JPS60159014A - Precision molded item - Google Patents

Precision molded item

Info

Publication number
JPS60159014A
JPS60159014A JP59015505A JP1550584A JPS60159014A JP S60159014 A JPS60159014 A JP S60159014A JP 59015505 A JP59015505 A JP 59015505A JP 1550584 A JP1550584 A JP 1550584A JP S60159014 A JPS60159014 A JP S60159014A
Authority
JP
Japan
Prior art keywords
coating
substrate
mold
surface layer
precision molded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59015505A
Other languages
Japanese (ja)
Inventor
Toshikatsu Komizu
香水 敏勝
Hiroyuki Sugimura
博之 杉村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP59015505A priority Critical patent/JPS60159014A/en
Publication of JPS60159014A publication Critical patent/JPS60159014A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/70General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
    • B29C66/71General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the composition of the plastics material of the parts to be joined

Landscapes

  • Moulding By Coating Moulds (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)

Abstract

PURPOSE:To secure transfer accuracy, hardness and adhesion, by applying a coating liquid mainly consisting of a monomer or oligomer capable of providing a polysiloxane type rigid coating, hardening the coating liquid, releasing the coating thereby forming a polysiloxane type rigid surface layer on a substrate. CONSTITUTION:A mold having a fine contoured pattern on the smooth surface is coated with a coating liquid mainly consisting of a monomer or oligomer capable of providing a polysiloxane type rigid skin, then if required, the liquid is preliminarily dried to form a film, and the film is heated to be hardened to give a polysiloxane type rigid surface layer (A). The thus obtained surface layer (A), after or before it is released from a mold, is bonded to a substrate (B) to provide a precision molded item. Thus, a precision molded item that is high in transfer accuracy, surface hardness, and adhesion to the vertically magnetized film and wherein the optical and magnetic properties of the vertically magnetized film would be less deteriorated can be obtained.

Description

【発明の詳細な説明】 (発明の技術分野) 本発明は平滑な表面に微細な凹凸模様を有する精密成形
品例えば光学式ビデオディスクやデジタルオーディオデ
ィスク等に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a precision molded product having a smooth surface with a fine uneven pattern, such as an optical video disc or a digital audio disc.

(発明の背景) 情報社会の進展に伴って大容量の情報記録媒体の要求が
高まり、ビデオディスクやデジタルオーディオディスク
等が実用化されている。
(Background of the Invention) With the development of the information society, the demand for large-capacity information recording media has increased, and video discs, digital audio discs, etc. have been put into practical use.

ビデオディスクの中でも光学式のものは、平滑な表面を
有する円盤の表面にピットと呼ばれるくぼみ又は島状突
起が渦巻き状に設けられており、情報はこのピットの有
無及びピント長によって記録される。1つのピットは例
えば中0.5 ミクロン×長さ0.9〜3ミクロン×深
さ又は高さ0.1 ミクロンという微細な寸法を有する
もので、トランク間隔も例えば1.6 ミクロンと微細
である。このように微細な模様を有する光学式ビデオデ
ィスクやデジタルオーディオディスクは安価に大量に供
給する必要があることから当然にプラスチックで成形さ
れ、市販されるに及んでいる。
Optical video discs have a smooth surface with depressions or island-like protrusions called pits arranged in a spiral pattern, and information is recorded based on the presence or absence of these pits and the focus length. One pit has minute dimensions, for example, 0.5 microns in diameter x 0.9 to 3 microns in length x 0.1 microns in depth or height, and the trunk spacing is also as small as 1.6 microns, for example. . Since optical video discs and digital audio discs having such fine patterns need to be supplied in large quantities at low cost, they are naturally molded from plastic and are now commercially available.

また、光磁気ディスクは、トラッキングのための渦巻き
又は同心円状の微細な溝(例えば中9.1ミクロン、深
さ700人間隔2.5 ミクロン)を有する例えば厚さ
1.2鶴直径180mmのPHMAディスク状基板の上
に真空蒸着又はスパッタリングにより磁性材料例えばT
bPe5GdTbPeSGdTbFeCoなどの非晶質
垂直磁化膜を薄く積層したものである。
In addition, the magneto-optical disk is a PHMA disk with a thickness of 1.2 mm and a diameter of 180 mm, for example, which has spiral or concentric fine grooves for tracking (for example, 9.1 micron in diameter, 700 people in depth and 2.5 micron in pitch). A magnetic material such as T is deposited on a disk-shaped substrate by vacuum evaporation or sputtering.
This is a thin layer of amorphous perpendicular magnetization films such as bPe5GdTbPeSGdTbFeCo.

