JPH027226A - Production of magnetic disk substrate - Google Patents
Production of magnetic disk substrateInfo
- Publication number
- JPH027226A JPH027226A JP15845088A JP15845088A JPH027226A JP H027226 A JPH027226 A JP H027226A JP 15845088 A JP15845088 A JP 15845088A JP 15845088 A JP15845088 A JP 15845088A JP H027226 A JPH027226 A JP H027226A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- synthetic resin
- good solvent
- solvent
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000002904 solvent Substances 0.000 claims abstract description 34
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 28
- 239000000057 synthetic resin Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims description 10
- 230000008961 swelling Effects 0.000 abstract description 3
- 238000006467 substitution reaction Methods 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical group ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004697 Polyetherimide Substances 0.000 description 3
- 239000006061 abrasive grain Substances 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229920001601 polyetherimide Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 239000013585 weight reducing agent Substances 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical group ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、合成樹脂からなる磁気ディスク基板の製造方
法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic disk substrate made of synthetic resin.
［従来の技術］
従来、磁気ディスクを搭載した磁気ディスク装置におい
ては、磁気ディスクが停止している時には、磁気ヘッド
は磁気ディスクの表面に接触した状態にあり、磁気ディ
スクが平滑な表面に形成されていると、上記停止時に磁
気ディスクと磁気ヘッドが密着してしまい、磁気ディス
クの回転起動時に大きなトルクが必要となるばかりでな
く、磁気ディスクと磁気ヘッドとの摩擦抵抗が大きくな
るため、磁気ディスクの摩耗が激しくなり、磁気記録層
の破壊にいたることがある。[Prior Art] Conventionally, in a magnetic disk device equipped with a magnetic disk, when the magnetic disk is stopped, the magnetic head is in contact with the surface of the magnetic disk, and the magnetic disk is formed on a smooth surface. If the magnetic disk is stopped, the magnetic disk and the magnetic head will come into close contact with each other, and not only will a large torque be required to start the rotation of the magnetic disk, but also the frictional resistance between the magnetic disk and the magnetic head will increase, causing the magnetic disk to The wear of the magnetic recording layer may become severe, leading to destruction of the magnetic recording layer.
そこで、これらの課題を解決するため、特開昭６１−２
９４１８号公報に記載されているように、磁気ディスク
の表面に微細な凹凸を形成することが検討されている。Therefore, in order to solve these problems,
As described in Japanese Patent No. 9418, it has been considered to form fine irregularities on the surface of a magnetic disk.
また、従来より磁気ディスクはアルミニウム合金の円板
からなる基板上に磁性体層を形成している。この基板に
は各種の高レベルな品質が要求され、そのためにアルミ
ニウム合金の円板は熱処理により歪を矯正し、さらにそ
の表面をダイヤモンド切削または砥粒によるラッピング
、およびポリッシング等により研磨して仕上げていた。Furthermore, conventionally, magnetic disks have a magnetic layer formed on a substrate made of an aluminum alloy disk. Various high-level qualities are required for this substrate, and to achieve this, the aluminum alloy disk is heat-treated to correct distortion, and its surface is finished by diamond cutting, lapping with abrasive grains, and polishing. Ta.
近年、磁気ディスク装置の小型化、記憶容量の高容量化
等の要求が益々高まりつつある。さらに、軽量化に対す
る要求も益々高まりつつある。In recent years, there has been an increasing demand for smaller magnetic disk drives and higher storage capacity. Furthermore, the demand for weight reduction is also increasing.
特に、軽量化の要求に対応する目的で特開昭５９−１３
５１３３号公報に記載されているように、磁気ディスク
基板を合成樹脂で形成することが検討されている。In particular, for the purpose of responding to the demand for weight reduction,
As described in Japanese Patent No. 5133, it has been considered to form a magnetic disk substrate from synthetic resin.
