JPS62104111A - Soft magnetic thin film - Google Patents

Soft magnetic thin film

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Publication number
JPS62104111A
JPS62104111A JP24462685A JP24462685A JPS62104111A JP S62104111 A JPS62104111 A JP S62104111A JP 24462685 A JP24462685 A JP 24462685A JP 24462685 A JP24462685 A JP 24462685A JP S62104111 A JPS62104111 A JP S62104111A
Authority
JP
Japan
Prior art keywords
thin film
soft magnetic
alloy
magnetic thin
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24462685A
Other languages
Japanese (ja)
Other versions
JPH0746656B2 (en
Inventor
Kazuhiko Hayashi
和彦 林
Masatoshi Hayakawa
正俊 早川
Osamu Ishikawa
理 石川
Yoshitaka Ochiai
落合 祥隆
Hideki Matsuda
秀樹 松田
Hiroshi Iwasaki
洋 岩崎
Koichi Aso
阿蘇 興一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
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Priority to JP60244626A priority Critical patent/JPH0746656B2/en
Publication of JPS62104111A publication Critical patent/JPS62104111A/en
Publication of JPH0746656B2 publication Critical patent/JPH0746656B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To contrive the improvement in the resistance to corrosion and abra sion without deteriorating a soft magnetic characteristic by specifying the compo sition ranges of Co, Si and Al and further adding Ru of specified atm% in an alloy thin film of Fe-Co-Si-Al group. CONSTITUTION:This soft magnetic thin film is mainly composed of Fe, Co, Si and Al and the composition ranges of said Co, Si and Al are 1-15atm% Co and 10-20atm% Si, 8-15atm% Al. Furthermore, Ru of 0.1-10atm% is included. In case of the composition of the soft magnetic thin film as Fe68Co10 Al9Si13-xRux (figures represent atm%), when the quantity of abrasion 15 examined while changing the addition quantity (x) of Ru, the quantity of abrasion becomes extremely small according to an increase in addition quantity of Ru, for example, even after the 30hr running of a magnetic head and more sperior resistance to abrasion than Sendust can been observed when Ru is 4atm%.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は軟磁性薄膜に関するものであり、詳細にはFe
−Co−3i −Affi系合金薄膜の耐蝕性の改良に
関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a soft magnetic thin film, and in particular, to a soft magnetic thin film.
The present invention relates to improving the corrosion resistance of -Co-3i -Affi alloy thin films.

〔発明の概要〕[Summary of the invention]

本発明は、Fe−Co−3i−AJ系合金薄膜において
、Co、Si及びAfiの組成範囲をそれぞれ1〜15
原子%、10〜20原子%、8〜15原子%とし、さら
にRuを0.1〜1o原子%添加して、 軟磁気特性を劣化することなく耐蝕性、耐摩耗性の改善
を図ろうとするものである。
In the present invention, in the Fe-Co-3i-AJ alloy thin film, the composition range of Co, Si and Afi is 1 to 15, respectively.
At %, 10 to 20 at %, 8 to 15 at %, and further adding 0.1 to 10 at % of Ru in an attempt to improve corrosion resistance and wear resistance without deteriorating soft magnetic properties. It is something.

(従来の技術〕 磁気記録における記録の高密度化、高品質化を図る目的
で、高保磁力を有する磁気記録媒体1例えば磁性粉にF
e、Co、Ni等の金属あるいは合金からなる金属磁性
粉末を用いた、いわゆる合金塗布型のメタルテープ等が
開発され、オーディオテープレコーダをはじめ、いわゆ
る8ミリVTR(8ミリビデオテープレコーダ)等、民
生用の磁気記録の分野で実用化が進んでいる。
(Prior Art) For the purpose of increasing recording density and quality in magnetic recording, a magnetic recording medium 1 having a high coercive force, for example, F is added to magnetic powder.
So-called alloy-coated metal tapes using metal magnetic powder made of metals or alloys such as e, Co, and Ni have been developed, and have been used in audio tape recorders, so-called 8 mm VTRs (8 mm video tape recorders), etc. Practical use is progressing in the field of consumer magnetic recording.

