JPS6192828A - Biaxially orientated poly-p-phenylenesulfide film - Google Patents

Biaxially orientated poly-p-phenylenesulfide film

Info

Publication number
JPS6192828A
JPS6192828A JP59212458A JP21245884A JPS6192828A JP S6192828 A JPS6192828 A JP S6192828A JP 59212458 A JP59212458 A JP 59212458A JP 21245884 A JP21245884 A JP 21245884A JP S6192828 A JPS6192828 A JP S6192828A
Authority
JP
Japan
Prior art keywords
film
polyp
phenylene
biaxially oriented
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59212458A
Other languages
Japanese (ja)
Other versions
JPH0523939B2 (en
Inventor
Takashi Watanabe
尚 渡辺
Yukichi Deguchi
出口 雄吉
Hiroaki Kobayashi
弘明 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP59212458A priority Critical patent/JPS6192828A/en
Publication of JPS6192828A publication Critical patent/JPS6192828A/en
Publication of JPH0523939B2 publication Critical patent/JPH0523939B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0333Organic insulating material consisting of one material containing S

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To obtain a printed circuit board, excellent in thermal dimensional stability, by a method wherein a metallic thin film is laminated on the material of biaxially orientated poly-P-phenylenesulfide film containing the specified amount of biaxially orientated poly-P-phenylenesulfone chain. CONSTITUTION:Biaxially orientated poly-P-phenylenesulfide film is oxided by percarboxylic acid to obtain the biaxially orientated film of three-layer structure, which contains 1 mol%-70 mol% of biaxially orientated poly-P-phenylene sulfone chain. Next, the metallic thin film is laminated on said biaxially orientated film to constitute the printed circuit board. According to this method, the printed circuit board, excellent in thermal dimensional stability in high temperature and a resistance to soldering, may be obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は2軸配向ポリP−フェニレンスルフィドフィル
ム及び該フィルムを用いたプリント配線基板に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a biaxially oriented polyP-phenylene sulfide film and a printed wiring board using the film.

〔従来技術〕[Prior art]

従来2軸配向ボ+7 p−フェニレンスルフィドのミカ
らなるフィルムは公知であi−嘔逗柿6く爪六く電気絶
縁性、耐熱性、耐薬品性などの点でも優れた性能を有し
ており、可柳性回路基板や集積回路用チップキャリアテ
ープなどのプリント配線基板用素材、感熱転写フィルム
基板、あるいはコンデンサー、転写箔等の各種蒸着フィ
ルム基板として注目されている。
Conventional biaxially oriented films made of p-phenylene sulfide are well known and have excellent performance in terms of electrical insulation, heat resistance, chemical resistance, etc. It is attracting attention as a material for printed wiring boards such as flexible circuit boards and chip carrier tapes for integrated circuits, thermal transfer film substrates, and various vapor-deposited film substrates such as capacitors and transfer foils.

しかし、従来の2軸配向ポリP−7二二レンスルフイド
フイルムは200℃以上の高温、特にボIJ P−フェ
ニレンスルフィドの融点約285℃近くの温度での寸法
安定性に欠けるという欠点を有していた。そのため高温
での寸法安定性が厳しく要求される用途への応用か制限
されていた。
However, the conventional biaxially oriented polyP-7 22lene sulfide film has the disadvantage of lacking dimensional stability at high temperatures of 200°C or higher, especially at temperatures near the melting point of IJ P-phenylene sulfide, about 285°C. Was. This has limited its application to applications where dimensional stability at high temperatures is strictly required.

特に部品のハンダ付などの高温雰囲気にさらされるプリ
ント配線基板用の素材としては、熱収縮による寸法変化
のため、基鈑にしわが入ったり。
In particular, materials for printed wiring boards that are exposed to high-temperature atmospheres such as when soldering components may wrinkle due to dimensional changes due to heat shrinkage.

あるいは金属箔とフィルムが剥離するといった間は公知
であり、ポリ1,4シクロセンスルホンを芳香環化した
もの、ポリP−フ二二レンスルフイトスルホン →→7
Xべ三とo、ケ を過酸化水素で酸イヒしたもの等が知
られている。得られる粒状あるいは粉末状ポリP−フ二
二しンスルホンは結晶性であり、融点500℃以上とま
れに見る優れた耐熱性を有している。しかしそのために
芙質的に溶融成形が不可能であり、かつ十分に溶解しう
る溶媒か存在しないために溶液状での成形も不可能なた
め、有用なポIJ P−フェニレンスルホン成形体は得
られていない。
Alternatively, it is known that the metal foil and film peel off, and poly-1,4 cyclosene sulfone is aromatically cyclized, poly-P-phenylene sulfite sulfone →→7
It is known that compounds obtained by acidifying X, O, and Q with hydrogen peroxide are known. The resulting granular or powdered poly-P-fluorinated sulfone is crystalline and has a melting point of 500° C. or higher, which is rare and has excellent heat resistance. However, because of this, melt molding is impossible due to its nature, and molding in a solution state is also impossible because there is no solvent that can sufficiently dissolve it. It has not been done.

特公昭47−14470はおいては で一部酸化した後、溶液状でフィルムその他に成形する
事を示しているが、得られる物品は非常にもろく実用に
供し得ない。
Japanese Patent Publication No. 47-14470 discloses that the product is partially oxidized and then molded into a film or other product in the form of a solution, but the resulting product is extremely brittle and cannot be put to practical use.

また、 u s p  3,948,865においては
ポリP−フェニレンスルフィド成形品を過酸化水素もし
くは次亜塩素酸ソーダ等で酸化して不溶融化する事が提
案されているが、これにおいても一部ポ17 pく、亀
裂を容易に形成するという欠点を有している。
Furthermore, in U.S.P. 3,948,865, it is proposed to oxidize polyP-phenylene sulfide molded products with hydrogen peroxide or sodium hypochlorite to make them infusible. It has the disadvantage of being small in size and easily forming cracks.

〔発明が解決しようとする問題点] 本発明の目的は、ポリP−フ二二しンスルフイドフイル
ムの欠点である高温での寸法安定性を改良するために本
来耐熱性に優れたボ!J P −フェニレンスルホン連
鎖を導入し、かつ既存のポリP−フエニレンスルホン成
形体にみられた脆いという欠点を解消するため、そのポ
リP−フェニレンスルホン連鎖に2軸配向構造を導入し
たフィルムを提供すること、及び耐ハンダ特性の優れた
プリント配線基板を提供することにある。
[Problems to be Solved by the Invention] An object of the present invention is to improve the dimensional stability at high temperatures, which is a drawback of polyP-fluoride sulfide film, by producing a film that inherently has excellent heat resistance. In order to introduce J P -phenylenesulfone chains and eliminate the flaw of brittleness observed in existing polyP-phenylenesulfone molded products, we created a film in which a biaxially oriented structure was introduced into the polyP-phenylenesulfone chains. and to provide a printed wiring board with excellent solder resistance.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は上記目的を達成するため次の構成を有するもの
である。すなわち。
The present invention has the following configuration to achieve the above object. Namely.