このように精密な成形表面を有するディスクまたはディ
スク状基板の成形には、これまでプレス成形や射出成形
が採用され又は提案されてきた。
Press molding and injection molding have been employed or proposed to mold disks or disk-shaped substrates having such precise molding surfaces.

しかし、いずれの成形法で得られた成形品も転写精度が
悪かったり、装置がおおがかりになる欠点があった。
However, molded products obtained by either molding method have drawbacks such as poor transfer accuracy and the need for bulky equipment.

そのため、ビットを形成する「くぼみ」又は島状突起、
あるいは渦巻き状の溝を形成する突条を設けた鋳型の上
に、放射線硬化型樹脂ラッカーを塗布した後、放射線例
えば紫外線、電子線、γ線を照射して硬化させたものを
表面層とし、これをプラスチックその他基板の上に接着
したディスクが提案された(例えば特開昭58−108
042、同58−159202参照)。
Therefore, the "indentation" or island-like protrusion that forms the bit,
Alternatively, a radiation-curable resin lacquer is applied onto a mold provided with protrusions forming spiral grooves, and then cured by irradiation with radiation, such as ultraviolet rays, electron beams, or gamma rays, to form the surface layer. A disk in which this was glued onto a plastic or other substrate was proposed (for example, in JP-A-58-108
042, 58-159202).

しかしながら、放射線硬化型樹脂として、提案されたア
クリル系樹脂やエポキシ系樹脂は、いずれも硬度が不十
分で、取り扱い中に傷がつき易く、その傷が記録された
情報を正しく再生させない原因となることが判明した。
However, the acrylic resins and epoxy resins that have been proposed as radiation-curable resins have insufficient hardness and are easily scratched during handling, and these scratches can cause recorded information to not be reproduced correctly. It has been found.

また、上述のアクリル系樹脂やエポキシ樹脂に対しては
垂直磁化膜の密着性が劣る欠点もあった。
Furthermore, the above-mentioned acrylic resins and epoxy resins had the disadvantage that the adhesion of the perpendicularly magnetized film was poor.

(発明の目的) 従って、本発明のビ的は光学式ビデオディスクやデジタ
ルオーディオディスクのように平滑な表面に微細な凸凹
模様を有する精密成形品であイて、凸凹模様を有する表
面層が高い転写精度、高い硬度及び垂直磁化膜に対する
高い密着性を有するものを提供することにある。
(Objective of the Invention) Therefore, the object of the present invention is a precision molded product having a fine uneven pattern on a smooth surface, such as an optical video disk or a digital audio disk, and the surface layer having the uneven pattern is high. It is an object of the present invention to provide a device having high transfer accuracy, high hardness, and high adhesion to a perpendicularly magnetized film.

溌明の概要) しかして、本発明は、平滑な表面に微細な凹凸模様を有
する鋳型の上に、ポリシロキサン系硬質皮膜を与えるモ
ノマー又はそのオリゴマーを主成分とする塗布、液を塗
布し、硬化させた後、離型させて得られるポリシロキサ
ン系硬質表面層(、A)と基板(B)とからなる精密成
形品を提供する。
Summary of Shinmei) Therefore, the present invention involves applying a coating or liquid mainly composed of a monomer or oligomer thereof that provides a polysiloxane hard coating onto a mold having a fine uneven pattern on a smooth surface. After curing, the mold is released to provide a precision molded product consisting of a polysiloxane hard surface layer (A) and a substrate (B).

本発明に使用されるポリシロキサン系硬質皮膜を与える
モノマーとしては、一般式: %式%) (式中、Rは置換基を有し又は有しない炭素数1〜3の
炭化水素基を表わし、 R′は炭素数1〜5の炭化水素基又は炭素数1〜4のア
シル基を表わし、 nは0、■又は2である。) で表わされる有機ケイ素化合物が好ましい。
The monomer that provides the polysiloxane hard coating used in the present invention has the general formula: % formula % (wherein R represents a hydrocarbon group having 1 to 3 carbon atoms with or without a substituent, R' represents a hydrocarbon group having 1 to 5 carbon atoms or an acyl group having 1 to 4 carbon atoms, and n is 0, ■ or 2.