したがって、このような磁気記録媒体を充分に磁化する
ためには、磁気ヘッドのコア材料に対して、この媒体の
保磁力に見合った充分高い飽和磁束密度を有することが
要求される。また、特に記録・再生を同一の磁気へノド
で行う場合においては、上述の飽和磁束密度のみならず
、通用する周波数帯域で充分に高い透磁率を有する材料
であることが必要である。
Therefore, in order to sufficiently magnetize such a magnetic recording medium, the core material of the magnetic head is required to have a sufficiently high saturation magnetic flux density commensurate with the coercive force of the medium. In addition, especially when recording and reproducing are performed using the same magnetic flux, the material needs to have not only the above-mentioned saturation magnetic flux density but also a sufficiently high magnetic permeability in a commonly used frequency band.

従来、このような基本的な磁気特性を満たすコア材料と
して、Fe−Al−3i系合金(センダスト合金)が知
られており、実用に供されていることは周知の通りであ
る。
It is well known that Fe-Al-3i alloy (Sendust alloy) has been known as a core material that satisfies such basic magnetic properties and is in practical use.

しかしながら、このセンダスト合金のように軟磁気特性
に優れた材料においては、磁歪λSと結晶磁気異方性K
が共に零付近であることが望ましり、磁気ヘッドに使用
可能な材料組成はこれら両者の値を考慮して決められる
。したがって、飽和磁束密度もこの組成に対応して一義
的に決まり、センダスト合金の場合、10〜llkガウ
スが限界である。
However, in materials with excellent soft magnetic properties such as this Sendust alloy, magnetostriction λS and magnetocrystalline anisotropy K
It is desirable that both values be around zero, and the material composition that can be used in the magnetic head is determined by taking these two values into consideration. Therefore, the saturation magnetic flux density is also uniquely determined according to this composition, and in the case of Sendust alloy, the limit is 10 to 11 gauss.

あるいは、上記センダスト合金にかわり、高周波数領域
でのi3磁率の低下が少なく高い飽和磁束密度を有する
非晶質磁性合金材料(いわゆるアモルファス磁性合金材
料)も開発されているが、この非晶質磁性合金材料でも
飽和磁束密度は12にガウス程度であり、また、熱的に
不安定で結晶化の可能性が大きいので500°C以上の
温度を長時間加えることはできず、例えばガラス融着の
ように各種熱処理が必要な磁気ヘッドに使用するには工
程上制限が生ずる。
Alternatively, instead of the Sendust alloy mentioned above, an amorphous magnetic alloy material (so-called amorphous magnetic alloy material) has been developed that has a high saturation magnetic flux density with less decrease in i3 magnetic flux density in the high frequency region. Even alloy materials have a saturation magnetic flux density of about 12 Gauss, and are thermally unstable and have a high possibility of crystallization, so it is not possible to apply temperatures over 500°C for a long time. There are process limitations when using it for magnetic heads that require various heat treatments.

(発明が解決しようとする問題点〕 このような状況から、さらに良好な軟磁気特性を示す軟
磁性材料の研究が進められ、例えば本願出願人は先に特
願昭6’ O−192903号明細書において、Fe、
Go、Si、 Alを主成分とし、軟磁気特性や熱安定
性に優れたFa−Co−3i−Al系軟磁性薄膜を提案
した。
(Problems to be Solved by the Invention) Under these circumstances, research into soft magnetic materials exhibiting even better soft magnetic properties has been progressing. In the book, Fe,
We have proposed a Fa-Co-3i-Al based soft magnetic thin film that has Go, Si, and Al as its main components and has excellent soft magnetic properties and thermal stability.

