JPS6139343A - Shadow mask - Google Patents

Shadow mask

Info

Publication number
JPS6139343A
JPS6139343A JP15862084A JP15862084A JPS6139343A JP S6139343 A JPS6139343 A JP S6139343A JP 15862084 A JP15862084 A JP 15862084A JP 15862084 A JP15862084 A JP 15862084A JP S6139343 A JPS6139343 A JP S6139343A
Authority
JP
Japan
Prior art keywords
shadow mask
pores
pitch
iron
crystalline particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15862084A
Other languages
Japanese (ja)
Other versions
JP2597971B2 (en
Inventor
Hirozo Sugai
菅井 普三
Takashi Kuze
久世 孝
Fumio Mori
盛 二三男
Noriaki Yagi
典章 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59158620A priority Critical patent/JP2597971B2/en
Publication of JPS6139343A publication Critical patent/JPS6139343A/en
Application granted granted Critical
Publication of JP2597971B2 publication Critical patent/JP2597971B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE:To enable uniformity of form, pitch etc. of pores over a shadow mask, by making the shadow mask from mild steel etc. and forming it making the number of crystalline particles around a pore wall more than 50/mm., and forming pores by photoetching. CONSTITUTION:After a mild steel-, iron-nickel type alloy, or iron-nickel-cobalt type alloy is melted, then heat-treated, and, in the process of annealing and cool- rolling, given the final annealing temperature and time at 700-750 deg.C in about 0.5-2hr, and the final cool-rolling of 15-30% processing rate, the material is made up, whereon numerous circular pores are formed by photoetching, so as to make up a shadow mask for a color picture tube. Thus, number of crystalline particles around a pore wall is increased up to more than 50/mm., and unevenness of form and pitch of pores caused by crystalline particles can be avoided, gaining a high accuracy and minuteness of the shadow mask.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明はシャドウマスクに関し、更に詳しくは、高精度
・高精細のシャドウマスクに関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a shadow mask, and more particularly to a high-precision, high-definition shadow mask.

[発明の技術的背景とその問題点] カラー受像管螢光面の直前には、所定の設計基準に基づ
いて穿設された多数の開孔(ドツト状、すだれ状)を有
づるシャドウマスクが配設されている。
[Technical background of the invention and its problems] Immediately in front of the color picture tube fluorescent surface, there is a shadow mask having a large number of apertures (dot-shaped, blind-shaped) formed based on predetermined design standards. It is arranged.

このシャドウマスクの材料としては、通常、厚み約0.
15m1の薄い軟鋼板が採用される。最近では、低熱膨
張特性を備えた鉄−ニッケル系合金であるインバ合金(
I nVar)が採用され始めている。
The material for this shadow mask usually has a thickness of about 0.
A 15m1 thin mild steel plate is used. Recently, Invar alloy, an iron-nickel alloy with low thermal expansion characteristics,
InVar) is beginning to be adopted.

このシャドウマスクは次のようにして製造されている。This shadow mask is manufactured as follows.

まず、素材の板材を洗浄し、フォトレジストを塗り露光
した後、塩化第二鉄でエツチングすることにより開孔を
形成する。
First, a plate material is cleaned, coated with photoresist, exposed, and then etched with ferric chloride to form holes.

その後、全体にプレス加工を施して所定の曲率半径の湾
曲面を―成し、最後にスチームで酸化して熱輻射能゛の
向上・乱反射防止のためにその表面全体を黒化する。
Thereafter, the entire surface is pressed to form a curved surface with a predetermined radius of curvature, and finally the entire surface is blackened by steam oxidation to improve thermal radiation and prevent diffuse reflection.

しかしながら、このようなフォトエツチング法を適用し
たシャドウマスクの製造方法には、以下のような問題点
が孕まれている。
However, the method of manufacturing a shadow mask using such a photoetching method has the following problems.

すなわち、穿設される開孔は板材の材質、形状、エツチ
ングの条件などによってその形状が微妙に、影響を受け
るので設計基単に忠実な高精度・高精細の開孔の穿設制
御がはなはだ困雌であること、とくに、近年用いられ始
めているインバ合金を使用するときには、そのエツチン
グ速度が軟鋼板に比べて著しく小さいことと相俟って形
成された開孔それ自体の形状、開孔間のピッチなどが不
均一になるという問題がある。
In other words, the shape of the holes to be drilled is subtly affected by the material, shape, etching conditions, etc. of the plate material, so it is extremely difficult to control the drilling of holes with high precision and high definition that is faithful to the design basis. In particular, when using Invar alloy, which has started to be used in recent years, the etching rate is significantly lower than that of mild steel sheets, and the shape of the holes themselves and the distance between the holes There is a problem that the pitch etc. become non-uniform.

