JPS6156843A - Electrostatic attractive plate - Google Patents

Electrostatic attractive plate

Info

Publication number
JPS6156843A
JPS6156843A JP17674584A JP17674584A JPS6156843A JP S6156843 A JPS6156843 A JP S6156843A JP 17674584 A JP17674584 A JP 17674584A JP 17674584 A JP17674584 A JP 17674584A JP S6156843 A JPS6156843 A JP S6156843A
Authority
JP
Japan
Prior art keywords
plate
thin layer
insulating material
processed
electrostatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17674584A
Other languages
Japanese (ja)
Inventor
Tsukasa Yaita
矢板 司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP17674584A priority Critical patent/JPS6156843A/en
Publication of JPS6156843A publication Critical patent/JPS6156843A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enable a plate shaped workpiece to be easily removed when it is removed from an electrostatic attractive plate, by providing grooves on the surface of a thin layer of elastic insulating material in a condition such that ratio of a width of the groove to its space obtains 1:10. CONSTITUTION:An insulating base plate 1 consists of a Al2O3 plate in diameter about 300mm., and its surface applies surface finishing by machining. Next the plate 1 forms an electrostatic electrode 2, 3 by the method of silk screen printing, further the surface of the insulating base plate 1 is coated with a thin layer 4 of elastic insulating material in a thickness about 0.2mm. by using the method of silk screen printing. Thereafter, this insulating material thin layer 4 provides on its surface a groove 8 in width about 1.5mm. in such a manner that ratio of the width of the groove to its space obtains 1:10. By this electrostatic attractive plate, the groove 8, being provided in a sporadic condition, enables good diffusion of heat from a plate shaped workpiece 5 to be obtained. While the plate shaped workpiece is also easily removed from the thin layer 4 of insulating material by forcing nitrogen gas or the like to be fed by pressure into the groove 8.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体製造時において半導体ウニノ・等の被
加工板状体の保持具として使用される計゛亀吸着板に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a tortoise suction plate used as a holder for a plate-like object to be processed, such as a semiconductor unit, during semiconductor manufacturing.

〔従来の技術〕[Conventional technology]

従来よシ半導体製造時において、被加工ウニノ・に対す
るイオンビームミリングあるいはマグネトロンスパンタ
リングによるエツチングを行なう際に、被加工ウェハを
保持するために静電吸着板が使用されている。
Conventionally, in semiconductor manufacturing, an electrostatic chuck plate has been used to hold a wafer to be processed when the wafer to be processed is etched by ion beam milling or magnetron sputtering.

この静電吸着板は1例えば第5図および第4図に示され
ているように、At20.よりなる絶縁基板1と、この
絶縁基板1の表面上に正負交互に配列された櫛歯状の静
電電極2および3と、絶縁基板1の表面と静電電極2お
よび3とを被って設けられた弾性絶縁材薄層4とよシな
シ、この絶縁材薄層4上に半導体ウニノ・のような被加
工板状体を載置した状態で正負の静電電極2および3に
+1500ボルトおよび−1500ボルト程度の電圧を
印加して、被加工板状体5を吸着保持するようになされ
ている。そしてこの静電吸着板に被加工板状体5を吸着
保持させた状態で、被加工板状体5に対して例えばイオ
ンビームミリングによるエツチング加工を施すが、この
加工によシ被加工板状体5に熱エネルギが発生して被加
工板状体5の温度が上昇する。この温度上昇が著しい場
合、エツチングのために被加工板状体5の上面に塗布さ
れているフォトレノストが炭化してその被加工板状体5
が不良品となるため1弾性絶縁材薄層4の上面と被加工
板状体5の下面との密着性を良好にして被加工板状体5
に発生した熱を弾性絶縁材薄層4を介して絶縁基板1に
伝達するとともに、絶縁基板1の下面に冷却水6を接触
させ、この冷却水6中に放熱するようなされている。
This electrostatic adsorption plate is 1, for example, as shown in FIGS. 5 and 4, At20. An insulating substrate 1 consisting of an insulating substrate 1, comb-shaped electrostatic electrodes 2 and 3 arranged alternately in positive and negative directions on the surface of the insulating substrate 1, and provided so as to cover the surface of the insulating substrate 1 and the electrostatic electrodes 2 and 3. +1500 volts is applied to the positive and negative electrostatic electrodes 2 and 3 while a plate-like object to be processed, such as a semiconductor chip, is placed on the insulating thin layer 4. A voltage of approximately -1,500 volts is applied to hold the plate-shaped object 5 to be processed by suction. Then, with the plate-like object 5 to be processed being attracted and held by this electrostatic adsorption plate, the plate-like object 5 to be processed is subjected to an etching process, for example, by ion beam milling. Thermal energy is generated in the body 5 and the temperature of the plate-shaped body 5 to be processed rises. If this temperature rise is significant, the photorenost coated on the top surface of the plate-like object 5 to be processed for etching will be carbonized and the plate-like object 5 to be processed will be carbonized.
1. The thin elastic insulating material layer 4 is made to have good adhesion between the upper surface of the thin elastic insulation layer 4 and the lower surface of the plate-like object 5 to be processed.
The heat generated is transmitted to the insulating substrate 1 via the elastic insulating thin layer 4, and cooling water 6 is brought into contact with the lower surface of the insulating substrate 1, so that the heat is radiated into the cooling water 6.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

