JPS6162516A - Resin composition for sealing semiconductor - Google Patents

Resin composition for sealing semiconductor

Info

Publication number
JPS6162516A
JPS6162516A JP18437084A JP18437084A JPS6162516A JP S6162516 A JPS6162516 A JP S6162516A JP 18437084 A JP18437084 A JP 18437084A JP 18437084 A JP18437084 A JP 18437084A JP S6162516 A JPS6162516 A JP S6162516A
Authority
JP
Japan
Prior art keywords
fatty acid
resin composition
epoxy resin
divalent
bisamide compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18437084A
Other languages
Japanese (ja)
Other versions
JPH0378404B2 (en
Inventor
Toshiro Takeda
敏郎 竹田
Akira Toko
都甲 明
Koichi Tanaka
孝一 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP18437084A priority Critical patent/JPS6162516A/en
Publication of JPS6162516A publication Critical patent/JPS6162516A/en
Publication of JPH0378404B2 publication Critical patent/JPH0378404B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To provide the titled composition having excellent moisture resistance, high-temperature electrical characteristics, mold-releasability, etc. and giving a molded article having high printability, by adding a specific amount of a specific dibasic fatty acid bisamide compound as an internal releasing agent to an epoxy resin. CONSTITUTION:The objective composition can be prepared by compounding (A) an epoxy resin with (B) 0.01-10wt% internal releasing agent consisting of a dibasic fatty acid biasamide of formula (l and n is >=14; m is >=3) (prefer ably a condensation product of a >=5C dibasic fatty acid and >=15C long-chain aliphatic primary amine, and having a melting point of 80-140 deg.C).

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体素子を封止するための半導体封止用樹脂
組成物:二関し、特(;耐湿性、高温電気特性等の信頼
性が優れ、しかも成形時(=おいては離盤性が良好で得
られる成形品への捺印性も良好である半導体封止用樹脂
組成物(:関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a semiconductor encapsulating resin composition for encapsulating a semiconductor element. It relates to a resin composition for semiconductor encapsulation that has excellent release properties during molding and also has good marking properties on the resulting molded products.

〔従来技術〕[Prior art]

従来、半導体素子の封止技術としては金属やセラミック
等を用いるバーメチツタ方式が使用されてきたが、生産
性コスト面で樹脂封止の方が経済的こ有利となるため近
年では樹脂による封止が主流を占めつつある。
Conventionally, the verme-cutter method using metals, ceramics, etc. has been used as a encapsulation technology for semiconductor elements, but resin encapsulation has become more economical in terms of productivity and cost, so resin encapsulation has become popular in recent years. It is becoming mainstream.

このような半導体封止用樹脂として)1大世生産::適
する低圧トランスファー成形法が可能な低圧成形用エポ
キシ樹脂が広く一般(−用いられ1いる。
Epoxy resins for low-pressure molding, which can be suitable for low-pressure transfer molding, are widely used as resins for semiconductor encapsulation.

かかるトランスファー成形法::おいて成形により封止
された半導体を金型から取り出せるようにするには予め
エポキシ樹脂組成物中に内部離型剤を添加することが常
法である。従来からよく使用される内部離型剤としては
ステアリン酸のような長鎖脂肪酸、ステアリン酸亜鉛の
ような長鎖脂肪酸の金属塩、カルナバワックスのような
長鎖脂肪酸のエステル系ワックス、エチレンビスステア
リン酸アミドのようなビスアミド系ワックス等が知られ
ているが、これら従来の1m製剤は何れも耐湿性、高温
電気特性等の信頼性、離を性、成形品表面への捺印性を
全て満足するものとはいえなかった。
In such a transfer molding method, in order to enable the molded semiconductor to be removed from the mold, it is a common practice to add an internal mold release agent to the epoxy resin composition in advance. Conventionally commonly used internal mold release agents include long chain fatty acids such as stearic acid, metal salts of long chain fatty acids such as zinc stearate, ester waxes of long chain fatty acids such as carnauba wax, and ethylene bisstearin. Bisamide-based waxes such as acid amide are known, but all of these conventional 1m formulations satisfy all of the requirements of moisture resistance, reliability such as high-temperature electrical properties, releasability, and imprintability on the surface of molded products. It was nothing special.

