JPS6190857U - - Google Patents
Info
- Publication number
- JPS6190857U JPS6190857U JP17596484U JP17596484U JPS6190857U JP S6190857 U JPS6190857 U JP S6190857U JP 17596484 U JP17596484 U JP 17596484U JP 17596484 U JP17596484 U JP 17596484U JP S6190857 U JPS6190857 U JP S6190857U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- workpiece
- plasma
- processing apparatus
- gas exhaust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17596484U JPS6190857U (enExample) | 1984-11-20 | 1984-11-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17596484U JPS6190857U (enExample) | 1984-11-20 | 1984-11-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6190857U true JPS6190857U (enExample) | 1986-06-12 |
Family
ID=30733564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17596484U Pending JPS6190857U (enExample) | 1984-11-20 | 1984-11-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6190857U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000043568A1 (en) * | 1999-01-22 | 2000-07-27 | Toyo Kohan Co., Ltd. | Microwave plasma cvd apparatus |
-
1984
- 1984-11-20 JP JP17596484U patent/JPS6190857U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000043568A1 (en) * | 1999-01-22 | 2000-07-27 | Toyo Kohan Co., Ltd. | Microwave plasma cvd apparatus |