JPS6165107A - Inspecting method for surface defect - Google Patents

Inspecting method for surface defect

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Publication number
JPS6165107A
JPS6165107A JP18632584A JP18632584A JPS6165107A JP S6165107 A JPS6165107 A JP S6165107A JP 18632584 A JP18632584 A JP 18632584A JP 18632584 A JP18632584 A JP 18632584A JP S6165107 A JPS6165107 A JP S6165107A
Authority
JP
Japan
Prior art keywords
inspected
phase
detected
light
illumination light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18632584A
Other languages
Japanese (ja)
Other versions
JPH0613963B2 (en
Inventor
Hideaki Doi
秀明 土井
Yasuhiko Hara
原 ▲靖▼彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59186325A priority Critical patent/JPH0613963B2/en
Publication of JPS6165107A publication Critical patent/JPS6165107A/en
Publication of JPH0613963B2 publication Critical patent/JPH0613963B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

PURPOSE:To inspect a fine uneven defect by converting the fine unevenness of an optically transparent substance to be inspected into a density picture by a phase difference microscope optical system to detect the fine unevenness as a defect. CONSTITUTION:Transmitting illumination light 25 radiated from a transmitting illumination light source 10 is irradiated to a substance 14 (magnetic bubble memory) to be inspected through a collector lens 11, a ring slit 12 and a condensor lens 13. Direct light 29 modulated at its amplitude in accordance with the transmissibility of the substance 14 and diffracted light 26 modulated at its phase on the basis of its refractive index are made interfere with each other through a phase plate 16 and an adsorption film 18 and a density signal corresponding to the phase difference is detected by a television camera. Then, the light source 10 is switched to a vertical illumination light source 24, the vertical illumination light 28 is irradiated through a half mirror 22 and an objective lens 15 and the reflected light is detected by a camera 23. A picture having a bright or dark background is obtained in accordance with the selection of a phase plate 16, and in case of the bright background, specific points existing in both the picture and the background are decided as foreign substances. On the other hand, a specific point existing in one side is decided as an uneven part. In case of the dark background, specific points existing in both the sides are decided as an uneven part.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、%に光学的に透明な平行平板物体上にある微
小な凹凸等の欠陥を検出するのに好適な欠陥検査方法に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a defect inspection method suitable for detecting defects such as minute irregularities on a parallel flat plate object that is optically transparent.

〔発明の背景〕[Background of the invention]

光学的に透明な物体表面の微小な凹凸を測定する手段と
して、光の干eを用いるものがるる。
There is a method that uses light emitted as a means of measuring minute irregularities on the surface of an optically transparent object.

この−例として第5図に示すようなマイクルソン干ea
tと呼ばれるものがろる。マイクルソン干渉計は例えば
岩波IIF店発行(昭和34牢ン久保田広著「応用光学
」オワ8頁から第100頁までに記載されているが、第
5図を用いて、この原理を説明する。
As an example of this, the Mikelson dry ea as shown in Figure 5
There is something called t. The Michelson interferometer is described, for example, in ``Applied Optics'' by Hiroshi Kubota, published by Iwanami IIF Store (1958), pages 8 to 100, and its principle will be explained using FIG.

レーデ光線等のコヒーレント光源1から出た光線がビー
ムスプリッタ2によって二つの光束に分けられ、その一
方の光束は対物レンズ3を通して被検査物体40表面忙
投影され、他方の光束は〜般に対物レンズ3と等しい倍
率を持つ対物レンズ5を通して参照IJ[K投影される
A beam of light emitted from a coherent light source 1 such as a Rede beam is divided into two beams by a beam splitter 2, one of which is projected onto the surface of an object to be inspected 40 through an objective lens 3, and the other beam is generally projected through an objective lens. The reference IJ[K is projected through an objective lens 5 with a magnification equal to 3.