即ち、長鎖脂肪酸及びその金属塩類は離を性、捺印性(
二ついては比較的良好であるの口対し、プレッシャーク
ツカーテスト、プレッシャークツカーバイアステスト等
の信頼性試験では不良が発生し易く耐湿性の劣ることが
認められている。またエステル系ワックスは離塁性、信
頼性は優れているものの、捺印性に劣り、特に成形回数
を重ねる(:つれて捺印性が極端に悪化する。ビスアミ
ド系ワックスは(4頼性、捺印性は優れているものの離
型性に劣る欠点があった。
In other words, long-chain fatty acids and their metal salts have good releasability and imprintability (
On the other hand, although it is relatively good, it has been recognized that failures tend to occur in reliability tests such as the pressure Kutsuker test and the pressure Kutsuker bias test, and that the moisture resistance is poor. In addition, although ester waxes have excellent base release properties and reliability, they are inferior in stamping properties, and especially as the number of molding cycles increases (: the stamping properties deteriorate extremely.) Bisamide waxes (4) Although it was excellent, it had the disadvantage of poor mold release properties.

〔発明の目的〕[Purpose of the invention]

本発明はかかる上記欠点を解決するため鋭意検討を重ね
た結果なされたもので、従来の半導体封止用エポキシ樹
脂に特定の二価脂肪酸ビスアミド化合物を内部離型剤と
して添加すること(二より、耐湿性、高温電気特性等の
信頼性が優れかつ離型性が良好で、しかも得られるIC
封土成形品への捺印性が良好な半導体封止用樹脂組成物
を提供するζ;ある。
The present invention was made as a result of intensive studies to solve the above-mentioned drawbacks, and it involves adding a specific divalent fatty acid bisamide compound as an internal mold release agent to the conventional epoxy resin for encapsulating semiconductors (Secondly, An IC that has excellent reliability such as moisture resistance and high temperature electrical properties, and has good mold releasability.
ζ to provide a resin composition for semiconductor encapsulation that has good marking properties on a molded earthen product.

〔発明の構成〕[Structure of the invention]

本発明は(1)エポキシ樹脂及び式〔A〕で辰わされる
二価脂肪酸ビスアミド化合物を0.01〜10重i%配
合してなることを特徴とする半導体封止用樹脂組成物、 CH,+OH,士、NHCO+CH,+mC0NH(−
(、’H,+nCH,〔A〕(J、nは14以上の整数 mは3以上の整数) および (2)二価脂肪酸ビスアミド化合物が炭素数5以上の二
価脂肪酸と炭素数15以上の長鎖脂肪族第一アー ミン
とを縮合させてなることを特徴とする特許請求の範囲第
1項記載の半導体封止用樹脂組成物および (3)二価脂肪酸ビスアミド化合物の融点が80℃〜1
40℃であることを特徴とする特許請求の範囲vX1項
記載の半導体封止用樹脂組成物(;関するものである。
The present invention provides (1) a resin composition for semiconductor encapsulation, characterized in that it contains an epoxy resin and a divalent fatty acid bisamide compound represented by formula [A] in an amount of 0.01 to 10% by weight, CH , +OH, NHCO+CH, +mC0NH(-
(, 'H, +nCH, [A] (J, n is an integer of 14 or more, m is an integer of 3 or more) and (2) the divalent fatty acid bisamide compound is a divalent fatty acid with 5 or more carbon atoms and a divalent fatty acid with 15 or more carbon atoms. The resin composition for semiconductor encapsulation according to claim 1, characterized in that it is formed by condensing a long-chain aliphatic primary amine, and (3) the divalent fatty acid bisamide compound has a melting point of 80°C or more. 1
The resin composition for semiconductor encapsulation according to claim vX1, characterized in that the temperature is 40°C.

