JPS6188135A - Production of semiconductor biosensor - Google Patents

Production of semiconductor biosensor

Info

Publication number
JPS6188135A
JPS6188135A JP59209165A JP20916584A JPS6188135A JP S6188135 A JPS6188135 A JP S6188135A JP 59209165 A JP59209165 A JP 59209165A JP 20916584 A JP20916584 A JP 20916584A JP S6188135 A JPS6188135 A JP S6188135A
Authority
JP
Japan
Prior art keywords
enzyme
photoresist
semiconductor
film
semiconductor field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59209165A
Other languages
Japanese (ja)
Other versions
JPH0548418B2 (en
Inventor
Toshihide Kuriyama
敏秀 栗山
Jun Kimura
純 木村
Yoshie Kawana
川名 美江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP59209165A priority Critical patent/JPS6188135A/en
Publication of JPS6188135A publication Critical patent/JPS6188135A/en
Publication of JPH0548418B2 publication Critical patent/JPH0548418B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12QMEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
    • C12Q1/00Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
    • C12Q1/001Enzyme electrodes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403Cells and electrode assemblies
    • G01N27/414Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS

Abstract

PURPOSE:To form easily integrated micro semiconductor biosensors by integrating the plural semiconductor field effect type ion sensors on one chip. CONSTITUTION:A photoresist film 6 soluble in acetone is spin-coated on the surface of a wafer constituted by forming the semiconductor field effect type ion sensors ISFETs by using an island-shaped silicon layer on the front of a sapphire substrate 1 and depositing gold 8 by evaporation on the rear. The photoresist film on the surface of the ISFETs to be provided with an enzyme immobilizing film is removed by exposing and developing in using a photomask and thereafter a protein soln. 7 contg. enzyme and crosslinking agent is spin- coated thereon. The water is then immersed in acetone to dissolve the photoresist 6 and at the same time the enzyme immobilizing film 7 coated on the photoresist is removed. The wafer is thereafter scribed, by which the semiconductor biosensors are obtd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体バイオセンサの製造方法に関し、特に半
導体電界効果型イオンセンサの表面に酵素固定化膜が設
けられてなる集積化された半導体バイオセンサの製造方
法に関するものである。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for manufacturing a semiconductor biosensor, and in particular to an integrated semiconductor biosensor in which an enzyme-immobilized membrane is provided on the surface of a semiconductor field-effect ion sensor. The present invention relates to a method of manufacturing a sensor.

(従来技術) 従来、溶液中の特定の有機物の濃度を測定する半導体バ
イオセンサの一種に半導体電界効果型イオンセンt(工
on 5ensitive Field Effect
工ransistor、以下l5FFiTと略す)の表
面に酵素を固定化した瞑が設けられたものが知られてい
る(宮原裕二、塩用祥子、森泉豊栄、松岡英明。
(Prior Art) Conventionally, a semiconductor field effect ion sensor is a type of semiconductor biosensor that measures the concentration of a specific organic substance in a solution.
Transistor (hereinafter abbreviated as l5FFiT) is known to have a membrane on which enzymes are immobilized (Yuji Miyahara, Shoko Shioyo, Toyosaka Moriizumi, and Hideaki Matsuoka).

軽部征夫、鈴木周−:「半導体技術を用いたバイオセン
サ」、電子通信学会電子部品・材料研究会資料CPM8
1−93,61(1981))Oこのl5FETバイオ
センサは、溶液中の特定の有機物が酵素固定化膜中で酵
素の触媒作用にょ夛分解された時に生ずる膜中の水素イ
オン濃度の変化をl5FETで検出することにより、特
定の有機物の濃度を測定するものである。この選択性を
もつ酵素固定化膜の例として、たとえば尿素検出用とし
てウレアーゼ固定化暎、グルコース検出用としてグルコ
ースオキシダーゼ固定化膜などが知られている。
Yukio Karube, Shu Suzuki: "Biosensor using semiconductor technology", Institute of Electronics and Communication Engineers Electronic Components and Materials Study Group Material CPM8
1-93, 61 (1981)) This 15FET biosensor detects the change in hydrogen ion concentration in the membrane that occurs when a specific organic substance in a solution is decomposed by the catalytic action of the enzyme in the enzyme-immobilized membrane. This method measures the concentration of specific organic substances by detecting them. Examples of enzyme-immobilized membranes having this selectivity include urease-immobilized membranes for urea detection and glucose oxidase-immobilized membranes for glucose detection.

