JPS6154246B2 - - Google Patents
Info
- Publication number
- JPS6154246B2 JPS6154246B2 JP54112546A JP11254679A JPS6154246B2 JP S6154246 B2 JPS6154246 B2 JP S6154246B2 JP 54112546 A JP54112546 A JP 54112546A JP 11254679 A JP11254679 A JP 11254679A JP S6154246 B2 JPS6154246 B2 JP S6154246B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- polystyrene
- tetrahydrofuran
- resist image
- negative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11254679A JPS5636135A (en) | 1979-09-03 | 1979-09-03 | Manufacture of resist image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11254679A JPS5636135A (en) | 1979-09-03 | 1979-09-03 | Manufacture of resist image |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5636135A JPS5636135A (en) | 1981-04-09 |
| JPS6154246B2 true JPS6154246B2 (enExample) | 1986-11-21 |
Family
ID=14589352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11254679A Granted JPS5636135A (en) | 1979-09-03 | 1979-09-03 | Manufacture of resist image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5636135A (enExample) |
-
1979
- 1979-09-03 JP JP11254679A patent/JPS5636135A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5636135A (en) | 1981-04-09 |
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