本発明::用いられるエポキシ樹脂はビスフェノールA
型エボ中シ樹脂、ノボ2ツク型エポキシ樹脂、レゾルシ
ン鳳エポ中シ樹脂、ハロゲン化エボΦシ樹脂、グリシジ
ルエステル減エポキシ樹脂、高分子型エポキシ樹脂等で
あり、硬化剤としては一アミン系硬化剤、脂肪族ポリア
ミン、ポリアミド樹脂、芳香族ジアミン、酸無水物系硬
化剤ルイス酸錯化合物、芳香族ポリアミン、ポリカルボ
ン酸、ポリカルボン酸ヒドラジド、三弗化ホウ素モノエ
チルアミン、ジシアンジアミド、イミダゾール、フェノ
ール樹脂、メラミン樹脂、アクリル樹脂、エリア樹脂、
イソシアネート等であり、充填剤としてはガラス繊維、
金属クィスカー、炭素繊維、ケプラー繊維、ポリエステ
ル繊維、ポリアミド繊維、パルプ、アスベスト、結晶性
シリカ、溶融シリカ、アルミナ、炭酸カルシウム、炭酸
マグネシウム、水酸化カルシウム、水酸化アルミニウム
、三酸化アンチモン、メルク、酸化チタン等を添加する
ことができる。その他の添加剤としてはカーボンブラッ
ク、酸化鉄などの着色剤およびカップリング剤等も添加
することが可能である。また通常の硬化促進剤も必要;
二応じて添加してもよい。
The present invention:: The epoxy resin used is bisphenol A
Type epoxy resin, Novo 2 Tsuku type epoxy resin, resorcinol epoxy resin, halogenated epoxy resin, glycidyl ester reduced epoxy resin, polymer type epoxy resin, etc., and the curing agent is monoamine type curing. agent, aliphatic polyamine, polyamide resin, aromatic diamine, acid anhydride curing agent Lewis acid complex compound, aromatic polyamine, polycarboxylic acid, polycarboxylic acid hydrazide, boron trifluoride monoethylamine, dicyandiamide, imidazole, phenolic resin , melamine resin, acrylic resin, area resin,
Isocyanate, etc., and fillers include glass fiber,
Metal Quisker, carbon fiber, Kepler fiber, polyester fiber, polyamide fiber, pulp, asbestos, crystalline silica, fused silica, alumina, calcium carbonate, magnesium carbonate, calcium hydroxide, aluminum hydroxide, antimony trioxide, Merck, titanium oxide etc. can be added. Other additives that can be added include coloring agents such as carbon black and iron oxide, and coupling agents. Also requires regular curing accelerator;
2. May be added accordingly.

本発明で使用される離型剤、二価脂肪酸ビスアミド化合
物は式〔A〕で表わされる。
The mold release agent used in the present invention, a divalent fatty acid bisamide compound, is represented by formula [A].

CH,(−CH,÷、 NHCO+CH,)−、C0N
H÷CH,÷、CH。
CH, (-CH, ÷, NHCO+CH,)-, C0N
H ÷ CH, ÷, CH.

(j、nは14以上の整数、 mは3以上の整数) 加えて従来よく使用される離型剤を併用することも可能
で°ある。二価脂肪酸ビスアミド化合物の添加量は特に
限定するものではないが好ましくは0.01〜10重量
%が望ましい。即ち二価脂肪酸ビスアきドが0.01%
以下では離型剤としての効果が発現されず、逆に10%
を越えるとエポキシ樹脂硬化後の架橋密度が著しく低下
するために硬化物の機械特性、電気特性等が損われ、半
導体素子の保護機能が果せなくなるからである。
(j and n are integers of 14 or more; m is an integer of 3 or more) In addition, it is also possible to use a conventionally commonly used mold release agent. The amount of the divalent fatty acid bisamide compound added is not particularly limited, but is preferably 0.01 to 10% by weight. That is, 0.01% divalent fatty acid bisoxide
Below 10%, the effect as a mold release agent is not expressed, and on the contrary,
This is because if it exceeds the epoxy resin, the crosslinking density after curing of the epoxy resin will drop significantly, and the mechanical properties, electrical properties, etc. of the cured product will be impaired, and the protective function of the semiconductor element will no longer be fulfilled.