［発明が解決しようとする課題］
特開昭６１−２９４１８号公報記載の発明では、アルミ
ニウム等の基板の表面を砥粒あるいはテクスチャリング
等により研磨して、表面に微細な凹凸を形成し、この上
にスパック法等により磁性記録層を形成することが提案
されている。しかし、この方法による場合には、製造さ
れた磁気ディスク基板はその一枚毎に凹凸の大きさ、形
状、および分布状態が異なることを避けることが難しく
不良品が発生することが多かった。さらにこの研磨によ
る方法は粗削り、粗仕上げ、微細仕上げという複数の工
程からなり、−枚の磁気ディスク基板を製造するのに、
かなりの時間を要した。[Problems to be Solved by the Invention] In the invention described in JP-A-61-29418, the surface of a substrate made of aluminum or the like is polished by abrasive grains or texturing to form fine irregularities on the surface. It has been proposed to form a magnetic recording layer thereon by a spuck method or the like. However, when this method is used, it is difficult to avoid variations in the size, shape, and distribution of unevenness from one magnetic disk substrate to another, which often results in defective products. Furthermore, this polishing method consists of multiple steps of rough cutting, rough finishing, and fine finishing, and in order to manufacture -1 magnetic disk substrate,
It took quite a while.
アルミニウム合金に替えて、合成樹脂を磁気ディスク基
板に用いる場合には、アルミニウム合金に比べて軽量で
あり、しかも射出成形等により一工程で平滑性、平面性
等のすぐれた安価な磁気ディスク基板を安定に量産でき
る等の利点がある。When synthetic resin is used for magnetic disk substrates instead of aluminum alloys, it is lighter than aluminum alloys, and it is possible to produce inexpensive magnetic disk substrates with excellent smoothness and flatness in one process using injection molding, etc. It has advantages such as stable mass production.
しかし、特開昭５９−１３５１３３号公報記載の合成樹
脂からなる基板に上記と同様の研磨を施すと、合成樹脂
は金属に比べ、その表面硬度が低いため、硬い砥粒で比
較的柔らかい合成樹脂の表面が削られることとなり、表
面に形成される凹凸が大きくなり過ぎたり、基板が変形
したりして、磁気ディスクに仕上げたときに、記録再生
特性が不満足となることが多かった。However, when a substrate made of synthetic resin described in JP-A-59-135133 is polished in the same manner as above, the synthetic resin has a lower surface hardness than metal, so the hard abrasive grains are used to remove the relatively soft synthetic resin. The surface of the magnetic disk is scraped, the unevenness formed on the surface becomes too large, the substrate is deformed, and when the magnetic disk is finished, the recording and reproducing characteristics are often unsatisfactory.
本発明は、上記従来の課題を解決し、磁気ヘッドが吸着
することがない磁気ディスク用の合成樹脂からなる基板
を提供することを目的とするものである。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems and to provide a substrate made of synthetic resin for magnetic disks that does not attract magnetic heads.
［課題を解決するための手段］
本発明の要旨は、合成樹脂からなる磁気ディスク基板の
表面に前記合成樹脂を溶解もしくは膨潤しうる溶媒（以
下、良溶媒という。）を接触させ、前記磁気ディスク基
板の表面に微細な凹凸を形成することを特徴とする磁気
ディスク基板の製造方法にある。[Means for Solving the Problems] The gist of the present invention is to contact the surface of a magnetic disk substrate made of synthetic resin with a solvent (hereinafter referred to as a good solvent) that can dissolve or swell the synthetic resin, A method of manufacturing a magnetic disk substrate is characterized in that fine irregularities are formed on the surface of the substrate.
本発明において用いる合成樹脂としては、ポリエーテル
イミド、ポリエーテルサルホン、ポリフェニレンサルフ
ァイド、ボリアリレート、ポリエーテルエーテルケトン
、ポリカーボネート等の耐熱性にすぐれた合成樹脂を好
適に用いることができる。さらに、必要に応じて無機質
充填材、例えば、チタン酸カリウムウィスカ、炭素繊維
、５ｉ−Ｃ＠維、アルミナ繊維等のセラミック繊維、ガ
ラス繊維、金属繊維等の繊維状物質、ガラスピーズ、セ
ラミック粉末、カーボン、マイカ等々を適宜添加しても
よい。As the synthetic resin used in the present invention, synthetic resins with excellent heat resistance such as polyetherimide, polyethersulfone, polyphenylene sulfide, polyarylate, polyetheretherketone, and polycarbonate can be suitably used. Furthermore, if necessary, inorganic fillers such as potassium titanate whiskers, carbon fibers, ceramic fibers such as 5i-C@fibers and alumina fibers, fibrous substances such as glass fibers and metal fibers, glass beads, ceramic powders, Carbon, mica, etc. may be added as appropriate.
