a high humidity atmosphere (RE (80 koto or higher)). However, after undergoing the copying process for tens of thousands of copies, spitting and blurring occur at relative humidity levels of 60%, and even if these surface protective layers are applied, printing durability II and flit humidity cannot be significantly improved. It is in.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、長期保存および繰り返し使用に際して
も劣化現象を起こさず、高湿雰囲気中においてもj而、
象不良などの特性の低下がほとんど観測されない、感光
体としての特性が常時安定していてほとんど便用環境に
制約を受けない耐久性。
The purpose of the present invention is to prevent deterioration even during long-term storage and repeated use, and to be able to withstand even high humidity atmosphere.
The photoreceptor's properties are always stable, with almost no deterioration in properties such as image defects observed, and its durability is almost unrestricted by the environment in which it is used.

耐刷性、耐湿性に優れ、かつ望ましい電気的特性を有す
るa−8i系感光体を辺供することにある。
It is an object of the present invention to provide an a-8i photoreceptor having excellent printing durability and moisture resistance and desirable electrical characteristics.

〔発明の要点〕[Key points of the invention]

本発明によれば、導I毬性基本上にアモルファスシリコ
ン(a−8i)系材料からなる光導Kliを有し、さら
に表面層によって11された電子写真感光体において、
表面層が、電子スピン共鳴吸収によるスピン濃度(以下
ESRスピンatとも記す)炭素からなることによって
上記の目的が1成される。
According to the present invention, in an electrophotographic photoreceptor having a light guide Kli made of an amorphous silicon (a-8i) based material on a conductive base, and further surrounded by a surface layer,
One of the above objects is achieved by the surface layer being made of carbon with a spin concentration due to electron spin resonance absorption (hereinafter also referred to as ESR spin at).

水素化アモルファス炭−(とは、水素によって炭層未結
合手が安定されたものでa−C(H)で表わさnX 壱
本的にはX線あるいは1子線による回折像が明、111
でなく、たとえ一部が結晶部を含んだとしてもその比率
が低いことを童未している。水素は炭素と結訃してその
赤外線吸収スペクトルにおいて少なくとも2900m 
 1辺に吸収が存在する。
Hydrogenated amorphous carbon (a carbon layer dangling bond is stabilized by hydrogen and is represented by a-C(H) n
Rather, even if some of it contains crystalline parts, the proportion is low. Hydrogen combines with carbon and has an infrared absorption spectrum of at least 2900 m.
Absorption exists on one side.

炭素未結合手安定化の手段として、水素以外に弗素、酸
素、窒素をよむことも有効である。
In addition to hydrogen, it is also effective to use fluorine, oxygen, and nitrogen as a means of stabilizing carbon dangling bonds.

a−8t系の光導−IL層とは、材料的には水素化アモ
ルファスシリコン(a −5i(H)) 、 7kJ 
化42 化アモルファスシリコン(a −5i(F、H
) ) 、 水素f’r:、アモルファス炭化シリニア
 ン(a −Sit −x Cz(H) (0<X(1
)、水素化弗素比アモルファス災化ンリコy (a −
Si1−x Cx(F、H))(0<X< 1)、水素
化アモルファス窒化シリコン(a −St Nx(H)
 ) (0< X <4/3)、水素化弗素化アモルフ
ァス酸化シリコン(a −SiOx (F 、H) )
 (0< X < 2)のうちの少なくとも一つを用い
た層あるいはこれらに不純物をドープした層である。
The a-8t-based light guide IL layer is made of hydrogenated amorphous silicon (a-5i(H)), 7kJ
Chemical 42 amorphous silicon (a -5i (F, H
) ), hydrogen f'r:, amorphous silicon carbide (a -Sit -x Cz(H) (0<X(1
), hydrogenated fluorine ratio amorphous disaster reaction (a −
Si1-x Cx(F,H)) (0<X<1), hydrogenated amorphous silicon nitride (a-St Nx(H)
) (0<X<4/3), hydrogenated fluorinated amorphous silicon oxide (a-SiOx (F,H))
This is a layer using at least one of (0<X<2) or a layer doped with impurities.