(1)21m配向したポリP−フェニレンスルホン連鎖
を1モル係以上70モル係未満含む2軸配向ポIJ p
−フェニレンスルフィドフィルム。
(1) Biaxially oriented polymer IJ p containing 1 molar or more and less than 70 molar polyP-phenylene sulfone chains with 21m orientation.
- Phenylene sulfide film.

(2)上記、(1)項のフィルムに金属薄膜を積層して
なるプリント配線基板 である。
(2) A printed wiring board formed by laminating a thin metal film on the film of item (1) above.

本発明で言うポリp−フェニレンスルホン連鎖とは、一
般式 ヘ!ΣSO,−で表わされるものであ(Rは炭素
e、20以下の炭化水素基) (E>co−。
The poly p-phenylene sulfone chain referred to in the present invention has the general formula H! It is represented by ΣSO,- (R is carbon e and a hydrocarbon group of 20 or less) (E>co-.

(IXt)−等)を20%未満含んでもさじかえない。(IXt)-, etc.), even if it contains less than 20%.

20%以十の共重合成分が存在すると、ポリP−フ二二
しンスルホンの配向性が損なわれて。
If 20% or more of the copolymer component is present, the orientation of polyP-phenyl sulfone will be impaired.

機械的物性か低下し、かつ耐熱性も低下傾向にあり好ま
1.<ない。
Mechanical properties tend to decrease and heat resistance also tends to decrease, so 1. <No.

本発明のフィルムはこのポリP−フェニレンスルホン連
鎖1モル係以上、70モル係未満、望ましくは5モル係
以上、40モル係未満含む2軸配向ポリP−フェニレン
スルフィドフィルムであるが、これはポIJ p−フェ
ニレンスルホンの耐熱性による優れた熱的寸法安定性と
、ポIJ p−フ二二しンスルフィドの優れた機榊的監
を同時に保持したフィルムである。
The film of the present invention is a biaxially oriented polyP-phenylene sulfide film containing this polyP-phenylene sulfone chain in a molar proportion of 1 or more and less than 70, preferably 5 and less than 40. This is a film that simultaneously maintains the excellent thermal dimensional stability due to the heat resistance of IJ p-phenylene sulfone and the excellent mechanical stability of IJ p-phenylene sulfide.

ポリp−フェニレンスルホン連鎖が1モルφ未満であれ
ば熱的寸法安定性が劣り好ましくなく。
If the poly p-phenylene sulfone chain is less than 1 mole φ, the thermal dimensional stability will be poor, which is not preferable.

70モル係をi14λるとポリP−7エニレンスルフイ
ドによる機械的特性の保持が減少する。
When i14λ is 70 molar, retention of mechanical properties by polyP-7 enylene sulfide is reduced.

本発明のフィルムは儀膚的に2軸配向したポリP−フェ
ニレンスルホン連鎖を主体とした層を外層とし、2軸配
向したポリP−フェニレンスルフィド層を中心層とした
6層構造を有しており、その外層は、該フィルムを65
0℃10分間加熱することにより溶融する内層と分離可
能で、その厚みは0.1μm以上が好ましく、O,Sμ
m以上がよ41好ましい。この外層は該フィルムの熱的
寸法安定性を付与し、内層であるポリP−フ二二しンス
ルフイド層は該フィルムの機械的特性を保持している。
The film of the present invention has a six-layer structure with an outer layer consisting mainly of biaxially oriented polyP-phenylene sulfone chains and a center layer consisting of a biaxially oriented polyP-phenylene sulfide layer. and its outer layer is made of 65
It can be separated from the melted inner layer by heating at 0°C for 10 minutes, and its thickness is preferably 0.1 μm or more, and O, Sμ
m or more is more preferable. This outer layer provides thermal dimensional stability of the film, while the inner poly-P-fluoride sulfide layer retains the mechanical properties of the film.

なお1片側外層の厚さく両外層の厚さか異なる場合は9
両外層の厚さの和の半分とする)Aと内層の厚さBとの
比A/Bは、0.01〜1.5が好ましく、0.05〜
035かより好ましい。
In addition, if the thickness of the outer layer on one side is different from the thickness of both outer layers, 9
The ratio A/B between A and the thickness B of the inner layer (which is half the sum of the thicknesses of both outer layers) is preferably 0.01 to 1.5, and preferably 0.05 to 1.5.
035 is more preferable.

また、ここでいうポリP−フェニレンスルフィドとはポ
リP−フェニレンスルホン連鎖を除いたい。20モル係
以上であれば、ポリP−フェニレンスルフィド本米の結
晶性か損われ2機械的特性の低下を起し望ましくない。
In addition, polyP-phenylene sulfide as used herein excludes polyP-phenylene sulfone chains. If the molar ratio is more than 20, the crystallinity of the polyP-phenylene sulfide may be impaired, resulting in a decrease in mechanical properties, which is undesirable.

本発明においてはこれらポリP−フエニレンス軸配向と
はフィルム面内でフィルム長手方向及びそれに垂直でし
かも厚み方向にも垂直な方向に分子鎖が配向している事
であり、以下の条件を満たすフィルムが好ましい。
In the present invention, polyP-phenylene axial orientation refers to the orientation of molecular chains within the film plane in the longitudinal direction of the film and in a direction perpendicular thereto and also perpendicular to the thickness direction, and the film satisfies the following conditions. is preferred.

フィルAのEdge、 EndQ−およびThroug
h方向からのXiプレート写真を後述の方法により撮影
し。
Phil A's Edge, EndQ- and Throug
A photograph of the Xi plate was taken from the h direction using the method described below.

ポリP−フェニレンスルホンの結晶相に基っく2θ=1
6の回折床を赤道線上でデンシトメータで半径方向に走
査した時の黒化度(■φ=0°〕と60゜方向での黒化
度(1φ=60)の比、つまりIφ−60/Iφ=0°
を配向度(OF)と定義して求めると End+および
Edge  方向の配向度が01〜07であり、かつ 
Through  方向の配向度か07〜10であるこ
とがフィルムの機械的特性の点て好ましい。ここで E
nd+方向とはフィルム長手方向に平行な方向からのX
勝入射であり、  Edge方向とはこれと直角方向の
しかも厚み方向にも垂直なX線入射てあり、 Thr6
ugh方向とはフィルム面に対して垂直なX線入射であ
る。
Based on the crystal phase of polyP-phenylene sulfone 2θ=1
The ratio of the degree of blackening (■φ=0°) when scanning the diffraction bed of No. 6 in the radial direction with a densitometer on the equator line and the degree of blackening in the 60° direction (1φ=60), that is, Iφ-60/Iφ =0°
When calculated by defining the degree of orientation (OF), the degree of orientation in the End+ and Edge directions is 01 to 07, and
The degree of orientation in the through direction is preferably 07 to 10 from the viewpoint of the mechanical properties of the film. Here E
The nd+ direction is the direction of X from the direction parallel to the longitudinal direction of the film.
The X-ray incidence is perpendicular to the edge direction and also perpendicular to the thickness direction, and Thr6
The ugh direction is the incidence of X-rays perpendicular to the film plane.