また式〔A〕で表わされる二価脂肪ビスアミド化合物は
炭素5以上の二価脂肪酸と炭素15以上の長鎖脂肪族第
一アミンとを縮合させて得ることができる。
Further, the divalent fatty bisamide compound represented by formula [A] can be obtained by condensing a divalent fatty acid having 5 or more carbon atoms with a long-chain aliphatic primary amine having 15 or more carbon atoms.

本発明は式〔A〕で表わされる二価脂肪酸ビスアミド化
合物をエポキシ樹脂の内部離型剤として使用すること(
二あり、本発明の方法により信頼性、離型性、捺印性等
を全て満足する半導体封止用樹脂組成物を提供すること
が可能となった。
The present invention uses a divalent fatty acid bisamide compound represented by formula [A] as an internal mold release agent for epoxy resin (
The method of the present invention makes it possible to provide a resin composition for semiconductor encapsulation that satisfies all of the requirements such as reliability, releasability, and imprintability.

従来のアミド系ワックスは他のワックスに比べて耐熱性
が良好であるため、成形材料の内部離型剤として広く用
いられてい名。即ち高温の金型で長時間成形作業を重ね
ても、金型表面に(二じみ出したワックスの耐熱性が良
好であること(二より金型内でゲル化し堆積するという
事がない為成形品の外観を著しく損うことがない、とい
う理由によるものである。ところがこのように連続成形
性の(優れている従来のアミド系ワックスは信頼性、捺
印性等も良好である反面離型性が不充分であった。
Conventional amide waxes have better heat resistance than other waxes, so they are widely used as internal mold release agents for molding materials. In other words, even if the molding process is repeated for a long time in a high-temperature mold, the wax that oozes out on the mold surface has good heat resistance. The reason for this is that it does not significantly damage the appearance of the product.However, while conventional amide waxes have excellent continuous moldability and are good in reliability and stampability, they have poor mold release properties. was insufficient.

従来のアミド系ワックスの殆んどはステアリン酸、ベヘ
ニン酸、モンタン酸等の高級脂肪酸とエチレンジアミン
等の多価アミンを縮合させて得られる分子内多価アミド
化合物もしくは高級脂肪酸とアンモニアを反応させさら
(;ホルマリンでメチロール化して縮合させた分子内多
価アミド化合物であり、極性が高くエポキシ樹脂等との
相溶性(二富んでいるため(=他の高級脂肪酸、高級脂
肪酸の金属塩、高級脂肪酸エステル等のワックス:ニル
べて内部離散剤として同じ量を添加しても成形品表面及
び金型表面::1:じみだすワックス量が極めて少なく
なりこの結果離型性に劣ること(:なると考えられる。
Most conventional amide waxes are made by reacting intramolecular polyamide compounds obtained by condensing higher fatty acids such as stearic acid, behenic acid, or montanic acid with polyvalent amines such as ethylenediamine, or by reacting higher fatty acids with ammonia. (; It is an intramolecular polyamide compound that is methylolated and condensed with formalin, and has high polarity and is compatible with epoxy resins etc. (= other higher fatty acids, metal salts of higher fatty acids, higher fatty acids) Wax such as ester: Even if the same amount is added as an internal dispersing agent, the amount of wax that oozes out from the surface of the molded product and the mold surface will be extremely small, resulting in poor mold releasability. It will be done.

またこのような高級脂肪酸分子内多価アミド化合物は結
晶性が高く、融点も115℃〜160℃と高いことも離
型性に劣る理由の一つである。
Further, such higher fatty acid intramolecular polyamide compounds have high crystallinity and a melting point as high as 115° C. to 160° C., which is also one of the reasons why the mold releasability is poor.