[発明の目的] 本発明は、開孔それ自体の形状及び開孔間のピッチなど
が比較的均一であるシャドウマスクを提供することを目
的とする。
[Object of the Invention] An object of the present invention is to provide a shadow mask in which the shape of the apertures themselves and the pitch between the apertures are relatively uniform.

[発明の概要] 本発明者らは、シャドウマスクを鋭意研究した結果、開
孔の不均一性は、結晶粒によってもたらされるという事
を見い出した。
[Summary of the Invention] As a result of intensive research into shadow masks, the present inventors discovered that non-uniformity of openings is caused by crystal grains.

本発明は、この知見をもとに完成されたものである。The present invention was completed based on this knowledge.

即ち、本発明のシャドウマスクは、開孔壁にかかる結晶
粒が50個/1Il1以上、好ましくは80個/mm以
上、更に好ましくは 110個/1111以上であるこ
とを特徴とする。
That is, the shadow mask of the present invention is characterized in that the number of crystal grains on the aperture walls is 50/111 or more, preferably 80/111 or more, more preferably 110/1111 or more.

即ち、各結晶粒は、それぞれ異なるエツチングの容易方
向を有する。その結果、開孔壁の各結晶粒によりエツチ
ング速度が異なる為、その結晶粒が少ないと容易方向の
影響が大となる為、開孔壁の形状がいびつになりやすい
That is, each crystal grain has a different direction of easy etching. As a result, since the etching rate differs depending on each crystal grain of the aperture wall, if the number of crystal grains is small, the influence of the easy direction becomes large, and the shape of the aperture wall tends to become distorted.

そこで、その結晶粒の数を増加させることにより、開孔
の形状のいびつさを軽減したシャドウマスクを提供する
Therefore, by increasing the number of crystal grains, a shadow mask is provided in which the distortion of the shape of the openings is reduced.

シャドウマスクの素材としては、軟鋼、鉄−42wt%
ニッケル合金(インバ合金)、鉄−ニッケル−コバルト
系等が考えられるが、この順番で結晶粒による開孔の不
均一性が大きくなる為、逆の順序で本発明は有効である
The material for the shadow mask is mild steel, iron -42wt%
Nickel alloys (Invar alloys), iron-nickel-cobalt systems, etc. are conceivable, but since this order increases the non-uniformity of openings due to crystal grains, the present invention is effective in the reverse order.

又、シャドウマスクの開孔の間隔がo、y+nsピッチ
以下、更には0.38n+mピッチ以下、更には0.2
m−ピッチ以下程度の高精度・高精細になると、特に結
晶粒による不均一性が大きくなる為、本発明は有効であ
る。
Further, the distance between the openings of the shadow mask is not more than o, y+ns pitch, furthermore, not more than 0.38n+m pitch, and even more preferably not more than 0.2
The present invention is effective when the precision and definition are as high as m-pitch or less, since the non-uniformity due to crystal grains becomes particularly large.

以上述べた本発明のシャドウマスクの製造方法について
以下に述べる。
The method for manufacturing the shadow mask of the present invention described above will be described below.

まず、素材を溶解した後、熱間加工する。First, the material is melted and then hot processed.

次に、冷同圧延と焼鈍を数回繰り返した後、最後に焼鈍
、冷間圧延をしてシャドウマスク用素材を得る。
Next, cold rolling and annealing are repeated several times, and finally annealing and cold rolling are performed to obtain a shadow mask material.

この工程にみいて、R*の焼鈍条件及び最終の冷間圧延
条件を以下に示す如く組み合せることにより結晶粒を細
かくできる。
In this process, crystal grains can be made finer by combining the R* annealing conditions and the final cold rolling conditions as shown below.

即ち、最終の焼#@濃度及び焼鈍時間としては、再結晶
粒が粗大化しない範囲で選択されれば良く、例えば、1
00〜150℃でO,S〜2時間程度焼鈍されると良い
That is, the final annealing concentration and annealing time may be selected within a range that does not cause the recrystallized grains to become coarse, for example, 1
It is preferable to perform annealing at 00 to 150° C. for about 2 hours.

