JPS6186495A - Gas phase growth apparatus - Google Patents

Abstract

PURPOSE:To obtain the titled apparatus making the attachment and the detachment of a wafer simple and easy by constituting the apparatus so that plural lamp houses are provided around the outer part of a bell jar incorporated with a susceptor assembly body of a lower part-driving system and several pieces thereof can be opened to the outer part. CONSTITUTION:A gas phase growth apparatus is constituted by fitting a barrel type susceptor assembly body 11 holding the wafers 12 to a rotary axis 13 by which a base plate 16 is perforated upward, enabling the lower end thereof to be sealed on the above-mentioned base plate 16, providing a bell jar 14 by which a reaction chamber is formed in the circumference of the above-mentioned assembly body 11 so that it is capable of ascending and descending with an elevating mechanism 28 and furthermore providing plural lamp houses 24 surrounding the outer part in opposition to the above-mentioned susceptor assembly body 11. In the gas phase growth apparatus, the central part of the lamp houses 24 corresponding to the nearly half circumference of the above-mentioned bell jar 14 is enabled to cut off and the left plus right lamp houses are joined freely rockingly and thereby the lamp houses 24 corresponding to the above-mentioned half circumferential part are constituted so as to be opened to the outside in a double-leafed hinged door.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field to which the Invention Pertains] The present invention relates to a barrel-type vapor phase growth apparatus for vapor phase growing silicon crystals or the like onto a semiconductor material substrate (hereinafter referred to as a wafer) such as silicon.

[Prior art]

In the nozzle-type vapor phase growth apparatus that uses lamp heating that has been put into practical use in the past, the drive source for the rotating shaft that rotates the susceptor is located above. This is a mechanism for raising the susceptor together with the rotating shaft and positioning the susceptor above the reaction tube and the lamp house surrounding it, making it easier to attach and detach the wafer. However, if the drive source is located above, there is a drawback that dirt from the rotating parts falls onto the unit 1 and causes contamination. Therefore, a system in which the drive source is located at the lower blade has also been proposed. In this method, it is difficult to attach and detach the wafer to and from the susceptor without raising the bell-shaped reaction tube, that is, the bell jar, and the lamp house provided around it, which is considered undesirable in terms of equipment design.

[Purpose of the invention]

The purpose of this book is to eliminate such drawbacks in the present invention.
To provide a vapor phase growth apparatus in which a part of the lamp house can be moved to the side, that is, by opening it when attaching and detaching a wafer, and a downward driving method can be adopted with a simple configuration. It is in.

[Key points of the invention]

The vapor phase growth apparatus of the present invention includes a pace plate, a rotating shaft that extends upward through the entire pace plate, a barrel-shaped susceptor assembly attached to the rotating shaft, and a susceptor whose lower end can be sealed to the pace plate. It consists of a bell jar forming a reaction chamber around the assembly, an elevator chest of the bell jar, and a plurality of lamp houses located around the outside of the bell jar and facing the susceptor of the susceptor assembly, Constructed so that one part of the house can open outward.

[Embodiments of the invention]

A diagram showing an embodiment of the present invention will be described below. In Fig. 1, the susceptor assembly 1 has a plurality of strip-shaped susceptors arranged in a polygonal shape, has an inclination with respect to the axis, and has an upper and lower surface covered with a lid-like body. A large number of wafers 12 are attached to the outer periphery. The susceptor assembly 11 is configured to be rotated in both directions by a hollow rotary shaft 13 made of non-metallic material such as ceramics, which is fixed to the upper and lower lid-like bodies, and a quartz bell jar is formed on the outer periphery of the susceptor assembly 11. It is covered by 14.

