JPS6163923A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JPS6163923A
JPS6163923A JP18543784A JP18543784A JPS6163923A JP S6163923 A JPS6163923 A JP S6163923A JP 18543784 A JP18543784 A JP 18543784A JP 18543784 A JP18543784 A JP 18543784A JP S6163923 A JPS6163923 A JP S6163923A
Authority
JP
Japan
Prior art keywords
protective layer
recording medium
magnetic recording
film
silicone resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18543784A
Other languages
Japanese (ja)
Inventor
Yoichi Nanba
洋一 南波
Itsuaki Matsuda
松田 五明
Shoji Aoki
青木 昭二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP18543784A priority Critical patent/JPS6163923A/en
Publication of JPS6163923A publication Critical patent/JPS6163923A/en
Pending legal-status Critical Current

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  • Paints Or Removers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To improve the scratching resistance, etc. of a magnetic recording medium having a protective layer on a thin magnetic film and to improve the workability in a stage for forming the protective layer by using a ladder type silicone resin film as the protective layer. CONSTITUTION:The silicone resin having ladder structure is prepd. by heating the flaky material of an organosiloxane oligomer having the structure expressed by the formula (R is alkyl, phenyl; n is 2-20) and having 500-5000mol.wt. or heating the same in the presence of an acidic catalyst. Such ladder type silicone resin is dissolved in a soln. of n-buranol, etc. and the soln. is coated by spin coating etc. on the thin magnetic film formed directly or indirectly on a substrate and is then calcined to form the protective layer, by which the intended magnetic recording medium is obtd.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、磁気記録媒体に係り、より詳細には、磁気デ
ィスク装置、磁気ドラム装置等の磁気記憶装置に用いら
れるもので1表面に保護層を備えた磁気記録媒体に関す
る。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a magnetic recording medium, and more particularly, it is used in magnetic storage devices such as magnetic disk devices and magnetic drum devices, and is a medium having a protective layer on one surface. The present invention relates to a magnetic recording medium provided with a magnetic recording medium.

(従来技術) 一般にこの種の磁気記憶装置では、記録再生用磁気ヘッ
トと磁気記録媒体とを利用して種々の方式の下で記録再
生が行われている。いずれの方式によっても、記録再生
用磁気ヘッドと磁気記録媒体は互に静的或いは動的接触
乃至抑圧下で利用されるため、接触摩擦状態が現出する
ので、磁気記録媒体の金kJt基盤上に形成されている
磁性薄膜を保護するべく1表面に保δ皮膜を被覆して保
護層を形成する必要がある。
(Prior Art) Generally, in this type of magnetic storage device, recording and reproduction are performed using various methods using a magnetic head for recording and reproduction and a magnetic recording medium. In either method, the recording/reproducing magnetic head and the magnetic recording medium are used in static or dynamic contact with each other or under pressure, so a contact friction condition appears, so the gold kJt substrate of the magnetic recording medium In order to protect the magnetic thin film formed on the magnetic thin film, it is necessary to form a protective layer by coating one surface with a δ-retaining film.

この保護層は、その目的とするところから、いわゆる耐
ヘッドクラツシユ性、耐摩耗性、潤滑性、耐高温高湿性
、対磁気特性非影響性等々の特性を具備していなければ
ならないものである。
Because of its purpose, this protective layer must have properties such as so-called head crush resistance, wear resistance, lubricity, high temperature and high humidity resistance, and no influence on magnetic properties. .

従来、このような保護皮膜としては、5iO23スパツ
タ法により磁気記録媒体の表面に形成するスパッタ膜が
用いられていた。しかし、このスパッタ法では対ヘツド
クラッシュ性等に欠ける皮膜しか得られず、技術的にも
問題があった。この点、最近に至って、テトラヒドロキ
シシラン溶液を塗布・焼成してポリ珪酸皮膜を形成する
技術が開発され、一応の成果をあげている(特開昭52
−20804)。
Conventionally, as such a protective film, a sputtered film formed on the surface of a magnetic recording medium by a 5iO23 sputtering method has been used. However, this sputtering method only yields a film that lacks head crush resistance and is technically problematic. In this regard, a technology has recently been developed to form a polysilicate film by coating and baking a tetrahydroxysilane solution, and has achieved some success (Japanese Unexamined Patent Application Publication No. 52-2011).
-20804).