分子内多価アミド化合物以外(二高級脂肪酸とアンモニ
アと反応させてアミド化した高級脂肪酸末端アミド化合
物や不飽和脂肪酸分子内多価アミド  j化合物があり
これらは80〜130℃と比較的低融点のワックスでは
あるが何れも耐熱性に劣り、長時間成形性の点で満足の
いくものではなかった。
In addition to intramolecular polyamide compounds (higher fatty acid terminal amide compounds that are amidated by reacting secondary fatty acids with ammonia and unsaturated fatty acid intramolecular polyamide compounds), these have a relatively low melting point of 80 to 130℃. Although they are waxes, they all have poor heat resistance and are unsatisfactory in terms of long-term moldability.

そこで本発明者らはアミド系ワックスの耐熱性、信頼性
、捺印性の良好である特徴を活かしさらに離型性を向上
させるために鋭意検討を重ねた結果、炭素数0.5以上
の二価飽和脂肪酸と炭素数15以上の長鎖脂肪族第一ア
ミンとを縮合させて得られる二価脂肪酸ビスアミド化合
物は融点が80〜140 ”Cと従来のアミド系ワック
ス:ニルべて融点が低く、離型性も良好で、しかも長時
間成形性、信頼性、・捺印性等を全て満足させるという
知見を得、本発明を完成するに到ったものである。二価
飽和脂肪酸の炭素数を5、長鎖脂肪族第一アミンの炭素
数を特に15以上と限定したのはこれ以下の炭素数のも
の同志を縮合させて得られる二価脂肪酸ビスアミド化合
物では離型性を発現できないし、特に炭素数4以下の二
価脂肪酸を用いると結晶性が高くなり融点も140℃以
上となり、これも離型性を低下させる原因となるからで
ある。
Therefore, the inventors of the present invention made extensive studies to take advantage of the heat resistance, reliability, and good marking properties of amide waxes to further improve mold release properties. The divalent fatty acid bisamide compound obtained by condensing a saturated fatty acid with a long-chain aliphatic primary amine having 15 or more carbon atoms has a melting point of 80 to 140"C. The present invention was completed based on the knowledge that it has good moldability and also satisfies long-term moldability, reliability, and stamping properties.The number of carbon atoms in the divalent saturated fatty acid was reduced to 5 The reason why the number of carbon atoms in the long-chain aliphatic primary amine is specifically limited to 15 or more is that divalent fatty acid bisamide compounds obtained by condensing together those having less than this number of carbon atoms cannot exhibit mold release properties, and This is because if a divalent fatty acid having a number of 4 or less is used, the crystallinity will be high and the melting point will be 140°C or higher, which also causes a decrease in mold releasability.

〔発明の効果〕〔Effect of the invention〕

本発明はエポキシ樹脂、硬化剤、充填剤、各種添加剤か
らなるエポキシ樹脂組成物C二内部離屋剤として特定の
二価脂肪酸ビスアミド化合物を配合してなることを特徴
とするものであり、トランスファー成形、射出成形等に
よる電子部品の多数個どりの成形ζ;適し信頼性、捺印
性、離型性、連続成形性停会て満足せしめることができ
る。
The present invention is characterized in that an epoxy resin composition C consisting of an epoxy resin, a curing agent, a filler, and various additives is blended with a specific divalent fatty acid bisamide compound as an internal release agent. Suitable for molding a large number of electronic parts by molding, injection molding, etc.; satisfies reliability, stampability, mold releasability, and continuous moldability.

次::本発明を実施例により具体的(二説明する。Next: The present invention will be explained in more detail by way of examples.

〔実施例〕〔Example〕

尚、以下において特(:限定しない限り部とあるのは重
量部を示すものである。
In the following, parts refer to parts by weight unless otherwise specified.