前記一般式に含まれる具体的な化合物としては、例えば
、ジメチルジメトキシシラン、ジエチルジメトキシシラ
ン、ジメチルジブトキシシランなどの2官能性シラン化
合物、メチルトリメトキシシラン、メチルトリエトキシ
シラン、メチルトリブトキシシラン、エチルトリメトキ
シシラン、ビニルトリメトキシシラン、ビニルトリエト
キシシラン、N−()リメトキシシリルプロビル)エチ
レンジアミン、アミノメチルトリメトキシシラン、3−
アミノプロピルトリメトキシシラン、γ−グリシドキシ
プロビルトリメトキシシラン、γ−メタクリロキシプロ
ピルトリメトキシシランなどの3官能性シラン化合物、
四メトキシケイ素、四エトキシケイ素、四プロポキシケ
イ素、四ブトキシケイ素などの4官能性シラン化合物が
挙げられる。
Specific compounds included in the general formula include, for example, difunctional silane compounds such as dimethyldimethoxysilane, diethyldimethoxysilane, and dimethyldibutoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltributoxysilane, Ethyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, N-()rimethoxysilylprobyl)ethylenediamine, aminomethyltrimethoxysilane, 3-
Trifunctional silane compounds such as aminopropyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane,
Examples include tetrafunctional silane compounds such as tetramethoxysilicon, tetraethoxysilicon, tetrapropoxysilicon, and tetrabutoxysilicon.

これらのモノマーは酢酸、塩酸、硫酸などを用いて部分
加水分解縮合することにより予めオリゴマーにしておい
てもよい。
These monomers may be made into oligomers in advance by partial hydrolytic condensation using acetic acid, hydrochloric acid, sulfuric acid, or the like.

前記七ツマ−またはそのオリゴマーを熔解する溶媒とし
ては、アルコール、エステル、エーテル、ケトン、ハロ
ゲン化炭化水素、トルエン、キシレンなどの芳香族炭化
水素などが使用される。
As the solvent for dissolving the hexamer or its oligomer, alcohols, esters, ethers, ketones, halogenated hydrocarbons, aromatic hydrocarbons such as toluene, xylene, etc. are used.

塗布液には、前記七ツマ−またはそのオリゴマーと溶媒
の外に一般に硬化触媒を加える。硬化触媒としては、飽
和又は不飽和の多価カルボン酸又はその酸無水物、多価
金属(例えばFe (I[l) 、Fe(II) 、A
 It (I[[) 、Ti (IV) 、Co(I[
[) 、Cr(11[)、Mn(II)、V (III
)、V (IV)、Cn(II)、Ca(II) 、M
g(II) 、Ni (I[) 、Zr(IV) 、)
のアルコキシドまたはキレート化合物、フェノール化合
物、ジシアンジアミドの如き窒素化金物、■フッ化ホウ
素化合物などが挙げられる。尚、硬化触媒は塗布液のボ
ットライフを短か(するので塗布直前に混合することが
好ましい。
A curing catalyst is generally added to the coating solution in addition to the above-mentioned hexamer or its oligomer and a solvent. As curing catalysts, saturated or unsaturated polycarboxylic acids or their acid anhydrides, polyvalent metals (e.g. Fe(I[l), Fe(II), A
It (I[[) , Ti (IV) , Co(I[
[), Cr(11[), Mn(II), V(III
), V (IV), Cn (II), Ca (II), M
g(II), Ni(I[), Zr(IV),)
Examples include alkoxides or chelate compounds, phenol compounds, metal nitrides such as dicyandiamide, and boron fluoride compounds. Incidentally, since the curing catalyst shortens the bot life of the coating solution, it is preferable to mix it immediately before coating.

更に塗布液には界面活性剤、粘度調節剤、顔料、染料、
充填剤などを加えてもよい。充填剤として例えば平均粒
径1〜200ミリミクロン特に10〜30ミリミクロン
のシリカ(コロイダルシリカ)を使用してもよい。
Furthermore, the coating solution contains surfactants, viscosity modifiers, pigments, dyes,
Fillers and the like may also be added. Silica (colloidal silica) having an average particle size of 1 to 200 mm, particularly 10 to 30 mm, may be used as a filler.

こうして調整された塗布液を鋳型表面に塗布するのであ
るが、塗布方法としてはハケ塗り、スプレーコート、バ
ーコード、流し塗り、ディッピング、ロールコート、ス
ピンコード、などが用いられる。
The coating liquid thus prepared is applied to the surface of the mold, and the coating methods used include brush coating, spray coating, barcode coating, flow coating, dipping, roll coating, and spin coating.