しかし、このポリ珪酸皮膜形成法は、形成されたポリ珪
酸皮膜自体では前述の諸特性の酊で効果をあげてはいる
ものの、皮膜形成工程の曲で問題があり、取扱いにくい
欠点がある。すなわち、ポリ珪酸はテトラヒドロキシシ
ランの脱水縮合重合により製造されるが、テトラヒドロ
キシシランは非常に活性であり、エチルアルコール及び
ブチルアルコールの溶媒を用いたアルコール溶液として
おかなければならず、保存期間が約3ケ月位で短かく、
反応が起こり変質し易い。また、ポリ珪酸中に残存する
未反応シラノール基を減少させるへく焼成温度を高くし
ないと性能が発揮し難く、逆に高温化により磁性皮膜に
磁気変態をもたらす危険性がある。更には、塗布に際し
ては、アルコール溶媒の蒸発に伴いポリ珪酸が形成され
ていくので、粘性1表面張力、薄膜厚化等々の制御が難
がしい。
However, although this method of forming a polysilicate film is effective due to the above-mentioned characteristics of the polysilicate film itself, there are problems in the process of forming the film and it is difficult to handle. That is, polysilicic acid is produced by dehydration condensation polymerization of tetrahydroxysilane, but tetrahydroxysilane is very active and must be prepared as an alcohol solution using ethyl alcohol and butyl alcohol as solvents, resulting in a long shelf life. It is short, about 3 months,
Reactions occur and the quality changes easily. In addition, unless the firing temperature is increased to reduce unreacted silanol groups remaining in the polysilicic acid, it is difficult to exhibit performance, and conversely, there is a risk that increasing the temperature will cause magnetic transformation in the magnetic film. Furthermore, during coating, polysilicic acid is formed as the alcohol solvent evaporates, making it difficult to control viscosity, surface tension, film thickness, etc.

(発明の目的) 本発明は、このような従来の保護皮膜形成に伴う欠点を
解消し、保護層として良好な諸特性を作業性(使い易さ
)よく具備でき、特に工業的生産性の優れた磁気記録媒
体を提供することを目的とするものである。
(Objective of the Invention) The present invention eliminates the drawbacks associated with the formation of a conventional protective film, provides various good properties as a protective layer with good workability (ease of use), and has particularly excellent industrial productivity. The object of the present invention is to provide a magnetic recording medium with a high degree of compatibility.

(発明の構成) か\る目的達成のため、各種コーテイング材及びその使
い易さについて実験研究を重ねた結果、シリコーン樹脂
の適用可能性に着目し、中でもラダー(梯子)型シリコ
ーン樹脂の皮膜の利用が実用上可能であることを見い出
した。
(Structure of the Invention) In order to achieve the above object, as a result of repeated experimental research on various coating materials and their ease of use, we focused on the applicability of silicone resins, and in particular, developed a ladder-type silicone resin coating. We have found that it is practically possible to use this method.

ラダー型シリコーン樹脂は、次の構造を有する分子量5
o○〜5000のオルガノシロキサンオリゴマーのフレ
ーク状物質を加熱又は酸性触媒存在下で加熱することに
よって得られるラダー状構造をもつ不溶、不融のポリマ
ーである。
Ladder type silicone resin has the following structure with a molecular weight of 5
It is an insoluble, infusible polymer with a ladder-like structure obtained by heating a flake-like substance of an organosiloxane oligomer having a molecular weight of 0 to 5,000 by heating or heating in the presence of an acidic catalyst.