実施例1゜ アジピン酸(HOOC(−(、’H,+4COOH) 
146 # (1モル)、ステアリルアミン(C*5H
syN鴇) 5381 (2−t=)v ) オよびト
ルエン100 LJ、を温度計還流冷却器、攪拌器を備
えたIA!の三つロフラスコに仕込み、攪拌しながら1
20℃(:なるまで加熱した。120 ’C〜130℃
でカルボン酸とアミンの縮合反応が活発となるが生成し
た水をトルエンで共沸させて系外に除きながら約3時間
、反応系を120〜130”Cに保つ。
Example 1゜Adipic acid (HOOC(-(,'H,+4COOH)
146 # (1 mol), stearylamine (C*5H
syN) 5381 (2-t=)v) and 100 LJ of toluene, thermometer, reflux condenser, IA equipped with a stirrer! Pour into a three-bottle flask and add 1 while stirring.
Heated until 20°C (120'C to 130°C)
The condensation reaction between carboxylic acid and amine becomes active, but the reaction system is maintained at 120-130''C for about 3 hours while the water produced is azeotropically removed with toluene and removed from the system.

次::温度を180℃まで2時間かけて除々に昇温させ
て縮合反応を完結した。反応系中に残存しているトルエ
ンを減圧によって除去し、生成物を130℃以上の温度
で取り出して冷却固化させた。
Next: The temperature was gradually raised to 180° C. over 2 hours to complete the condensation reaction. Toluene remaining in the reaction system was removed under reduced pressure, and the product was taken out at a temperature of 130°C or higher and solidified by cooling.

反応生成物の融点を測定した結果136℃であった。一
方生成物の赤外吸収スペクトルを測定すると、原料カル
ボン酸の1710 cIIL−1のカルボニルの吸収が
先金に消失し、代わり1ニアミドのカルボニルの吸収が
1640α−1に現われ、二価カルボン酸とアミンの縮
合反応はほぼ定量的におこり、得られた反応生成物は所
望の二価脂肪酸ビスアミド化合物であることが確認され
た。
The melting point of the reaction product was measured and found to be 136°C. On the other hand, when the infrared absorption spectrum of the product was measured, the carbonyl absorption of 1710 cIIL-1 of the raw material carboxylic acid disappeared beforehand, and instead, the carbonyl absorption of 1-niamide appeared at 1640α-1, indicating that it was a divalent carboxylic acid. It was confirmed that the amine condensation reaction occurred almost quantitatively, and the resulting reaction product was the desired divalent fatty acid bisamide compound.

次にこの二価脂肪酸ビスアミド化合物5.5部を内部離
散剤としてクレゾールノボ2ツクエポキシ(エポキシ当
M 220 ) 100部、臭素化フェノールノボラッ
クエポキシ(エポキシ当量300)30部、フェノール
ノボラック硬化剤(分子量750 ) 60部、2−エ
チル−4−メチルイミダゾール0.5部、結晶シリカ粉
末400部、シランカップリング剤2.0部、三酸化ア
ンチモン30部、カーボンブラック2.0部ととも;二
配合し混合、混練して得た成形材料を半導体封止用樹脂
組成物とした。
Next, 5.5 parts of this divalent fatty acid bisamide compound was used as an internal dissipating agent, 100 parts of cresol novolac epoxy (M220 per epoxy), 30 parts of brominated phenol novolac epoxy (epoxy equivalent: 300), and a phenol novolac curing agent (molecular weight: 750). ) 60 parts, 0.5 parts of 2-ethyl-4-methylimidazole, 400 parts of crystalline silica powder, 2.0 parts of silane coupling agent, 30 parts of antimony trioxide, and 2.0 parts of carbon black; The molding material obtained by mixing and kneading was used as a resin composition for semiconductor encapsulation.

実施例2゜ スペリン酸(H00C4−eH,+6eoOH)174
N (1モル)、ステアリルアミン538 !I(2モ
ル)およびトルエン130頭を実施例1と同様(二して
反応し、二価脂肪酸ビスアミド化合物を得た。この化合
物の融点は128℃であった。続いてこの化合物35部
を内部離型剤として実施例1と同様の組成で配合し、半
導体封止用樹脂組成物を得た。
Example 2° Speric acid (H00C4-eH, +6eoOH) 174
N (1 mol), stearylamine 538! I (2 mol) and 130 toluene were reacted in the same manner as in Example 1 to obtain a divalent fatty acid bisamide compound. The melting point of this compound was 128°C. Subsequently, 35 parts of this compound was A mold release agent was blended in the same composition as in Example 1 to obtain a resin composition for semiconductor encapsulation.