〔発明の実施例〕[Embodiments of the invention]

第1図は本発明による感光体の一実施例の構造を示し、
Alまたはステンレス調などからなる導電性基体1の上
にブロッキング112.a −8i系光導It/13.
バッファ44.a−C(H)あるいld a −C(0
,H)からなる表面+85が積層されている。導電性基
体1は円筒状、シート状のいずれでも良く、材質的には
ガラスあるいは樹脂上に専心処理を施したものでも良い
FIG. 1 shows the structure of an embodiment of a photoreceptor according to the present invention,
Blocking 112. is placed on the conductive substrate 1 made of Al or stainless steel. a-8i system light guide It/13.
Buffer 44. a-C(H) or ld a-C(0
, H) are laminated. The conductive substrate 1 may be either cylindrical or sheet-like, and may be made of glass or resin that has been specially treated.

ブロッキング1#4の目的は、導電性基体1からの電荷
の注入を阻止することである。材料的にはAl2O3、
AIN 、 SiO、5in2. a −5fi−x 
Cx(F、H) 。
The purpose of blocking 1 #4 is to prevent charge injection from conductive substrate 1. In terms of material, Al2O3,
AIN, SiO, 5in2. a-5fi-x
Cx(F,H).

a−8iNx(H) l &−C(H) I a−C(
F) l  Iff期律表の■族、■喪元素をドープし
A a−C(H) 、 a −C(F) 、 a −5
i(H) fxどを使J’f[*ル。
a-8iNx(H) l &-C(H) I a-C(
F) l Iff period table ■ group, ■ Doping with mourning element A a-C(H), a-C(F), a-5
i(H) Use fx and J'f[*le.

バッファI11は、先導成層と表面層との間の材料的異
質性を緩和するためのもので、材料的にはa−Siz 
−x Cz(H) 、 a −Si1−x Cz(F、
H) 、 a −5tNx(H,a −5iOz(H)
 、 a −Stow(F、H)などを使用できる。
Buffer I11 is for alleviating material heterogeneity between the leading layer and the surface layer, and is made of a-Siz material.
-x Cz(H), a -Si1-x Cz(F,
H), a-5tNx(H, a-5iOz(H)
, a-Stow(F,H), etc. can be used.

第1図に示す構造を有する感光体の製造には例えば$2
1fflK−例を示すようなアモルファス膜の生成装置
が用いられ、真空槽11の内部に基体1の保持部12と
それに対向する電極13が配置され、保持部12.′成
極13にはそれぞれヒータ14 、15が備えられてい
る。トリクロルエチレンで脱脂洗浄しfcAlの円筒基
体1を保持部12に固定し、真空槽11内の圧力を10
 Torrになるように排気ポンプ16により排気パル
プ17を介して排気する。基体1および電極13の@度
を所定温度になるようにヒータ14およびヒータ15に
より加熱する。保持部12と導電性基体lは周方向の膜
均一性を出すために回転する。
For example, it costs $2 to manufacture a photoreceptor having the structure shown in FIG.
1fflK - An amorphous film generating apparatus as shown in the example is used, in which a holding part 12 of the substrate 1 and an electrode 13 facing it are arranged inside a vacuum chamber 11, and holding part 12. 'The polarization 13 is equipped with heaters 14 and 15, respectively. After degreasing and cleaning with trichlorethylene, the fcAl cylindrical substrate 1 is fixed to the holding part 12, and the pressure inside the vacuum chamber 11 is reduced to 10
The exhaust is evacuated via the exhaust pulp 17 by the exhaust pump 16 so that the pressure becomes Torr. The base 1 and the electrode 13 are heated by the heaters 14 and 15 to a predetermined temperature. The holding portion 12 and the conductive substrate 1 are rotated to achieve uniformity of the film in the circumferential direction.

次に原料ガスの圧力容器21〜25の中から成膜に必要
なガス圧力容器列えば21のパルプ18を開け、流量調
節計19を通し、ストップパルプ20を開けて、真空槽
11の中に供給する。他のガスについても同様である。
Next, the pulp 18 of the gas pressure vessel row 21 necessary for film formation is opened from among the raw material gas pressure vessels 21 to 25, passed through the flow rate controller 19, the stop pulp 20 is opened, and the pulp 18 is placed in the vacuum chamber 11. supply The same applies to other gases.