Below the bell jar 14, there is a cylindrical body 15 made of quartz at a position concentric with the bell jar 14 and having a small gap close to it that does not hinder the rotation of the susceptor assembly 11. Both the cylindrical body 15 of the bell jar 14 are made of stainless steel. are placed in close contact on the pace plate 16 of the The cylindrical body 15 is a susceptor assembly, and the space formed by the susceptor assembly 11 and the cylindrical body 15 is called a reaction chamber.
Rotation (13 (passes through the 1 base plate 16 airtightly)). A quartz ring 19A is scattered around to prevent the formation of 4 ions, and a hole 1g is provided between the quartz ring 19A and the base ring 16K for discharging gas from the reaction chamber to the outside.
B is Ake.

Rotation 1ura 13 medium L? The inner tube 17 and the outer tube 818 are each fixed at 2"1; from the inner tube 17 to the N
2 or H2 gas flows upward, and the outer tube 18 branches into a plurality of parts (only two IDs are shown in the figure) at the upper end, and the reaction residue flows toward the wafer 12 located below through the nozzle 18A. The process is getting better. The details of the flow of the reaction gas will be described later.

At the outer periphery of the lower part of the bell jar 14, an exhaust pipe duct 21 is provided which surrounds the bell jar 14 and is open only on the V bell jar 14 side. It is connected to an exhaust pipe 22 shown in FIG. Exhaust i.

A lamp house 24 having a large number of lamps 23 is arranged surrounding the bell jar 4, as shown in FIG. An A cooling fluid supply section 25 is formed on the back side of the lamp house 2.1, and cooling air from a blower and a cooler (not shown) is blown into the A cooling fluid supply section 25K, and the cooling air pump 23 and bell jar are blown into the A cooling fluid supply section 25K. ] 4 to cool these areas.

The pace 20 is provided with an elevating and rotating mechanism 28 adjacent to the exhaust tact, and the mechanism 28 has an arm 29 at its upper end.
is fixed to the bell jar 14, and the tip of the arm 29 is made into a gripping tool 30 and removably grips a gripping part 31 fixed to the top of the bell jar 14. Further, a B cooling fluid supply section 33 is attached to the tip of the arm 29 by a grip 32. The lower end of the B cooling fluid supply section 33 is placed on the upper surface of the lamp house 24, and its inner wall 34 has a number of holes 35, so that cooling air is supplied to the bell jar like the A cooling fluid supply section 25. Spray on top of 4. Here, since the bell jar 14 and the B cooling fluid supply section 33 are attached to the arm 29, they can be raised and lowered at the same time, and the lower surface of the bell jar 1-14 is connected to the nozzle IR.
After rising above A and turning the arm 29, the eliberger 14 moves the B cooling fluid supply section 33 to the side, and the ends A and B are rotatably connected to each other. There is a cut-out mechanism in the center of the lower side, which allows it to be moved to the position shown by the dotted line in the same figure.

The cooling air blown out from the cooling fluid supply section 25 and the cooling fluid supply section 33 descends while cooling the outer circumference of the bell jar 14 and the lamp 23, and enters the exhaust duct 21 as shown in the upper part of Fig. 2. It is forcibly discharged to the outside from the exhaust pipe 22. As shown in the figure, the nozzle IRA through which the reaction gas flows is provided with radial ice in this example, with one downward hole 36 (see diagram Z1) near the tip, and eight holes in this hole 36. By combining the two nozzles 18A or F1a as a set and changing the distance from the axis of the rotating shaft 13,
Susceptor assembly having an inclination with respect to the axial center] Reaction gas is ejected corresponding to each of the wafers 12 at different distances from the axial center.

Alternatively, in addition to the bottom of the tank, it is also possible to make two nozzles 1FIA as a set and provide holes 36- near the tips of each at an angle so as to face each other. A wide gas flow may also be formed.

Next, the operation of the above-mentioned embodiment will be explained. Lifting mechanism 2
8, the bell jar 14 and the B cooling fluid supply section 33 are raised, and then the bell jar 14 and the B cooling fluid supply section 33 are lowered to the state shown in FIG. In this state, N2 gas is ejected from the inner tube 17 and the outer tube 18 to purge the air. After the air purge is completed, the N2 gas is purged into the H2 gas, and then the lamp 23 is heated by F. Heating: 12 or predetermined temperature 1jl: UC:a then outer tube 18 and therefore nozzle 18
Vapor phase growth is performed by blowing out a reaction gas such as Mi/Ran from A together with the 112 dregs.

