JPS6165427A - 移動ステ−ジ装置 - Google Patents

移動ステ−ジ装置

Info

Publication number
JPS6165427A
JPS6165427A JP59186516A JP18651684A JPS6165427A JP S6165427 A JPS6165427 A JP S6165427A JP 59186516 A JP59186516 A JP 59186516A JP 18651684 A JP18651684 A JP 18651684A JP S6165427 A JPS6165427 A JP S6165427A
Authority
JP
Japan
Prior art keywords
stage
nut
positioning
electrostrictive elements
ball screw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59186516A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0574226B2 (enrdf_load_html_response
Inventor
Toru Tojo
東条　徹
Kazuyoshi Sugihara
和佳 杉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59186516A priority Critical patent/JPS6165427A/ja
Publication of JPS6165427A publication Critical patent/JPS6165427A/ja
Publication of JPH0574226B2 publication Critical patent/JPH0574226B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59186516A 1984-09-07 1984-09-07 移動ステ−ジ装置 Granted JPS6165427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59186516A JPS6165427A (ja) 1984-09-07 1984-09-07 移動ステ−ジ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59186516A JPS6165427A (ja) 1984-09-07 1984-09-07 移動ステ−ジ装置

Publications (2)

Publication Number Publication Date
JPS6165427A true JPS6165427A (ja) 1986-04-04
JPH0574226B2 JPH0574226B2 (enrdf_load_html_response) 1993-10-18

Family

ID=16189861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59186516A Granted JPS6165427A (ja) 1984-09-07 1984-09-07 移動ステ−ジ装置

Country Status (1)

Country Link
JP (1) JPS6165427A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01144552A (ja) * 1987-11-30 1989-06-06 Shimadzu Corp 薄膜断面分析装置
JP2007324045A (ja) * 2006-06-02 2007-12-13 Hitachi High-Technologies Corp 電子顕微鏡装置およびブレーキ機構

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926477A (enrdf_load_html_response) * 1972-07-07 1974-03-08
JPS5830129A (ja) * 1981-08-17 1983-02-22 Hitachi Ltd 精密平面移動装置
JPS5850008A (ja) * 1981-09-21 1983-03-24 Toshiba Corp 高精度移動テ−ブル装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926477A (enrdf_load_html_response) * 1972-07-07 1974-03-08
JPS5830129A (ja) * 1981-08-17 1983-02-22 Hitachi Ltd 精密平面移動装置
JPS5850008A (ja) * 1981-09-21 1983-03-24 Toshiba Corp 高精度移動テ−ブル装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01144552A (ja) * 1987-11-30 1989-06-06 Shimadzu Corp 薄膜断面分析装置
JP2007324045A (ja) * 2006-06-02 2007-12-13 Hitachi High-Technologies Corp 電子顕微鏡装置およびブレーキ機構

Also Published As

Publication number Publication date
JPH0574226B2 (enrdf_load_html_response) 1993-10-18

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term