ポIJ p−フェニレンスルフィドについても同様にフ
ィルムのEdge、 End4P、およびThroug
h方向からのXHプレート写真において、ポリP−フェ
ニレンスルフィドの(200)面を示す2θ−21°に
ついて各々配向度を求めると、 EdgeおよびEnc
i=h方向の配向度か各々01〜07であり、 Thr
ough方向の配向度が0.7〜1.0である事が好ま
しい、また該フィルムの相対結晶化度は広角X線による
フィルムの回折プロフィルより2θ%16 の強度(I
、6) 、 2θ=21°の強度(I2.)および2θ
−30’の強度(I、。)を測定し以下の式をもって相
対結晶化度と定義するが。この値か3〜50の範囲にあ
る事が機械的特性の点で好ましい。
Similarly, for poIJ p-phenylene sulfide, Edge, End4P, and Throug of the film
In the XH plate photograph taken from the h direction, the degrees of orientation are determined for 2θ-21° representing the (200) plane of polyP-phenylene sulfide. Edge and Enc
The degree of orientation in the i=h direction is 01 to 07, respectively, and Thr
It is preferable that the degree of orientation in the outward direction is 0.7 to 1.0, and the relative crystallinity of the film is determined by the intensity of 2θ%16 (I
, 6), 2θ=21° intensity (I2.) and 2θ
-30' intensity (I,.) is measured and defined as relative crystallinity using the following formula. This value is preferably in the range of 3 to 50 from the viewpoint of mechanical properties.

(ココでxは不りP−)ユニしンスルホン連鎖のモル%
) また該フィルムの引張り強度及び伸度は、フィルムの長
手方向2幅方向とも各々10kg/mm’以上。
(here x is not P-) mole% of unisulfone chain
) The tensile strength and elongation of the film are 10 kg/mm' or more in both longitudinal and width directions.

及び20%以上であることが好ましい。and preferably 20% or more.

ましい。Delicious.

なお9本発明のフィルムは、厚さが特に限定されないが
、1〜1oooμが好ましく 、 f 200μかより
好ましい。
Note that the thickness of the film of the present invention is not particularly limited, but is preferably 1 to 100μ, and more preferably f 200μ.

以上の様な本発明のフィルムを目的として公知の無機系
粒子が本発明の目的を阻害しない範囲で含まれていても
さし支えなく、また耐候性向上。
For the purpose of the film of the present invention as described above, known inorganic particles may be included as long as they do not impede the purpose of the present invention, and also to improve weather resistance.

耐熱性向ト等を目的として公知の有機系添加剤か物品の
実用的な特性を損わない範囲内で含まれていても何らさ
し支えない。
There is no problem even if known organic additives are included for the purpose of improving heat resistance, etc., within a range that does not impair the practical properties of the article.

また該フィルムに接着性等の改善のため必要に応じてコ
ロナ放電表面処理、プラズマ表面処理等の電気的表面処
理、酸処理アルカリ処理等の薬品表面処理を単独あるい
は複合して施しても何らさし支えない。また他のフィル
ム、金属箔と貼り合せて使用しても何らさし支えない。
Furthermore, if necessary, the film may be subjected to electrical surface treatment such as corona discharge surface treatment, plasma surface treatment, or chemical surface treatment such as acid treatment or alkali treatment, either alone or in combination. I can't support it. Furthermore, there is no problem in using it in combination with other films or metal foils.

金属薄膜とは材質、厚さは特に限定されないか。There are no particular limitations on the material and thickness of the metal thin film.

銅等に代表される厚さ11[l[[1以下の金属箔ある
いは金属層が好ましい。これにおいてフィルムと金属薄
膜の間に任意の接着層か存在していても同らさし支えな
い。
A metal foil or metal layer, typically made of copper or the like, having a thickness of 11[l[[1] or less is preferable. In this case, the presence of any adhesive layer between the film and the metal film is equally unsupportive.

次に具体的な本発明の2軸配向フイルムの製造方法を示
す。
Next, a specific method for manufacturing the biaxially oriented film of the present invention will be described.

本発明の2軸配向フイルムは2軸配向ポIJ p−フェ
ニレンスルフィドフィルムを過カルボン酸ニより酸化す
ることによって得られ2本発明のプリント配線基板はそ
のフィルムに金属箔膜を積層することによって得られる
The biaxially oriented film of the present invention is obtained by oxidizing a biaxially oriented p-phenylene sulfide film with percarboxylic acid, and the printed wiring board of the present invention is obtained by laminating a metal foil film on the film. It will be done.

ココで言う2軸配向ポリP−7エ;レンスルフ単位を8
0モルチ以上含み、かつ600℃における溶融粘度がぜ
ん断速度200(秒) のもとて100以上60万ポイ
ズ以下であるポリP−7エニレンスルフイドをフィルム
状に120℃以下の表面温度を有する冷却媒体上へ押し
出した後、該押出されたフィルムを85℃〜110℃で
6〜4.7倍に同時または逐次二軸延伸し。さらに20
0〜275°Cにて熱固定して得られる。
Here we say biaxially oriented polyP-7E; 8 Rensulf units
Poly P-7 enylene sulfide containing 0 molt or more and having a melt viscosity at 600°C of 100 to 600,000 poise at a shear rate of 200 (seconds) and having a surface temperature of 120°C or less After extrusion onto a cooling medium, the extruded film is simultaneously or sequentially biaxially stretched by a factor of 6 to 4.7 at 85°C to 110°C. 20 more
Obtained by heat fixing at 0 to 275°C.

この2軸配向ポリP−フェニレンスルフィドの等を20
モル%未満含んでもさし支えない。20モル係以上であ
れは、ポリP−フユニレンスルフイド本米の結晶性が損
われ9機械的特性の低下をおこし、ひいては本発明2軸
配向フイルムの機械的特性の低下をおこし好ましくない
20 of this biaxially oriented polyP-phenylene sulfide etc.
It is acceptable even if it is contained in an amount less than mol%. If the molar ratio is more than 20, the crystallinity of the polyP-phenylene sulfide is impaired and the mechanical properties of the biaxially oriented film of the present invention are deteriorated, which is undesirable. .