At this time, H2 gas is directly ejected from the inner tube 17 to fill the upper space of the bell jar 14 with H2 gas, thereby cooling the upper wall surface of the bell jar 14 and preventing contact of the reaction gas with the upper wall surface. These gases are then discharged from the holes 19B of the base plate 16. At this time, the waste goes around to the cessation part and decorates the waste, allowing smooth discharge without disturbing the flow of waste inside the bell jar 14. At the same time as heating by 1,97123M, cooling from the blower and cooler is achieved. Air is supplied by A, B, and cooling fluid.
The bell jar 14 is sprayed through the holes 26 and 35 of als 25 and 33 onto the lamp 23, and the lamp 23
After cooling the bell jar 14, it descends along the bell jar 14 and is forcibly exhausted from the exhaust tact 1 to the exhaust 122.The air volume varies from several tens to seven minutes to several minutes, depending on the size of the quartz bell jar 14. Although it is extremely large at 10nrr?/min, it is an exhaust table.

Since the pipe 21 surrounds the air of the bell jar 14 and is large in circumference, the exhaust resistance is small, and suction from the exhaust pipe 22 allows smooth exhaust.

After vapor phase growth has been carried out for a certain period of time, the lamp 23 is turned off to stop heating, and the wafer 12 is cooled via the bell jar 14 while only H2 gas is jetted out from both tubes 17 and 18 to purge the reaction gas. However, in the next discussion, will we stop the H2 gas and blow out the N2 gas inside Eliberja 14?
Use N2 gas. Finally, the series of vapor phase growth operations is completed by raising the bell jar 14 etc. to the elevating mechanism 28, opening the lamp house 24, and taking out the wafer 12.If cleaning of the bell jar 4 is required, After the bell jar 14 is raised, it is rotated to the F side by the lifting and rotating mechanism 28, and then lowered to land on a stand (not shown), and the bell jar 14 is separated from the gripping tool 30 and washed 4r-Ey. .

〔Effect of the invention〕

The vapor phase master device of the present invention is a set that drives the susceptor assembly from below, and the lamp house on the rear front side can be removed from the outside without raising a part of the lung house arranged around the bell jar. By opening 1C, the hand can easily reach the outer peripheral surface of the susceptor assembly, which has the advantage that attachment and detachment of the wafer is extremely simple.

[Brief explanation of the drawing]

The drawings show one embodiment of the present invention, and FIG. 1 is a sectional view, and FIG. 2 is a sectional view taken along the line 2-2 of the fJ1 diagram. 11... Susceptor assembly, 12... Wafer, 13...
... Rotating shaft, 14... Bell jar, 15... Cylindrical body,
16... pace plate, 17... inner tube, 18...
・Outer tube, 23... lamp, 24... lamp house,
25.33...Cooling fluid supply unit, 28...Elevating and rotating mechanism.

Claims (1)

[Scope of Claims] 1. A base plate, a rotating shaft extending upward through the base plate, a barrel-shaped susceptor assembly attached to the rotating shaft, and a lower end of the susceptor whose lower end is sealable to the base plate. A bell jar forming a reaction chamber around the assembly, an elevating mechanism for the bell jar, and a plurality of lamp houses located surrounding the outside of the bell jar and facing the susceptor of the susceptor assembly. A vapor phase growth apparatus characterized in that some of the lamp houses are configured to be able to open outward. 2. The lamp houses corresponding to approximately half the circumference of the bell jar are formed so that they can be separated from each other in the center of the approximately half circumference, and the lamp houses on the left and right sides thereof are connected so as to be swingable. A vapor phase growth apparatus according to claim 1, characterized in that: