JPS6184500U - - Google Patents

Info

Publication number
JPS6184500U
JPS6184500U JP16887384U JP16887384U JPS6184500U JP S6184500 U JPS6184500 U JP S6184500U JP 16887384 U JP16887384 U JP 16887384U JP 16887384 U JP16887384 U JP 16887384U JP S6184500 U JPS6184500 U JP S6184500U
Authority
JP
Japan
Prior art keywords
insulating layer
heat insulating
lead terminal
heating means
treatment tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16887384U
Other languages
Japanese (ja)
Other versions
JPH0120640Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984168873U priority Critical patent/JPH0120640Y2/ja
Publication of JPS6184500U publication Critical patent/JPS6184500U/ja
Application granted granted Critical
Publication of JPH0120640Y2 publication Critical patent/JPH0120640Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Control Of Resistance Heating (AREA)
  • Resistance Heating (AREA)
  • Furnace Details (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案を半導体ウエハの縦型拡散炉に適
用した一実施例を示すものであつて、第１図は拡
散炉の概略縦断面図、第２図はリード端子の引出
し部分の拡大縦断面図、第３図は炉内の温度分布
を示すグラフ、第４図は拡散炉の変形例を示す部
分拡大縦断面図である。 なお図面に用いた符号において、１…処理管、
２…断熱層、３…抵抗加熱線、６，７…リード端
子である。 The drawings show an embodiment in which the present invention is applied to a vertical diffusion furnace for semiconductor wafers. Figure 1 is a schematic vertical cross-sectional view of the diffusion furnace, and Figure 2 is an enlarged vertical cross-section of the lead terminal part. 3 is a graph showing the temperature distribution in the furnace, and FIG. 4 is a partially enlarged vertical sectional view showing a modification of the diffusion furnace. In addition, in the symbols used in the drawings, 1...processing tube;
2... heat insulation layer, 3... resistance heating wire, 6, 7... lead terminal.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電気炉の熱処理管を包囲して配された断熱層と
、この断熱層の内面で且つ上記熱処理管の周囲に
配された電気加熱手段と、上記断熱層を通つて上
記電気加熱手段に接続される少なくとも１個のリ
ード端子とを夫々具備し、上記リード端子が上記
断熱層の側面から外部に引き出されるとともに、
その引出し位置が、上記リード端子と上記電気加
熱手段との接続位置から上記熱処理管の長手軸に
沿つた方向に偏倚されていることを特徴とする電
気炉の加熱装置。 a heat insulating layer disposed surrounding a heat treatment tube of an electric furnace; an electric heating means disposed on the inner surface of the heat insulating layer and around the heat treatment tube; and a heat insulating layer connected to the electric heating means through the heat insulating layer. at least one lead terminal, the lead terminal being pulled out from a side surface of the heat insulating layer,
1. A heating device for an electric furnace, wherein a pull-out position thereof is offset from a connection position between the lead terminal and the electric heating means in a direction along the longitudinal axis of the heat treatment tube.
JP1984168873U 1984-11-07 1984-11-07 Expired JPH0120640Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984168873U JPH0120640Y2 (en) 1984-11-07 1984-11-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984168873U JPH0120640Y2 (en) 1984-11-07 1984-11-07

Publications (2)

Publication Number Publication Date
JPS6184500U true JPS6184500U (en) 1986-06-03
JPH0120640Y2 JPH0120640Y2 (en) 1989-06-21

Family

ID=30726634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984168873U Expired JPH0120640Y2 (en) 1984-11-07 1984-11-07

Country Status (1)

Country Link
JP (1) JPH0120640Y2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01110724A (en) * 1987-07-31 1989-04-27 Tokyo Electron Ltd Heating furnace
JP2008288051A (en) * 2007-05-18 2008-11-27 Nissan Motor Co Ltd Insulating container for fuel cell stack and fuel cell device
JP2012089557A (en) * 2010-10-15 2012-05-10 Hitachi Kokusai Electric Inc Substrate processing equipment and method for manufacturing semiconductor device
JP2013098227A (en) * 2011-10-28 2013-05-20 Toshiba Corp Heat treatment device and heat treatment method for superconducting coil

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007110163A (en) * 2007-01-10 2007-04-26 Hitachi Kokusai Electric Inc Semiconductor processing apparatus and heat treatment device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54174041U (en) * 1978-05-29 1979-12-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54174041U (en) * 1978-05-29 1979-12-08

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01110724A (en) * 1987-07-31 1989-04-27 Tokyo Electron Ltd Heating furnace
JP2008288051A (en) * 2007-05-18 2008-11-27 Nissan Motor Co Ltd Insulating container for fuel cell stack and fuel cell device
JP2012089557A (en) * 2010-10-15 2012-05-10 Hitachi Kokusai Electric Inc Substrate processing equipment and method for manufacturing semiconductor device
JP2013098227A (en) * 2011-10-28 2013-05-20 Toshiba Corp Heat treatment device and heat treatment method for superconducting coil

Also Published As

Publication number Publication date
JPH0120640Y2 (en) 1989-06-21

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