このポリP−7ユニレンスルフイドフイルムは構造パラ
メータとして次の3つが満たされる事が好ましい。まず
第一に相対結晶化度は広角X線によるフィルムの回折プ
ロフィルより(200)ピークである2θ−21°の強
度〔工21)と20=60°での強度CI、。〕を測定
し両者の比I 2./I 、。をもって相対結晶化度と
定義するが、この値が5〜65の範囲にある事が好まし
い。
This poly P-7 unilene sulfide film preferably satisfies the following three structural parameters. First of all, the relative crystallinity can be determined from the diffraction profile of the film by wide-angle X-rays, where the (200) peak is the intensity at 2θ-21° [Eng. 21] and the intensity CI at 20 = 60°. ] and the ratio of both I2. /I,. This value is defined as relative crystallinity, and it is preferable that this value is in the range of 5 to 65.

第二に微結晶の大きさが一定範囲であることが好ましく
、これは(200)回折ピークの半価幅より5chel
ler  の式を使用して得られる見がけの結晶粒子サ
イズを意味しており、40〜130′Aである事が好ま
しい。
Second, it is preferable that the size of the microcrystals is within a certain range, which is 5 chel from the half width of the (200) diffraction peak.
It refers to the apparent crystal grain size obtained using the ler formula, and is preferably from 40 to 130'A.

第三に配向度についてであるが、2θ=21°における
前述のEdge及びPjndm方向の配向度が021〜
0.7であり、 Through方向の配向度が0.7
〜1.0である事が好ましい。
Thirdly, regarding the degree of orientation, the degree of orientation in the Edge and Pjndm directions mentioned above at 2θ=21° is 021~
0.7, and the degree of orientation in the Through direction is 0.7.
It is preferable that it is 1.0.

以上の様な2軸配向ポリp−フェニレンスルフィドフィ
ルムに易滑性の発現等を目的として公知の無機系粒子が
本発明の目的を阻害しない範囲で含まれていてもさし支
えなく、また耐候性向上。
The biaxially oriented poly p-phenylene sulfide film as described above may contain known inorganic particles for the purpose of imparting slipperiness, etc., to the extent that it does not impede the purpose of the present invention. Improving sex.

耐熱性向上等を目的として公知の有機系添加剤が物品の
芙用的な特性を損わない範囲内で含まれていても何らさ
し支えない。
There is no problem even if known organic additives are included for the purpose of improving heat resistance, etc., within a range that does not impair the usable properties of the article.

またこの2軸配向ポリP−フェニレンスルフィドフィル
ムに必要に応じてコロナ放電表面処理。
This biaxially oriented polyP-phenylene sulfide film is also subjected to corona discharge surface treatment as required.

プラズマ表面処理等の電気的表面処理を単独あるいは複
合して施していても何らさし支えない。
There is no problem in applying electrical surface treatment such as plasma surface treatment alone or in combination.

矢にこの2軸配向ポリP−7二二レンスルフイドフイリ
ムを一般式 R+C00H)   (Rは炭素数か20
以下の炭化水素基てnは1から4の整数)で示される過
カルボン畝で酸化するわけであるが過カルボン岐以外の
畝化蒼1jによる歌化では主鎖の切断あるいはそれに付
随する酸化架橋が非常に多く有用な2軸配向フイルムに
はなり得ない。
The general formula R+C00H) (R is the number of carbon atoms or 20
The following hydrocarbon groups (n is an integer from 1 to 4) are oxidized at the percarboxylic chain, but when oxidation is performed by a carboxyl group other than the percarboxylic branch, the main chain is cleaved or the oxidative crosslinking associated with it is oxidized. There are so many that it cannot be a useful biaxially oriented film.

過カルボン酸には、過蟻酸、過酢酸、過プロピオン酸、
過酪酸、過安息香酸9mクロル過安息香酸、過トリクロ
ル酢酸、過トリフロル酢ば、過フタル酸等が挙げられる
。取り扱いの容易さと反応速度とのバランスの点で過酢
酸が最も好ましい。
Percarboxylic acids include performic acid, peracetic acid, perpropionic acid,
Examples include perbutyric acid, perbenzoic acid 9mchloroperbenzoic acid, pertrichloroacetic acid, pertrifluoroacetic acid, perphthalic acid, and the like. Peracetic acid is most preferred in view of the balance between ease of handling and reaction rate.

過カルボン酸は、アルデヒドの自動酸化、過酸化水素と
カルボン酸の無水物または塩化物からの合成、過酸化水
素とカルボン酸および硫酸を触媒としての合成、過酸化
シアロイルとナトリウムメトキシドの反応9等により生
成することができる。
Percarboxylic acids can be produced by autoxidation of aldehydes, synthesis of hydrogen peroxide and carboxylic acids from anhydrides or chlorides, synthesis of hydrogen peroxide with carboxylic acids and sulfuric acid as catalysts, reaction of sialoyl peroxide with sodium methoxide 9 It can be generated by etc.

この様な過カルボン酸もしくはその水浴液あるいは有機
溶媒による溶液あるいはそれらの混合Z液にKI述の2
軸配向ポリP−フェニレンスルフィドフィルムを浸せき
し反応せしめる。
2 mentioned in KI to such percarboxylic acid or its water bath solution or solution in organic solvent or mixed solution Z.
An axially oriented polyP-phenylene sulfide film is immersed and reacted.

ココでいつ有機溶媒にはカルボン酸、エステル。Here, when organic solvents are carboxylic acids and esters.

ケトン、エーテル等が挙げられ、過カルボン[ト相浴注
があり、かつ過カルボン酸により著しい変質を受けない
溶媒であればいかなる有&i媒でもさし支えない。
Examples include ketones, ethers, etc., and any solvent may be used as long as it has a percarboxylic acid phase and is not significantly altered by percarboxylic acid.

反応は常温から150℃、好ましくは過カルボン酸の安
定性の面から常温から100℃で反応を行なわしめる。
The reaction is carried out at room temperature to 150°C, preferably at room temperature to 100°C in view of the stability of the percarboxylic acid.

この際反応はフィルム表層から中心層に向って徐々に進
行する。反応は処理剤中の過カルボン酸濃度が高い程1
反応温度が高い程。
At this time, the reaction progresses gradually from the surface layer of the film toward the center layer. The reaction increases as the concentration of percarboxylic acid in the treatment agent increases.
The higher the reaction temperature.