塗布後、必要に応じて予備乾燥して成膜した後、一般に
50〜250℃に加熱することにより硬化させ、ポリシ
ロキサン系硬質表面層(A)を得る。このような表面層
(A)の厚さは用途によるが、一般に1〜100 ミク
ロンもあれば十分である。−回の塗布で所望の膜厚が得
られなければ数回繰り返す。
After coating and forming a film by pre-drying if necessary, it is generally cured by heating at 50 to 250°C to obtain a polysiloxane hard surface layer (A). The thickness of such surface layer (A) depends on the application, but generally 1 to 100 microns is sufficient. - Repeat several times if the desired film thickness is not obtained after the first coating.

こうして得られた表面層(A)は鋳型から離型させた後
又は離型させる前に基板(B)に接着させ、本発明の精
密成形品とする。基板(B)は用途に応じてプラスチッ
ク、金属、セラミック、ガラスなどが挙げられる。もち
ろん、基板(B)の表裏両面に表面層(A)を接着する
ことも可能である。表面層(A)を基板(、B)に接着
させるには、接着剤を使用するか、場合により熱融着す
ればよい。接着剤としては、基板の種類にもよるが、エ
ポキシ系、ウレタン系、アクリル系、シリコーン系など
が使用される。
The surface layer (A) thus obtained is adhered to the substrate (B) after or before being released from the mold to obtain the precision molded product of the present invention. The substrate (B) may be made of plastic, metal, ceramic, glass, etc. depending on the purpose. Of course, it is also possible to adhere the surface layer (A) to both the front and back surfaces of the substrate (B). In order to adhere the surface layer (A) to the substrate (, B), an adhesive may be used or heat fusion may be performed as the case requires. As the adhesive, epoxy, urethane, acrylic, silicone, etc. are used, depending on the type of substrate.

本発明の精密成形品は、凹凸模様に応じて、光学式ビデ
オディスク及びデジタルオーディオディスク、光磁気デ
ィスク用基板、位相型フレネルゾーンプレートレンズ、
回折格子などに使用される。
The precision molded product of the present invention can be used for optical video discs and digital audio discs, substrates for magneto-optical discs, phase-type Fresnel zone plate lenses, etc. depending on the uneven pattern.
Used for diffraction gratings, etc.

以下実施例により本発明を具体的に説明する。The present invention will be specifically explained below using Examples.

(実施例) ガラス原盤から電鋳法により作製したニッケル製の鋳型
を用意する。
(Example) A nickel mold made from a glass master by electroforming is prepared.

この鋳型は直径180++u++厚さ10mm (台座
を含む)の円板で、外周付近に中35mn+にわたって
、第1図に示す如く、高さ700人、中0.8ミクロン
、ピッチ2.5ミクロンの突条が渦巻き状に形成されて
いる。市販されている勝田化工株式会社製の NIKC
O^T(商品名)の主剤^−430の100重量部と触
媒Z−102の7重量部とを混合した後、混合液を上述
の鋳型の表面にスピンコード法(回転数10100Or
pによりコートし、30分間室温で自然乾燥させた後、
80℃で1時間その後更に100℃で1時間焼成し硬化
させた。
This mold is a circular plate with a diameter of 180++ u++ and a thickness of 10 mm (including the pedestal).As shown in Figure 1, the mold is a circular plate with a diameter of 180++ u++ and a thickness of 10 mm (including the pedestal). The stripes are formed in a spiral shape. Commercially available NIKC manufactured by Katsuta Kako Co., Ltd.
After mixing 100 parts by weight of the main agent ^-430 of O^T (trade name) and 7 parts by weight of catalyst Z-102, the mixed liquid was applied to the surface of the mold described above using a spin cord method (rotation speed 10,100 or
After coating with p and air drying at room temperature for 30 minutes,
It was baked at 80° C. for 1 hour and then further baked at 100° C. for 1 hour to harden it.

得られた膜厚的10μのポリシロキサン系硬質被111
(A)を鋳型から剥がして、これを直径180n++*
厚さ1 、2mmの硬質アクリル樹脂製基板(B)にエ
ポキシ系接着剤を用いて張り付け、光磁気ディスク用基
板を作成した。
The obtained polysiloxane hard coating 111 with a film thickness of 10μ
Peel off (A) from the mold and make it with a diameter of 180n++*
This was attached to a hard acrylic resin substrate (B) with a thickness of 1 to 2 mm using an epoxy adhesive to prepare a magneto-optical disk substrate.