参照鏡6は対物レンズ5の視野内において、高い平面精
度を有する鏡面でるる。被検査物体4および参照説6か
らの反射鏡はそれぞれ対物し。
The reference mirror 6 has a mirror surface with high planar accuracy within the field of view of the objective lens 5. The reflecting mirrors from the object to be inspected 4 and the reference theory 6 serve as objectives, respectively.

ンズ3幹よび5によって集光され、ビームスプリ、り2
で合成され、干$像を像面7に結像する。
The light is focused by lenses 3 and 5, and beam splitter and beam 2
The two images are synthesized at the image plane 7, and a dry image is formed on the image plane 7.

この場合の干渉原理は、ピームスク9:、夕2の反射面
上の点Oと被検査物体4上の点Q1の距離OQ+と、点
Oと参照鏡6上の点Q2の距離数2の差Δ2が、使用す
る光線の波長をλとして、÷λの奇数倍であれば、干渉
によって被検査物体4からの反射光と参照鏡6からの反
射光は互いに弱めあい、一方、Δχが上λの偶数倍であ
れば、両反射光は互に強めあうというものである。すな
わち、参照A6の位置を光軸方向く移動すると、像面7
は明暗を繰り返し、前記へ1がユλの整数暗になる毎に
、像面7は明るさの極大値となる。
The principle of interference in this case is the difference between the distance OQ+ between the point O on the reflective surface of the mirror 2 and the point Q1 on the object to be inspected 4, and the distance number 2 between the point O and the point Q2 on the reference mirror 6. If Δ2 is an odd multiple of ÷λ, where λ is the wavelength of the light beam used, the reflected light from the object to be inspected 4 and the reflected light from the reference mirror 6 will weaken each other due to interference, while Δχ is above λ If it is an even number multiple of , both reflected lights will mutually strengthen each other. That is, when the position of the reference A6 is moved in the optical axis direction, the image plane 7
repeats brightness and darkness, and each time the above-mentioned 1 becomes darker by an integer of λ, the image plane 7 reaches its maximum brightness.

本原理によって、被検査試料4上の凹凸は、その凹凸猷
に応じて÷λを周期として明暗となって像面7で観測さ
れる。
According to this principle, the irregularities on the sample to be inspected 4 are observed on the image plane 7 as bright and dark with a period of ÷λ depending on the irregularities.

このような、光の干渉を用いて光学的に透明な物体表面
の微小な凹凸を検出する方法は、例えば、特開昭57−
120805号公報に記載されている。この公印例では
、前記マイクルソン干渉計の参照鏡6を光軸に対して僅
かに煩けて、検出範囲内に必ず明暗1対以上の干渉縞を
生じるようにして背景の干渉条件を変化させ、被検査物
本上の微小凹凸欠陥をコントラスト良く検出でよる条件
が得られるようになっている。
Such a method of detecting minute irregularities on the surface of an optically transparent object using light interference is described, for example, in Japanese Patent Application Laid-Open No. 57-1999.
It is described in No. 120805. In this official seal example, the reference mirror 6 of the mickeyson interferometer is slightly moved relative to the optical axis to ensure that at least one pair of bright and dark interference fringes is generated within the detection range, thereby changing the background interference conditions. , it is possible to obtain conditions for detecting minute irregularities defects on the object to be inspected with good contrast.

しかし、これら公知列に述べられている方法は、被検査
(勿体4のるいは参照鏡6からの反射を考えているだけ
で、対物レンズ3や対物レンズ5等の光路中に挿入され
ている物体からの反射光については配慮されていない。
However, the methods described in these publicly known articles only consider the reflection from the inspection target (objective lens 4 or reference mirror 6), and the reflection from the objective lens 3, objective lens 5, etc. is inserted into the optical path. No consideration is given to light reflected from objects.