あるいは反応時間が長い程進行する。ここにおいて適当
な条件を選択する事により任意のポリp−フェニレンス
ルホン連鎖量を持つポリP−フェニレンスルホンフィル
ムを得る事ができるが、あらかじめいくつかの条件での
スルホン化反応速度を求めておく事により、ポリP−フ
ユニレンスルホン連鎖が1モル係以上70モルチ未満、
好ましくは5モル係以上40モルチ未満をより正確に含
む2軸配向フイルムを得る事ができる。
Alternatively, the longer the reaction time, the faster the reaction progresses. By selecting appropriate conditions here, it is possible to obtain a polyP-phenylenesulfone film with any amount of polyp-phenylenesulfone chains, but it is important to determine the sulfonation reaction rate under several conditions in advance. Accordingly, the polyP-fuynylene sulfone chain is 1 molar or more and less than 70 molar,
It is possible to obtain a biaxially oriented film that preferably contains more than 5 moles and less than 40 moles.

ポリP−フェニレンスルホン連鎖がiモル係未満になる
様な処理であれば得られるフィルムは熱的寸法安定性が
劣り好ましくなく、70モモル係越える様な処理であれ
ば得られるフィルムは機械的特性の保持が減少する。
If the polyP-phenylene sulfone chain is processed to have less than i molar number, the resulting film will have poor thermal dimensional stability, which is undesirable. If the processing is such that the number of polyP-phenylene sulfone chains is less than 70 mole, the resulting film will have poor mechanical properties. retention is reduced.

外層の2軸配向ポリP−フェニレンスルホン連鎖を主体
とした層か好ましくは01μm以上、さらに好ましくは
0.5μm以上の厚さである3層構造を有した2軸配向
フイルムが得られる条件で過カルボン酸により2軸配向
ポリP−フェニレンスルフィドフィルムを処理するのが
望ましい。
The outer layer, which is a layer mainly composed of biaxially oriented polyP-phenylene sulfone chains, is heated under conditions that yield a biaxially oriented film having a three-layer structure with a thickness of preferably 0.1 μm or more, more preferably 0.5 μm or more. It is desirable to treat the biaxially oriented polyP-phenylene sulfide film with a carboxylic acid.

ここで言うポリP−フェニレンスルホン連鎖を外層とし
てなる2軸配向フイルムとは、外層がポリP−フユニレ
ンスルホン連鎖を主体とした層で中心層がポリP−フェ
ニレンスルフィド層でアル様な6層構造をもったフィル
ムであり、すなわち該フィルムを650°Cで10分加
熱した時に、中心層が溶融して←     3層にはく
離するフィルムである。この際その外層の厚みは0.1
μm以上である事が好ましい。さらに好ましくは05μ
m以上である。
The biaxially oriented film made of polyP-phenylene sulfone chains as the outer layer is the outer layer consisting mainly of polyP-phenylene sulfone chains, the center layer being a polyP-phenylene sulfide layer, and six Al-like layers. It is a film with a structure, that is, when the film is heated at 650°C for 10 minutes, the center layer melts and the film separates into three layers. At this time, the thickness of the outer layer is 0.1
It is preferable that the thickness is μm or more. More preferably 05μ
m or more.

又2反応は2軸配向ポリP−7二二レンスルフイドフイ
ルムを連続で過カルボン酸槽に通す事による連続処理と
フィルムをスペーサ等と一緒に巻き込んでロール状で処
理するバッチ処理といずれも可能である。反応後は望ま
しくは水洗あるいは有機溶媒で洗浄した後、任意の方法
で乾燥を行なり更に優れた熱寸法安定性を有するフィル
ムを得る事ができる。
The two reactions are continuous processing in which biaxially oriented polyP-7 22lene sulfide film is continuously passed through a percarboxylic acid bath, and batch processing in which the film is rolled up with spacers and processed in roll form. It is possible. After the reaction, the film is desirably washed with water or an organic solvent, and then dried by any method to obtain a film having even better thermal dimensional stability.

また該フィルムは接着性等の改善のため必要に応じてコ
ロナ放電表面処理、プラズマ表面処理等の電気的表面処
理、酸処理、アルカリ処理等の薬品表面処理を単独ある
いは複合して施しても何らさし支えない。
In addition, the film may be subjected to electrical surface treatment such as corona discharge surface treatment, plasma surface treatment, or chemical surface treatment such as acid treatment or alkali treatment, either alone or in combination, as necessary to improve adhesion. I can't help it.

また該フィルムを他のフィルムあるいは金属箔等とはり
合せても何らさし支えない。
Further, even if the film is laminated with other films or metal foils, there is no support at all.

次に本発明のプリント配線基板を得るためには一般には
十述の方法で得られたフィルムに適当な接着剤を用いて
鉤に代表される金属箔を貼り合せるか、メッキや真空蒸
着などの方法でフィルム表面に金属層を形成する方法を
用いる。
Next, in order to obtain the printed wiring board of the present invention, generally, a metal foil such as a hook is attached to the film obtained by the above-mentioned method using an appropriate adhesive, or by plating, vacuum deposition, etc. A method of forming a metal layer on the surface of the film is used.

〔作用および発明の効果〕[Action and effect of the invention]

かくして得られた2軸配向したポリP−フェニレンスル
ホン連鎖を2モル係以上、70モル係未満含む2軸配向
ポリP−フェニレンスルフィトフィルムは熱寸法安定性
が優れており、かつ優れた機械的特性を保持しているた
め、フレキシブル回路基板、感熱転写フィルム、あるい
はコンデンサー、転写箔等の各種蒸着フィルム等ポIJ
 p−フェニレンスルフィドフィルムのほとんどの用途
分野に応用が可能である。
The thus obtained biaxially oriented polyP-phenylene sulfite film containing biaxially oriented polyP-phenylene sulfone chains of 2 molar or more and less than 70 molar ratio has excellent thermal dimensional stability and excellent mechanical properties. Because it maintains its characteristics, it can be used for flexible circuit boards, thermal transfer films, capacitors, transfer foils, and other vapor-deposited films.
The p-phenylene sulfide film can be applied to most fields of use.

またかくして得られたプリント配線基板は耐ハンダ性に
非常にすぐれており、熱収縮による基板へのしわあるい
は金属箔とフィルムの剥離等の問題が皆無に近いもので
ある。
Furthermore, the printed wiring board thus obtained has excellent solder resistance, and there are almost no problems such as wrinkles on the board due to heat shrinkage or peeling of the metal foil and film.

〔特性の測定法〕 測定項目は以下の方法で測定し1こ。[Method of measuring characteristics] Measurement items were measured using the following method.

(1)ホl、IF−フェニレンスルホン連鎖のモル係任
意の一劣#フィルムと下記に示す標準物質である100
モル係のポリP−フユニレンスルホンフイルムをそれぞ
れ一定量微粉化後、 KBr法てIRを測足し1両者の
1160cm  のS−O逆対称伸縮振動の吸光度比に
よりポリP−フエニレンスルホン連鎖のモル係を算出し
た。
(1) The molar ratio of the hol, IF-phenylene sulfone chain.
After pulverizing a certain amount of polyP-phenylenesulfone film of each molar ratio, the IR was measured using the KBr method, and the molar ratio of the polyP-phenylenesulfone chain was determined by the absorbance ratio of the S-O antisymmetric stretching vibration at 1160 cm. We calculated the number of people in charge.

