JPS6148101B2 - - Google Patents

Info

Publication number
JPS6148101B2
JPS6148101B2 JP17250081A JP17250081A JPS6148101B2 JP S6148101 B2 JPS6148101 B2 JP S6148101B2 JP 17250081 A JP17250081 A JP 17250081A JP 17250081 A JP17250081 A JP 17250081A JP S6148101 B2 JPS6148101 B2 JP S6148101B2
Authority
JP
Japan
Prior art keywords
load
power
wave power
plasma
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17250081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5873848A (ja
Inventor
Hideo Hatsutori
Shotaro Asada
Koji Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP17250081A priority Critical patent/JPS5873848A/ja
Publication of JPS5873848A publication Critical patent/JPS5873848A/ja
Publication of JPS6148101B2 publication Critical patent/JPS6148101B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP17250081A 1981-10-27 1981-10-27 高周波誘導結合プラズマ安定装置 Granted JPS5873848A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17250081A JPS5873848A (ja) 1981-10-27 1981-10-27 高周波誘導結合プラズマ安定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17250081A JPS5873848A (ja) 1981-10-27 1981-10-27 高周波誘導結合プラズマ安定装置

Publications (2)

Publication Number Publication Date
JPS5873848A JPS5873848A (ja) 1983-05-04
JPS6148101B2 true JPS6148101B2 (en:Method) 1986-10-22

Family

ID=15943120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17250081A Granted JPS5873848A (ja) 1981-10-27 1981-10-27 高周波誘導結合プラズマ安定装置

Country Status (1)

Country Link
JP (1) JPS5873848A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286936A (ja) * 2004-03-31 2005-10-13 Daihen Corp 高周波電源の出力電力制御方法および高周波電源装置

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60207075A (ja) * 1984-03-31 1985-10-18 Shimadzu Corp Ｉｃｐ分析装置用高周波電力表示装置
JPS6116314A (ja) * 1984-07-02 1986-01-24 Matsushita Electric Ind Co Ltd 高周波電源装置
FR2616932B1 (fr) * 1987-06-16 1989-11-03 Applied Res Lab Procede de regulation du plasma dans un appareil d'analyse spectroscopique
GB9226335D0 (en) * 1992-12-17 1993-02-10 Fisons Plc Inductively coupled plasma spectrometers and radio-frequency power supply therefor
CA2116821C (en) * 1993-03-05 2003-12-23 Stephen Esler Anderson Improvements in plasma mass spectrometry
DE69509046T2 (de) * 1994-11-30 1999-10-21 Applied Materials, Inc. Plasmareaktoren zur Behandlung von Halbleiterscheiben
JP2005172473A (ja) * 2003-12-08 2005-06-30 Horiba Ltd グロー放電用給電方法、グロー放電発光分析装置及び給電装置
JP2007205897A (ja) * 2006-02-02 2007-08-16 Shimadzu Corp Ｉｃｐ用高周波電源装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286936A (ja) * 2004-03-31 2005-10-13 Daihen Corp 高周波電源の出力電力制御方法および高周波電源装置

Also Published As

Publication number Publication date
JPS5873848A (ja) 1983-05-04

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