また、本発明において用いる溶媒としては、用いる合成
樹脂の良溶媒を使用する。また、この良溶媒に、該良溶
媒に対しては相溶性が良好で、かつ合成樹脂に対しては
溶解性もしくは膨潤性を示さない溶媒（以下、貧溶媒と
いう。）を混合して、混合溶媒となし合成樹脂に対する
溶解度もしくは膨潤度を調整してもよい。例えば、合成
樹脂として、ポリエーテルイミド樹脂を用いる場合には
、好ましい良溶媒としては、クロロフォルム、１゜１．
２−）リクロロエタン、メチレンジクロライド、メチル
エチルケトン等の溶媒が挙げられる。Further, as the solvent used in the present invention, a good solvent for the synthetic resin used is used. In addition, a solvent (hereinafter referred to as a poor solvent) that has good compatibility with the good solvent and does not show solubility or swelling properties for the synthetic resin is mixed with this good solvent. The solubility or swelling degree in the solvent and the synthetic resin may be adjusted. For example, when polyetherimide resin is used as the synthetic resin, a preferable good solvent is chloroform, 1.1.
2-) Solvents such as dichloroethane, methylene dichloride, and methyl ethyl ketone can be mentioned.
また、例えば、合成樹脂として、ポリエーテルサルホン
樹脂を用いる場合には、好ましい良溶媒としては、クロ
ロフォルム、１，１．２−）ＩＪクロロエチレン、１，
２−ジクロルエタン、酢酸エチル、ジエチルエーテル、
メチルエチルケトン、シクロヘキサノン、アセトン等の
溶媒が挙げられる。For example, when polyether sulfone resin is used as the synthetic resin, preferable good solvents include chloroform, 1,1.2-)IJ chloroethylene, 1,
2-dichloroethane, ethyl acetate, diethyl ether,
Examples include solvents such as methyl ethyl ketone, cyclohexanone, and acetone.
本発明において合成樹脂からなる磁気ディスク基板の表
面に良溶媒を接触させる方法としては、溶媒中に基板を
浸漬させる方法、スピンコード法等で塗布する方法が用
いられるが、溶媒を接触させ得る方法であればよく、特
に制限するものではない。In the present invention, as a method for bringing a good solvent into contact with the surface of a magnetic disk substrate made of synthetic resin, a method of dipping the substrate in a solvent, a method of coating by a spin code method, etc. are used, but methods that allow contact with a solvent are used. There is no particular restriction as long as it is acceptable.
また、本発明においては、基板表面に形成される凹凸は
その表面粗さを中心線平均粗さ（以下、Ｒａという。）
で表すと、０．００３〜０．０５μｍが好ましい。Ｒａ
が０．００３μｍ以下であると、その基板に磁性記録層
を形成した磁気ディスクは停止時には磁気ヘッドがその
表面に吸着し易く、回転起動時には磁気ヘッドとの摩擦
抵抗が大きくなり、その結果、磁気ディスクが摩耗し易
くなる。また、Ｒａが０．０５μｍを越えると、磁気デ
ィスクとして使用した際に、磁気ディスク回転時におけ
る磁気ヘッドの浮上走行安定性が悪くなり、磁気ディス
クと磁気ヘッドの距離を一定に維持できなくなったりし
て、情報の記録再生のエラーを招く原因となる。In addition, in the present invention, the surface roughness of the unevenness formed on the substrate surface is referred to as center line average roughness (hereinafter referred to as Ra).