特に対物レンズ3.5等に、通常、収差を補正するため
に複数のレンズを1組みあわせた、例えは第6図に示す
プラン対物レンズ等の組合わせレンズを用いる必要がロ
シ、各レンズ底面からの反射光?1゜#2+I−yL等
と参照鏡6からの反射光等、種々の光が互いtζ干渉し
、像面7上でバックグランドノイズとして検出されるた
め、被検査物体4上の微小な凹凸による像面7上の干渉
像の認識が困難となる欠点があった。
In particular, it is usually necessary to use a combination lens such as the plan objective lens shown in Figure 6, which is a combination of multiple lenses in order to correct aberrations, especially for the objective lens 3.5, etc., and the bottom surface of each lens. Reflected light from? 1° Since various lights such as #2+I-yL and the reflected light from the reference mirror 6 interfere with each other and are detected as background noise on the image plane 7, noise caused by minute irregularities on the object to be inspected 4. There was a drawback that it was difficult to recognize the interference image on the image plane 7.

また、被検査物体4上の埃等の異物の反射率が高い場合
、この異物からの反射光と同位相の被検査物からの反射
光とは区別することができず、一方、異物の反射率が低
い場合には像面7上に干渉像は得られないが、像面7上
で異物近傍の背景が明るいと、被検査物体4上の凹凸欠
陥と同様に観測されるので、被検査物体上の凹凸欠陥の
みを精度良く検出することはできないという欠点があっ
た。
In addition, when the reflectance of a foreign object such as dust on the object to be inspected 4 is high, it is impossible to distinguish the reflected light from this foreign object from the reflected light from the object to be inspected that is in the same phase. If the ratio is low, no interference image will be obtained on the image plane 7, but if the background near the foreign object is bright on the image plane 7, it will be observed in the same way as the irregularity defect on the object to be inspected 4, so the interference image will not be obtained on the image plane 7. This method has the disadvantage that it is not possible to accurately detect only uneven defects on an object.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上記した従来方法の欠点をなくシ、光
学的に透明な被検査物体表面の微小凹凸欠陥の検査を行
なう方法を提供し、さらに、この微小凹凸欠陥と埃等の
異物を分別して認識する方法を提供することにある。
It is an object of the present invention to eliminate the drawbacks of the conventional methods described above, to provide a method for inspecting minute irregularities on the surface of an optically transparent object to be inspected, and to further eliminate the minute irregularities and foreign matter such as dust. The purpose is to provide a method for separating and recognizing them.

〔発明の概要〕[Summary of the invention]

本発明の要点は、被検査物体を透過する光は被検査物の
厚みに応じた付則変化を受けるので、位相変化量を測定
することによって被検査物体上の微小凹凸欠陥を検出す
ることKある。
The main point of the present invention is that since the light passing through the object to be inspected undergoes an additional change depending on the thickness of the object to be inspected, it is possible to detect minute irregularities defects on the object to be inspected by measuring the amount of phase change. .

位相差を測定する手段として、なまの細胞や菌などのよ
うに透明で明暗や色調の差に乏しい物体を観察するのに
用いられる位相差顕微鏡がある。
As a means of measuring phase difference, there is a phase contrast microscope, which is used to observe objects that are transparent and have little difference in brightness or color tone, such as raw cells or bacteria.

第2図に位相差顕微鏡の光学系の一例を示すが、被検量
物体14の透過″4によって変調される直接光8を背暴
強とし、被検査物体の屈折率変化あるいは厚みの変化に
よって位相変調される回折光9に位相板16を用いて直
接光と干渉するように位相変化を与え、被検査物体14
による位相変化を明暗コントラストで像面17を観察で
よるよう忙したものである。こへで、1oは光源、11
はコレクタレンズ、12はリンゲス!l、)、13はコ
ンデンサレンズ、15は対物レンズである。
An example of the optical system of a phase contrast microscope is shown in FIG. 2, where the direct light 8 modulated by the transmission of the object to be tested 14 is used as a backlight, and the phase is changed by changes in the refractive index or thickness of the object to be tested. A phase plate 16 is used to change the phase of the modulated diffracted light 9 so that it interferes with the direct light, and the object to be inspected 14 is
The image plane 17 was busy observing the phase change due to the brightness and darkness contrast. Here, 1o is the light source, 11
is a collector lens, and 12 is a Ringes! 1, ), 13 is a condenser lens, and 15 is an objective lens.