(但し、Rはアルキル基又はフェニル基で、n=2〜2
0) そして、Rの態様によって、RがCH,基である場合、
各種比率でのCH,基及びCGH9基である場合、C,
H,基である場合等々の種類があり、特長としては、■
フレーク状で、アルコール、芳香族炭化水素、エステル
系等多くの溶媒に可溶であり、■低粘度であって、スプ
レーコーティング等々の各種操作を容易に行うことがで
き、■2゜O′C以下のように低温、短時間での加熱(
焼成)によって硬化する熱硬化性樹脂であり、■保存は
単に冷暗所(5°C)におくだけで、変質しない、1の
硬化コーティング膜厚は硬化条件により任意に決められ
る、■硬化物は耐熱性が著しく優れており。
(However, R is an alkyl group or a phenyl group, and n=2-2
0) And, depending on the aspect of R, when R is a CH, group,
CH, groups and CGH9 groups in various ratios, C,
There are different types such as H, groups, etc., and the features are: ■
It has a flake shape and is soluble in many solvents such as alcohol, aromatic hydrocarbons, and esters. ■It has a low viscosity and can be easily subjected to various operations such as spray coating. ■2°O'C Heating at a low temperature and for a short time as shown below (
It is a thermosetting resin that hardens by firing), ■ It will not change in quality simply by storing it in a cool, dark place (5°C). The thickness of the cured coating in 1 can be determined arbitrarily depending on the curing conditions. ■ The cured product is heat resistant. It has outstanding properties.

RとしてC,H,基が多い程耐熱性が高くなり、CN3
基が多い程硬度が高くなり、■鉄、アルミニューム等々
の金属との接着性に優れ、■硬化物は電気絶縁性、耐候
性、耐食性などに優れ、(Φ硬化コーティング面はガラ
スライクで、硬度、耐擦傷性等に優れている。
The more C, H, groups there are in R, the higher the heat resistance becomes.
The more groups there are, the higher the hardness. ■ Excellent adhesion with metals such as iron and aluminum. ■ The cured product has excellent electrical insulation, weather resistance, and corrosion resistance. (Φ The cured coating surface is glass-like, Excellent hardness, scratch resistance, etc.

本発明者らは、この樹脂を磁気記録媒体にコーティング
(スピンコーティング)する際の1渚条件について実験
し、最適条件を調らへた。まず、溶媒は、基盤上に吐出
された溶液が蒸発する駁を最少に抑えて均一に薄膜をコ
ーティングするために、n−ブタノール(沸点118°
C)のみとした。また、溶液濃度は、第1表に示すよう
に、低濃度の方が硬度があり、薄くコーティングでき、
0.5 w t%が好ましい。
The present inventors conducted an experiment on single-coat conditions when coating (spin coating) this resin on a magnetic recording medium, and determined the optimum conditions. First, the solvent was n-butanol (boiling point 118°
Only C) was used. As for the solution concentration, as shown in Table 1, the lower the concentration, the harder it is and the thinner the coating.
0.5 wt% is preferred.

焼成は、第2表に示す実験結果より、高温で長い時間処
理する程有利であるが、磁性薄膜上に非磁性材(Ni〜
P層)を被覆する場合があるときの強磁性化を考慮して
、200″C,lhrが好ましい。なお、この焼成条件
の下では、磁性変態が生じないことを確認した。
According to the experimental results shown in Table 2, firing is more advantageous if it is treated at a higher temperature for a longer time.
In consideration of ferromagnetization in the case of coating a P layer), 200''C, lhr is preferable.It was confirmed that no magnetic transformation occurred under these firing conditions.

(以下余白) 滴下量 約0.5 mQ 焼成(200℃X 1hr) 引掻試験: JISK6718による(サファイヤ針使
用)判定方法:0 傷なし Δ 浅く傷つく × 深く傷つく 第1表の(注)参照。
(Leaving space below) Dropped amount: Approximately 0.5 mQ Firing (200°C x 1 hr) Scratch test: JISK6718 (using sapphire needle) Judgment method: 0 No scratch Δ Shallow scratch × Deep scratch See (note) in Table 1.

但し、溶液濃度は0゜5νt% また、滴下方法は、200〜3000rpmの基盤回転
数で行うのが望ましい。20 OrPm未ii+liで
滴下すると遠心力が不足して溶液が外側へよく広がらず
、高速回転後にムラ、放射状の縞模様が生じ易い。
However, the solution concentration is 0°5vt%. Furthermore, the dropping method is preferably performed at a base rotation speed of 200 to 3000 rpm. If the solution is dropped at 20 OrPm (ii+li), centrifugal force is insufficient and the solution does not spread outward well, and unevenness and radial striped patterns are likely to occur after high-speed rotation.