When expressed as , 0.003 to 0.05 μm is preferable. Ra
If the magnetic disk has a magnetic recording layer formed on its substrate, the magnetic head tends to stick to the surface when the disk is stopped, and when the rotation starts, the frictional resistance with the magnetic head becomes large, and as a result, the magnetic disk has a magnetic recording layer formed on the substrate. Discs are more likely to wear out. Furthermore, if Ra exceeds 0.05 μm, when used as a magnetic disk, the flying stability of the magnetic head will deteriorate when the magnetic disk rotates, and the distance between the magnetic disk and the magnetic head may not be maintained constant. This can lead to errors in recording and reproducing information.
Ｒａが上記の好ましい範囲の磁気ディスク基板を製造す
るためには、用いる良溶媒もしくは混合溶媒、接触時間
を適宜組み合わせて行えばよく、さらに、良溶媒を接触
させ、次いで貧溶媒を接触させこともできる。In order to produce a magnetic disk substrate with Ra in the above preferred range, it is sufficient to appropriately combine the good solvent or mixed solvent used and the contact time.Furthermore, it is also possible to bring the good solvent into contact and then bring the poor solvent into contact. can.
［作用］
本発明において、合成樹脂からなる磁気ディスク基板の
表面に良溶媒を接触させると、基板の極く表面のみが部
分的に溶解もしくは膨潤され、良溶媒が蒸発後、その表
面に微細な凹凸が形成される。また、良溶媒を接触させ
、次いで貧溶媒を接触させると、基板の掻く表面のみを
部分的に溶解もしくは膨潤して浸透している良溶媒と入
れ換わる。すなわち、溶媒置換が行われ、それ以上溶解
もしくは膨潤が進行しなくなり、かつ部分的に溶解もし
くは膨潤した箇所の合成樹脂が凝縮して、その結果、微
細な凹凸が形成される。[Function] In the present invention, when a good solvent is brought into contact with the surface of a magnetic disk substrate made of synthetic resin, only the very surface of the substrate is partially dissolved or swollen, and after the good solvent evaporates, fine particles are formed on the surface. Irregularities are formed. Further, when a good solvent is brought into contact with the substrate and then a poor solvent is brought into contact with the substrate, only the scratched surface of the substrate is partially dissolved or swelled and replaced with the good solvent that has permeated therein. That is, the solvent is replaced, dissolution or swelling no longer progresses, and the synthetic resin in the partially dissolved or swollen areas condenses, resulting in the formation of fine irregularities.
［実施例］ 以下、本発明の実施例を示す。[Example] Examples of the present invention will be shown below.
合成樹脂として、ポリエーテルイミド樹脂を用い、射出
成形法にて磁気ディスク基板を成形した。A magnetic disk substrate was molded by injection molding using polyetherimide resin as the synthetic resin.
次いで、該磁気ディスク基板をスピンコータにかけて、
１５００ＲＰＭの速度で回転させながら、その表面にク
ロロフォルムを１５秒間滴下した。Next, the magnetic disk substrate is applied to a spin coater,
Chloroform was dropped onto the surface for 15 seconds while rotating at a speed of 1500 RPM.
次いで、室温で乾燥した。It was then dried at room temperature.
得られた磁気ディスク基板のＲａを測定した結果、０．
００６μｍであった。また、光学式顕微鏡でその表面状
態を観察した結果、微細な凹凸が全面に均一に形成され
ていることが確認できた。As a result of measuring the Ra of the obtained magnetic disk substrate, it was found to be 0.
It was 0.006 μm. Furthermore, as a result of observing the surface condition with an optical microscope, it was confirmed that fine irregularities were uniformly formed over the entire surface.
次いで、該磁気ディスク基板の表面にスパッタ法で通常
の薄膜型磁性記録層を形成して、耐久性試験（ＣＳＳ試
験）を行った結果２、微細な凹凸を形成していない基板
を用いた磁気ディスクが約８０００回で記録層が破壊し
たのに対し、４００００回でも全く記録層表面には変化
が見られなかった。すなわち、約５倍以上の耐久性を有
することがわかった。Next, a normal thin-film magnetic recording layer was formed on the surface of the magnetic disk substrate by sputtering, and a durability test (CSS test) was conducted. 2. While the recording layer of the disk was destroyed after about 8,000 cycles, no change was observed on the surface of the recording layer even after 40,000 cycles. In other words, it was found that the durability was about 5 times or more.