次に、槽内圧力を所定の圧力、例えば0.001〜5 
Torrに、、4整後、高周波(RF)電#31から傷
周波(13,56MHz )電力を絶縁材32i通して
対向KtIi13に供給し13と基体1の間にグロー放
電を発生式せて成膜を行う。
Next, the pressure inside the tank is set to a predetermined pressure, for example, 0.001 to 5.
Torr, after adjusting the frequency (13,56 MHz) from the radio frequency (RF) power #31, it is supplied to the opposing KtIi 13 through the insulating material 32i, and a glow discharge is generated between the 13 and the base 1. Do membrane.

以下、具体的な実施例について説明する。Hereinafter, specific examples will be described.

実施例1 トリクロルエチレンで脱脂洗浄したAI円円筒体lを第
2図の装置の成空槽11内の保持部12に装着し、次の
条件で厚さ0.2μmのブロッキング’d 2を形成し
た。
Example 1 An AI cylindrical body 1 that had been degreased and cleaned with trichlorethylene was attached to the holding part 12 in the vacancy tank 11 of the apparatus shown in FIG. 2, and a blocking 'd 2 with a thickness of 0.2 μm was formed under the following conditions. did.

5iH4(100%)流=jt  250ee/分B2
H6(5000ppM、 H2ペース)流量 20cc
/分ガス圧     0.5 Torr RF電力     50W 基体温度    200℃ 成膜時間    10分 さらにこの上に、同様に第2図に示した装置ftK原料
ガスとしてSiH4,B2H6を用いて次の条件で光導
電1−3を厚さ25μm形成した。
5iH4 (100%) flow = jt 250ee/min B2
H6 (5000ppM, H2 pace) flow rate 20cc
/min Gas pressure: 0.5 Torr RF power: 50 W Substrate temperature: 200°C Film forming time: 10 minutes On top of this, photoconductivity was applied under the following conditions using SiH4 and B2H6 as the ftK source gases in the same apparatus shown in Figure 2. 1-3 was formed to a thickness of 25 μm.

5iH4(100X)流量 200cc 7分B2H6
(20ppM 、 H2ペース)流t  10cc/分
ガス圧     1−2 Torr RF電力    300W 基体温度    200C 成膜時間    3時間 さらにこの上に、原料ガスとして5IH4+ CH4+
B2H6を用いてパンツ7114を厚さ0.1μm形成
した。
5iH4 (100X) flow rate 200cc 7 minutes B2H6
(20 ppM, H2 pace) Flow t 10 cc/min Gas pressure 1-2 Torr RF power 300 W Substrate temperature 200 C Film forming time 3 hours On top of this, 5IH4+ CH4+ as source gas
Pants 7114 were formed using B2H6 to a thickness of 0.1 μm.

5iHd100%)流量 100ee/分CH4(10
0X)流量  gQcc/分B2H6(2000ppM
 、 H2ペース)流量  15cc/分ガス圧   
   1.0Torr RF電力     200 W 基体温度    200℃ 成膜時間    2分 最後にこの上に、次の条件でa−C(H)表面層5を厚
さ0.1μm形成した。
5iHd100%) flow rate 100ee/min CH4 (10
0X) Flow rate gQcc/min B2H6 (2000ppM
, H2 pace) Flow rate 15cc/min Gas pressure
1.0 Torr RF power 200 W Substrate temperature 200° C. Film forming time 2 minutes Finally, an a-C(H) surface layer 5 was formed thereon to a thickness of 0.1 μm under the following conditions.

C3H11(100%)fi看20cc/分ガス圧  
      0.I TorrRF直力    200
W 基体温度    90〜110℃ 成膜時間    5分 基体@変は赤外線屋度計と熟成対により測定した。
C3H11 (100%)fi view 20cc/min gas pressure
0. I TorrRF direct force 200
W Substrate temperature: 90 to 110° C. Film forming time: 5 minutes Substrate @ Change was measured using an infrared thermometer and an aging pair.

