JPS62112793A - Method for plating electronic parts at high speed - Google Patents

Method for plating electronic parts at high speed

Info

Publication number
JPS62112793A
JPS62112793A JP25331885A JP25331885A JPS62112793A JP S62112793 A JPS62112793 A JP S62112793A JP 25331885 A JP25331885 A JP 25331885A JP 25331885 A JP25331885 A JP 25331885A JP S62112793 A JPS62112793 A JP S62112793A
Authority
JP
Japan
Prior art keywords
plating
electrodes
anode
plated
insoluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25331885A
Other languages
Japanese (ja)
Inventor
Masaharu Ishizaka
石坂 雅治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Denshi Kogyo KK
Original Assignee
Tanaka Denshi Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Denshi Kogyo KK filed Critical Tanaka Denshi Kogyo KK
Priority to JP25331885A priority Critical patent/JPS62112793A/en
Publication of JPS62112793A publication Critical patent/JPS62112793A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To accelerate the plating of electronic parts by placing the parts between insoluble electrodes in an electrolytic soln., electrifying the electrodes as the anode and the parts to be plated as the cathode and supplying a high electric current to the electrodes. CONSTITUTION:A hoop (a) of phosphor bronze or the like to be plated is put in a cell (c), insoluble electrodes (b) and the hoop (a) are electrified as the anode and cathode, respectively, and a high electric current is supplied to the electrodes to carry out Watts bath nickel plating or other plating. By this method, stirring action is caused by bubbles generated from the electrodes (b), so plating is accelerated, the occurrence of unevenness in a plated layer is prevented and plating can be stabilized.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はリードフレーム、コネクター等の長尺索材を連
続めっき加工する場合で、主に下地めっきを高電流密度
で行なう方法に関1゛るちのである。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a method of continuously plating long cable materials such as lead frames and connectors, and mainly relates to a method of performing base plating at high current density. Ruchino.

(従来の技術とその問題点) 現在、リードフレーム、コネクター等は銅及び銅合金又
はiス及び鉄合金の平板若しくはブレス加工笠による成
型品の長尺索材等をリールツウリールとよばれるめっき
方法でiiO処理工程。
(Prior art and its problems) At present, lead frames, connectors, etc. are made of copper, copper alloys, IS, and iron alloys, and are made of flat plates or pressed caps. Method iiO treatment step.

下地めっき工程、最終貴金属めっき工程を連続的に行な
って製造されている。
It is manufactured by continuously performing the base plating process and the final precious metal plating process.

而して、最近ではこのリールツウリールのライン速度の
高速化が望まれ、そのためには最も処理時間の長いめっ
き工程におけるめっき槽をライン速度に比例して長くと
ることが考えられる。
Recently, there has been a desire to increase the line speed of reel-to-reel systems, and to this end, it is conceivable to increase the length of the plating tank in the plating step, which takes the longest processing time, in proportion to the line speed.

又、最終の円金属めっき工程では、コスト低減のために
部分めっきの採用が増え、従来と同様の長さのめっき槽
でもラインスピードを数倍に上げることが可能となった
が、銅めっきやニッケルめっき等の゛ト地に行なう全面
めっきでは高速化が難しく、さらに工場スペース等の関
係でめっき槽を長くとれない場合等にはライン速度の高
速化の障害となっていた。
In addition, in the final circular metal plating process, partial plating is increasingly used to reduce costs, making it possible to increase the line speed several times even with a plating bath of the same length as before. It is difficult to increase the speed when performing full-surface plating on a substrate such as nickel plating, and furthermore, when the plating tank cannot be made long due to factory space constraints, this becomes an obstacle to increasing the line speed.

更に、高速めつき方法としては、めっき液をポンプ、イ
ンペラ等で強制的に流動させる強制流動法、陰極回転法
、振動法、12擦払透が提唱されているが、強1i11
流動法が貴金属めつきに応用されている以外は実用例が
ないのが現状゛Cある。
Furthermore, as high-speed plating methods, the forced flow method in which the plating solution is forced to flow with a pump, impeller, etc., the cathode rotation method, the vibration method, and the 12 scraping method have been proposed.
Currently, there is no practical example of the flow method other than its application to precious metal plating.