本発明は、このFe−Co−3i−AI系軟磁性FI[
#の耐蝕性の一層の改善を図るものである。
The present invention is directed to this Fe-Co-3i-AI soft magnetic FI [
This aims to further improve the corrosion resistance of #.

すなわち、本発明は、センダスト合金を凌ぐ高い飽和磁
束密度を有するとともに、優れた耐蝕性。
That is, the present invention has a higher saturation magnetic flux density than Sendust alloy, and also has excellent corrosion resistance.

熱安定性を有する軟磁性薄膜を提供することを目的とす
る。
The purpose of the present invention is to provide a soft magnetic thin film having thermal stability.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者等は、前述の問題点を解消せんものと鋭意研究
の結果、所定量のRuの添加が耐蝕性。
The inventors of the present invention have conducted extensive research to solve the above-mentioned problems, and have found that adding a predetermined amount of Ru improves corrosion resistance.

耐摩耗性の向上に有効で、また軟磁気特性を損なうこと
もないとの知見を得るに至った。
We have found that it is effective in improving wear resistance and does not impair soft magnetic properties.

本発明の軟磁性薄膜は、このような知見に基づいて完成
されたものであって、Fe、Go、SL。
The soft magnetic thin film of the present invention was completed based on such knowledge, and includes Fe, Go, and SL.

Alを主成分とし、上記Co、Si及びAlの組成範囲
がそれぞれ1〜15原子%Co、lO〜20原子%Si
、8〜15原子%Afであって、さらに0.1〜10原
子%のRuを含有することを特徴としている。
Al is the main component, and the composition ranges of Co, Si and Al are 1 to 15 at% Co, 1O to 20 at% Si, respectively.
, 8 to 15 atom % Af, and further contains 0.1 to 10 atom % Ru.

Ruの添加は、耐蝕性、耐摩耗性の改善に極めて有効で
、例えば、軟磁性薄膜の組成をF e bIlc Ol
oA 1 *S i +*−xRu X(ただし、数値
はそれぞれ原子%を示す。)とし、Ruの添加ffIx
を変えて摩耗量を調べたところ、第1図に示すように摩
耗量低減に顕著な効果を示した。すなわち、一般に軟磁
性薄膜を磁気ヘッドに加工し磁気テープを走行させると
、走行時間の増加に伴って摩耗量も増加するが、Ruの
添加量の増加に伴い、例えば30時間走行後であっても
摩耗量は極めて少ないものとなり、Ru4原子%の時、
センダストより優れた耐摩耗性を示すことがわかった。
Addition of Ru is extremely effective in improving corrosion resistance and abrasion resistance. For example, when the composition of a soft magnetic thin film is
oA 1 *S i +*-xRu
When the amount of wear was investigated by changing the amount of wear, as shown in FIG. 1, it showed a remarkable effect in reducing the amount of wear. In other words, when a soft magnetic thin film is processed into a magnetic head and a magnetic tape is run, the amount of wear increases as the running time increases, but as the amount of Ru added increases, for example, after running for 30 hours, The amount of wear is extremely small, and when Ru is 4 atomic%,
It was found that it exhibits better wear resistance than Sendust.

また、Feの一部をRuで直換し、飽和磁束密度の変化
を調べたところ、第2図に示すように、Ruの置換量の
増加に伴って飽和磁束密度は若干減少するものの、Cr
で置換した場合に比べると減少の割合は極めて小さく、
SiやAIで置換した場合に比べても小さいことがわか
った。
In addition, when we directly replaced a part of Fe with Ru and investigated the change in the saturation magnetic flux density, we found that as shown in Figure 2, the saturation magnetic flux density slightly decreased as the amount of Ru substitution increased, but Cr
The rate of decrease is extremely small compared to when replaced with
It was found that it is smaller than when replaced with Si or AI.