実施例3゜ セパシン酸(HOOC+CH,す、(、’0OH)  
202.9 (1モル)、ステアリルアミン538 N
 (2そ/I/)およびトルエン150=を実施例1と
同様(ニして反応し、高級脂肪酸分子内モノアミド化合
物を得た。この化合物の融点は123℃であった。続い
てこの化合物25部を内部離散剤として実施例1と同様
の組成で配合し半導体封止用樹脂組成物を得た。
Example 3 Sepacic acid (HOOC+CH,su,(,'0OH)
202.9 (1 mol), stearylamine 538 N
(2so/I/) and toluene 150= were reacted in the same manner as in Example 1 to obtain a higher fatty acid intramolecular monoamide compound. The melting point of this compound was 123°C. A resin composition for encapsulating a semiconductor was obtained by blending the same composition as in Example 1, using the following ingredients as an internal dissipating agent.

実施例4.。Example 4. .

実施例1で得た二価脂肪酸ビスアミド化合物5.0部と
カルナバワックス0.5部とを内部離型剤として実施例
1と同様の組成で配合して半導体対土用エポキシ樹脂組
成物を得た。
An epoxy resin composition for semiconductors was obtained by blending 5.0 parts of the divalent fatty acid bisamide compound obtained in Example 1 and 0.5 parts of carnauba wax as an internal mold release agent in the same composition as in Example 1. Ta.

比較例1〜6 内部離型剤として下記の第1表礪;記載したもの以外は
全て実施例1と同様の組成で配合し6種の半導体対土用
エポキシ樹脂組成物を得た。
Comparative Examples 1 to 6 Six types of epoxy resin compositions for semiconductors were prepared using the same compositions as in Example 1 except for those listed in Table 1 below as an internal mold release agent.

第  1  表 上記組成物をトランスファー成形機によ)圧力60 y
yycu?、金製温度175℃、2分30秒の条件で成
形品を成形しさらに175℃で4時間のボストキエアー
を行ない半導体封止物を得た。成形時の離型性および長
時間成形性、成形品の信頼性、捺印性は第2表に示され
る通りであった。各特性の評価は以下のようにして行な
った。
Table 1 The above composition was molded using a transfer molding machine) at a pressure of 60 y.
Yyycu? A molded article was molded at a metal temperature of 175° C. for 2 minutes and 30 seconds, and further air-boosted at 175° C. for 4 hours to obtain a semiconductor sealed article. The mold releasability during molding, the long-term moldability, the reliability of the molded product, and the stampability were as shown in Table 2. Evaluation of each characteristic was performed as follows.

(a)離型性 金型上下のうち下型のみノックビン付きのもので連続成
形を行ない上型(ノックビンなし)に成形品が付着し容
易(二離壓しなくなった成形回数で評価した。
(a) Mold releasability Among the upper and lower molds, only the lower mold was equipped with a knock bottle, and continuous molding was carried out, and the molded product was easily attached to the upper mold (without knock bottle) and evaluated by the number of moldings at which it did not come loose.

(b)長時間成形性 金型表面が鏡面状態(二あるもので連続成形を実施し成
形品表面が汚れ【外観;;くもりが生じ始めた時の成形
回数で示した。
(b) Long-term moldability The surface of the mold is in a mirror-like state (in two cases, continuous molding was performed and the surface of the molded product was dirty [appearance; indicated by the number of moldings when cloudiness began to occur).

(C)信頼性。(C) Reliability.

得られたIC封止物::ついてプレッシャークツカーテ
スト(PC,’T : 120℃水蒸気、2気圧)を行
ない、アルミ配線の腐蝕を調べた。アルミニウム腐蝕に
よるオープン発生を検出し初期不良発生時間で表現した
The resulting IC encapsulation was subjected to a pressure test (PC, 'T: 120° C. steam, 2 atm) to examine corrosion of the aluminum wiring. The occurrence of open circuits due to aluminum corrosion was detected and expressed as the initial failure occurrence time.