まだ、酵素固定化膜が設けられたISB’ETと設けら
れていないl5FETの出力の差を測定することにより
、溶液の電位変化の影1テを打し消すことができ、プラ
チナや金などの金属電電を診照電甑に使用することが近
年報告されている0(Y。
However, by measuring the difference in output between the ISB'ET with an enzyme-immobilized membrane and the 15FET without it, it is possible to cancel out the effects of potential changes in the solution, and In recent years, it has been reported that metal electrolytes are used for diagnostic electric appliances.

Hanazato and S、 5hiono : 
BioelectrodeVsing TVOHydr
ogen Ion 5cnsitive Tran −
5istors and a Platinum wi
re Pseud。
Hanazato and S, 5hiono:
Bioelectrode Vsing TVOHydr
ogen Ion 5cnsitive Tran -
5isters and a Platinum wi
re Pseud.

Reference Electrode、  Pro
co  of theInternational M
eeting on Che+n1calSansor
s、P、513(1983))(従来技術の問題点) しかしながら、従来知られている上記半導体バイオセン
サは個々のxsrgTや金屑製参照電極を基板にはシつ
けて形成されており、l5FETの特徴であるIC技術
の適用による集積化や微小化の利点が生かされないとい
う欠点があった〇(発明の目的) 本発明はこの様な従来の欠点を除去し、酵素固定化膜が
設けられたISF’ETと設けられていないl5FET
を同一チップ上に容易に形成でき、集積化された微小な
半導体バイオセンサを製造できる方法を提供することに
あるり (発明のイf′イ成) 本発明によれば、1つのチップ上に複数の半導体電界効
果型イオンセンサが集積化され、そのうちの少なくとも
1つの半導体電界効果型イオンセ/すの表面に酵素固定
化膜が設けられてなる半導体バイオセンサの製造方法に
おいて、半導体電界効果型イオンセンサが形成された半
導体ウェーハ上にフォトレジストを塗布した後フォトリ
ングラフイー法はり酵素固定化膜が設けられる所定の半
導体電界効果型イオンセンサの表面のフォトレジストを
除く工程と、酵素と架橋剤を含む蛋白質溶液を塗布し酵
素固定化膜を形成する工程と、フォトレジストを溶かし
所定の半導体電界効果型イオンセンサの表面以外に存在
する酵素固定化膜を除去する工程を備えたことを特徴と
する半導体バイオセンサの製造方法が得られる。
Reference Electrode, Pro
co of the International M
eating on Che+n1cal Sansor
s, P, 513 (1983)) (Problems with the Prior Art) However, the conventionally known semiconductor biosensor is formed by attaching individual xsrgT or gold scrap reference electrodes to the substrate, and the l5FET There was a drawback that the advantages of integration and miniaturization by applying IC technology, which are the characteristics of ISF'ET and l5FET
An object of the present invention is to provide a method for manufacturing an integrated microscopic semiconductor biosensor by easily forming on the same chip. In a method for manufacturing a semiconductor biosensor, in which a plurality of semiconductor field-effect ion sensors are integrated, and an enzyme-immobilized film is provided on the surface of at least one of the semiconductor field-effect ion sensors, the semiconductor field-effect ion sensor is A step of applying a photoresist on a semiconductor wafer on which a sensor is formed, and then using a photophosphorography method to remove the photoresist on the surface of a given semiconductor field effect ion sensor on which an enzyme-immobilized film is provided, and an enzyme and a crosslinking agent. The present invention is characterized by comprising a step of applying a protein solution containing a protein solution to form an enzyme-immobilized film, and a step of dissolving the photoresist and removing the enzyme-immobilized film existing on areas other than the surface of a predetermined semiconductor field-effect ion sensor. A method for manufacturing a semiconductor biosensor is obtained.

