JPS6185693A - Ion implantation bubble memory element - Google Patents

Ion implantation bubble memory element

Info

Publication number
JPS6185693A
JPS6185693A JP59205510A JP20551084A JPS6185693A JP S6185693 A JPS6185693 A JP S6185693A JP 59205510 A JP59205510 A JP 59205510A JP 20551084 A JP20551084 A JP 20551084A JP S6185693 A JPS6185693 A JP S6185693A
Authority
JP
Japan
Prior art keywords
transmission line
bubble
ion
ion implantation
memory element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59205510A
Other languages
Japanese (ja)
Other versions
JPS6342353B2 (en
Inventor
Yoshio Sato
良夫 佐藤
Tsutomu Miyashita
勉 宮下
Makoto Ohashi
誠 大橋
Keiichi Betsui
圭一 別井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59205510A priority Critical patent/JPS6185693A/en
Publication of JPS6185693A publication Critical patent/JPS6185693A/en
Publication of JPS6342353B2 publication Critical patent/JPS6342353B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To improve a margin and to prevent an oscillating error of a bubble at the turning-up part by making the prescribed shape of a transmission line at the turning-up part of the folding type minor loop of an ion implantation bubble memory element. CONSTITUTION:Into an ion implantation area 10 except a bubble transmission line, a necessary ion is implantated, and a folding type minor loop transmission line 11 is formed. In the crystallizing direction of the transmission line 11, on the turning-up transmission line between an inlet transmission line of a stripe difficulty shaft direction <1, -2, and 1> and an outlet transmission line of a stripe easiness shaft direction <-1, 2, and -1>, cusps will not be found between a starting point and a terminal point besides cusps 12 and 13 of the starting point and a terminal point, and an angle tip 14 is installed between the starting point and the terminal point. By the shape, the bisector direction of the cusps 12 and 13 toes to [-2, 1, and 1] and [1, 1, and -2] and goes to the direction near <1, -2, and 1> direction, the margin is improved and an oscillation error occurrence of the bubble in the folding part can be prevented.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電子計算装置等の記憶装置として用いられるイ
オン注入バブルメモリ素子に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an ion-implanted bubble memory element used as a memory device for electronic computing devices and the like.

イオン注入バブルメモリ素子は第5図の平面図及び第6
図の断面図に示す如く、ガドリニウムeガリウム・ガー
ネット基板1の上にバブル用結晶となる磁性ガーネット
の薄膜2を液相エピタキシャル成長させて形成し、この
磁性薄膜2に対し・くター23以外の領域4にH,Ne
、He等のイオンを注入してパズル転送路を形成し念も
のでちる。
The ion-implanted bubble memory device is shown in the plan view of FIG.
As shown in the cross-sectional view of the figure, a thin film 2 of magnetic garnet that will become a crystal for bubbles is formed on a gadolinium e gallium garnet substrate 1 by liquid phase epitaxial growth. 4 H, Ne
, He, and other ions are implanted to form a puzzle transfer path, which is then used as a metaphor.

このように形成され九素子は、・くターン部分3の磁化
容易軸方向は矢印aの如くもとの1まで面内方向と垂直
でhるが、イオンを注入され九領域4の磁化容易軸方向
は矢印すの如く面内方向と一致する方向になる。従って
バブル5は回転磁界によってパターン30周縁に沿って
矢印Cの如く転送され石。そしてこのパターン3け円形
や四角形をその一部が重なるようにして連続して並べた
形状であり、従来のパーマロイパターンの如くギャップ
を要しないため寸法nt変が緩くとも良く、従りてパタ
ーンが小さくでき高密電化が実現される。
In the nine elements formed in this way, the direction of the easy magnetization axis of the turn region 3 is perpendicular to the in-plane direction up to the original 1 as shown by the arrow a, but the easy magnetization axis of the nine region 4 is ion-implanted. The direction is the same as the in-plane direction, as shown by the arrow. Therefore, the bubbles 5 are transferred along the periphery of the pattern 30 as shown by the arrow C by the rotating magnetic field. This pattern has a shape in which three circles or squares are arranged in succession so that some of them overlap, and unlike conventional permalloy patterns, there is no need for a gap, so the dimension nt change can be gentle, and the pattern is It can be made smaller and achieves high-density electrification.

しかしこのイオン注入・くプルメモリ素子には第7図に
示すようにバブルがストライプ・アウトされやすい軸が
3方向(1) 、 (II) 、 (III)に120
°の間隔をなして存在し、これら12000間隔をなす
容重磁化!f11に対し、上記連接ディスクパターン3
を形成するディスクパターンが何れの方向K −列に並
んでいるかによってスーパートラ、り9と。
However, in this ion-implanted couple memory element, as shown in Figure 7, there are 120 axes in which bubbles are likely to be striped out in three directions (1), (II), and (III).
Exist at intervals of 12,000 ° and these 12,000 intervals of heavy magnetization! For f11, the above connected disk pattern 3
Depending on which direction the disk patterns forming the K-column are arranged in the supertra, ri9.