(標準物質の製法) 厚さ6μのポリP−フェニレンスルフィト非晶フィルム
(未延伸)を40%過酢酸浴液(三菱ガス化学■市販品
)に常温で24時間浸せきし、水浩後乾燥する。原子組
成比を調べたところほぼ100モル係のポリP−フェニ
レンスルホンに相当し、かつCP/MAS  CNMR
で測定したところ確認された。
(Manufacturing method of standard material) A polyP-phenylene sulfite amorphous film (unstretched) with a thickness of 6 μm was immersed in a 40% peracetic acid bath solution (Mitsubishi Gas Chemical, commercially available product) for 24 hours at room temperature, and dried after being soaked in water. do. An examination of the atomic composition ratio reveals that it corresponds to approximately 100 molar polyP-phenylene sulfone, and CP/MAS CNMR
It was confirmed when measured.

(2)広角X想回折法 OF=各試料の延伸方向をそろえて厚み1工。(2) Wide-angle X-ray diffraction method OF=1 thickness with the stretching direction of each sample aligned.

幅1−2長さ10−の短冊状に成型(成型時の各入射(
Edge、 End=eおよびThrough 方向)
してプレート写真を撮影した。Xi発生装置は理学電機
製D−3F型装置を用い、40KV−20mAでNiフ
ィルターを通したCu −Ka 線をX線源とした。試
料フィルム間距離は41mmでコダックノンスクリーン
タイプフイルムを用い多重露出(15分および60分)
法を採用した。
Molded into a strip shape with a width of 1-2 and a length of 10-2 (each incidence during molding (
Edge, End=e and Through direction)
I then took a photo of the plate. The Xi generator used was a Rigaku D-3F type device, and the X-ray source was Cu - Ka rays passed through a Ni filter at 40 KV and 20 mA. Multiple exposures (15 minutes and 60 minutes) using Kodak non-screen type film with a distance between sample films of 41 mm.
adopted the law.

また、デンシトメータ装置は小西六写真工業製すクラマ
イクロデンシトメータモデルPDM−5タイプAを使用
し、測定濃度範囲は0.0〜4.0D(最小測定面積4
μ換算)、光学系倍率100倍でスリット幅1μ、高さ
10μを使用しフィルム移動速度50μ/秒でチャート
速度は1m1l[17秒である。
In addition, the densitometer device used is the Kura Microdensitometer Model PDM-5 Type A manufactured by Roku Konishi Photo Industry, and the measurement concentration range is 0.0 to 4.0D (minimum measurement area 4
Using a slit width of 1 μ and height of 10 μ with an optical system magnification of 100 times, a film movement speed of 50 μ/sec, and a chart speed of 1 ml/1 [17 seconds].

微結晶の大きさおよび相対結晶化指数:試料の配向効果
を消去するために試料を面内で回転する方法を採用し9
反射法で回折パターンを測定した。
Microcrystal size and relative crystallinity index: A method of rotating the sample in the plane was adopted to eliminate the sample orientation effect9.
Diffraction patterns were measured using a reflection method.

X線発生装置は理学電機製D−8C型装置を用い。The X-ray generator used was a Rigaku D-8C model.

35kV−15mAで Niフィルターを通してCu−
KaをXat源とした。ゴニオメータは理学電機製PM
G−A2型を用い、試料を回転速度80rpmで回転す
る回転試料台に取り付け、スリット系はDi−は1°/
分、チャート速度は1■/分である。各試料は一辺20
−の正方形に切り出し厚さ05−に重ねて測定試料とし
た。
Cu-
Ka was used as the Xat source. The goniometer is made by Rigaku PM.
Using the G-A2 model, the sample was mounted on a rotating sample stage that rotated at a rotation speed of 80 rpm, and the slit system had Di-1°/
minute, and the chart speed is 1/min. Each sample has 20
A measurement sample was cut out into a square of - and overlapped with a thickness of 05-.

(3)強度、伸度 テンシロン型引張り試験機により0幅10mm。(3) Strength, elongation 0 width 10mm by Tensilon type tensile testing machine.

試技50mmのサンプルの破断伸度、破断強度を求めn
=5の平均値として算出した。
Determine the breaking elongation and breaking strength of a 50mm sample.
Calculated as the average value of =5.

(4)熱収縮率 試技200mm、幅10mtoのフィルムを一定温度の
熱風式オープンに無荷重下で10分間加熱し。
(4) Heat shrinkage test A film with a width of 200 mm and a width of 10 mto was heated for 10 minutes under no load in a hot air open oven at a constant temperature.

卯熱前後の試料の長さから収縮率ヲ算出した。The shrinkage rate was calculated from the length of the sample before and after the heat.

〔実施例〕〔Example〕

次に実施例をもって本発明を説明する。 Next, the present invention will be explained with reference to examples.

実施例1 以下の様にポリP−フェニレンスルフィドの重合を行な
った。
Example 1 Polymerization of polyP-phenylene sulfide was carried out as follows.

+り “「内容積501のオートクレーブに重合溶媒として2
07のNメチル2ピロリドン、75モルのNa、S9H
,Q 、及び重合助剤として25モルの酢酸ナトリウム
を仕込み、オートクレーブの内温か200°C(こなる
捷でヒーターによりカロ熱111J2下窒去気流中で脱
水を行なった。脱水終了後オートクレーブ内温か170
℃になるまで冷却し、75モルのP−ジクロルベンゼン
、および0.15モルの1゜2、4−トリクロルベンゼ
ンを添加し。窒素により2.0kg/cm、に加圧した
、オートクレーブ内温を260°Cに昇温後、2時間攪
拌して重合を行ない、系を冷却後内容物を取り出し水中
にあけ、水洗した後150℃で真空乾燥してZO踵の白
色ポリマを得た。(詳細については例えば特公昭52−
122.40号参照)。このポリマを高化式フローテス
タを使用し、300℃、せん断速度200(秒) の条
件下で測定した所、 5200Poiseであった。
2" as a polymerization solvent in an autoclave with an internal volume of 501"
07 N-methyl 2-pyrrolidone, 75 mol Na, S9H
, Q, and 25 mol of sodium acetate as a polymerization aid were charged, and the internal temperature of the autoclave was 200°C. 170
75 moles of P-dichlorobenzene and 0.15 moles of 1°2,4-trichlorobenzene were added. The autoclave was pressurized to 2.0 kg/cm with nitrogen. After raising the internal temperature to 260°C, polymerization was carried out by stirring for 2 hours. After cooling the system, the contents were taken out and poured into water, and washed with water. A white ZO heel polymer was obtained by vacuum drying at .degree. (For details, please refer to the Special Publication Act of 1973-
122.40). This polymer was measured using a Koka type flow tester under the conditions of 300° C. and a shear rate of 200 (seconds) and found to be 5200 Poise.