この基板は表面が鉛筆硬度で6Hと硬く、従来のアクリ
ル系樹脂やエポキシ樹脂を表面層とするものに比べては
るかに硬い。
The surface of this substrate has a pencil hardness of 6H, which is much harder than conventional acrylic resin or epoxy resin surface layers.

また、本実施例の光磁気ディスク用基板の上に真空蒸着
により厚さ500人のTbFe系磁性合金垂直磁化膜を
形成させたが、磁化膜の基板に対する密着性は十分で、
また垂直磁化膜の光磁気特性の劣化がプラスチック成形
基板に比べて少なかった。
Further, a TbFe-based magnetic alloy perpendicularly magnetized film with a thickness of 500 mm was formed on the magneto-optical disk substrate of this example by vacuum evaporation, but the adhesion of the magnetized film to the substrate was sufficient.
Furthermore, the deterioration of the magneto-optical properties of the perpendicularly magnetized film was less than that of the plastic molded substrate.

(発明の効果) 本発明によれば、高い転写精度、高い表面硬度及び垂直
磁化膜に対する高い密着性を有し、垂直磁化膜の光磁気
特性の劣化が少ない精密成形品が得られる。
(Effects of the Invention) According to the present invention, a precision molded product can be obtained that has high transfer accuracy, high surface hardness, and high adhesion to the perpendicularly magnetized film, and has little deterioration in the magneto-optical properties of the perpendicularly magnetized film.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例で使用した鋳型の部分断面図で
ある。 出願人 日本光学工業株式会社 代理人 渡 辺 隆 男
FIG. 1 is a partial sectional view of a mold used in an example of the present invention. Applicant: Nippon Kogaku Kogyo Co., Ltd. Agent: Takashi Watanabe

Claims (1)

【特許請求の範囲】 1、平滑な表面に微細な凹凸模様を有する鋳型の上に、
ポリシロキサン系硬質皮膜を与えるモノマー又はそのオ
リゴマーを主成分とする塗布液を塗布し、硬化させた後
、離型させて得られるポリシロキサン系硬質表面層(A
)と基板(B)とからなる精密成形品。 2、前記モノマーが 一般式: %式%) (式中、Rは置換基を有し又は有しない炭素数1〜3の
炭化水素基を表し、 R′は炭素数1〜5の炭化水素基又は炭素数1〜4のア
シル基を表し、 nは0.1又は2である。) で表される有機ケイ素化合物であることを特徴とする特
許請求の範囲第1項記載の精密成形品。
[Claims] 1. On a mold having a fine uneven pattern on a smooth surface,
A polysiloxane-based hard surface layer (A
) and a substrate (B). 2. The monomer has the general formula: % formula %) (wherein R represents a hydrocarbon group having 1 to 3 carbon atoms with or without a substituent, and R' is a hydrocarbon group having 1 to 5 carbon atoms) or an acyl group having 1 to 4 carbon atoms, and n is 0.1 or 2.) The precision molded article according to claim 1, wherein the precision molded article is an organosilicon compound represented by the following formula.
JP59015505A 1984-01-31 1984-01-31 Precision molded item Pending JPS60159014A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59015505A JPS60159014A (en) 1984-01-31 1984-01-31 Precision molded item

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59015505A JPS60159014A (en) 1984-01-31 1984-01-31 Precision molded item

Publications (1)

Publication Number Publication Date
JPS60159014A true JPS60159014A (en) 1985-08-20

Family

ID=11890663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59015505A Pending JPS60159014A (en) 1984-01-31 1984-01-31 Precision molded item

Country Status (1)

Country Link
JP (1) JPS60159014A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001019587A1 (en) * 1999-09-16 2001-03-22 Nippon Sheet Glass Co., Ltd. Method for producing article having predetermined surface shape, and optical waveguide element
JP2009510216A (en) * 2005-09-29 2009-03-12 ダウ・コーニング・コーポレイション Method for peeling high-temperature film and / or device from metal substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001019587A1 (en) * 1999-09-16 2001-03-22 Nippon Sheet Glass Co., Ltd. Method for producing article having predetermined surface shape, and optical waveguide element
US6535680B1 (en) 1999-09-16 2003-03-18 Nippon Sheet Glass Co., Ltd. Process for producing an article having a predetermined surface shape and optical waveguide element
JP2009510216A (en) * 2005-09-29 2009-03-12 ダウ・コーニング・コーポレイション Method for peeling high-temperature film and / or device from metal substrate

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