以上のようにして形成した実施例1の感光体における先
導″F!L53のエネルギーギャップEgは1.8’ 
 eVである。また、バッファ層4の組成はa−8io
、7C0,3(H)であり、そのEgは2.leVであ
る。さらに表面層5のEgは2.7 eVであり、ES
Rスピン濃変は5xlOL:Tn+:!J(の密度は1
.7g/cm、屈折率は2,1でスープ1度は2000
 Kff/−である。さらに、熱放出から測定した水素
濃度は35@子琴であった9この実施例1の感光体をカ
ールソン方式の停通紙複写機に装着し5万枚のコピーを
実施したが、極めて鮮明な画i象が得られた。また、5
万枚コピー実施後のコピーテストにおいて、温度35℃
相対湿度85 %のスミ男気におけるコピーにおいても
画1象は呻明であった。
The energy gap Eg of the leading "F!L53" in the photoreceptor of Example 1 formed as described above is 1.8'
It is eV. Further, the composition of the buffer layer 4 is a-8io
, 7C0,3(H), and its Eg is 2. leV. Furthermore, the Eg of the surface layer 5 is 2.7 eV, and the ES
R spin concentration change is 5xlOL:Tn+:! The density of J( is 1
.. 7g/cm, refractive index is 2.1, 1 degree soup is 2000
Kff/-. Furthermore, the hydrogen concentration measured from heat release was 35@ziqin. An image was obtained. Also, 5
In a copy test after copying 10,000 copies, the temperature was 35℃.
Even when copying at a relative humidity of 85%, the image was very clear.

比較のために、実施例1と同様の手頃で表面層5だけが
ない感光体を作製し、同様に5万枚のコピーを実施後雰
囲気を変えてコピーテストを行ったが、11犠変35℃
相対湿度60%の雰囲気ですでに画像分解能が低下し1
Iifi像ぼけが生じた。従ってこの表面層を形成する
ことKより耐温性が向上したことが判る。
For comparison, a photoconductor similar to that in Example 1, which was affordable but without only the surface layer 5, was prepared, and after 50,000 copies were made in the same manner, a copy test was conducted by changing the atmosphere. ℃
Image resolution has already decreased in an atmosphere with relative humidity of 60%.
Iifi image blurring occurred. Therefore, it can be seen that the temperature resistance was improved by forming this surface layer.

表面層5の形成のためには必ずしもC3f(8を用いる
必要はなく、各種の炭化水素、列えばCH4。
In order to form the surface layer 5, it is not necessarily necessary to use C3f (8), but various hydrocarbons, such as CH4.

C2H6、C4H10、C2H4、CQH2,CaHa
などのガスおよびこれらのガスと水素やratsとの混
合ガスの便用が可能である。表面rlI形成の際の等体
温度は好適には50〜150℃が望ましく、単位ガス量
当たりのガスの分解に要するエネルギーは300〜20
000J/cc :6E egましい。ガス圧は0.0
01〜0.5 Torrが望ましい。成膜時には、外部
からバイアス電圧を加えることも膜質の制量上有効であ
る5また式放填の場合は自然にバイアスが発生してくろ
うこれを通常は自己バイアスと呼んでいるが、このよう
なバイアス電圧d+100〜+500V、−100〜−
1500Vが適している。
C2H6, C4H10, C2H4, CQH2, CaHa
It is possible to use gases such as, and mixtures of these gases with hydrogen or rats. The isobody temperature during surface rlI formation is preferably 50 to 150°C, and the energy required to decompose the gas per unit gas amount is 300 to 20°C.
000J/cc: 6E is extremely desirable. Gas pressure is 0.0
01 to 0.5 Torr is desirable. Applying an external bias voltage during film formation is also effective in controlling the film quality5.Furthermore, in the case of formula discharge, a bias naturally occurs, and this is usually called self-bias. bias voltage d+100~+500V, -100~-
1500V is suitable.

