JPS618930A - 半導体ウエーハの標準化処理方法 - Google Patents

半導体ウエーハの標準化処理方法

Info

Publication number
JPS618930A
JPS618930A JP4501985A JP4501985A JPS618930A JP S618930 A JPS618930 A JP S618930A JP 4501985 A JP4501985 A JP 4501985A JP 4501985 A JP4501985 A JP 4501985A JP S618930 A JPS618930 A JP S618930A
Authority
JP
Japan
Prior art keywords
wafers
wafer
clusters
oxygen
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4501985A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0527974B2 (enrdf_load_stackoverflow
Inventor
ビクトール・カズカラ
ジヨスリン・ルルーイユ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to JP4501985A priority Critical patent/JPS618930A/ja
Publication of JPS618930A publication Critical patent/JPS618930A/ja
Publication of JPH0527974B2 publication Critical patent/JPH0527974B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP4501985A 1984-06-20 1985-03-08 半導体ウエーハの標準化処理方法 Granted JPS618930A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4501985A JPS618930A (ja) 1984-06-20 1985-03-08 半導体ウエーハの標準化処理方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP84430020.2 1984-06-20
JP4501985A JPS618930A (ja) 1984-06-20 1985-03-08 半導体ウエーハの標準化処理方法

Publications (2)

Publication Number Publication Date
JPS618930A true JPS618930A (ja) 1986-01-16
JPH0527974B2 JPH0527974B2 (enrdf_load_stackoverflow) 1993-04-22

Family

ID=12707630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4501985A Granted JPS618930A (ja) 1984-06-20 1985-03-08 半導体ウエーハの標準化処理方法

Country Status (1)

Country Link
JP (1) JPS618930A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992005578A1 (en) * 1990-09-14 1992-04-02 Komatsu Electronic Metals Co., Ltd. Semiconductor device manufacturing process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167637A (en) * 1981-03-11 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167637A (en) * 1981-03-11 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992005578A1 (en) * 1990-09-14 1992-04-02 Komatsu Electronic Metals Co., Ltd. Semiconductor device manufacturing process
US5506154A (en) * 1990-09-14 1996-04-09 Komatsu Electronic Metals Co., Ltd. Process for preheat treatment of semiconductor wafers

Also Published As

Publication number Publication date
JPH0527974B2 (enrdf_load_stackoverflow) 1993-04-22

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