直接光8と回折光9が干渉するように1憑幅の大きい直
接光8は吸収膜18によって減資させるが、位相差顕微
鏡の主たる用途からいって、被検査物体14の忠実度を
大きく損なわないように、吸収膜1日の吸収率は90%
程度までである。
Although the direct light 8 having a large width is reduced by the absorption film 18 so that the direct light 8 and the diffracted light 9 interfere, the fidelity of the object to be inspected 14 is not significantly impaired considering the main use of the phase contrast microscope. So, the absorption rate of the absorption membrane per day is 90%.
To a certain extent.

本発明の目的からいって、位相差の有無を検出すればよ
いので、直接光8をさらに減少させるか、あるいは全く
通過させずえ、主として回折光9を検出すれば、被検査
物体14による低位相差、すなわち、被検査物体14の
微小な凹凸を高感度に検出することがでよる。
For the purposes of the present invention, it is sufficient to detect the presence or absence of a phase difference. Therefore, if the direct light 8 is further reduced or not transmitted at all, and the diffracted light 9 is mainly detected, the phase difference caused by the object to be inspected 14 can be reduced. That is, minute irregularities on the object to be inspected 14 can be detected with high sensitivity.

位相板16による直接光8と回折光9の干渉のさせ方に
よって、すなわち、両光−の位相関係が同位相のとよ、
直接光8による背景コントラスト19は明るいものとな
シ、逆位トuのときに暗いものとなる。ところで、埃等
の異物が被検査物体14上にあるとき、J4wは像面1
7に暗部として検出されるが、背景コントラスト19が
暗いときは検出することができず、逆に背景コントラス
ト19が明るいときは検出できる。しかし、この検出さ
れた異物を被検査物体14上1c微小凹凸欠陥と識別す
ることは困難である。一方、例えば、通常の透過照明あ
るいは落射照明を用いる場合には、微小凹凸欠陥を検出
することはできないが、異物等は容易+C検出すること
ができる。
Depending on how the direct light 8 and the diffracted light 9 are caused to interfere with each other by the phase plate 16, that is, when the phase relationship between the two lights is the same,
The background contrast 19 caused by the direct light 8 is bright, but becomes dark when the object is inverted. By the way, when foreign matter such as dust is on the object to be inspected 14, J4w is
However, when the background contrast 19 is dark, it cannot be detected, and conversely, when the background contrast 19 is bright, it can be detected. However, it is difficult to distinguish the detected foreign matter from the minute unevenness defect 1c on the object to be inspected 14. On the other hand, for example, when normal transmitted illumination or epi-illumination is used, minute unevenness defects cannot be detected, but foreign objects etc. can be easily +C detected.

そこで、位相差顕微鏡光学系と、例えばリンゲス!I、
)12を除去した通過照明(通常顕微鏡)とを併用し、
第5図のように位相差顕微鏡光学系による像面19の背
景コントラストが明るいと#(a)に示す慣出された欠
陥20 、21のうち、通常顕微鏡でも同様に検出され
る欠陥21は異物であシ、検出されない欠陥20は被検
査物体14上の微小凹凸欠陥であると識別できる。第4
図のよ5iC,位相差顕微鏡光学系による像面19の背
景コントラストが暗いとよ(α)に示す検出された欠陥
20は肢検査物体上の微小凹凸欠陥でろり1通常顕微m
Kよって検出される欠陥は異物でるると識別でよる。第
5図および第4図中ハyf”ングが施された部分は視野
中暗い部分を表わす。
Therefore, we developed a phase-contrast microscope optical system and, for example, Ringes! I,
)12 is removed in conjunction with passing illumination (usually a microscope),
As shown in FIG. 5, when the background contrast of the image plane 19 by the optical system of the phase contrast microscope is bright, the defect 20 and 21 shown in #(a), which is detected in the same way by a normal microscope, is a foreign object. Otherwise, the undetected defect 20 can be identified as a minute unevenness defect on the object 14 to be inspected. Fourth
As shown in Figure 5iC, the background contrast of the image plane 19 by the phase contrast microscope optical system is dark.The detected defect 20 shown in (α) is a minute irregularity defect on the limb inspection object.
Defects detected by K are identified as foreign substances. In FIGS. 5 and 4, the portions marked with hyf'' represent dark portions in the field of view.