以上の記載から明らかなように、静電電極2および3に
通電されて被加工板状体5が静電吸着板。
As is clear from the above description, when the electrostatic electrodes 2 and 3 are energized, the plate-like object 5 to be processed becomes an electrostatic adsorption plate.

に吸着保持されている場合には、被加工板状体5と絶縁
材薄層4との良好な密着性が必要であるが、被加工板状
体5に対する所要の加工を施した後。
In the case where the plate-shaped body 5 to be processed and the thin insulating material layer 4 are held by suction, good adhesion between the plate-shaped body 5 to be processed and the thin insulating material layer 4 is required.

静電電極2および3に対する通電を停止して、被加工板
状体5を静電吸着板上から取外す場合1両者の密着性が
良好な場合建は、通電停止後も密着した状態が継続して
被加工板状体5の取外しが困難であった。
When the electrostatic electrodes 2 and 3 are de-energized and the workpiece plate 5 is removed from the electrostatic adsorption plate 1. If the adhesion between the two is good, the electrodes will remain in close contact even after the de-energization is stopped. Therefore, it was difficult to remove the plate-shaped object 5 to be processed.

この問題を解決するだめの1つの方法として、絶縁材薄
層4の表面に、第5図に示すような溝7を設けることが
考えられる。しかしながらこの溝7の間隔を例えば1:
3のように密なものにすると、第6図の拡大図に示すよ
うに白部分の表面が凹んで、その上に載置されている被
加工板状体5と絶縁材薄層4との間に空間が生じ、その
結果両者の接触状態が点接触状態となって安定な支持状
態が得られないばかシでなく、被加工板状体5に発生し
た熱が絶縁基板1側に充分に伝達されないという不都合
を生じる。絶縁材薄層4はスフIJ +ン印刷法によシ
絶縁基板1の面上に形成されるため、後処理によってこ
のような凹みを修正することは不可能であった。
One possible solution to this problem is to provide grooves 7 on the surface of the thin insulating layer 4 as shown in FIG. However, if the interval between the grooves 7 is set to 1:
If it is dense as shown in Fig. 3, the surface of the white part will be concave, as shown in the enlarged view of Fig. 6, and the plate-like object 5 to be processed and the thin insulating material layer 4 placed on it will become indented. Rather than creating a space between the two and resulting in a point contact between the two, which makes it impossible to obtain a stable support, the heat generated in the plate-shaped object 5 to be processed is sufficiently transferred to the insulating substrate 1 side. This causes the inconvenience of not being transmitted. Since the thin layer of insulating material 4 is formed on the surface of the insulating substrate 1 by the inkjet printer printing method, it has been impossible to correct such dents by post-processing.

〔問題点を解決するための手段〕[Means for solving problems]

そこで本発明においては、弾性絶縁材薄層の表面に、加
工後の被加工板状体の除去を容易にする溝を設けるとし
ても、その溝を、被加工板状体との密着性を確保しつる
ように疎の状態に設けたものである。
Therefore, in the present invention, even if grooves are provided on the surface of the thin layer of elastic insulating material to facilitate removal of the plate-like object to be processed after processing, the grooves are designed to ensure adhesion to the plate-like object to be processed. It was set up sparsely so that it would hang down.

〔作 用〕[For production]

この弾性絶縁材薄層の表面に設けられる溝は。 The grooves provided on the surface of this thin layer of elastic insulation material.