この強制流動法を銅、ニッケル等の下地全面めっきに採
用した場合、毎分数百リッターのめつき液を供給する必
要があるため巨大なポンプを必要とし、騒音や振動が大
きく又投首スペースを広く要する等の問題があった。
When this forced flow method is applied to the entire surface plating of copper, nickel, etc. substrates, it is necessary to supply several hundred liters of plating solution per minute, which requires a huge pump, which causes large noise and vibrations, and also requires a large space for plating. There were problems such as the need for a wide range of

その上この方法では全体を均一に撹拌することが難しく
、外観むらを生じる等の欠点があった。
Furthermore, this method has drawbacks such as difficulty in uniformly stirring the entire product, resulting in uneven appearance.

又、従来は可溶性アノードに低電流を流していたものが
あるので、これを応用して低電流の苔わりに高電流を流
すことが考えられる。
Furthermore, since there is a conventional method that allows a low current to flow through a soluble anode, it is possible to apply this to flow a high current in place of the low current moss.

ところが、この場合はiJ溶性7ノードの溶ける吊が多
くなり、気泡の発生は少ないのが現状であった。
However, in this case, the number of iJ-soluble 7 nodes melted increased, and the number of bubbles was small.

(発明が解決しようとする技術的課題)以上の問題を解
決しようとする本発明の技術的課題は、リードフレーム
、コネクター等の長尺素材をめっきする際に、従来のめ
つき槽において、電解液中に気泡を発生させることによ
り撹拌効果を生け゛しめ、めっきの高速化及び安定化を
図ることである。
(Technical Problem to be Solved by the Invention) A technical problem to be solved by the present invention is to solve the above-mentioned problems by electrolysis in a conventional plating bath when plating long materials such as lead frames and connectors. The aim is to increase the stirring effect by generating air bubbles in the liquid, thereby increasing the speed and stabilization of plating.

(技術的課題を達成するための技術的手段)以上の技術
的課題を達成するための本発明の技術的手段は、電解液
に適宜間隔をもって対向する不溶性アノードを垂直状に
配置すると共に、これら不溶性アノード間に被メッキ物
を配置し、該不溶性アノードを陽極に、被メッキ物を陰
極に夫々帯電せしめ、そのアノードに高電流を流すこと
によって電解液中に気泡を発生させてめっきをすること
である。
(Technical Means for Achieving the Technical Problem) The technical means of the present invention for achieving the above-mentioned technical problem is to vertically arrange insoluble anodes facing the electrolytic solution at appropriate intervals, and Placing the object to be plated between insoluble anodes, charging the insoluble anode as an anode and the object to be plated as a cathode, and applying a high current to the anode to generate bubbles in the electrolyte to perform plating. It is.

(発明の効果) 本発明は以上の様な構成にしたことにより下記の効果を
有する。
(Effects of the Invention) The present invention has the following effects by having the above configuration.

■ 不溶性アノードを用い、該アノード表面から発生す
る気泡により撹拌効果を生じさせるので、めっきの高速
化を図ると共に、電極間に電気絶縁性の気泡が充満して
いるため先端電流がおさえられ、めっき厚のばらつきを
防ぐことが出来、めっきの安定化を図ることができる。
■ An insoluble anode is used, and the air bubbles generated from the anode surface create a stirring effect, which speeds up plating, and the electrically insulating air bubbles between the electrodes suppress the tip current, resulting in faster plating. It is possible to prevent variations in thickness and stabilize the plating.

■ 不溶性7ノードをI型に配置したことにより、該不
溶性アノードから発生する気泡は何ら遮断されるという
不具合を受けずに上背するので、被めっき物にめっきが
効串良く、且つ安定して行なわれる。
■ By arranging the insoluble 7 nodes in an I-shape, the air bubbles generated from the insoluble anode will not be blocked in any way and will rise, so the plating will be effective and stable on the object to be plated. It is done.

■ 特別の装買及びめっき槽を大きくすることなく、通
常のめつき槽において、めっきの高速化を図ることが出
来るので、コストの低減を図ることができる。
■ Since it is possible to speed up plating in a normal plating tank without purchasing special equipment or enlarging the plating tank, costs can be reduced.