［効果コ
以上のように、本発明によれば、合成樹脂からなる磁気
ディスク基板の表面を該合成樹脂の良溶媒を接触させ、
その表面に均一に微細な凹凸を形成しているので、その
表面に磁性記録層を形成して磁気ディスクを作成すれば
、磁気ディスク装置に搭載した使用状態において、磁気
ディスクの停止時に磁気ディスクと磁気ヘッドが密着す
ることが殆どなく、また、回転起動時には起動トルクが
比較的小さく、かつ磁気ディスクと磁気ヘッドの摩擦抵
抗が低減され、その結果、磁気ディスクの摩耗が減少し
て耐久性がすぐれ、記録再生のエラーが少なく、かつ磁
気ヘッドの走行安定性がすぐれた磁気ディスクを得るこ
とができるという効果を奏する。[Effects] As described above, according to the present invention, the surface of a magnetic disk substrate made of synthetic resin is brought into contact with a good solvent for the synthetic resin,
Since the surface has uniformly fine irregularities, if a magnetic recording layer is formed on the surface to create a magnetic disk, when the magnetic disk is stopped and used in a magnetic disk device, The magnetic head almost never comes into close contact with each other, and the starting torque is relatively small when starting rotation, and the frictional resistance between the magnetic disk and the magnetic head is reduced.As a result, wear on the magnetic disk is reduced and durability is excellent. This has the effect that it is possible to obtain a magnetic disk with few recording/reproducing errors and excellent running stability of the magnetic head.
また、従来の研磨による凹凸の形成方法に比べ、短時間
で、かつ−枚毎のバラツキが殆どない微細な凹凸を形成
することができるという効果も奏する。Furthermore, compared to the conventional method of forming irregularities by polishing, it is possible to form fine irregularities in a shorter time and with almost no variation from sheet to sheet.
Claims (1)
合成樹脂を溶解もしくは膨潤しうる溶媒を接触させ、前
記磁気ディスク基板の表面に微細な凹凸を形成すること
を特徴とする磁気ディスク基板の製造方法。(1) Manufacture of a magnetic disk substrate, characterized in that fine irregularities are formed on the surface of the magnetic disk substrate by contacting the surface of the magnetic disk substrate made of synthetic resin with a solvent that can dissolve or swell the synthetic resin. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15845088A JPH027226A (en) | 1988-06-27 | 1988-06-27 | Production of magnetic disk substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15845088A JPH027226A (en) | 1988-06-27 | 1988-06-27 | Production of magnetic disk substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH027226A true JPH027226A (en) | 1990-01-11 |
Family
ID=15672020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15845088A Pending JPH027226A (en) | 1988-06-27 | 1988-06-27 | Production of magnetic disk substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH027226A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007125799A (en) * | 2005-11-04 | 2007-05-24 | Konica Minolta Holdings Inc | Fine structure transfer method, fine structure transfer device, optical element manufacturing method, and mold |
| JP2014061458A (en) * | 2012-09-20 | 2014-04-10 | Japan Vilene Co Ltd | Method of producing porous sheet imparted with polyvinyl alcohol resin |
-
1988
- 1988-06-27 JP JP15845088A patent/JPH027226A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007125799A (en) * | 2005-11-04 | 2007-05-24 | Konica Minolta Holdings Inc | Fine structure transfer method, fine structure transfer device, optical element manufacturing method, and mold |
| JP4756339B2 (en) * | 2005-11-04 | 2011-08-24 | コニカミノルタホールディングス株式会社 | Fine structure transfer method, fine structure transfer apparatus, and optical element manufacturing method |
| JP2014061458A (en) * | 2012-09-20 | 2014-04-10 | Japan Vilene Co Ltd | Method of producing porous sheet imparted with polyvinyl alcohol resin |
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