パッドのトラックbと、グツド・トラ、りgの5通りの
バブル移動通路ができる。
There are five bubble movement paths: Pad track b, Gutsudora, Rig.

〔従来の技術と発明が解決しようとする問題点〕第8図
は従来のメジャーマイナー構成のイオン注入バブルメモ
リ素子における折シ畳み形マイナールーズのインサイド
ターンを示した図である。
[Prior Art and Problems to be Solved by the Invention] FIG. 8 is a diagram showing the inside turn of a folded minor loose in a conventional ion implantation bubble memory device having a major minor configuration.

同図において6はイオン注入領域、7はバブル転送路H
xは駆動磁界方向、〔121〕、〔112〕。
In the figure, 6 is an ion implantation region, and 7 is a bubble transfer path H.
x is the driving magnetic field direction, [121], [112].

(211:)は結晶方位をそれぞれ示している。(211:) indicates the crystal orientation, respectively.

本従来例は(121’)方向から(121)方向へ折り
返すタイプのマイナールーズで直線伝送路はスネーク型
パターンである。なおく121>とは[:121]、(
112LC211)を総称する記号である。
This conventional example is a minor loose type that is folded back from the (121') direction to the (121) direction, and the straight transmission line has a snake-shaped pattern. Naoku121> means [:121], (
112LC211).

このパターン7#i折り返し部分の転送区間a−bの間
にカスプ8を含んでおり、このカスプ8の開き角の2等
分方向が(121)とパッドトラックのそれと等しくな
っているなめマージンの劣化を招いていた。これを改良
するため第9図(各符号は第8図と同じ)に示す如き形
状へ考えられているが、このパターンにおいても[01
1]とグツドトラックのそれに等しくなるものの未だ十
分とは言えず、またカスプ8の開き角自体が狭く、微細
パターンが必要な高密妾デバイス(16Mビット/譚2
以上)には適さないという問題がおる。
A cusp 8 is included between the transfer section a-b of this pattern 7 #i folding part, and the bisecting direction of the opening angle of this cusp 8 is (121) and the lick margin is equal to that of the pad track. It was causing deterioration. In order to improve this, a shape as shown in FIG. 9 (each symbol is the same as in FIG. 8) has been considered, but even in this pattern [01
1] is equivalent to that of the good track, but it is still not sufficient, and the opening angle of the cusp 8 itself is narrow, making it difficult to use high-density devices (16 Mbit/tan 2) that require fine patterns.
There is a problem that it is not suitable for the above).

〔問題を解決する光めの手段〕[A bright way to solve problems]

本発明は、上記問題点を解消したイオン注入・(プルメ
モリ素子を提倶するもので、その手段は、イオン注入バ
ブルメモリ素子の折り畳み型マイナーループの一部であ
るストライブ困難軸方向<121>から容易軸方向(’
121’)へ折り返すインサイド型折り返し部において
、バブルが折り返し部へ入って来る仰の直線転送路と出
てゆく側の直線転送路との間の転送路にカスプが無く、
かつそのfr送j!2h5j山形状となっていることを
特徴とするイオン注入バブルメモリ素子によってなされ
る。
The present invention provides an ion-implanted (pull) memory element that solves the above-mentioned problems. Easy from axial direction ('
121'), there is no cusp in the transfer path between the upward straight transfer path where the bubble enters the folded portion and the straight transfer path on the exit side.
And that fr sending j! This is achieved by using an ion-implanted bubble memory element characterized by a 2h5j mountain shape.

〔作 用〕[For production]

上記イオン注入バブルメモリ素子は、折り返し部の始点
から終点までの間にはカスプが存在せず、ま六始点と含
むカスプ及び終点を含むカスプはそれぞれその2等分線
の方向が(’721)近傍へ向かうためスーパートラッ
クのそれと同等となり、マージンが向上する。また折り
返し部の始点から終点へ向かう伝送路が山形状であるた
め始点、終点間でのバブルの撮動エラーが防止される。
In the above ion-implanted bubble memory element, there is no cusp between the starting point and the ending point of the folded part, and the direction of the bisector of the cusp including the sixth starting point and the cusp including the ending point is ('721). Since it goes to nearby areas, it becomes equivalent to that of a super truck, improving margins. Furthermore, since the transmission path from the starting point to the ending point of the folding section is mountain-shaped, errors in capturing bubbles between the starting point and the ending point are prevented.