(d)捺印性 得られたIC封正物表面にマーケム社製97224シル
バーインクで捺印し、150℃で1時間インクキエアー
を行なった後セロテープで引き剥しテストを実施し、少
しでも文字の欠落のある場合は不良とした。
(d) Stamping property The surface of the IC package obtained was stamped with 97224 silver ink manufactured by Markem, and after ink air was applied at 150°C for 1 hour, a peeling test was performed with cellophane tape to ensure that even the slightest characters were missing. If there is, it is considered defective.

第  2  表 ×・・・ 500回以下 牽3  0・・・1200時間以上、△・・・800〜
1200時間、×・・・ 800時間以下
Table 2 ×...500 times or less 3 0...1200 hours or more, △...800~
1200 hours, ×... 800 hours or less

Claims (3)

【特許請求の範囲】[Claims] (1)エポキシ樹脂および式〔A〕で表わされる二価脂
肪酸ビスアミド化合物を0.01〜10重量%配合して
なることを特徴とする半導体封止用樹脂組成物。▲数式
、化学式、表等があります▼ (l、nは14以上の整数、mは3以上の整数)
(1) A resin composition for semiconductor encapsulation, comprising an epoxy resin and a divalent fatty acid bisamide compound represented by formula [A] in an amount of 0.01 to 10% by weight. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (l, n are integers of 14 or more, m is an integer of 3 or more)
(2)二価脂肪酸ビスアミド化合物が炭素数5以上の二
価脂肪酸と炭素数15以上の長鎖脂肪族第一アミンとを
縮合させてなることを特徴とする特許請求の範囲第1項
記載の半導体封止用樹脂組成物。
(2) The divalent fatty acid bisamide compound is obtained by condensing a divalent fatty acid having 5 or more carbon atoms with a long-chain aliphatic primary amine having 15 or more carbon atoms. Resin composition for semiconductor encapsulation.
(3)二価脂肪酸ビスアミド化合物の融点が80〜14
0℃であることを特徴とする特許請求の範囲第1項記載
の半導体封止用樹脂組成物。
(3) The melting point of the divalent fatty acid bisamide compound is 80 to 14
The resin composition for semiconductor encapsulation according to claim 1, characterized in that the temperature is 0°C.
JP18437084A 1984-09-05 1984-09-05 Resin composition for sealing semiconductor Granted JPS6162516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18437084A JPS6162516A (en) 1984-09-05 1984-09-05 Resin composition for sealing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18437084A JPS6162516A (en) 1984-09-05 1984-09-05 Resin composition for sealing semiconductor

Publications (2)

Publication Number Publication Date
JPS6162516A true JPS6162516A (en) 1986-03-31
JPH0378404B2 JPH0378404B2 (en) 1991-12-13

Family

ID=16152031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18437084A Granted JPS6162516A (en) 1984-09-05 1984-09-05 Resin composition for sealing semiconductor

Country Status (1)

Country Link
JP (1) JPS6162516A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6475554A (en) * 1987-09-17 1989-03-22 Toshiba Corp Epoxy resin composition and resin-sealing type semiconductor device
JPH0258572A (en) * 1988-08-25 1990-02-27 Kanegafuchi Chem Ind Co Ltd Molding resin composition
JPH06200127A (en) * 1993-01-07 1994-07-19 Matsushita Electric Works Ltd Epoxy resin molding material for sealing

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6475554A (en) * 1987-09-17 1989-03-22 Toshiba Corp Epoxy resin composition and resin-sealing type semiconductor device
JPH0258572A (en) * 1988-08-25 1990-02-27 Kanegafuchi Chem Ind Co Ltd Molding resin composition
JPH06200127A (en) * 1993-01-07 1994-07-19 Matsushita Electric Works Ltd Epoxy resin molding material for sealing

Also Published As

Publication number Publication date
JPH0378404B2 (en) 1991-12-13

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