以上の実験結果より、n−ブタノールを溶媒として濃度
0 、5 wt%の溶液を基盤回転数300゜rpn+
の下に冴下し、200℃X1hrの焼成を行うのが好ま
しい。これにより耐引掻試験荷重60g相当でも傷がつ
かない0.08μm以下の膜厚が可能となる。
From the above experimental results, a solution of n-butanol as a solvent with a concentration of 0 and 5 wt% was prepared at a substrate rotation speed of 300°rpn+.
It is preferable to remove the powder under 200° C. and bake at 200° C. for 1 hr. This enables a film thickness of 0.08 μm or less that does not cause scratches even under a scratch resistance test load of 60 g.

(実施例) ディスク状アルミニウム合金円盤(外径130mm、内
径40mm)上にN1−P非磁性合金を約50μmの厚
さにメッキし、このN1−Pメッキ膜を機械的研磨によ
り鏡面仕上げした後、その上にCo−N1−Pの磁性合
金を約0.05〜0.08 μmの厚さにメッキした。
(Example) After plating N1-P nonmagnetic alloy to a thickness of about 50 μm on a disc-shaped aluminum alloy disk (outer diameter 130 mm, inner diameter 40 mm), and mechanically polishing this N1-P plating film to a mirror finish. A magnetic alloy of Co-N1-P was plated thereon to a thickness of about 0.05 to 0.08 μm.

更にその上に以下に示す各種の保護膜形成材を回転塗布
法によりコーティングした。
Furthermore, various protective film forming materials shown below were coated thereon by a spin coating method.

叉11引Y 前記ディスク状円盤を20Orpmで回転させながら、
ラダー型シリコーンオリゴマー溶液(Owens−fQ
ffinois社グラスレジンGR650のn−ブタノ
ール中、0.5wt%溶液)0.4mQを内径周囲部に
滴下させ、溶液か遠心力によりディスク状円盤の外側へ
十分法がった後、高速回転させ、約0.08μmの膜厚
の皮1膜が形成された。これを室温(25℃)でしばら
(放置した後、200°C,lhr焼成し、シリコン糸
探51!股をディスク状円盤上に形成した。
Fork 11 pull Y While rotating the disk-shaped disc at 20 Orpm,
Ladder type silicone oligomer solution (Owens-fQ
0.4 mQ of a 0.5 wt% solution of Ffinois Glass Resin GR650 in n-butanol was dropped around the inner diameter, and after the solution was sufficiently moved to the outside of the disc by centrifugal force, it was rotated at high speed. One film with a thickness of about 0.08 μm was formed. This was left at room temperature (25° C.) for a while and then fired at 200° C. for 1 hour to form a silicon yarn probe 51! crotch on a disc-shaped disk.

実施例2 同様にディスク状円盤を20Orpmで回転させながら
、ラダー型シリコーンオリゴマー溶液(○wens−I
QQinois社クラスレジンGR650のn−ブタノ
ール中、0.5wt%ン容液)0.2mQを内径周囲部
から外径へ半径方向に移動させながら滴下させ、ディス
ク状円盤上に溶液が十分法がった後、実施例1と同様に
して、高速回転、焼成、保護膜形成を行った。
Example 2 While rotating the disk-shaped disc at 20 rpm, a ladder-type silicone oligomer solution (○wens-I
0.2 mQ of QQinois class resin GR650 in n-butanol (0.5 wt% solution) was dropped while moving in the radial direction from the inner circumference to the outer diameter until the solution was sufficiently spread on the disk-shaped disc. After that, high-speed rotation, baking, and protective film formation were performed in the same manner as in Example 1.

ル虜UしL 実施例1と同様の方法により、ポリ珪酸Si(○H)4
(東京応化10 C、Dのn−ブタノ7−ル中。
By the same method as in Example 1, polysilicate Si(○H)4
(Tokyo Ohka 10 C, D in n-butanol 7-ol.

0.5wt%溶液)0.4mQを塗布し、ディスク状円
盤上に保護膜を形成した。
0.4 mQ of 0.5 wt% solution) was applied to form a protective film on the disc-shaped disc.

比較例2 実施例1と同様の方法により、ハードコーティング用シ
リコーンワニス(東芝シリコーン製トスガード510の
n−ブタノール中、0 、5 wt%溶液)0.4mQ
を塗布し、ディスク状円盤」二に保31F、iを形成し
た。
Comparative Example 2 0.4 mQ of silicone varnish for hard coating (0.5 wt% solution of Toshiba Silicone Tosguard 510 in n-butanol) was prepared in the same manner as in Example 1.
was applied to form a disc-shaped disk 31F, i.