(実施例) 以下本発明の一突施例について図面を参照して詳細に説
明する。
(Embodiments) Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

第1図〜第4図は本発明による半導体バイオセンサの製
造方法の一実施例を説明するための図で主要工程におけ
る断面図である。同図はサファイア基板上に酵素固定化
膜が設けられたt S FETと設けられていないl8
FETを形成する場合について示している口なお、金属
参照゛電極はサファイア基板の裏面に蒸着されている。
FIGS. 1 to 4 are cross-sectional views of main steps for explaining an embodiment of the method for manufacturing a semiconductor biosensor according to the present invention. The figure shows a tS FET with an enzyme-immobilized membrane provided on a sapphire substrate and an l8 without it.
In the case shown for forming an FET, a metal reference electrode is deposited on the back side of the sapphire substrate.

第1図〜第4図において、1はサファイア基板、2は高
不純物d度n形シリコン領域、3はp形シリコン領域、
4は酸化シリコン膜、5は窒化シリコン模、6はアセト
ン可溶性のフォトレジスト膜、7は酵素固定化膜8は金
電極である。矢に製造工程を順を追って層ヲ用いてl8
FETを形成し、サファイア基&l裏面に金8を蒸層し
たウェーハの表面にアセトン可溶性生のフォトレジスト
袂6−(シラプレー社製人Z1450J )をスピン塗
布した(第1図)0次に。
1 to 4, 1 is a sapphire substrate, 2 is a highly impurity n-type silicon region, 3 is a p-type silicon region,
4 is a silicon oxide film, 5 is a silicon nitride model, 6 is an acetone-soluble photoresist film, and 7 is an enzyme-immobilized film 8 which is a gold electrode. Follow the manufacturing process step by step and use the layers 18
An acetone-soluble raw photoresist (Z1450J manufactured by Silaplay Co., Ltd.) was spin-coated on the surface of the wafer on which FETs were formed and gold 8 was vapor-coated on the back surface of the sapphire group (see FIG. 1).

フォトマスクを用い露光、現像にょシ酵素固定化膜が設
けられるl8FETの表面のフォトレジスト膜を除去し
た(第2図)コその後、酵素と架橋剤を含む蛋白質溶液
の一例として尿素を検出するために15%牛血清アルブ
ミンを含む0.2M、p[(8,5のトリス−塩酸緩衝
液250μlに、同じ緩衝液で調裏した100mg/d
lウレアーゼ(ペーリンガー・マンハイム社製、約50
V/mg )俗’1250μノを加え、0.75%ゲル
タールアルデヒド水溶液500μlと攪拌混合した溶液
をスピン塗布した(第3図)。また別の例としてグルコ
ースを検出するため、酵素としてグルコースオキシダー
ゼを用いて酵素固定化膜を作った。この他同様の方法で
凡々の酵素固定化膜を用いることが可能である。
After exposure and development using a photomask, the photoresist film on the surface of the 18FET on which the enzyme-immobilized film was provided was removed (Fig. 2).After that, in order to detect urea as an example of a protein solution containing an enzyme and a crosslinking agent, 100 mg/d mixed with the same buffer in 250 μl of 0.2 M, p[(8,5) Tris-HCl buffer containing 15% bovine serum albumin.
l urease (manufactured by Peringer Mannheim, approx. 50
A solution prepared by adding 1250 μl of V/mg) and stirring and mixing with 500 μl of a 0.75% geltaraldehyde aqueous solution was applied by spin coating (Figure 3). As another example, in order to detect glucose, an enzyme-immobilized membrane was created using glucose oxidase as an enzyme. In addition, it is possible to use ordinary enzyme-immobilized membranes in a similar manner.

酵素固定化ノ漠は本実施例の場合5000X以下の厚も
良好であったが、さらに密層性を向上させるため酵素固
定化膜のスピン塗布の前にプライマー処理を行うことも
可能である。この後、ウェーハをアセトンに浸しフォト
レジストを溶かし、同時にフォトレジスト上に塗布され
ていた酵素固定化膜を除去する。酵素固定化膜中の酵素
はアセトンにより失活しないのでこの工程によシ所定の
l5FETの表面だけに活性な酵素固定化膜を形成する
ことができた(第4図)。その後、ウェーハをスクライ
ブすることによシ第5図、第6図に示す半導体バイオセ
ンサが完成するっ第5図は平面図で第6図はセンサ部の
断面図である。チップサイズは咄0−6mm、長さ4 
mmで、微小なバイオセンサが得られた。
In this example, the enzyme-immobilized film had a good thickness of 5000X or less, but it is also possible to perform primer treatment before spin-coating the enzyme-immobilized film in order to further improve the layer density. After this, the wafer is immersed in acetone to dissolve the photoresist, and at the same time, the enzyme immobilization film coated on the photoresist is removed. Since the enzyme in the enzyme-immobilized membrane was not inactivated by acetone, an active enzyme-immobilized membrane could be formed only on the surface of a given 15FET by this step (FIG. 4). Thereafter, by scribing the wafer, the semiconductor biosensor shown in FIGS. 5 and 6 is completed. FIG. 5 is a plan view, and FIG. 6 is a sectional view of the sensor section. Chip size is 0-6mm, length 4
A minute biosensor was obtained.