以下に、図面を参照しながら、実施例を用いて本発明を
一ノ#詳励に説明するが、それらは例示に!ぎず、本発
明の枠を越えることなしにいろいろな変形や改良がろ9
得ることは勿論である。
The present invention will be explained in detail below using examples with reference to the drawings, but these are merely illustrative! However, various modifications and improvements may be made without exceeding the scope of the present invention.
Of course you can get it.

〔発明の実施例〕[Embodiments of the invention]

第1図を参照すれ、ば、透過照明光源10よシ発せられ
た透過R明光25はコレクタレンズ11,9ングス9ッ
ト12.コンゲンチレンズ15’lAって被検査物体1
4 (@気バブルメモリはCPt1GpsOt2等の光
学的にxf!明なりエバ上1c YsF4sCh 2等
の磁性ガーネット透BArl!膜をこの液槽成長させた
ものを基板として作成する。磁気バブルメモリの特性確
保のため、この透明基の凹凸を測定する必要がある。)
を照明する。透明照明光25によって、被検査物体14
から、被検査物体の透過享忙よって生として振幅変調さ
れるis光29と被検査物体の厚さあるいは屈折率によ
って主として位相変調される回折光26が発せられる。
Referring to FIG. 1, the transmitted R bright light 25 emitted from the transmitted illumination light source 10 is transmitted through the collector lens 11.9. Congenchi lens 15'lA is the object to be inspected 1
4 (@Qi bubble memory is made by growing a magnetic garnet transparent BArl! film such as CPt1GpsOt2 etc. in this liquid bath as a substrate. Therefore, it is necessary to measure the unevenness of this transparent base.)
to illuminate. The object to be inspected 14 is illuminated by the transparent illumination light 25.
From this, IS light 29 is amplitude-modulated as a raw material depending on the transmission rate of the object to be inspected, and diffracted light 26 is mainly phase-modulated depending on the thickness or refractive index of the object to be inspected.

直接光29は、位相板16によって4あるいは一÷の位
相変化を受け、吸収膜18によって減衰させられて、回
折光26と干渉でよるように変換される。
The direct light 29 undergoes a phase change of 4 or 1 by the phase plate 16, is attenuated by the absorption film 18, and is converted into interference with the diffracted light 26.

これによシ、テレビカメラ23の像面上に被検査物体の
位相差量に応じたiII淡信号を検出することができる
With this, it is possible to detect an III light signal on the image plane of the television camera 23 according to the amount of phase difference of the object to be inspected.

一方、落射照明光源24による落射照明光28はハーフ
ミラ−221Cよって光軸を曲げられ、対物レンズ15
を通して、被検査物体14を落射照明する。これによる
被検食物体140反射率忙応じた振幅を与えられた反射
光27は、テレビカメラ23によって検出される。
On the other hand, the epi-illumination light 28 from the epi-illumination light source 24 has its optical axis bent by the half mirror 221C, and the objective lens 15
The object to be inspected 14 is illuminated by epi-illumination. The reflected light 27 given an amplitude according to the reflectance of the test food 140 is detected by the television camera 23.

