JPS6154271B2 - - Google Patents

Info

Publication number
JPS6154271B2
JPS6154271B2 JP4421680A JP4421680A JPS6154271B2 JP S6154271 B2 JPS6154271 B2 JP S6154271B2 JP 4421680 A JP4421680 A JP 4421680A JP 4421680 A JP4421680 A JP 4421680A JP S6154271 B2 JPS6154271 B2 JP S6154271B2
Authority
JP
Japan
Prior art keywords
resistance value
diaphragm
gauge
pressure
gauge resistors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4421680A
Other languages
Japanese (ja)
Other versions
JPS56140670A (en
Inventor
Tooru Shinmen
Mitsuhiko Asano
Hideaki Goshima
Hirokazu Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Cable Works Ltd
Original Assignee
Fujikura Cable Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Cable Works Ltd filed Critical Fujikura Cable Works Ltd
Priority to JP4421680A priority Critical patent/JPS56140670A/en
Publication of JPS56140670A publication Critical patent/JPS56140670A/en
Publication of JPS6154271B2 publication Critical patent/JPS6154271B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Pressure Sensors (AREA)

Description

【発明の詳細な説明】 この発明は、ピエゾ抵抗効果を利用したダイア
フラム型の半導体圧力センサに関して、特に絶対
圧測定に適した半導体圧力センサに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a diaphragm type semiconductor pressure sensor that utilizes a piezoresistance effect, and particularly to a semiconductor pressure sensor suitable for absolute pressure measurement.

半導体圧力センサは、典型的には次のように構
成されている。すなわち第1図及び第2図に示す
ように、面方位が(100)のシリコン単結晶基板
のチツプ1の中央部に薄肉部を設け、これをダイ
アフラム(起歪部)2とし、このダイアフラム2
上に不純物拡散によりゲージ抵抗R1〜R4を各抵
抗値ができるだけ均一になるように形成する。こ
のチツプ1をシリコン単結晶の台座4に接着剤に
より接着し、ダイアフラム2の背面を真空室3と
する。圧力Rがダイアフラム2に加わると、ゲー
ジ抵抗R1,R3はその抵抗値が減少し、ゲージ抵
抗R2,R4は増加する。そのため第3図に示すよ
うに、ゲージ抵抗R1〜R4をブリツジ接続し、一
定の電圧を加えてブリツジ出力Vを取り出せば、
この出力Vは圧力Pに比例する。
A semiconductor pressure sensor is typically configured as follows. That is, as shown in FIGS. 1 and 2, a thin part is provided at the center of a chip 1 of a silicon single crystal substrate with a plane orientation of (100), and this is used as a diaphragm (strain part) 2.
Gauge resistors R 1 to R 4 are formed thereon by impurity diffusion so that their respective resistance values are as uniform as possible. This chip 1 is adhered to a silicon single crystal pedestal 4 with an adhesive, and the back surface of the diaphragm 2 is used as a vacuum chamber 3. When pressure R is applied to the diaphragm 2, the resistance values of the gauge resistances R 1 and R 3 decrease, and the resistance values of the gauge resistances R 2 and R 4 increase. Therefore, as shown in Fig. 3, if the gauge resistors R 1 to R 4 are bridge-connected and a constant voltage is applied to obtain the bridge output V,
This output V is proportional to the pressure P.

このようにブリツジ接続することにより、拡散
抵抗は本来温度係数が非常に大きいという欠点を
もつているのであるが、これを互いに相殺し、温
度による零ドリフト及び感度変化を小さくするこ
とができるようにしている。
By bridge-connecting them in this way, diffused resistors originally have the disadvantage of having a very large temperature coefficient, but this can be canceled out and zero drift and sensitivity changes due to temperature can be reduced. ing.