本発明において、Ruの添加量を0.1〜10原子%と
したのは、添加量が0.1原子%未満では耐摩耗性の改
善に充分な効果が期待できず、一方、添加量がlO原子
%を越えると軟磁気特性の劣化や飽和磁束密度の減少を
もたらし、本来の意味を失うからである。
In the present invention, the amount of Ru added is set to 0.1 to 10 atom% because if the amount added is less than 0.1 atom%, a sufficient effect in improving wear resistance cannot be expected. This is because if it exceeds 10 atomic %, the soft magnetic properties will deteriorate and the saturation magnetic flux density will decrease, and the original meaning will be lost.

一方、本発明の軟磁性薄膜において、所定の磁気特性を
確保するために、基本成分であるFe。
On the other hand, in the soft magnetic thin film of the present invention, in order to ensure predetermined magnetic properties, Fe is used as a basic component.

Co、Si、Anについては、Col〜15原子%、5
ilo〜20原子%、Al8〜15原子%。
For Co, Si, An, Col ~ 15 atomic%, 5
ilo~20 at%, Al8~15 at%.

残部Feとする。これら基本成分が前記組成範囲を外れ
ると、飽和磁束密度、透磁率、保磁力等の磁気特性を確
保することが難しくなる。
The remainder is Fe. When these basic components are outside the above composition range, it becomes difficult to ensure magnetic properties such as saturation magnetic flux density, magnetic permeability, and coercive force.

したがって、本発明の軟磁性薄膜の組成を式%式% (ただし、式中a、b、c、d、eはそれぞれ組成を原
子%で表す。) で表せば、その組成範囲は、 0.1≦b≦10 1≦C≦15 10≦d≦20 8≦e≦15 a+b+c+d+e=100 となる。
Therefore, if the composition of the soft magnetic thin film of the present invention is expressed by the formula % (wherein a, b, c, d, and e each represent the composition in atomic %), the composition range is 0. 1≦b≦10 1≦C≦15 10≦d≦20 8≦e≦15 a+b+c+d+e=100.

上述の軟磁性薄膜の製造方法としては種々の方法が考え
られるが、なかでも真空薄膜形成技術によるのが良い。
Although various methods can be considered for manufacturing the above-mentioned soft magnetic thin film, vacuum thin film forming technology is particularly preferred.

この真空薄膜形成技術の手法としては、スパッタリング
やイオンブレーティング、真空蒸着法。
The techniques for forming this vacuum thin film include sputtering, ion blasting, and vacuum evaporation.

クラスター・イオンビーム法等が挙げられる。Examples include cluster ion beam method.

また、上記各成分元素の組成を調節する方法としては、 1)Fe、Ru、Go、Si、A#を所定の割合となる
ように秤量し、これらをあらかじめ例えば高周波溶解炉
等で溶解して合金インゴットを形成しておき、この合金
インゴットを蒸発源として使用する方法、 ii)各成分の単独元素の蒸発源を用意し、これら蒸発
源の数で組成を制御する方法、 ■)各成分の単独元素の蒸発源を用意し、これら蒸発源
に加える出力(印加電圧)を制御して蒸発スピードをコ
ントロールし組成を制御する方法、 iv)合金を蒸発源として蒸着しながら他の元素を打ち
込む方法、 等が挙げられる。
In addition, as a method for adjusting the composition of each of the above component elements, 1) Weigh Fe, Ru, Go, Si, and A# in a predetermined ratio, and melt them in advance in, for example, a high-frequency melting furnace. A method in which an alloy ingot is formed and this alloy ingot is used as an evaporation source; ii) A method in which evaporation sources for a single element of each component are prepared and the composition is controlled by the number of these evaporation sources; A method of preparing evaporation sources of a single element and controlling the output (applied voltage) applied to these evaporation sources to control the evaporation speed and composition; iv) A method of implanting other elements while depositing an alloy as an evaporation source. , etc.