被検査物体14への照明は透過照明光源10と落射照明
光源24を切夛換えることによっていずれかくよって行
なわれ、透明照明光源25を用いた場合には位相差顕微
鏡照明光学系を、落射照明光源22を用いた場合には、
通常の顕微鏡照明法を得ることがでよる。
The object to be inspected 14 is illuminated by either the transmitted illumination light source 10 or the epi-illumination light source 24. When the transparent illumination light source 25 is used, the phase contrast microscope illumination optical system is replaced by the epi-illumination light source. When using 22,
Depends on obtaining normal microscope illumination.

位相板16の選び方によって、背景の明るい前記第3図
あるいは背景の暗い前記第4図のような画像をテレビカ
メラ23で検出でよる。第3図の場合忙は、位相差顕微
鏡光学系で得られる第5図(4)と通常顕微鏡の照明で
得られる第3図(4)の両者に存在する特異点21は埃
等の異物でろ)、(りのみに存在する特異点20は微小
凹凸欠陥であると判定できる。第4図の場合には、位相
差顕微鏡光学系で得られる特異点(eL)は、微小凹凸
欠陥であシ、通常顕微鏡の照明で得られる特異点(J)
は埃等の異物である、と判定できる。
Depending on how the phase plate 16 is selected, an image as shown in FIG. 3 with a bright background or as shown in FIG. 4 with a dark background can be detected by the television camera 23. In the case of Fig. 3, the singular point 21 that exists in both Fig. 5 (4) obtained with the phase contrast microscope optical system and Fig. 3 (4) obtained with the illumination of a normal microscope may be a foreign object such as dust. ), (It can be determined that the singular point 20 present in Rinoki is a minute unevenness defect. In the case of Fig. 4, the singular point (eL) obtained by the phase contrast microscope optical system is a minute unevenness defect. , the singularity (J) obtained under normal microscope illumination
can be determined to be foreign matter such as dust.

以上の実施例では位旧差顕微境照明と通常顕微鏡の落射
照明とを組み合わせたが、位相差顕微鏡照明と組み合わ
せる通常顕微腕の照明法は池の照明法でもよく、例えば
透過層FJAあるいは暗携舒照萌あるいは微分干渉顕微
鏡との組み合F)讐であってもよい。
In the above embodiment, the phase-contrast microscope field illumination and the epi-illumination of the normal microscope were combined, but the illumination method of the normal microscope arm in combination with the phase-contrast microscope illumination may be the pond illumination method, for example, the transparent layer FJA or the dark microscope arm illumination method. Combination with Shuzhaomeng or differential interference microscope F) May be the enemy.

〔゛発明の効果〕[Effect of invention]

以上説明した通り、本発に!AVcよれば、通常の顕微
鏡では識別不0T能な光学的に透明な被検査物体上の微
小凹凸欠陥を高感度に検出でよるとともに、上記欠陥と
埃等の異物とを識別することができるという効果が得ら
れる。
As explained above, let's get started! According to AVc, it is capable of highly sensitively detecting minute irregularities defects on optically transparent objects to be inspected that cannot be identified with normal microscopes, and can also distinguish between these defects and foreign objects such as dust. Effects can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による表面欠陥検査方法を実施するため
の装置の図式図、第2図は位泪差顕微虜光学系の構成を
示す図式図、第3図(a)。 (−I!−)および第4図CG)、C4)はそれぞれ位
…差顕微跳光学系および通常顕微鏡で観察される儂を示
す図、第5図は従来の式面欠陥検査方法で使用されてい
る干渉光学系の(S成を示す図式図、第6図は第5図に
示す光学系の中で使用される対物レンズの模式図である
。 10・・・透過照明光源、11・・・コンタクトレンズ
、12・・・9ングスy、ト、15・・・コンタクトレ
ンズ、14・・・被検査物体、15・・・対物レンズ、
16・・・位相板、17・・・像面、18・・・技収膜
、19・・・背景コントラスト、20・・・微小凹凸欠
陥の慮、21・・・埃などの異物の像、22・・・ハー
フミラ−123・・・テレビカメラ、24・・・落射照
明光源、25・・・透過照明光、26・・・回折光、2
7・・・反射光、28・・・落射照明光、29・・・直
接光。
FIG. 1 is a schematic diagram of an apparatus for carrying out the surface defect inspection method according to the present invention, FIG. 2 is a schematic diagram showing the configuration of a phase difference microscope optical system, and FIG. 3(a). (-I!-) and Figures 4 (CG) and C4) are respectively... Diagrams showing the images observed with a differential microscope jump optical system and a normal microscope, and Figure 5 shows the images used in the conventional surface defect inspection method. FIG. 6 is a schematic diagram showing the (S configuration) of the interference optical system shown in FIG. 5. 10... transmitted illumination light source, 11...・Contact lens, 12...9 lengths, 15...Contact lens, 14...Object to be inspected, 15...Objective lens,
16... Phase plate, 17... Image plane, 18... Technique recording film, 19... Background contrast, 20... Consideration of minute unevenness defects, 21... Image of foreign matter such as dust, 22... Half mirror 123... Television camera, 24... Epi-illumination light source, 25... Transmitted illumination light, 26... Diffracted light, 2
7... Reflected light, 28... Epi-illumination light, 29... Direct light.