(発明の効果) 本発明によりIC製造技術を適用でき、大量生産が可能
で微小な集積化された半導体バイオセンサが製造できた
(Effects of the Invention) According to the present invention, IC manufacturing technology can be applied, and a microscopic integrated semiconductor biosensor that can be mass-produced can be manufactured.

本発明はサファイア基板上に形成されるl5FETK限
られず、一般のPJ祿基板を用いた8QI(S目1co
non 5apphire )構造のl8FETやバル
クSiを用いたl5FETにも適用できることは明らか
であるO 図面のiil単な説明 第1図〜第4図は本発明による半導体バイオセンサの製
造方法の一実施例を説明するための図である。第1図〜
第4図及び第6図において、1はサファイア基板、2は
高不純物5度。形シリコン領域、3はp形シリコン領域
、4は酸化シリコン嗅、5は窒化シリコン膜、6はアセ
トン可溶性のフォトレジスト俣、7は酵素固定化膜、8
は金電極%9はl5FET、10は電極である。
The present invention is not limited to 15FETK formed on a sapphire substrate, but is also applicable to 8QI (S-eye 1co) using a general PJ substrate.
It is clear that it can also be applied to 18FETs with a non-5apphire structure and 15FETs using bulk Si. It is a figure for explaining. Figure 1~
In FIGS. 4 and 6, 1 is a sapphire substrate, and 2 is a high impurity 5 degree. 3 is a p-type silicon region, 4 is a silicon oxide layer, 5 is a silicon nitride film, 6 is an acetone-soluble photoresist layer, 7 is an enzyme immobilization film, 8
9 is a gold electrode, 9 is a 15FET, and 10 is an electrode.

手続補正書(方式) :j+、:j’。Procedural amendment (formality) :j+, :j’.

Claims (1)

【特許請求の範囲】[Claims] 1つのチップ上に複数の半導体電界効果型イオンセンサ
が集積化され、そのうちの少なくとも1つの半導体電界
効果型イオンセンサの表面に酵素固定化膜が設けられて
なる半導体バイオセンサの製造方法において、半導体電
界効果型イオンセンサが形成された半導体ウェーハ上に
フォトレジストを塗布した後フォトリソグラフィー法に
より酵素固定化膜が設けられる所定の半導体電界効果型
イオンセンサの表面のフォトレジストを除く工程と、酵
素と架橋剤を含む蛋白質溶液を塗布し酵素固定化膜を形
成する工程と、フォトレジストを溶かし所定の半導体電
界効果型イオンセンサの表面以外に存在する酵素固定化
膜を除去する工程とを備えたことを特徴とする半導体バ
イオセンサの製造方法。
A method for manufacturing a semiconductor biosensor, in which a plurality of semiconductor field-effect ion sensors are integrated on one chip, and an enzyme-immobilized film is provided on the surface of at least one semiconductor field-effect ion sensor. A step of removing the photoresist from the surface of a predetermined semiconductor field-effect ion sensor, in which a photoresist is applied on a semiconductor wafer on which a field-effect ion sensor is formed, and then an enzyme-immobilized film is provided by a photolithography method; The method includes a step of applying a protein solution containing a cross-linking agent to form an enzyme-immobilized film, and a step of dissolving the photoresist and removing the enzyme-immobilized film existing on areas other than the surface of a predetermined semiconductor field-effect ion sensor. A method for manufacturing a semiconductor biosensor characterized by:
JP59209165A 1984-10-05 1984-10-05 Production of semiconductor biosensor Granted JPS6188135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59209165A JPS6188135A (en) 1984-10-05 1984-10-05 Production of semiconductor biosensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59209165A JPS6188135A (en) 1984-10-05 1984-10-05 Production of semiconductor biosensor