ところでゲージ抵抗R1〜R4の各抵抗値は、ダ
イアフラム2の無歪状態で略均一になるように設
計・製造されているのが普通である。しかしなが
ら絶対圧測定の場合は、1気圧以上のある圧力範
囲の測定に使用されるのが通常である。この場
合、各抵抗値の変化は第4図に示すようになり、
真空中でダイアフラム2に歪が生じない状態では
各抵抗値は製造時のばらつきの範囲内で似たよう
な値になつているが、肝心の使用範囲の圧力が加
えられた状態ではゲージ抵抗R1,R3とR2,R4
では抵抗値が非常に異つた値となつてしまう。そ
してこのように抵抗値が大きく異ると、温度係数
が同一であつても変化分が大きく異るため、第5
図に示すようにブリツジ出力Vに温度変化の影響
が大きく顕われ、この影響は測定圧力が大になる
ほど顕著になる。
Incidentally, the gauge resistors R 1 to R 4 are usually designed and manufactured so that their resistance values are substantially uniform when the diaphragm 2 is in an unstrained state. However, in the case of absolute pressure measurement, it is usually used to measure a pressure range of 1 atmosphere or more. In this case, the changes in each resistance value will be as shown in Figure 4,
When the diaphragm 2 is not strained in vacuum, each resistance value is similar within the range of manufacturing variations, but when pressure is applied within the critical usage range, the gauge resistance R 1 , R 3 and R 2 , R 4 have very different resistance values. If the resistance values differ greatly in this way, even if the temperature coefficient is the same, the amount of change will differ greatly.
As shown in the figure, the bridge output V is greatly affected by temperature changes, and this effect becomes more pronounced as the measured pressure increases.

本発明は、上記の温度変化による悪影響を緩和
するよう改善した半導体圧力センサを提供するこ
とを目的とするもので、使用圧力範囲に対応して
予めゲージ抵抗の各抵抗値にオフセツトを設ける
ように設計・製造し、ゲージ抵抗の各抵抗値が使
用圧力範囲でできるだけ近いものとなるようにす
ることを特徴とする。
An object of the present invention is to provide a semiconductor pressure sensor that is improved so as to alleviate the adverse effects caused by the above-mentioned temperature changes. It is characterized in that it is designed and manufactured so that each resistance value of the gauge resistor is as close as possible within the working pressure range.

次に、本発明の一実施例について説明する。例
えば第6図に示すように、加圧により抵抗値が増
加するゲージ抵抗R1,R3の組の抵抗値が、加圧
により抵抗値が減少するゲージ抵抗R2,R4の組
の抵抗値よりもダイアフラムの無歪状態において
オフセツト値△Rだけ小さくなるように設計・製
造しておく。するとこの第6図の場合には、ダイ
アフラムが加圧されて使用圧力状態の下限に達し
たとき、抵抗値が略等しいものとなる。そのため
この使用範囲内では、ゲージ抵抗R1,R3の抵抗
値とゲージ抵抗R2,R4の抵抗値はそれほど大き
く異つた値とならず、そのため温度による変化分
も従来に比して小さくなる。従つてブリツジ出力
Vは第7図に示すように、使用範囲の下限におい
て温度変化の影響を略受けないようになり、使用
範囲の上限においてはその影響が生じるがその程
度は少なく、従来に比して著しく改善される。
Next, one embodiment of the present invention will be described. For example, as shown in Figure 6, the resistance value of the pair of gauge resistors R 1 and R 3 whose resistance value increases with pressurization is the resistance value of the pair of gauge resistors R 2 and R 4 whose resistance value decreases with pressurization. It is designed and manufactured so that the offset value ΔR is smaller than the value when the diaphragm is in a non-strained state. Then, in the case of FIG. 6, when the diaphragm is pressurized and reaches the lower limit of the operating pressure state, the resistance values become approximately equal. Therefore, within this usage range, the resistance values of gauge resistors R 1 and R 3 and the resistance values of gauge resistors R 2 and R 4 do not differ significantly, and therefore the change due to temperature is also smaller than before. Become. Therefore, as shown in Figure 7, the bridge output V is almost unaffected by temperature changes at the lower end of the operating range, and although it does have an effect at the upper end of the operating range, the degree is small and compared to the conventional one. The result is a marked improvement.

また、抵抗値のオフセツトの値△Rは使用範囲
の下限の圧力で等しくなるように設定するだけに
限らず、使用圧力範囲内のどの点で等しくなるよ
うに設定することも可能である。例えば第8図に
示すように、使用圧力範囲の中央で略等しくなる
ようオフセツト値△Rを設定すれば、ブリツジ出
力Vの温度特性は第9図に示すようになり、原理
的に温度特性が最も良好となる。
Further, the offset value ΔR of the resistance value is not limited to being set to be equal at the lower limit pressure of the working pressure range, but can also be set to be equal at any point within the working pressure range. For example, as shown in Figure 8, if the offset values △R are set to be approximately equal at the center of the working pressure range, the temperature characteristics of the bridge output V will become as shown in Figure 9, and in principle the temperature characteristics will change. Most favorable.