〔実#例〕〔Illustration〕

以下、図面を#!照して本発明の実施例を詳細に説明す
る。
Below are the drawings! Examples of the present invention will now be described in detail.

笛1図に本発明の一実施例の要部を示す。本実施例は(
121)方向から(121)方向へ折り返すインサイド
ターンであり直線転送路は折り畳み型パターンの場合で
ある。同図において10はイオン注入領域、11はバブ
ル転送路、I(Rは駆動磁界方向、(721)、(11
2)、(:211)は結晶方位をそれぞれ示している。
Fig. 1 shows the main parts of an embodiment of the present invention. This example is (
This is an inside turn that is folded back from the 121) direction to the (121) direction, and the straight transfer path is a folding pattern. In the same figure, 10 is an ion implantation region, 11 is a bubble transfer path, I(R is a driving magnetic field direction, (721), (11
2) and (:211) indicate the crystal orientation, respectively.

本実施例は図に示す如く、折り返し部の始点12から終
点13までの間にはカスプが存在せず、山形状のティッ
プ14のみを設は念ものである。
In this embodiment, as shown in the figure, there is no cusp between the starting point 12 and the ending point 13 of the folded portion, and only a chevron-shaped tip 14 is provided.

このように構成された本実施例は、折り返し部の始点を
含むカスプ12、及び終点を含むカスプ13のそれぞれ
の2等分被15,115の方向が<j21)近傍の方向
へ向かうためスーパートラックのそれと同等となりマー
ジンが向上する。
In this embodiment configured in this way, the directions of the bisecting halves 15 and 115 of the cusp 12 including the starting point of the folding portion and the cusp 13 including the ending point are directed in a direction near <j21), so that a super track is achieved. This will improve margins.

なおティップ14の高さとバイアスマージンの関係は実
験によれば第2図に示す如くになる。同図はティップの
高さを1とし、バブルの平均直径マージンの低駆動低バ
イアス側が改善されることがわかる。またa = 00
場合は第1図のカスプ12.1!i間でバブルが振動し
てしまうためマージンが劣化する。
According to experiments, the relationship between the height of the tip 14 and the bias margin is as shown in FIG. In the figure, the tip height is set to 1, and it can be seen that the average diameter margin of the bubble is improved on the low drive, low bias side. Also a = 00
In this case, cusp 12.1 in Figure 1! Since the bubble oscillates between i, the margin deteriorates.

第3図は本実施例のマージンを従来列と比較して示し念
図である。図Vi横軸に回転駆動磁界HDを、縦軸にバ
イアス磁界HBをとり、曲qAにょジ本実檜例の・くイ
アスマージンを、曲線8により第8図の従来例のマージ
ンを、曲線CKよフ第9図の従来例のマージンをそれぞ
れ示した。なお試別は結晶としてh=(1,6、Sw 
=0.6.4xMq=1050G、Hk=27000e
 のもCIで、イオン注入条件け Ne 、  30K
eV、  I X 10”/crJI2:Ne+、 1
20KeV、 2X10”/c*2: H2、36Ke
V。
FIG. 3 is a conceptual diagram comparing the margin of this embodiment with that of the conventional column. In Figure VI, the horizontal axis represents the rotational driving magnetic field HD, and the vertical axis represents the bias magnetic field HB. The margins of the conventional example shown in FIG. 9 are shown respectively. In addition, the trial is conducted as a crystal h = (1,6, Sw
=0.6.4xMq=1050G, Hk=27000e
Nomo CI, ion implantation conditions Ne, 30K
eV, I X 10”/crJI2:Ne+, 1
20KeV, 2X10”/c*2: H2, 36Ke
V.

2X10/m  の3を注入を行ない、転送路周期は2
μm (16M /(yy2相当)のものである。同図
より本実施例(曲線人)が従来例(曲線B、C)K比し
て青電良いことがわかる。
3 of 2×10/m was implanted, and the transfer path period was 2.
μm (equivalent to 16M/(yy2)).From the same figure, it can be seen that this example (curved line) has a better blue electric current than the conventional example (curved lines B and C).

第4図は他の実施例を示す図である。同図において第1
図と同一部分は同一符号を付して示した。
FIG. 4 is a diagram showing another embodiment. In the same figure, the first
The same parts as in the figures are indicated with the same reference numerals.

本実施列はコンテイギユアスディスク型の転送路でろり
、前実施例と同様な思想で設計され光ものでろり、従っ
て効果鳥同様である。
This embodiment has a continuous disk type transfer path, is designed based on the same idea as the previous embodiment, and has an optical system, and therefore has the same effect.

