JPS6181139U - - Google Patents
Info
- Publication number
- JPS6181139U JPS6181139U JP16623184U JP16623184U JPS6181139U JP S6181139 U JPS6181139 U JP S6181139U JP 16623184 U JP16623184 U JP 16623184U JP 16623184 U JP16623184 U JP 16623184U JP S6181139 U JPS6181139 U JP S6181139U
- Authority
- JP
- Japan
- Prior art keywords
- nozzles
- reaction gas
- cvd apparatus
- ejection hole
- gas ejection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012495 reaction gas Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16623184U JPS6181139U (US07709020-20100504-C00041.png) | 1984-10-31 | 1984-10-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16623184U JPS6181139U (US07709020-20100504-C00041.png) | 1984-10-31 | 1984-10-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6181139U true JPS6181139U (US07709020-20100504-C00041.png) | 1986-05-29 |
Family
ID=30724058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16623184U Pending JPS6181139U (US07709020-20100504-C00041.png) | 1984-10-31 | 1984-10-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6181139U (US07709020-20100504-C00041.png) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05335239A (ja) * | 1992-05-27 | 1993-12-17 | Tokyo Electron Ltd | 成膜装置 |
| WO1998044175A1 (en) * | 1997-03-28 | 1998-10-08 | Super Silicon Crystal Research Institute Corp. | Epitaxial growth furnace |
| KR19990066468A (ko) * | 1998-01-26 | 1999-08-16 | 윤종용 | 반도체 장치의 알루미늄 샤워 헤드 |
-
1984
- 1984-10-31 JP JP16623184U patent/JPS6181139U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05335239A (ja) * | 1992-05-27 | 1993-12-17 | Tokyo Electron Ltd | 成膜装置 |
| WO1998044175A1 (en) * | 1997-03-28 | 1998-10-08 | Super Silicon Crystal Research Institute Corp. | Epitaxial growth furnace |
| KR19990066468A (ko) * | 1998-01-26 | 1999-08-16 | 윤종용 | 반도체 장치의 알루미늄 샤워 헤드 |
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