なお、上述の真空薄膜形成技術等により膜付けされた軟
磁性薄膜は、そのままの状態では保磁力は若干高い値を
示し良好な軟磁気特性が得られないので、熱処理を施し
て膜の歪を除去し、軟磁気特性を改善することが好まし
い。
Note that the soft magnetic thin film formed by the above-mentioned vacuum thin film forming technology has a slightly high coercive force in its original state and good soft magnetic properties cannot be obtained, so heat treatment is performed to reduce the distortion of the film. It is preferable to remove it to improve the soft magnetic properties.

〔作用〕[Effect]

このように、Fe、Co、Si、AIを基本成分とする
Fe−Co−3i−Ajj系合金へのRuの添加は、耐
摩耗性向上や耐蝕性の改善の点で顕著に作用する。また
、Ruの添加による軟磁気特性の劣化はほとんどなく、
飽和磁束密度の減少も著しく少ない。
As described above, the addition of Ru to the Fe-Co-3i-Ajj alloy whose basic components are Fe, Co, Si, and AI has a significant effect on improving wear resistance and corrosion resistance. In addition, there is almost no deterioration of soft magnetic properties due to the addition of Ru,
The decrease in saturation magnetic flux density is also significantly small.

〔実施例〕〔Example〕

以下、本発明の具体的な実施例について説明するが、本
発明がこの実施例に限定されるものではない。
Hereinafter, specific examples of the present invention will be described, but the present invention is not limited to these examples.

先ず、Fe、Ru、Co、Si、 Altをそれぞれ所
定の組成比となるように秤量し、アルゴン雰囲気中で高
周波誘導加熱炉を用いて溶解・鋳造後、さらに平面研削
盤により機械加工を行って直径4インチ、厚み41mの
スパッタリング用合金ターゲットを得た。
First, Fe, Ru, Co, Si, and Alt were each weighed to have a predetermined composition ratio, melted and cast using a high-frequency induction heating furnace in an argon atmosphere, and then machined using a surface grinder. An alloy target for sputtering with a diameter of 4 inches and a thickness of 41 m was obtained.

次に、この合金ターゲットを用いて、高周波マグネトロ
ンスパッタ装置により、アルゴン分圧5X 10−3T
orr、投入電力300Wの条件でスパッタリングを行
い、水冷した結晶化ガラス基板(保谷ガラス社製、商品
名HOY八 PEG3130C)上に膜厚約1μmの薄
膜を得た。
Next, using this alloy target, an argon partial pressure of 5X 10-3T was applied using a high-frequency magnetron sputtering device.
Sputtering was performed under conditions of 300 W input power and a thin film with a thickness of about 1 μm was obtained on a water-cooled crystallized glass substrate (manufactured by Hoya Glass Co., Ltd., trade name: HOY8 PEG3130C).

さらに、この54膜を、I X 10−’Torr以下
の真空下でTaなる温度で1時間焼鈍し、徐冷して軟磁
性薄膜を得た。
Further, this 54 film was annealed at a temperature of Ta in a vacuum of I x 10-' Torr or less for 1 hour, and then slowly cooled to obtain a soft magnetic thin film.

上述の方法に従い、合金ターゲットの組成比を次表中に
示すような値に設定し、サンプル1ないしサンプル3を
作製した。
According to the method described above, samples 1 to 3 were prepared by setting the composition ratio of the alloy target to the values shown in the following table.

得られた各ナンプルについて、軟磁性薄膜の膜組成を分
析し、飽和磁束密度Bs、抗磁力1(c。
For each sample obtained, the film composition of the soft magnetic thin film was analyzed, and the saturation magnetic flux density Bs, coercive force 1 (c.

透磁率μ(I M llzにおける値)、磁歪、 II
耗■および耐蝕性について調べた。
Magnetic permeability μ (value at I M llz), magnetostriction, II
Abrasion and corrosion resistance were investigated.