〔を明の効果〕[light effect]

以上説明したように本発明によれば、マイナーループの
折り返し部の始点から終点までの間にカスプを設けず、
山形状のティップのみを設けることによr)%始点を含
むカスプ及び終点を含むカスプのそれぞれの2等分線の
方向をく121〉近傍へ向かわせ、スーパートラックと
同等にしてマージンの向上を可能にし、オた山形状のテ
ィラグ忙より始点、終点間でのバブルの振動エラーを防
止するといった効果がある。
As explained above, according to the present invention, no cusp is provided between the starting point and the ending point of the folded portion of the minor loop.
By providing only a mountain-shaped tip, the directions of the bisectors of the cusp including the start point and the cusp including the end point are directed to the vicinity of 121〉, making it equivalent to the super truck and improving the margin. This has the effect of preventing bubble vibration errors between the starting point and the ending point due to the mountain-shaped tiller.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のイオン注入バブルメモリ素子の一実施
例の要部を示す平面図、第2図はそのティップの高さと
バイアスマージンの関係を示す図、第3図は本発明実施
例のバイアスマージンヲ従来例と比較して示した図、第
4図は本発明の他の実施例を示す図、筆5図は従来のイ
オン注入バブルメモリ素子を説明するための図、第6図
は湾5図の■−■線における断面図、第7図は・シプル
結晶の結晶方位と転さ路の関係lt説明するための同。 第8図及び第9図は従来のイオン注入バブルメモリ素子
にシけるマイナールーズの折り返し部を説明するための
図である@ 図中、10はイオン注入領域、11ば・くプル転送路、
HFIけ駆動磁界方向、[:121]、(:112)。 (2111は結晶方位、17.13はカスプ、14はテ
ィップをそれぞり、示す。
FIG. 1 is a plan view showing the essential parts of an embodiment of the ion-implanted bubble memory element of the present invention, FIG. 2 is a diagram showing the relationship between the tip height and bias margin, and FIG. A diagram showing the bias margin in comparison with a conventional example, FIG. 4 is a diagram showing another embodiment of the present invention, FIG. 5 is a diagram for explaining a conventional ion-implanted bubble memory element, and FIG. Figure 7 is a cross-sectional view taken along the line ■-■ in Figure 5, and Figure 7 is the same for explaining the relationship between the crystal orientation and the rolling path of the ciple crystal. FIGS. 8 and 9 are diagrams for explaining the folding portion of minor looseness in a conventional ion-implanted bubble memory element. In the figures, 10 is an ion-implanted region, 11 is a bubble transfer path,
HFI driving magnetic field direction, [:121], (:112). (2111 is the crystal orientation, 17.13 is the cusp, and 14 is the tip.

Claims (1)

【特許請求の範囲】 1、イオン注入バブルメモリ素子の折り畳み型マイナー
ループの一部であるストライプ困難軸方向〈1@2@1
〉から容易軸方向〈@1@2@1@〉へ折返すインサイ
ド型折り返し部において、バブルが折り返し部へ入って
来る側の直線転送路と出てゆく側の直線転送路との間の
転送路にカスプが無く、かつその転送路が山形状となっ
ていることを特徴とするイオン注入バブルメモリ素子。 2、前記折返し部の転送路の山形状の高さがバブルの平
均直径の1/2もしくはそれ以上であることを特徴とす
る特許請求の範囲第1項記載のイオン注入バブルメモリ
素子。
[Claims] 1. Stripe difficult axis direction <1@2@1 which is part of the folded minor loop of the ion-implanted bubble memory device
Transfer between the straight transfer path on the side where the bubble enters the folded portion and the straight transfer path on the side where the bubble exits in the inside type folded portion that folds from An ion-implanted bubble memory element characterized in that there are no cusps in the path and the transfer path is mountain-shaped. 2. The ion-implanted bubble memory device according to claim 1, wherein the height of the mountain-shaped transfer path of the folded portion is 1/2 or more of the average diameter of the bubbles.
JP59205510A 1984-10-02 1984-10-02 Ion implantation bubble memory element Granted JPS6185693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59205510A JPS6185693A (en) 1984-10-02 1984-10-02 Ion implantation bubble memory element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59205510A JPS6185693A (en) 1984-10-02 1984-10-02 Ion implantation bubble memory element

Publications (2)

Publication Number Publication Date
JPS6185693A true JPS6185693A (en) 1986-05-01
JPS6342353B2 JPS6342353B2 (en) 1988-08-23

Family

ID=16508059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59205510A Granted JPS6185693A (en) 1984-10-02 1984-10-02 Ion implantation bubble memory element

Country Status (1)

Country Link
JP (1) JPS6185693A (en)

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IEEE TRANSACTIONS ON MAGNETICS=1982 *

Also Published As

Publication number Publication date
JPS6342353B2 (en) 1988-08-23

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