実施例2 寿施例1と同様の手順および条件でバッファ層4までを
形成し、この上に異ったESRスピンaVのa −C(
H)表布層を形成して感光体としての適合性金調べた。
Example 2 Up to the buffer layer 4 was formed using the same procedure and conditions as in Example 1, and a-C(
H) A surface fabric layer was formed to examine its compatibility as a photoreceptor.

その結果を第1表に示す。このときの表面層の膜厚は約
帆1μmである。
The results are shown in Table 1. The thickness of the surface layer at this time was approximately 1 μm.

窮1表 切期面像テストばI温度25℃、相対湿度50イの雰囲
気中での・而出しテスト、5万吹凌画障テストは55枚
コピー寿FA後の35℃、85写のギ囲気中での複写→
による圃像試倹の結果であって、O印は良好な・・舅′
pが得られたこと金示し、△印;寸、肩い両像不良、X
印は修しいlI!jlI!不良が生じたことを示してい
る。ESRスピン濃度が低め場合の・面像不良は残留電
位が高いために画像が黒っぽくなるものである。高ES
Rスピン・遣1(の1面・重不良は高湿による・面像ぼ
けである。
The final image test was conducted in an atmosphere with a temperature of 25℃ and a relative humidity of 50℃. Copying in ambient air →
The results of the field image trial are shown by O.
Indicates that p was obtained, △ mark; size, shoulder and both images are defective, X
The mark is repaired! jlI! Indicates that a defect has occurred. When the ESR spin concentration is low, the surface image defect is caused by a high residual potential resulting in a dark image. High ES
The serious defect on the first side of R-spin 1 is due to high humidity and blurring of the surface image.

第1冴から表面1#5が表酊保−蓮層として十分な性能
を佇するためにはS面層を形成するa −C(H)模の
ESRスピン濃度が10(7)以上10 cm  収ド
であることが望ましい。これは、この範囲においてa−
C(H)1−の耐薬品性および機械的強史がすぐ几でい
るためと考えられる。a−C(H:表面51J中に含有
される炭素原子の結合状便は形成されたa−C(H) 
=鰻がXf−写真感光体の表面・−として適用され得る
か舌かを左右する大きな要1月の一つであり重要である
。炭素の不抱11]結合は不対電子を持ち成子スピン共
、15により検出される。すなわち炭素原子の未)古今
−Jll:(ダノグリングボンド) :t ESRスピ
ン・涜、度から見遺もることができる。炭ぺ原子の;吉
1伏甜3寸刈債条沖てより′(化し、当然ESf七スビ
スピンもそれ・、ζ半って1戊するう一般的にばESR
スピンartの低い膜すなわち欠陥Ial&の少ない膜
が良質とされ、SP3結合の多いダイヤモンド構造に近
いa−CではESRスピン濃度が10ないし10′8譚
であることが知られている。ところがa −CIJを電
子写真感光体の表面層として用いる場合は以下に述べる
様な不都合が生じるため最適範囲が限定される。
In order for the surface 1#5 to have sufficient performance as a lotus layer from the first layer, the ESR spin concentration of the a-C(H) model forming the S-plane layer must be 10(7) or more than 10 cm. It is desirable that the This means that in this range a-
This is thought to be due to the chemical resistance and mechanical strength of C(H)1-, which are readily stable. a-C(H: The bonded stool of carbon atoms contained in the surface 51J is formed a-C(H)
This is one of the major factors that determines whether eel can be applied as Xf--the surface of a photographic photoreceptor--and is important. The unsupported 11] bond of carbon has an unpaired electron and both the electron spin and 15 are detected. In other words, the history of carbon atoms, past and present, can be seen from the ESR spin/destruction. The carbon atoms; 1, 2, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 3, 1, 2 pins,
A film with low spin art, that is, a film with few defects Ial&, is considered to be of good quality, and it is known that a-C, which is close to a diamond structure with many SP3 bonds, has an ESR spin concentration of 10 to 10'8 tan. However, when a-CIJ is used as a surface layer of an electrophotographic photoreceptor, the optimum range is limited due to the following disadvantages.

