JPS6140155B2 - - Google Patents

Info

Publication number
JPS6140155B2
JPS6140155B2 JP53089163A JP8916378A JPS6140155B2 JP S6140155 B2 JPS6140155 B2 JP S6140155B2 JP 53089163 A JP53089163 A JP 53089163A JP 8916378 A JP8916378 A JP 8916378A JP S6140155 B2 JPS6140155 B2 JP S6140155B2
Authority
JP
Japan
Prior art keywords
zinc oxide
zinc
thin film
boron
oxide thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53089163A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5516554A (en
Inventor
Mitsuo Sakakura
Tetsuo Takaku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EASTERN STEEL
Original Assignee
EASTERN STEEL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EASTERN STEEL filed Critical EASTERN STEEL
Priority to JP8916378A priority Critical patent/JPS5516554A/ja
Priority to DE2929269A priority patent/DE2929269C2/de
Publication of JPS5516554A publication Critical patent/JPS5516554A/ja
Priority to US06/240,578 priority patent/US4336120A/en
Publication of JPS6140155B2 publication Critical patent/JPS6140155B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
JP8916378A 1978-07-21 1978-07-21 Manufacture of thin film of zinc oxide Granted JPS5516554A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8916378A JPS5516554A (en) 1978-07-21 1978-07-21 Manufacture of thin film of zinc oxide
DE2929269A DE2929269C2 (de) 1978-07-21 1979-07-19 Verfahren zur Herstellung eines Zinkoxid-Dünnfilms
US06/240,578 US4336120A (en) 1978-07-21 1981-03-04 Method of fabricating a zinc oxide thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8916378A JPS5516554A (en) 1978-07-21 1978-07-21 Manufacture of thin film of zinc oxide

Publications (2)

Publication Number Publication Date
JPS5516554A JPS5516554A (en) 1980-02-05
JPS6140155B2 true JPS6140155B2 (fr) 1986-09-08

Family

ID=13963144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8916378A Granted JPS5516554A (en) 1978-07-21 1978-07-21 Manufacture of thin film of zinc oxide

Country Status (3)

Country Link
US (1) US4336120A (fr)
JP (1) JPS5516554A (fr)
DE (1) DE2929269C2 (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118022A (en) * 1981-01-12 1982-07-22 Murata Mfg Co Ltd Formation of zinc oxide film
JPH0731950B2 (ja) * 1985-11-22 1995-04-10 株式会社リコー 透明導電膜の製造方法
US4853594A (en) * 1988-08-10 1989-08-01 Rogers Corporation Electroluminescent lamp
JPH02181304A (ja) * 1988-09-22 1990-07-16 Nippon Soken Inc 酸化亜鉛系透明導電膜およびその製膜方法
JP3335384B2 (ja) * 1991-12-26 2002-10-15 旭硝子株式会社 熱線遮断膜
US5532062A (en) * 1990-07-05 1996-07-02 Asahi Glass Company Ltd. Low emissivity film
US5419969A (en) * 1990-07-05 1995-05-30 Asahi Glass Company Ltd. Low emissivity film
JP3085043B2 (ja) * 1993-08-05 2000-09-04 株式会社村田製作所 サファイア面上の酸化亜鉛圧電結晶膜
US5736267A (en) * 1994-08-17 1998-04-07 Asahi Glass Company Ltd. Transparent conductive film and method for its production, and sputtering target
US5942090A (en) * 1996-04-12 1999-08-24 Asahi Glass Company Ltd. Methods of producing a laminate
US6238808B1 (en) * 1998-01-23 2001-05-29 Canon Kabushiki Kaisha Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device
FI19992510A (fi) * 1999-11-24 2001-05-25 Nokia Mobile Phones Ltd Elektroniikkalaite ja menetelmä elektroniikkalaitteessa
JP4884575B2 (ja) * 2010-05-13 2012-02-29 三井・デュポンポリケミカル株式会社 多層材料、太陽電池用封止材、安全（合わせ）ガラス用中間膜、太陽電池モジュール及び安全（合わせ）ガラス
US8815420B2 (en) 2010-09-17 2014-08-26 Guardian Industries Corp. Coated article having zinc oxide seed layer with reduced stress under functional layer and method of making the same
US8808882B2 (en) 2010-09-17 2014-08-19 Guardian Industries Corp. Coated article having boron doped zinc oxide based seed layer with enhanced durability under functional layer and method of making the same
EP3305939A4 (fr) * 2015-05-26 2019-03-13 National Institute for Materials Science Revêtement à faible frottement formé d'un film mince d'oxyde de zinc à bore ajouté, et micromachine
JP7077287B2 (ja) * 2018-09-28 2022-05-30 日東電工株式会社 圧電デバイス、及び圧電デバイスの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3766041A (en) * 1970-09-29 1973-10-16 Matsushita Electric Ind Co Ltd Method of producing piezoelectric thin films by cathodic sputtering
GB1582317A (en) * 1977-01-25 1981-01-07 Murata Manufacturing Co Piezoelectric crystalline films
JPS5396495A (en) * 1977-02-02 1978-08-23 Murata Manufacturing Co Piezooelectric crystal film of zinc oxide
DE2811044C3 (de) * 1977-03-16 1981-02-26 Murata Manufacturing Co., Ltd., Nagaokakyo, Kyoto (Japan) Piezoelektrische kristalline Filme
JPS5830749B2 (ja) * 1977-07-28 1983-07-01 株式会社村田製作所 酸化亜鉛の圧電結晶膜

Also Published As

Publication number Publication date
DE2929269C2 (de) 1983-07-07
JPS5516554A (en) 1980-02-05
DE2929269A1 (de) 1980-01-31
US4336120A (en) 1982-06-22

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