このポリマの一部を30mm径の2軸エクストル融し、
長さ200mm、間隙1.0 mmの直線状リップを有
するTダイから押出し。表面温度を20°C1こ保った
金属ドラム上に静電印力ロキャストして冷却固化し幅1
70mm、厚さ610μmのシートを得た。
A part of this polymer was melted in a 30 mm diameter biaxial extrusion,
Extruded from a T-die with straight lips 200 mm long and 1.0 mm gap. Electrostatic printing force is cast onto a metal drum whose surface temperature is maintained at 20°C, then cooled and solidified to form a sheet with a width of 1.
A sheet having a size of 70 mm and a thickness of 610 μm was obtained.

さらに該シートを、フィルムストレッチャ(米国T、 
M Long社製)を用いて95℃でたて・よこ3.5
倍に逐時2軸延伸し、続いて熱風オープンを用いて27
0℃で1分間定長熱処理して、厚さ25μmの2軸配向
ポリp−フェニレンスルフィトフィルムを得た。
Furthermore, the sheet was transferred to a film stretcher (US T,
Vertical/width 3.5 at 95℃ using M Long Co., Ltd.)
27-fold biaxial stretching, followed by hot air opening.
A fixed length heat treatment was performed at 0° C. for 1 minute to obtain a biaxially oriented poly p-phenylene sulfite film with a thickness of 25 μm.

このフィルムを広角X線回折分析を行なったところ E
nd+の配向度0.20  Edge  の配向度02
5Throughの配向度0.90であり、相対結晶化
度19微結晶の大きさ70Aであった。
When this film was subjected to wide-angle X-ray diffraction analysis, E
nd+ orientation degree 0.20 Edge orientation degree 02
The degree of orientation of 5Through was 0.90, and the relative crystallinity was 19 and the size of microcrystals was 70A.

イ?のフィル・の一部を市販の過酢酸40%溶液(三菱
ガス化学株式会社製)に常温で6時間浸せきして反応さ
せ水洗後100℃で真空乾燥した。
stomach? A portion of the film was immersed in a commercially available 40% peracetic acid solution (manufactured by Mitsubishi Gas Chemical Co., Ltd.) for 6 hours at room temperature to react, washed with water, and then vacuum-dried at 100°C.

ポリP−フェニレンスルホン連鎖は22モモルであった
The poly P-phenylene sulfone chain was 22 moles.

このフィルムの配向度を測定したところポリP−フェニ
レンスルホンの結晶相に基つく2θ−16″でEdge
 O,35End◆0.!+2 Througb O,
85であり、ポリP−フェニレンスルフィドの(200
)面を示ス2θ=21°でEdge O,28Enda
−0,25Through O,95であり、2軸配卵
してい、る事が明らかとなった。相対結晶化度を測定し
たところ18であった。
When the degree of orientation of this film was measured, it was determined that the orientation was 2θ-16″ based on the crystalline phase of polyP-phenylene sulfone.
O, 35End◆0. ! +2 Througb O,
85, and polyP-phenylene sulfide (200
) surface at 2θ=21° Edge O, 28Enda
-0.25Through O.95, and it became clear that the egg was laid on two axes. The relative crystallinity was measured and found to be 18.

機械的特性を調べたところ9強度14.51cg/mm
 ’伸度56%であり優れた機械的特性を示し、またこ
のフィルムを350℃のオープン中に入れたところ、フ
ィルム状の形態は保っているものの。
When examining the mechanical properties, the strength of 9 was 14.51 cg/mm.
'It has an elongation of 56% and exhibits excellent mechanical properties, and when this film was placed in an open oven at 350°C, it retained its film-like form.

中心部が溶融しており、中心層がポリP−フェニレンス
ルフィド層であり、外層にポリP−フ、エニレンスルホ
ン層が存在した3層構造である事が明らかになった7 評価結果を第1表に示す。
The center part was melted, and it became clear that the center layer was a polyP-phenylene sulfide layer, and the outer layer was a polyP-phenylene sulfide layer, making it a three-layer structure. It is shown in Table 1.

実施例2,3 実施例1で作製したポリP−フェニレンスルホン連鎖を
22モルチ含むフィルムを熱風オープン中200℃10
分および240℃10分各々熱処理した。更に優れた熱
寸法安定性を示すフィルムになった。その結果を第1表
に示す。
Examples 2 and 3 A film containing 22 moles of polyP-phenylene sulfone chains prepared in Example 1 was heated at 200°C at 10°C in hot air.
and 240° C. for 10 minutes, respectively. The resulting film showed even better thermal dimensional stability. The results are shown in Table 1.

ンスルフイドフイルムをmクロル過安息香酸(東京化成
試薬)10%アセトン溶液に浸せきして常温で20日間
反応させた。アセトンで洗浄後100℃で真空乾燥した
。ポリP−フェニレンスルホン連鎖25モル係のフィル
ムが得られた。評価結果を第1表に示す。
The sulfide film was immersed in a 10% acetone solution of m-chloroperbenzoic acid (Tokyo Kasei Reagent) and reacted at room temperature for 20 days. After washing with acetone, it was vacuum dried at 100°C. A film containing 25 moles of polyP-phenylene sulfone chains was obtained. The evaluation results are shown in Table 1.

ンスルフイドフイルムの熱収縮率を測定した。実施例に
較べ極端に熱寸法安定性が劣っている事が明らかになっ
た。評価結果を第1表に示す。
The heat shrinkage rate of the sulfide film was measured. It became clear that the thermal dimensional stability was extremely inferior compared to the examples. The evaluation results are shown in Table 1.

また650℃のオープン中にフィルムを入れたところ、
すぐに溶融してフィルム形状を保たなかった。
Also, when I put the film in while it was open at 650℃,
It melted quickly and did not maintain its film shape.

ンスルフイドフイルムを熱風オーブン中200℃10分
および240℃10分各々熱処理した。そのフィルムの
熱収縮率を測定したところ、250に劣る事が明らかに
なった。第1表に評価結果を示す。
The sulfide film was heat treated in a hot air oven at 200°C for 10 minutes and at 240°C for 10 minutes, respectively. When the heat shrinkage rate of the film was measured, it was found to be inferior to 250. Table 1 shows the evaluation results.