ここで、飽和磁束密度BSは試料振動磁束計(■SM)
、抗(51力Hcは交流10 llzのB−Hループト
レーサ、rA C11率μは8の字コイル型ilt率計
で測定した。また、各サンプルの膜厚は、試料表面にア
ルミニウムを薄く蒸着し、多重干渉膜厚計によって膜と
基板との段差をα1定することにより求めた。さらに、
各サンプルの組成分析は、EPMA (Electro
n Probe Micro−八nalysis)法に
よった。
Here, the saturation magnetic flux density BS is measured using a sample vibrating magnetometer (■SM).
, resistance (51 force Hc was measured with a B-H loop tracer of AC 10 llz, and rA C11 rate μ was measured with a figure-8 coil type ILT rate meter.The film thickness of each sample was determined by thinly vapor-depositing aluminum on the sample surface. Then, it was determined by using a multi-interference film thickness meter to determine the step difference between the film and the substrate by α1.Furthermore,
Compositional analysis of each sample was performed using EPMA (Electro
n Probe Micro-analysis) method.

摩耗量は次のようにして求めた。すなわち、先ず基板と
してフェライトよりなる擬像ヘッドを作製し、先に述べ
たスパック条件と同一の条件で膜厚18μmの軟磁性薄
膜をヘッドチップの先端に成膜した。この擬僚へンドを
テープ幅1インチのビデオテープレコーダ(相対速度2
5.6 m / 5ee)にトラック幅9.5mm、突
き出し180μmとなるように取り付け、r−FezO
sを磁性粉末とする磁気テープを30時時間待させて膜
の減少量を顕微鏡で写真観察して求めた。
The amount of wear was determined as follows. That is, first, a pseudo-imaging head made of ferrite was prepared as a substrate, and a soft magnetic thin film having a thickness of 18 μm was formed on the tip of the head chip under the same spuck conditions as described above. The video tape recorder with a tape width of 1 inch (relative speed 2
5.6 m / 5ee) with a track width of 9.5 mm and a protrusion of 180 μm, and r-FezO
A magnetic tape containing S as a magnetic powder was allowed to stand for 30 hours, and the amount of film reduction was determined by photographic observation using a microscope.

各サンプルの耐蝕性は、1規定の食塩水に室温で一週間
浸した後の膜面の表面の観察に依った。
The corrosion resistance of each sample was determined by observing the surface of the membrane after being immersed in 1N saline at room temperature for one week.

この耐蝕性の評価は、下記のような表面状態から判定し
た。
The corrosion resistance was evaluated based on the following surface conditions.

A:g1面に変化がなく、鏡面を保ったままの状態。A: There is no change in the g1 surface and the mirror surface is maintained.

B:膜面に薄く錆が発生した状態。B: A state in which a thin layer of rust has formed on the film surface.

C:膜面に濃く錆が発生した状態。C: A state in which thick rust has occurred on the film surface.

D;膜自体が消失する程度に錆が発生した状態。D: A state in which rust has occurred to the extent that the film itself disappears.

結果を次表に示す、なお、比較のために、上述の方法と
同様に成膜したFe−Co−3i−Al合金(Ruを含
まず。)についても、比較サンプル1〜3として各値を
測定した。
The results are shown in the table below. For comparison, the values for Fe-Co-3i-Al alloy (excluding Ru) formed in the same manner as the above method were also used as comparative samples 1 to 3. It was measured.

(以下余白) この表より、本発明を適用した各サンプルにあっては、
特に耐蝕性や摩耗量において顕著な改善効果が見られ、
また飽和磁束密度、33磁率、保磁力についてもFe 
 Co−3i−Aff系合金と遜色のないことがわかっ
た。
(Left below) From this table, it can be seen that for each sample to which the present invention is applied,
In particular, remarkable improvement effects were seen in corrosion resistance and wear amount.
In addition, regarding the saturation magnetic flux density, 33 magnetic flux density, and coercive force, Fe
It was found that it is comparable to Co-3i-Aff alloy.