又、最終の冷間圧延の加工としては、加工率が小さい方
が結晶粒がファイバー状にならなくて済むため好ましく
、一方、あまり小さすぎると、冷間圧延による結晶粒微
細化の効果を得にくい。その為、例えば、50%以下の
加工率が好ましく、更には15〜30%の加工率が好ま
しい。
In addition, for the final cold rolling process, a small working rate is preferable because it prevents the crystal grains from forming into fibers. On the other hand, if the working rate is too small, the effect of grain refinement due to cold rolling is lost. Hateful. Therefore, for example, a processing rate of 50% or less is preferable, and a processing rate of 15 to 30% is more preferable.

[発明の実施例] 次に本発明の実msについて説明する。[Embodiments of the invention] Next, the actual ms of the present invention will be explained.

ピッチ0.38m5の円状開孔を有する14インチ用の
シャドウマスクを第1表で示す素材で製造する。その結
果、形成された開孔に関して、それにかわる結晶粒の数
、開孔形状及びピッチの不拘−一を測定し・第1表に併
記した・この表から明らかな如り、開孔壁にかかる結晶
粒の数が増すほど開孔形状及びピッチの不均一さが減少
することがわかる。
A 14-inch shadow mask having circular openings with a pitch of 0.38 m5 is manufactured using the materials shown in Table 1. As a result, the number of crystal grains that replaced the formed pores, the shape of the pores, and the pitch were measured and are listed in Table 1.As is clear from this table, it is clear that It can be seen that as the number of crystal grains increases, the non-uniformity of the pore shape and pitch decreases.

又、インバ合金やFe −Ni −Or金合金シャドウ
マスクでは、本発明は特に有効であった。
Further, the present invention was particularly effective for Invar alloy and Fe-Ni-Or gold alloy shadow masks.

以下余白 [発明の効果] 以上述べた如く、本発明のシャドウマスクは、開孔壁に
かかる結晶粒を50個/mm以上にすることにより、開
孔それ自体の形状及び開孔間のピッチなどを比較的均一
にできる。
Margins below [Effects of the Invention] As described above, the shadow mask of the present invention has a shape of the apertures themselves and a pitch between the apertures by increasing the number of crystal grains on the aperture walls to 50/mm or more. can be made relatively uniform.

Claims (1)

【特許請求の範囲】 1、開孔壁にかかる結晶粒が50個/mm以上であるシ
ャドウマスク。 2、シャドウマスクが軟鋼からなる特許請求の範囲第1
項に記載のシャドウマスク。 3、シャドウマスクが鉄−ニッケル系合金からなる特許
請求の範囲第1項に記載のシャド ウマスク。 4、シャドウマスクが鉄−ニッケル−コバルト系合金か
らなる特許請求の範囲第1項に記 載のシャドウマスク。
[Claims] 1. A shadow mask in which the number of crystal grains on the aperture wall is 50/mm or more. 2. Claim 1 in which the shadow mask is made of mild steel
Shadow mask as described in section. 3. The shadow mask according to claim 1, wherein the shadow mask is made of an iron-nickel alloy. 4. The shadow mask according to claim 1, wherein the shadow mask is made of an iron-nickel-cobalt alloy.
JP59158620A 1984-07-31 1984-07-31 Shadow mask Expired - Lifetime JP2597971B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59158620A JP2597971B2 (en) 1984-07-31 1984-07-31 Shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59158620A JP2597971B2 (en) 1984-07-31 1984-07-31 Shadow mask

Publications (2)

Publication Number Publication Date
JPS6139343A true JPS6139343A (en) 1986-02-25
JP2597971B2 JP2597971B2 (en) 1997-04-09

Family

ID=15675688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59158620A Expired - Lifetime JP2597971B2 (en) 1984-07-31 1984-07-31 Shadow mask

Country Status (1)

Country Link
JP (1) JP2597971B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5396146A (en) * 1992-04-27 1995-03-07 Hitachi Metals, Ltd. Shadow mask sheet, method of producing same and cathode ray tube provided therewith

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5058977A (en) * 1973-09-19 1975-05-22
JPS58164754A (en) * 1982-03-26 1983-09-29 Kawasaki Steel Corp Cold rolled thin steel strip for shadow mask and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5058977A (en) * 1973-09-19 1975-05-22
JPS58164754A (en) * 1982-03-26 1983-09-29 Kawasaki Steel Corp Cold rolled thin steel strip for shadow mask and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5396146A (en) * 1992-04-27 1995-03-07 Hitachi Metals, Ltd. Shadow mask sheet, method of producing same and cathode ray tube provided therewith

Also Published As

Publication number Publication date
JP2597971B2 (en) 1997-04-09

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