(実施例) 本発明の実施例は図に示す如く、リン青銅フープ(a)
を脱脂、酸洗い等の前処理を行なった後、有効長50(
1mmの本発明によるめっきセル中(C)に送り速度6
m/分で導入し、通常のワット浴ニッケルめっきテスト
を行なった。
(Example) As shown in the figure, an example of the present invention is a phosphor bronze hoop (a).
After pre-treatment such as degreasing and pickling, the effective length is 50 (
1 mm in the plating cell according to the invention (C) at a feed rate of 6
m/min and a conventional Watt bath nickel plating test was carried out.

(b)は不溶性アノードである。(b) is an insoluble anode.

その結果を示したのが次の第1表である。Table 1 below shows the results.

第1表 めっき後の外観 該表における比較例−1は従来法によるオーバーフロー
法でニッケルめっきを行なったしのであり、比較例−2
は比較例−1のめっき中に0.5耀/分でめっき液を供
給し、ニッケルめっきテストを行なったものである。
Table 1: Appearance after plating Comparative Example 1 in this table is the one in which nickel plating was performed using the conventional overflow method, and Comparative Example 2
A nickel plating test was conducted by supplying a plating solution at a rate of 0.5/min during plating in Comparative Example-1.

第2表は実施例及び比較例−2の方法でリン青銅フープ
に陰極型流密1食100A/dTItで5秒間ニッケル
めっきを行なったものの幅方向のめっき厚分布を示した
ものである。
Table 2 shows the plating thickness distribution in the width direction of phosphor bronze hoops subjected to cathodic flow-tight nickel plating at 100 A/dTIt for 5 seconds using the method of Example and Comparative Example-2.

第2表 めっき厚の分布 尚、測定位置のA、Cは被めっき物の端から1Nnの部
分、Bは中央部である。
Table 2 Distribution of plating thickness Note that measurement positions A and C are 1Nn from the edge of the object to be plated, and B is the center.

従って、以上の表から明らかな様に、前記の効果、即ち
めっきの高速化、めっきのばらつきを防ぐことによるめ
っきの安定化及び効率化を図ると共に、コストの低減を
図ることができるという効果を確認することができた。
Therefore, as is clear from the table above, the above effects can be achieved, namely, speeding up plating, stabilizing and improving plating efficiency by preventing plating variations, and reducing costs. I was able to confirm.

【図面の簡単な説明】 図は本発明のめつき方法を示すめっき槽の縦断面図であ
る。 尚、図中 (a)・・・被めっき物 (b)・・・不溶性アノード
を夫々示す。
BRIEF DESCRIPTION OF THE DRAWINGS The figure is a longitudinal sectional view of a plating tank showing the plating method of the present invention. In the figure, (a) shows an object to be plated, and (b) shows an insoluble anode.

Claims (1)

【特許請求の範囲】[Claims] 電解液に適宜間隔をもつて対向する不溶性アノードを垂
直状に配置すると共に、これら不溶性アノード間に被メ
ッキ物を配置し、該不溶性アノードを陽極に、被メッキ
物を陰極に夫々帯電せしめ、そのアノードに高電流を流
すことによつて電解液中に気泡を発生させてめつきをす
る電子部品の高速めつき方法。
Insoluble anodes facing the electrolytic solution with an appropriate interval are arranged vertically, and an object to be plated is arranged between these insoluble anodes, and the insoluble anode is charged as an anode and the object to be plated is charged as a cathode. A high-speed plating method for electronic components that generates bubbles in the electrolyte by passing a high current through the anode.
JP25331885A 1985-11-11 1985-11-11 Method for plating electronic parts at high speed Pending JPS62112793A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25331885A JPS62112793A (en) 1985-11-11 1985-11-11 Method for plating electronic parts at high speed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25331885A JPS62112793A (en) 1985-11-11 1985-11-11 Method for plating electronic parts at high speed

Publications (1)

Publication Number Publication Date
JPS62112793A true JPS62112793A (en) 1987-05-23

Family

ID=17249633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25331885A Pending JPS62112793A (en) 1985-11-11 1985-11-11 Method for plating electronic parts at high speed

Country Status (1)

Country Link
JP (1) JPS62112793A (en)

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