坊較例3 実施例1と同様の方法により、比較例2で用いたものよ
りもより低温で硬化するシリコーンワニス(東芝シリコ
ーン製トスガード520のn−フタノール中、0.5w
t%溶液)0.4m立を塗布し、ディスク状円盤上に保
5膜を形成した。
Comparative Example 3 A silicone varnish that cures at a lower temperature than that used in Comparative Example 2 (0.5 w in n-phthanol of Toshiba Silicone Tosguard 520) was prepared using the same method as in Example 1.
t% solution) was applied in an amount of 0.4 mL to form a 5-layer film on a disc-shaped disc.

以上の各実験例により保護1漠を形成した各ディスク状
円盤について、JISK6718に基づき(0,05R
のサファイヤ針使用)引掻試験を行った。その結果を第
3表に示す。
Based on JISK6718, (0,05R
A scratch test was conducted using a sapphire needle. The results are shown in Table 3.

同表に示す試験結果よりわかるように、本発明のいずれ
の実施例の39合にも、耐引掻試験荷重が60gまでは
表面に全く儂が発生しておらず、ラダー型シリコーン樹
脂は、既述の特長と相俟って、優れた特性を示し、使い
易さも優れている。なお、実施例2は実施例1に比らべ
て塗布量が異なるが、滴下法も変えたため、同等の結果
を示している。
As can be seen from the test results shown in the same table, no scratches were generated on the surface of any of the 39 examples of the present invention up to a scratch resistance test load of 60 g, and the ladder type silicone resin Combined with the features mentioned above, it exhibits excellent properties and is easy to use. Although Example 2 differs in the amount of coating compared to Example 1, it shows the same results because the dropping method was also changed.

これに対し、ポリ珪酸皮膜を形成した比較例1の場合は
、耐引掻試験で本発明の各実施例と同等の結果を示して
はいるものの、取扱いにくいという欠点がある。また、
比較例2及び3は僅かの荷重で引掻傷が発生してしまう
ことを示している。
On the other hand, in the case of Comparative Example 1 in which a polysilicate film was formed, although it showed the same results as each of the examples of the present invention in the scratch resistance test, it had the disadvantage of being difficult to handle. Also,
Comparative Examples 2 and 3 show that scratches occur with a slight load.

(以下余白) (注)判定方法:第1表の(注)に同じ(発明の効果) 以−ヒ詳述したことから明らかなように、本発明によれ
ば、磁気記録媒体の保3層としてラダー型シリコーン樹
脂皮膜を用いるので、優れた諸特性の保護層を可能にし
、しかもその形成技術面での使い易さく作業性)も優れ
ているので、実用的効果は大きい。
(Leaving space below) (Note) Judgment method: Same as (note) in Table 1 (Effect of the invention) As is clear from the detailed description below, according to the present invention, the third layer of the magnetic recording medium Since a ladder-type silicone resin film is used as a protective layer, it is possible to form a protective layer with excellent properties, and its formation technology is also easy to use (and workable), so it has great practical effects.

Claims (1)

【特許請求の範囲】[Claims] 基盤上に直接若しくは間接的に磁性薄膜を被覆し、該磁
性薄膜上に保護層を有する磁気記録媒体において、前記
保護層としてラダー型シリコーン樹脂皮膜を用いてなる
ことを特徴とする磁気記録媒体。
1. A magnetic recording medium comprising a substrate directly or indirectly coated with a magnetic thin film and a protective layer on the magnetic thin film, characterized in that the protective layer is a ladder-type silicone resin film.
JP18543784A 1984-09-06 1984-09-06 Magnetic recording medium Pending JPS6163923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18543784A JPS6163923A (en) 1984-09-06 1984-09-06 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18543784A JPS6163923A (en) 1984-09-06 1984-09-06 Magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS6163923A true JPS6163923A (en) 1986-04-02

Family

ID=16170773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18543784A Pending JPS6163923A (en) 1984-09-06 1984-09-06 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS6163923A (en)

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