その間隔が1:10以上となるように疎に設けられるこ
とにより、絶縁材薄層の表面の平面度は良好に保たれ、
したがって被加工板状体の密着性は良好であり、加工後
に静電電極に対する通電を停止して被加工板状体を静電
吸着板上から除去する場合には、溝内に例えば窒素ガス
を圧送することによ)除去が容易となる。
By spacing them sparsely at a ratio of 1:10 or more, the flatness of the surface of the thin insulating layer is maintained well.
Therefore, the adhesion of the plate-shaped object to be processed is good, and when the electricity to the electrostatic electrode is stopped after processing and the plate-shaped object to be processed is removed from the electrostatic adsorption plate, for example, nitrogen gas is injected into the groove. Removal is facilitated by pumping).

〔発明の実施例〕[Embodiments of the invention]

第1図は本発明による静電吸着板の一実施例を第4図に
対応させて示し、絶縁基板1は直径約300闘のAt2
03板よりなシ、その表面に対し機械加工による平面仕
上げを行なった後、静電電極2および3をシルクスクリ
ーン印刷法で形成し。
FIG. 1 shows an embodiment of the electrostatic adsorption plate according to the present invention in correspondence with FIG.
After the surface of the 03 plate was flat-finished by machining, the electrostatic electrodes 2 and 3 were formed by silk screen printing.

さらに絶縁基板lの表面と静電電極2および3とを被っ
て厚さQ、2mm程度の弾性絶縁材薄層4をシルクスク
リーン印刷法金用いて被着させ1次にこの絶縁材薄層4
の表面に幅1.5間程度の溝8を設ける。溝8の間隔は
l:10以上とするのがよい。
Furthermore, a thin layer 4 of elastic insulating material with a thickness Q of about 2 mm is deposited over the surface of the insulating substrate 1 and the electrostatic electrodes 2 and 3 using a silk screen printing method.
A groove 8 having a width of about 1.5 mm is provided on the surface of the plate. The interval between the grooves 8 is preferably 1:10 or more.

第2図は本発明の他の実施例を示し、静電電極2および
3が絶縁基板1の表面部分に、絶縁基板lの表面と静電
電極2および3の表面とが平坦な同一平面関係となるよ
うな態様で埋設されている。
FIG. 2 shows another embodiment of the present invention, in which electrostatic electrodes 2 and 3 are placed on the surface of an insulating substrate 1, and the surface of the insulating substrate l and the surfaces of the electrostatic electrodes 2 and 3 are flat and on the same plane. It is buried in such a manner that

このようにすれば、絶縁材薄層40表面の平面度をさら
に良好なものとすることができる。
In this way, the flatness of the surface of the thin insulating material layer 40 can be further improved.

〔発明の効果〕〔Effect of the invention〕

以上の説明で明らかなように、本発明によれば。 As is clear from the above description, according to the present invention.

弾性絶縁材薄層の表面に、被加工板状体との密着性を確
保しかつ被加工板状体の除去を容易にする手段例えば疎
に形成された溝を設けたので、被加工板状体からの良好
な熱放散が可能でありかつこの溝内に窒素ガス等の不活
性ガスを圧送することによって被加工板状体の除去をも
容易である。
The surface of the thin layer of elastic insulating material is provided with a means to ensure adhesion to the plate-shaped object to be processed and to facilitate the removal of the plate-shaped object to be processed, such as sparsely formed grooves. Good heat dissipation from the body is possible, and the plate-shaped body to be processed can be easily removed by pumping an inert gas such as nitrogen gas into the groove.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による静電吸着板の一実施例の部分的拡
大断面図、第2図は他の実施例の部分的拡大断面図、第
5図は従来の静電吸着板の一部を切截した平面図、第4
図は第6図のIV−IV線上の部分的拡大断面図、第5
図は従来の静電吸着板の部分的拡大断面図、第6図は第
5図の部分的拡大図である。 図面において、1は絶縁基板、2および3は静電電極、
4は弾性絶縁材薄層、5は被加工板状体。 8は溝をそれぞれ示す。
FIG. 1 is a partially enlarged cross-sectional view of one embodiment of an electrostatic chuck plate according to the present invention, FIG. 2 is a partially enlarged cross-sectional view of another embodiment, and FIG. 5 is a part of a conventional electrostatic chuck plate. Plan view cut away, No. 4
The figure is a partially enlarged sectional view taken along line IV-IV in Figure 6.
The figure is a partially enlarged sectional view of a conventional electrostatic chuck plate, and FIG. 6 is a partially enlarged view of FIG. 5. In the drawings, 1 is an insulating substrate, 2 and 3 are electrostatic electrodes,
4 is a thin layer of elastic insulating material, and 5 is a plate-shaped object to be processed. 8 indicates a groove, respectively.