ESRスピン濃度が10 cm 以下と低い時、すなわ
ち炭素1乗子のダングリングボンドが水t4原子により
効率良く補償されている時は4中にS?結合が多く化学
的に安定であるが光学的エネルギーギャップが約3.Q
eVになる。アモルファスシリコン系光導電!−3の光
学的エネルギーギャップは通常1,6ないし1.9eV
であるため光導電−3とa−C(H)表面+15との整
合のためバッファ層4の光学的エネルギーギャップを光
導電層3からa−C(H)表面f#に向けて連続的ある
いはステップ状に増加させる必要があり、バッファIi
i 4の膜厚は4くなる。
When the ESR spin concentration is as low as 10 cm or less, that is, when the dangling bond of carbon 1 is efficiently compensated by water t4 atoms, S in 4? It has many bonds and is chemically stable, but the optical energy gap is about 3. Q
becomes eV. Amorphous silicon photoconductive! -3 optical energy gap is typically 1.6 to 1.9 eV
Therefore, in order to match the photoconductive layer 3 with the a-C(H) surface +15, the optical energy gap of the buffer layer 4 is continuously or It is necessary to increase stepwise, buffer Ii
The film thickness of i4 is 4.

これは感光体特性上は残留電位を大きくすることになり
好ましくない。
This is undesirable in view of the characteristics of the photoreceptor because it increases the residual potential.

一方、ESRスピン濃度が1ocrR以上と高い時(は
ダングリングボンドが多く化学的に不安定で、画1象腹
写プロセスにおけるコロナ放電により発生するオゾンや
窒素酸化物による変質を生じ、5万枚コヒー債の高湿中
での1面像不良と々ろのである。
On the other hand, when the ESR spin concentration is high (more than 1ocrR), it is chemically unstable due to the large number of dangling bonds, and deterioration occurs due to ozone and nitrogen oxides generated by corona discharge in the image capture process. This is because the one-sided image of coffee bond in high humidity is poor.

実施例3 実施例1と同様の手頃および条件でバッファ14までを
形成し、表面r@5の膜厚を変えた場合の感光体特性を
示したのが第2表である。耐湿性試験は35℃、85%
雰囲気中における複写機による画1象試・検の結果であ
る。
Example 3 Table 2 shows the photoreceptor characteristics when the layers up to the buffer 14 were formed under the same conditions and conditions as in Example 1, and the film thickness of the surface r@5 was changed. Moisture resistance test: 35℃, 85%
These are the results of an image test/inspection using a copying machine in an atmosphere.

第2表 第2表の結果から表面’15の膜厚は耐湿性の面よp 
o、oosμm以上が望ましく、残留電位、感度の面か
ら1.0μm以下が1ましく、さらに好適には0.01
μm以上0.5μm以下である。
Table 2 From the results in Table 2, the film thickness of surface '15 is p
o, oos μm or more, preferably 1.0 μm or less in terms of residual potential and sensitivity, and more preferably 0.01 μm or less.
It is not less than μm and not more than 0.5 μm.

〔発明の効果〕〔Effect of the invention〕

本発明においては、a−8t系感光1を有する電子写真
感光体の表面層として、10個ないし1019傭のES
RスピンiIt度を有するa −C(H)膜を用いる。
In the present invention, as a surface layer of an electrophotographic photoreceptor having an a-8t photoreceptor, 10 to 1019 ES
An a-C(H) film having an R spin iIt degree is used.