〔発明の効果〕〔Effect of the invention〕

上述の説明からも明らかなように、Fa、Co。 As is clear from the above description, Fa, Co.

Si、Aj+を基本成分とするFe−Co−3i−Aj
!系合金に、Ruを添加することにより、耐蝕性や耐摩
耗性の大幅な改善が図られる。また、このRuの添加に
よって軟磁気特性の劣化や飽和磁束密度の減少がもたら
されることもない。
Fe-Co-3i-Aj with Si and Aj+ as basic components
! By adding Ru to the alloy, corrosion resistance and wear resistance can be significantly improved. Further, the addition of Ru does not cause deterioration of soft magnetic properties or decrease of saturation magnetic flux density.

したがって、耐蝕性、耐摩耗性等の実用特性に(1れる
とともに磁気特性にも優れた軟磁性薄膜の提供が可能と
なり、磁気ヘッドのコア材等として極めて実用価値が高
いと言える。
Therefore, it is possible to provide a soft magnetic thin film that has excellent practical properties such as corrosion resistance and abrasion resistance, as well as excellent magnetic properties, and can be said to have extremely high practical value as a core material of a magnetic head.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はF ehsc OloA /9S i 1.−
11RLlllとしたときのRu添加i1xと摩耗量の
関係を示す特性図であり、第2図はRu置換に伴う飽和
磁束密度の変化の様子をCr添加の場合と比較して示す
特性図である。
Figure 1 shows F ehsc OloA /9S i 1. −
11RLllll is a characteristic diagram showing the relationship between Ru addition i1x and wear amount, and FIG. 2 is a characteristic diagram showing the change in saturation magnetic flux density due to Ru substitution in comparison with the case of Cr addition.

Claims (1)

【特許請求の範囲】[Claims]  Fe、Co、Si、Alを主成分とし、上記Co、S
i及びAlの組成範囲がそれぞれ1〜15原子%Co、
10〜20原子%Si、8〜15原子%Alであって、
さらに0.1〜10原子%のRuを含有することを特徴
とする軟磁性薄膜。
The main components are Fe, Co, Si, and Al, and the Co, S
The composition range of i and Al is 1 to 15 at% Co, respectively.
10 to 20 at% Si, 8 to 15 at% Al,
A soft magnetic thin film further comprising 0.1 to 10 atomic % of Ru.
JP60244626A 1985-10-31 1985-10-31 Crystalline soft magnetic thin film Expired - Lifetime JPH0746656B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60244626A JPH0746656B2 (en) 1985-10-31 1985-10-31 Crystalline soft magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60244626A JPH0746656B2 (en) 1985-10-31 1985-10-31 Crystalline soft magnetic thin film

Publications (2)

Publication Number Publication Date
JPS62104111A true JPS62104111A (en) 1987-05-14
JPH0746656B2 JPH0746656B2 (en) 1995-05-17

Family

ID=17121547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60244626A Expired - Lifetime JPH0746656B2 (en) 1985-10-31 1985-10-31 Crystalline soft magnetic thin film

Country Status (1)

Country Link
JP (1) JPH0746656B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01217708A (en) * 1988-02-24 1989-08-31 Tokin Corp Magnetic alloy

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5739125A (en) * 1980-08-20 1982-03-04 Tohoku Metal Ind Ltd Preparation of magnetic material
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Manufacture of amorphous thin film
JPS6273604A (en) * 1985-09-27 1987-04-04 Hitachi Ltd Ferromagnetic thin film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5739125A (en) * 1980-08-20 1982-03-04 Tohoku Metal Ind Ltd Preparation of magnetic material
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Manufacture of amorphous thin film
JPS6273604A (en) * 1985-09-27 1987-04-04 Hitachi Ltd Ferromagnetic thin film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01217708A (en) * 1988-02-24 1989-08-31 Tokin Corp Magnetic alloy

Also Published As

Publication number Publication date
JPH0746656B2 (en) 1995-05-17

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