Publications (2)

Publication Number Publication Date
JPS6188135A true JPS6188135A (en) 1986-05-06
JPH0548418B2 JPH0548418B2 (en) 1993-07-21

Family

ID=16568400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59209165A Granted JPS6188135A (en) 1984-10-05 1984-10-05 Production of semiconductor biosensor

Country Status (1)

Country Link
JP (1) JPS6188135A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02168153A (en) * 1988-12-22 1990-06-28 Nec Corp Method for forming immobilized enzyme film
JPH04173841A (en) * 1990-11-05 1992-06-22 Nec Corp Method for partially forming polymer membrane having functional group
JPH06242068A (en) * 1993-02-18 1994-09-02 Nec Corp Fabrication of glucose sensor
US5465133A (en) * 1988-10-04 1995-11-07 Asahi Kogaku Kogyo Kabushiki Kaisha Still video camera
US6537310B1 (en) 1999-11-19 2003-03-25 Advanced Bio Prosthetic Surfaces, Ltd. Endoluminal implantable devices and method of making same
KR100473361B1 (en) * 2001-10-17 2005-03-08 주식회사 디지탈바이오테크놀러지 Microchip and method for manufacturing the same
JP2011512804A (en) * 2008-02-29 2011-04-28 アイメック Cellular enzyme-based biosensor
US8372139B2 (en) 2001-02-14 2013-02-12 Advanced Bio Prosthetic Surfaces, Ltd. In vivo sensor and method of making same
US10172730B2 (en) 1999-11-19 2019-01-08 Vactronix Scientific, Llc Stents with metallic covers and methods of making same
US10292849B2 (en) 1999-11-19 2019-05-21 Vactronix Scientific, Llc Balloon catheter having metal balloon and method of making same
US10465274B2 (en) 2002-09-26 2019-11-05 Vactronix Scientific, Llc Implantable graft and methods of making same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59209166A (en) * 1984-04-13 1984-11-27 Matsushita Electric Ind Co Ltd Printing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59209166A (en) * 1984-04-13 1984-11-27 Matsushita Electric Ind Co Ltd Printing device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5465133A (en) * 1988-10-04 1995-11-07 Asahi Kogaku Kogyo Kabushiki Kaisha Still video camera
JPH02168153A (en) * 1988-12-22 1990-06-28 Nec Corp Method for forming immobilized enzyme film
JPH04173841A (en) * 1990-11-05 1992-06-22 Nec Corp Method for partially forming polymer membrane having functional group
JPH06242068A (en) * 1993-02-18 1994-09-02 Nec Corp Fabrication of glucose sensor
US10172730B2 (en) 1999-11-19 2019-01-08 Vactronix Scientific, Llc Stents with metallic covers and methods of making same
US6537310B1 (en) 1999-11-19 2003-03-25 Advanced Bio Prosthetic Surfaces, Ltd. Endoluminal implantable devices and method of making same
US10292849B2 (en) 1999-11-19 2019-05-21 Vactronix Scientific, Llc Balloon catheter having metal balloon and method of making same
US8372139B2 (en) 2001-02-14 2013-02-12 Advanced Bio Prosthetic Surfaces, Ltd. In vivo sensor and method of making same
US9433515B2 (en) 2001-02-14 2016-09-06 Advanced Bio Prosthetic Surfaces, Ltd. In vivo sensor and method of making same
US10660528B2 (en) 2001-02-14 2020-05-26 Vactronix Scientific, Llc Method of using an in vivo sensor having differential material properties
KR100473361B1 (en) * 2001-10-17 2005-03-08 주식회사 디지탈바이오테크놀러지 Microchip and method for manufacturing the same
US10465274B2 (en) 2002-09-26 2019-11-05 Vactronix Scientific, Llc Implantable graft and methods of making same
JP2011512804A (en) * 2008-02-29 2011-04-28 アイメック Cellular enzyme-based biosensor

Also Published As

Publication number Publication date
JPH0548418B2 (en) 1993-07-21

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