比較例4 厚さ25μmの、未延伸ポリP−フユニレンスルフイド
フイルムを作製し、それを40係過酢酸溶液に常温で2
.5時間浸せきした。ポIJ p−フエニレンス、ルホ
ン連鎖は22%であった。配向度を測定したところ、2
θ−16°でEdge 1.OEndk O,9BTh
rough O,982θ−21°でEdge 1.0
2  End? 0.99Through 0.99で
あり、未配向フィルムであった。
Comparative Example 4 An unstretched polyP-fuynylene sulfide film with a thickness of 25 μm was prepared, and it was added to a 40% peracetic acid solution at room temperature for 2 hours.
.. Soaked for 5 hours. PoIJ p-phenylenes, sulfone linkage was 22%. When the degree of orientation was measured, it was found to be 2
Edge 1. at θ-16°. OEndk O,9BTh
rough O, Edge 1.0 at 982θ-21°
2 End? 0.99Through 0.99, and was an unoriented film.

相対結晶化度は5であった。The relative crystallinity was 5.

またフィルム表面に多数の亀裂が生成I1.その部分が
剥離し1通常のフィルムとしての使用が不可能であった
。評価結果を第1表に示す。
Also, many cracks are formed on the film surface I1. That part peeled off, making it impossible to use it as a normal film. The evaluation results are shown in Table 1.

比較例5 実施例1で作製した2軸配向ポリPフエニレンスルフイ
ドフイルムを40%過酢酸溶液に常温で12時間浸漬し
、水洗後100℃で真空乾燥した。ポIJ p−フェニ
レンスルホン連鎖が75モル機械的特性を測定したとこ
ろ強度13.0 ka7mm ” 。
Comparative Example 5 The biaxially oriented polyP phenylene sulfide film produced in Example 1 was immersed in a 40% peracetic acid solution at room temperature for 12 hours, washed with water, and then vacuum dried at 100°C. Po IJ p-phenylene sulfone chain is 75 molar The mechanical properties were measured and the strength was 13.0 ka7mm''.

伸度18%で実施例に較べ非常に劣る事が明らかになっ
た。
It became clear that the elongation was 18%, which was very inferior to the example.

また650℃で10分間熱処理したところ不溶融性であ
った。
Further, when heat treated at 650°C for 10 minutes, it was found to be infusible.

の電気エネルギーを印加してコロナ放電処理した後続い
てダイマ酸系ポリアミド(ミルペックス1200)を主
成分とする接着剤をリバースタイプのコータを用いて2
0μm(乾燥後〕の厚さにコーティングした。次にこの
上にプリント基板用電解銅箔(65μm厚)を重ねて、
100℃に保たれた10当り6kgの線圧を有するプレ
スロールを通過せしめて貼り合せた。得られた積層体を
80℃の熱風オープン中に4日間放置し接着剤を硬化さ
せ、プリント配線用基板を得た。
After corona discharge treatment by applying electrical energy of
It was coated to a thickness of 0 μm (after drying).Next, electrolytic copper foil for printed circuit boards (65 μm thick) was layered on top of this.
The materials were bonded by passing through a press roll maintained at 100° C. and having a linear pressure of 6 kg per 100°C. The obtained laminate was left in a hot air oven at 80° C. for 4 days to cure the adhesive, thereby obtaining a printed wiring board.

このプリント用配線基板を250℃のハンダ浴中に1分
間浸漬し、取り出し後形態を観察した。
This printed wiring board was immersed in a 250° C. solder bath for 1 minute, and the shape was observed after taking it out.

極めて優れた平面性を有していた、 比較例6 実施例1で作製した2軸配向ポリP−フェニレンスルフ
ィドフィルムを用い、実施例5と同様に銅箔と積層しプ
リント用配線基板を作製した。
Comparative Example 6 The biaxially oriented polyP-phenylene sulfide film produced in Example 1 was laminated with copper foil in the same manner as in Example 5 to produce a printed wiring board. .

同様に250℃のハンダ浴中に1分間浸漬したところ、
フィルム面側の方向に大きくカールし。
Similarly, when immersed in a 250°C solder bath for 1 minute,
It curls greatly in the direction of the film side.

熱収縮により部分的に銅箔とフィルムが剥離していた。The copper foil and film were partially peeled off due to heat shrinkage.

小さなしわも確認された。Small wrinkles were also observed.

Claims (2)

【特許請求の範囲】[Claims] (1)2軸配向したポリP−フェニレンスルホン連鎖を
1モル%以上70モル%未満含む2軸配向ポリP−フェ
ニレンスルフィドフィルム。
(1) A biaxially oriented polyP-phenylene sulfide film containing 1 mol% or more and less than 70 mol% of biaxially oriented polyP-phenylene sulfone chains.
(2)2軸配向したポリP−フェニレンスルホン連鎖を
1モル%以上70モル%未満含む2軸配向ポリP−フェ
ニレンスルフィドフィルムに金属薄膜を積層してなるプ
リント配線基板。
(2) A printed wiring board formed by laminating a metal thin film on a biaxially oriented polyP-phenylene sulfide film containing 1 mol% or more and less than 70 mol% of biaxially oriented polyP-phenylene sulfone chains.
JP59212458A 1984-10-12 1984-10-12 Biaxially orientated poly-p-phenylenesulfide film Granted JPS6192828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59212458A JPS6192828A (en) 1984-10-12 1984-10-12 Biaxially orientated poly-p-phenylenesulfide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59212458A JPS6192828A (en) 1984-10-12 1984-10-12 Biaxially orientated poly-p-phenylenesulfide film

Publications (2)

Publication Number Publication Date
JPS6192828A true JPS6192828A (en) 1986-05-10
JPH0523939B2 JPH0523939B2 (en) 1993-04-06

Family

ID=16622960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59212458A Granted JPS6192828A (en) 1984-10-12 1984-10-12 Biaxially orientated poly-p-phenylenesulfide film

Country Status (1)

Country Link
JP (1) JPS6192828A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0195586A (en) * 1987-10-07 1989-04-13 Toray Ind Inc Metal base circuit board
US6069324A (en) * 1995-10-12 2000-05-30 Yazaki Corporation Load deflecting degree computing apparatus and carrying weight computing apparatus for vehicle
WO2024128145A1 (en) * 2022-12-15 2024-06-20 株式会社ダイセル Substituted polyphenylene sulfide resin

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0195586A (en) * 1987-10-07 1989-04-13 Toray Ind Inc Metal base circuit board
US6069324A (en) * 1995-10-12 2000-05-30 Yazaki Corporation Load deflecting degree computing apparatus and carrying weight computing apparatus for vehicle
WO2024128145A1 (en) * 2022-12-15 2024-06-20 株式会社ダイセル Substituted polyphenylene sulfide resin

Also Published As

Publication number Publication date
JPH0523939B2 (en) 1993-04-06

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