以上、実施例について説明したように、本発明
によれば、ゲージ抵抗をなす拡散抵抗の抵抗値に
オフセツト値を設けるようにして設計・製造して
おき、使用圧力範囲でゲージ抵抗の各抵抗値がで
きるだけ近に値となるようにしているため、温度
変化による悪影響を緩和することができる。
As described above with respect to the embodiments, according to the present invention, the resistance value of the diffused resistor constituting the gauge resistor is designed and manufactured to have an offset value, and each resistance value of the gauge resistor is set within the working pressure range. Since the values are made to be as close as possible, the adverse effects of temperature changes can be alleviated.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第5図は従来例を説明するためのも
ので、第1図は平面図、第2図は縦断面図、第3
図は接続関係を示す回路図、第4図は圧力とゲー
ジ抵抗の抵抗値との関係を示すグラフ、第5図は
圧力とブリツジ出力Vとの関係を示すグラフ、第
6図は本発明の第1の実施例にかかる圧力とゲー
ジ抵抗の抵抗値との関係を示すグラフ、第7図は
同実施例にかかる圧力とブリツジ出力Vとの関係
を示すグラフ、第8図は第2の実施例にかかる圧
力とゲージ抵抗の抵抗値との関係を示すグラフ、
第9図は同実施例にかかる圧力とブリツジ出力V
との関係を示すグラフである。 1……チツプ、2……ダイアフラム、3……真
空室、4……台座、R1〜R4……ゲージ抵抗。
Figures 1 to 5 are for explaining the conventional example. Figure 1 is a plan view, Figure 2 is a vertical sectional view, and Figure 3 is a longitudinal sectional view.
4 is a graph showing the relationship between pressure and the resistance value of the gauge resistor. FIG. 5 is a graph showing the relationship between pressure and bridge output V. FIG. 6 is a graph showing the relationship between pressure and bridge output V. A graph showing the relationship between the pressure applied to the first embodiment and the resistance value of the gauge resistance, FIG. 7 a graph showing the relationship between the pressure applied to the same embodiment and the bridge output V, and FIG. 8 a graph showing the relationship between the pressure applied to the first embodiment and the bridge output V. A graph showing the relationship between the pressure applied to the example and the resistance value of the gauge resistance,
Figure 9 shows the pressure applied to the same example and the bridge output V.
It is a graph showing the relationship between 1...chip, 2...diaphragm, 3...vacuum chamber, 4...pedestal, R1 to R4 ...gauge resistance.

Claims (1)

【特許請求の範囲】[Claims] 1 半導体単結晶基板よりなるダイアフラム上に
不純物拡散により複数個のゲージ抵抗を形成する
とともに、前記ダイアフラムの背面と真空室に形
成してなる半導体圧力センサにおいて、前記ゲー
ジ抵抗に抵抗値が使用圧力範囲において略同一と
なるように、加圧により抵抗値が増加するゲージ
抵抗の組を、加圧により抵抗値が減少するゲージ
抵抗の組よりも、前記ダイアフラムの無歪状態に
おいて、抵抗値が小になるようにしたことを特徴
とする半導体圧力センサ。
1. In a semiconductor pressure sensor in which a plurality of gauge resistors are formed by impurity diffusion on a diaphragm made of a semiconductor single crystal substrate, and are formed on the back surface of the diaphragm and in a vacuum chamber, the resistance value of the gauge resistors is within the working pressure range. A set of gauge resistors whose resistance value increases when pressurized has a smaller resistance value when the diaphragm is in the unstrained state than a set of gauge resistors whose resistance value decreases when pressurized so that the resistance values are approximately the same. A semiconductor pressure sensor characterized by:
JP4421680A 1980-04-04 1980-04-04 Semiconductor pressure sensor Granted JPS56140670A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4421680A JPS56140670A (en) 1980-04-04 1980-04-04 Semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4421680A JPS56140670A (en) 1980-04-04 1980-04-04 Semiconductor pressure sensor

Publications (2)

Publication Number Publication Date
JPS56140670A JPS56140670A (en) 1981-11-04
JPS6154271B2 true JPS6154271B2 (en) 1986-11-21

Family

ID=12685341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4421680A Granted JPS56140670A (en) 1980-04-04 1980-04-04 Semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPS56140670A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0535335Y2 (en) * 1986-02-21 1993-09-08

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750789B2 (en) * 1986-07-18 1995-05-31 日産自動車株式会社 Method for manufacturing semiconductor pressure converter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0535335Y2 (en) * 1986-02-21 1993-09-08

Also Published As

Publication number Publication date
JPS56140670A (en) 1981-11-04

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