Claims (1)

【特許請求の範囲】 1、位相差顕微鏡光学系を用い、被検査物体の微小凹凸
を濃淡画像に変換し、欠陥として検出することを特徴と
する、光学的に透明な被検査物体上の微小凹凸欠陥検査
方法。 2、上記位相差顕微鏡光学系を用いて検出された微小凹
凸と通常顕微鏡を用いて検出された異物を組み合わせる
ことによって凹凸欠陥のみを検出することを特徴とする
特許請求の範囲第1項記載の表面欠陥検査方法。
[Claims] 1. Microscopic irregularities on an optically transparent object to be inspected, characterized in that a phase-contrast microscope optical system is used to convert minute irregularities on the object to be inspected into a grayscale image and to detect them as defects. Unevenness defect inspection method. 2. Only unevenness defects are detected by combining minute unevenness detected using the phase contrast microscope optical system and foreign matter detected using a normal microscope. Surface defect inspection method.
JP59186325A 1984-09-07 1984-09-07 Surface defect inspection method Expired - Lifetime JPH0613963B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59186325A JPH0613963B2 (en) 1984-09-07 1984-09-07 Surface defect inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59186325A JPH0613963B2 (en) 1984-09-07 1984-09-07 Surface defect inspection method

Publications (2)

Publication Number Publication Date
JPS6165107A true JPS6165107A (en) 1986-04-03
JPH0613963B2 JPH0613963B2 (en) 1994-02-23

Family

ID=16186363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59186325A Expired - Lifetime JPH0613963B2 (en) 1984-09-07 1984-09-07 Surface defect inspection method

Country Status (1)

Country Link
JP (1) JPH0613963B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS636442A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Method and device for foreign matter inspection
JPS636443A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign matter inspection device
JPS636444A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign matter inspection device
JPS636854A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign substance inspection apparatus
WO2014115871A1 (en) * 2013-01-28 2014-07-31 横浜リーディングデザイン合資会社 Optical system, phase plate used in optical system, and method for manufacturing optical system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS636442A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Method and device for foreign matter inspection
JPS636443A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign matter inspection device
JPS636444A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign matter inspection device
JPS636854A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign substance inspection apparatus
WO2014115871A1 (en) * 2013-01-28 2014-07-31 横浜リーディングデザイン合資会社 Optical system, phase plate used in optical system, and method for manufacturing optical system
JP2014145839A (en) * 2013-01-28 2014-08-14 Yokohama Leading Design Co Ltd Optical system, phase plate employing optical system and optical system manufacturing method

Also Published As

Publication number Publication date
JPH0613963B2 (en) 1994-02-23

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