JPS6166962U - - Google Patents

Info

Publication number
JPS6166962U
JPS6166962U JP15187984U JP15187984U JPS6166962U JP S6166962 U JPS6166962 U JP S6166962U JP 15187984 U JP15187984 U JP 15187984U JP 15187984 U JP15187984 U JP 15187984U JP S6166962 U JPS6166962 U JP S6166962U
Authority
JP
Japan
Prior art keywords
groove
silicon
diameter
metal film
receiving element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15187984U
Other languages
Japanese (ja)
Other versions
JPH079391Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15187984U priority Critical patent/JPH079391Y2/en
Publication of JPS6166962U publication Critical patent/JPS6166962U/ja
Application granted granted Critical
Publication of JPH079391Y2 publication Critical patent/JPH079391Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

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  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本考案の概略断面図及び横
断面図、第3図は凹溝の光の入射角θを拡大説明
図、第4図は入射角と光電流IPとの関係を示す
線図である。 1…N+シリコンH、2…NシリコンH、3…
PシリコンH、4…P+シリコンH、5…SiO
膜、6…Al等メタル膜、6′…P電極メタル
膜、7…凹座部メタル膜、8…N電極メタル膜、
A…凹溝、B…開孔窓、J…PN接合面、h…P
N接合深さ、H…凹溝深さ、W…開孔窓径、t…
SiO2+メタル層の厚み。
Figures 1 and 2 are a schematic cross-sectional view and a cross-sectional view of the present invention, Figure 3 is an enlarged explanatory diagram of the incident angle θ of light in the groove, and Figure 4 shows the relationship between the incident angle and photocurrent IP. FIG. 1...N+ silicon H, 2...N silicon H, 3...
P silicon H, 4...P+silicon H, 5...SiO
2 film, 6... Metal film such as Al, 6'... P electrode metal film, 7... Concave seat metal film, 8... N electrode metal film,
A...concave groove, B...perforated window, J...PN joint surface, h...P
N junction depth, H...groove depth, W...hole window diameter, t...
Thickness of SiO 2+ metal layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 内面にPN接合面を露呈している半球状凹溝を
設け、かつ該凹溝の中心上部に凹溝の径よりも小
さい開孔窓を設けたことを特徴とする半導体受光
素子。
1. A semiconductor light-receiving element, characterized in that a hemispherical groove exposing a PN junction surface is provided on the inner surface, and an aperture window smaller than the diameter of the groove is provided above the center of the groove.
JP15187984U 1984-10-08 1984-10-08 Semiconductor light receiving element Expired - Lifetime JPH079391Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15187984U JPH079391Y2 (en) 1984-10-08 1984-10-08 Semiconductor light receiving element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15187984U JPH079391Y2 (en) 1984-10-08 1984-10-08 Semiconductor light receiving element

Publications (2)

Publication Number Publication Date
JPS6166962U true JPS6166962U (en) 1986-05-08
JPH079391Y2 JPH079391Y2 (en) 1995-03-06

Family

ID=30709975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15187984U Expired - Lifetime JPH079391Y2 (en) 1984-10-08 1984-10-08 Semiconductor light receiving element

Country Status (1)

Country Link
JP (1) JPH079391Y2 (en)

Also Published As

Publication number Publication date
JPH079391Y2 (en) 1995-03-06

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