JPS6169282U - - Google Patents
Info
- Publication number
- JPS6169282U JPS6169282U JP15113784U JP15113784U JPS6169282U JP S6169282 U JPS6169282 U JP S6169282U JP 15113784 U JP15113784 U JP 15113784U JP 15113784 U JP15113784 U JP 15113784U JP S6169282 U JPS6169282 U JP S6169282U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- generated gas
- quartz nozzle
- nitride film
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15113784U JPS6169282U (US06373033-20020416-M00071.png) | 1984-10-08 | 1984-10-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15113784U JPS6169282U (US06373033-20020416-M00071.png) | 1984-10-08 | 1984-10-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6169282U true JPS6169282U (US06373033-20020416-M00071.png) | 1986-05-12 |
Family
ID=30709263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15113784U Pending JPS6169282U (US06373033-20020416-M00071.png) | 1984-10-08 | 1984-10-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6169282U (US06373033-20020416-M00071.png) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS559427A (en) * | 1978-07-07 | 1980-01-23 | Hitachi Ltd | Manufacturing device of silicon nitride film |
| JPS5787120A (en) * | 1980-11-20 | 1982-05-31 | Matsushita Electric Ind Co Ltd | Method and device for plasma cvd |
-
1984
- 1984-10-08 JP JP15113784U patent/JPS6169282U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS559427A (en) * | 1978-07-07 | 1980-01-23 | Hitachi Ltd | Manufacturing device of silicon nitride film |
| JPS5787120A (en) * | 1980-11-20 | 1982-05-31 | Matsushita Electric Ind Co Ltd | Method and device for plasma cvd |
