JPS616274A - 基板用の保持装置 - Google Patents

基板用の保持装置

Info

Publication number
JPS616274A
JPS616274A JP60061064A JP6106485A JPS616274A JP S616274 A JPS616274 A JP S616274A JP 60061064 A JP60061064 A JP 60061064A JP 6106485 A JP6106485 A JP 6106485A JP S616274 A JPS616274 A JP S616274A
Authority
JP
Japan
Prior art keywords
substrate
plate
groove
radius
rotary cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60061064A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033744B2 (US08177716-20120515-C00003.png
Inventor
ペーター・マーラー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of JPS616274A publication Critical patent/JPS616274A/ja
Publication of JPH033744B2 publication Critical patent/JPH033744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP60061064A 1984-03-27 1985-03-27 基板用の保持装置 Granted JPS616274A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19843411208 DE3411208A1 (de) 1984-03-27 1984-03-27 Haltevorrichtung fuer substrate, insbesondere in vakuum-beschichtungsanlagen
DE3411208.1 1984-03-27

Publications (2)

Publication Number Publication Date
JPS616274A true JPS616274A (ja) 1986-01-11
JPH033744B2 JPH033744B2 (US08177716-20120515-C00003.png) 1991-01-21

Family

ID=6231725

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60061064A Granted JPS616274A (ja) 1984-03-27 1985-03-27 基板用の保持装置

Country Status (5)

Country Link
US (1) US4589369A (US08177716-20120515-C00003.png)
JP (1) JPS616274A (US08177716-20120515-C00003.png)
DE (1) DE3411208A1 (US08177716-20120515-C00003.png)
FR (1) FR2562094B1 (US08177716-20120515-C00003.png)
GB (1) GB2156861B (US08177716-20120515-C00003.png)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156262A (en) * 1979-05-25 1980-12-05 Nissan Motor Co Ltd Ignition lead angle controller
JPS5677557A (en) * 1979-11-30 1981-06-25 Hitachi Ltd Ignition device
JPS63127972U (US08177716-20120515-C00003.png) * 1987-02-16 1988-08-22
JP2005215216A (ja) * 2004-01-28 2005-08-11 Kyocera Kinseki Corp 光学用部品の基板の蒸着ジグ

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4595481A (en) * 1984-08-21 1986-06-17 Komag, Inc. Disk carrier
DE3606152A1 (de) * 1986-02-26 1987-08-27 Basf Ag Halterung fuer substratplatten auf traegerplatten
JPH0198165U (US08177716-20120515-C00003.png) * 1987-12-18 1989-06-30
US4944860A (en) * 1988-11-04 1990-07-31 Eaton Corporation Platen assembly for a vacuum processing system
US5042423A (en) * 1988-12-20 1991-08-27 Texas Instruments Incorporated Semiconductor wafer carrier design
US5074736A (en) * 1988-12-20 1991-12-24 Texas Instruments Incorporated Semiconductor wafer carrier design
US5169453A (en) * 1989-03-20 1992-12-08 Toyoko Kagaku Co., Ltd. Wafer supporting jig and a decompressed gas phase growth method using such a jig
US4880518A (en) * 1989-03-27 1989-11-14 Intelmatec Corporation Disk carrier
US5089110A (en) * 1990-07-30 1992-02-18 Komag, Incorporated Data storage disk and plug
CA2076701C (en) * 1991-08-26 1997-12-23 Sunghee Yoon Flow-inducing panels for electroless copper plating of complex assemblies
US5244555A (en) * 1991-11-27 1993-09-14 Komag, Inc. Floating pocket memory disk carrier, memory disk and method
JP3433760B2 (ja) * 1993-05-14 2003-08-04 ソニー株式会社 光ディスクの保護膜機
JP4059549B2 (ja) * 1997-09-20 2008-03-12 キヤノンアネルバ株式会社 基板支持装置
KR101463581B1 (ko) 2005-01-18 2014-11-20 에이에스엠 아메리카, 인코포레이티드 박막 성장용 반응 시스템
WO2018133952A1 (en) * 2017-01-23 2018-07-26 Applied Materials, Inc. Holder for substrates
US10872803B2 (en) 2017-11-03 2020-12-22 Asm Ip Holding B.V. Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination
US10872804B2 (en) 2017-11-03 2020-12-22 Asm Ip Holding B.V. Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247781A (en) * 1979-06-29 1981-01-27 International Business Machines Corporation Cooled target disc for high current ion implantation method and apparatus
CH652754A5 (de) * 1981-03-13 1985-11-29 Balzers Hochvakuum Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage.

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156262A (en) * 1979-05-25 1980-12-05 Nissan Motor Co Ltd Ignition lead angle controller
JPS631462B2 (US08177716-20120515-C00003.png) * 1979-05-25 1988-01-12 Nissan Motor
JPS5677557A (en) * 1979-11-30 1981-06-25 Hitachi Ltd Ignition device
JPS63127972U (US08177716-20120515-C00003.png) * 1987-02-16 1988-08-22
JP2005215216A (ja) * 2004-01-28 2005-08-11 Kyocera Kinseki Corp 光学用部品の基板の蒸着ジグ

Also Published As

Publication number Publication date
GB8506702D0 (en) 1985-04-17
US4589369A (en) 1986-05-20
FR2562094A1 (fr) 1985-10-04
DE3411208C2 (US08177716-20120515-C00003.png) 1987-01-29
GB2156861A (en) 1985-10-16
FR2562094B1 (fr) 1988-08-05
DE3411208A1 (de) 1985-10-10
GB2156861B (en) 1987-10-14
JPH033744B2 (US08177716-20120515-C00003.png) 1991-01-21

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