Claims (1)

【特許請求の範囲】 1、絶縁基板と、この絶縁基板の表面上に正負交互に配
列された静電電極と、前記絶縁基板の表面と前記静電電
極とを被って設けられた弾性絶縁材薄層とよりなり、こ
の絶縁材薄層上に被加工板状体を載置した状態で前記正
負の静電電極間に通電して前記被加工板状体を吸着保持
するようになされた静電吸着板において、 前記被加工板状体との密着性を確保しかつ前記被加工板
状体の加工後の除去を容易にする手段を前記弾性絶縁材
薄層の表面に設けたことを特徴とする静電吸着板。 2、前記手段が、前記弾性絶縁材薄層上に粗に形成され
た溝である特許請求の範囲第1項記載の静電吸着板。
[Claims] 1. An insulating substrate, electrostatic electrodes arranged alternately in positive and negative directions on the surface of the insulating substrate, and an elastic insulating material provided to cover the surface of the insulating substrate and the electrostatic electrodes. The electrostatic material is made of a thin layer of insulating material, and when a plate-like object to be processed is placed on this thin layer of insulating material, current is applied between the positive and negative electrostatic electrodes to attract and hold the plate-like object to be processed. The electrochucking plate is characterized in that means is provided on the surface of the elastic insulating thin layer to ensure adhesion to the plate-like object to be processed and to facilitate removal of the plate-like object after processing. Electrostatic adsorption plate. 2. The electrostatic adsorption plate according to claim 1, wherein said means is a groove roughly formed on said thin layer of elastic insulating material.
JP17674584A 1984-08-27 1984-08-27 Electrostatic attractive plate Pending JPS6156843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17674584A JPS6156843A (en) 1984-08-27 1984-08-27 Electrostatic attractive plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17674584A JPS6156843A (en) 1984-08-27 1984-08-27 Electrostatic attractive plate

Publications (1)

Publication Number Publication Date
JPS6156843A true JPS6156843A (en) 1986-03-22

Family

ID=16019059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17674584A Pending JPS6156843A (en) 1984-08-27 1984-08-27 Electrostatic attractive plate

Country Status (1)

Country Link
JP (1) JPS6156843A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234994A (en) * 1988-07-25 1990-02-05 Abisare:Kk Electrostatic attraction plate utilizing remaining attraction force
JPH02219203A (en) * 1989-02-20 1990-08-31 Fuji Electric Co Ltd Manufacture of voltage dependent nonlinear resistive element
WO1994020984A1 (en) * 1993-03-08 1994-09-15 Wolfowitz, Steven, Alan Non-adhesive ecologically-pure electroadhesion method of clamping and fixing materials
US5841624A (en) * 1997-06-09 1998-11-24 Applied Materials, Inc. Cover layer for a substrate support chuck and method of fabricating same
US5885469A (en) * 1996-11-05 1999-03-23 Applied Materials, Inc. Topographical structure of an electrostatic chuck and method of fabricating same
WO2007007731A1 (en) * 2005-07-12 2007-01-18 Creative Technology Corporation Apparatus for removing foreign material from substrate and method for removing foreign material from substrate

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234994A (en) * 1988-07-25 1990-02-05 Abisare:Kk Electrostatic attraction plate utilizing remaining attraction force
JPH02219203A (en) * 1989-02-20 1990-08-31 Fuji Electric Co Ltd Manufacture of voltage dependent nonlinear resistive element
WO1994020984A1 (en) * 1993-03-08 1994-09-15 Wolfowitz, Steven, Alan Non-adhesive ecologically-pure electroadhesion method of clamping and fixing materials
US5885469A (en) * 1996-11-05 1999-03-23 Applied Materials, Inc. Topographical structure of an electrostatic chuck and method of fabricating same
US5841624A (en) * 1997-06-09 1998-11-24 Applied Materials, Inc. Cover layer for a substrate support chuck and method of fabricating same
WO2007007731A1 (en) * 2005-07-12 2007-01-18 Creative Technology Corporation Apparatus for removing foreign material from substrate and method for removing foreign material from substrate
JPWO2007007731A1 (en) * 2005-07-12 2009-01-29 株式会社クリエイティブ テクノロジー Substrate foreign matter removing apparatus and substrate foreign matter removing method
JP4616346B2 (en) * 2005-07-12 2011-01-19 株式会社クリエイティブ テクノロジー Substrate foreign matter removing apparatus and substrate foreign matter removing method
US8196594B2 (en) 2005-07-12 2012-06-12 Creative Technology Corporation Apparatus for removing foreign material from substrate and method for removing foreign material from substrate
TWI420579B (en) * 2005-07-12 2013-12-21 Creative Tech Corp And a foreign matter removing method for a substrate

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