このような表面層を形成することにより、a−8i系光
導電性材料の優れた特性−高光感度、可視光全域にわた
る高い分光感窒、低い残留電位など−を良好に保持しな
がら、その上に設けられた炭素と合目的的に結合した水
素を含有したa−C(H)膜の保護膜としての優れた機
能−オゾン、窒素酸化物などに対する化学的安定性、特
に優れた耐湿性、耐刷i生など−によシ、長期保存およ
び繰り返し使用に際しても考化現寮を起こさず、高湿雰
囲気中においても画像不良などの特性の低下が/1とん
ど視測されない、感光体としての特性が常時安定してい
てほとんど使用環境に制約を受けない、・廿久注、耐刷
キ、耐湿性に優れたa −8i系電子写1i光体を得る
ことができる。かくして、いわゆる感光体の寿命が飛躍
的にのびることになり。
By forming such a surface layer, the excellent properties of the A-8i photoconductive material, such as high photosensitivity, high spectral nitrification sensitivity over the entire visible light range, and low residual potential, can be maintained while Excellent function as a protective film of the a-C(H) film containing hydrogen purposely combined with carbon provided in A photoreceptor that does not cause problems even during long-term storage and repeated use, and hardly any deterioration of characteristics such as image defects is observed even in a high-humidity atmosphere. It is possible to obtain an a-8i electrophotographic material which has stable properties at all times and is hardly restricted by the environment in which it is used, and which has excellent durability, printing durability, and moisture resistance. In this way, the life of the so-called photoreceptor will be extended dramatically.

得られる効果は甑めて大きい。The effects obtained are enormous.

【図面の簡単な説明】[Brief explanation of drawings]

・耳1図は本伯明の一実池例の層構成を示す、@面図、
第2図は本発明の実施に用いる製造洟・置の一例の構F
li図である、 1・・4成性基体、2・・・ブロッキング層、3・・・
a−8i系光導醒・―、4・・・バッファ・−15・・
・a−C(H)表面層。 2.・°−“ 第 1図 第2図
・Diagram 1 shows the layer structure of Honhakumei's Ichiji Pond example.
Figure 2 shows an example of the structure of the manufacturing process and equipment used to carry out the present invention.
It is a li diagram, 1...4-forming substrate, 2... blocking layer, 3...
a-8i system light guide awakening・-, 4...Buffer・-15・・
・a-C(H) surface layer. 2.・°−“ Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 1)導電性基体上にアモルファスシリコン系材料からな
る光導電層を有し、さらに表面層によって被覆された電
子写真感光体において、前記表面層が電子スピン共鳴吸
収によるスピン濃度が10^1^8^−^3cmないし
10^1^9^−^3cmである水素化アモルファス炭
素であることを特徴とする電子写真感光体。
1) In an electrophotographic photoreceptor having a photoconductive layer made of an amorphous silicon-based material on a conductive substrate and further covered with a surface layer, the surface layer has a spin concentration of 10^1^8 due to electron spin resonance absorption. An electrophotographic photoreceptor characterized by being made of hydrogenated amorphous carbon having a thickness of ^-^3 cm to 10^1^9^-^3 cm.
JP25404085A 1985-11-13 1985-11-13 Electrophotographic sensitive body Pending JPS62113155A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25404085A JPS62113155A (en) 1985-11-13 1985-11-13 Electrophotographic sensitive body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25404085A JPS62113155A (en) 1985-11-13 1985-11-13 Electrophotographic sensitive body

Publications (1)

Publication Number Publication Date
JPS62113155A true JPS62113155A (en) 1987-05-25

Family

ID=17259400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25404085A Pending JPS62113155A (en) 1985-11-13 1985-11-13 Electrophotographic sensitive body

Country Status (1)

Country Link
JP (1) JPS62113155A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01107268A (en) * 1987-10-21 1989-04-25 Shindengen Electric Mfg Co Ltd Electrophotographic sensitive body
EP0872771A2 (en) * 1997-04-14 1998-10-21 Canon Kabushiki Kaisha Photosensitive member, process for its production, image forming apparatus having the photosensitive member, and image forming process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01107268A (en) * 1987-10-21 1989-04-25 Shindengen Electric Mfg Co Ltd Electrophotographic sensitive body
EP0872771A2 (en) * 1997-04-14 1998-10-21 Canon Kabushiki Kaisha Photosensitive member, process for its production, image forming apparatus having the photosensitive member, and image forming process
EP0872771A3 (en) * 1997-04-14 1999-01-07 Canon Kabushiki Kaisha Photosensitive member, process for its production, image forming apparatus having the photosensitive member, and image forming process
EP0872771B1 (en) * 1997-04-14 2001-07-18 Canon Kabushiki Kaisha Photosensitive member, process for its production, image forming apparatus having the photosensitive member, and image forming process

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