JPS62112140U - - Google Patents

Info

Publication number
JPS62112140U
JPS62112140U JP1985203648U JP20364885U JPS62112140U JP S62112140 U JPS62112140 U JP S62112140U JP 1985203648 U JP1985203648 U JP 1985203648U JP 20364885 U JP20364885 U JP 20364885U JP S62112140 U JPS62112140 U JP S62112140U
Authority
JP
Japan
Prior art keywords
magnification correction
magnification
alignment mark
exposure apparatus
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985203648U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985203648U priority Critical patent/JPS62112140U/ja
Publication of JPS62112140U publication Critical patent/JPS62112140U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP1985203648U 1985-12-28 1985-12-28 Pending JPS62112140U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985203648U JPS62112140U (enrdf_load_stackoverflow) 1985-12-28 1985-12-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985203648U JPS62112140U (enrdf_load_stackoverflow) 1985-12-28 1985-12-28

Publications (1)

Publication Number Publication Date
JPS62112140U true JPS62112140U (enrdf_load_stackoverflow) 1987-07-17

Family

ID=31169173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985203648U Pending JPS62112140U (enrdf_load_stackoverflow) 1985-12-28 1985-12-28

Country Status (1)

Country Link
JP (1) JPS62112140U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07261371A (ja) * 1994-03-16 1995-10-13 Nec Corp 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07261371A (ja) * 1994-03-16 1995-10-13 Nec Corp 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法

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