JPS6136108A - Method of pretreatment of indium metal and its jig - Google Patents

Method of pretreatment of indium metal and its jig

Info

Publication number
JPS6136108A
JPS6136108A JP15666784A JP15666784A JPS6136108A JP S6136108 A JPS6136108 A JP S6136108A JP 15666784 A JP15666784 A JP 15666784A JP 15666784 A JP15666784 A JP 15666784A JP S6136108 A JPS6136108 A JP S6136108A
Authority
JP
Japan
Prior art keywords
ampul
ampoule
cap
quartz
boat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15666784A
Other languages
Japanese (ja)
Inventor
Kenichi Sakagami
健一 坂上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP15666784A priority Critical patent/JPS6136108A/en
Publication of JPS6136108A publication Critical patent/JPS6136108A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To seal ampul by a simple operation in a short time, and to obtain high-purity In-P polycrystal, by placing In and P in a long cylindrical quartz ampul with a bottom, inserting a specific quartz cap into it, carrying out a reaction under heating in a vacuum. CONSTITUTION:P is placed on the inner bottom part 13a of the long cylindrical quartz ampul 13 with a bottom, and In put in the quartz boat 15 is placed on the middle part 13c, the short cylindrical quartz cap 16 with a bottom provided with the plural dented channels 16 a in the longer direction at equal intervals on the outer peripheral face, having a cross section of regular wavy shape and the maximum diameter part 16b of the shape somewhat smaller than the inner diameter of the ampul 13 is inserted into the middle part between the opening 13b and the boat 15, the ampul is introduced into the baking furnace 11, and supported by the supporting tool 14. The ampul is then evacuated from the vacuum attachment 17, the interior of the ampul 13 is kept at = 10<-5>Torr, the furnance 11 is transferred to a given position, the cap 16 and the boat 15 is heated at 800-900 deg.C, the bottom part 13a at 100-150 deg.C, so that the ampul 13 melted, the inside face of it is pressed to and welded to the cap 16, and the ampul is sealed, to give high-purity In-P polycystal.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はInおよびPを真空中でそ終ぞれ所定の温度で
ベーキング処理した後、上記真空状態を保持してアンプ
ル内に密封して合成する高純度InP多結晶合成前処理
方法およびその治具に関する。
[Detailed Description of the Invention] Industrial Application Field The present invention involves baking In and P at a predetermined temperature in a vacuum, and then sealing them in an ampoule while maintaining the vacuum state for synthesis. The present invention relates to a pretreatment method for synthesizing high-purity InP polycrystals and a jig therefor.

従来の技術 一般にInP高純度多結晶を合成する場合には、次のよ
うな前処理を行なっている。すなわち、第一図に示すよ
うな有底長円筒状の石英アンプル13内底部13aにP
1アンプル13の中間部13cに石英ボボート15に入
れたInを配置し、アンプル開口部13bと上記ボート
15との間に有底短円筒状の石英キャップ1を挿入する
。そしてこのアンプル内を高真空と【2てInおよびP
をそれぞれ所定の温度にベーキング炉4によってベーキ
ングして不純物を充分揮散させた後Pの蒸気圧を一定に
保持して、ベーキング終了後、上記真空度を保持したま
ま、キャップ1とアンプル13を浴着し、アンプルを密
封して次のInP合成工程の原料としている1、 発明か解決しようとする問題点 ところで、従来はベーキング終了後アンプル13を封じ
るためのキャップとして第3図(a)(b)に示すよう
な側壁が滑らかな円筒面を有するキャップ1が使用され
ていた。
BACKGROUND ART Generally, when synthesizing InP high-purity polycrystals, the following pretreatment is performed. That is, as shown in FIG.
1. In is placed in a quartz boat 15 in the middle part 13c of the ampoule 13, and a short cylindrical quartz cap 1 with a bottom is inserted between the ampoule opening 13b and the boat 15. Then, the inside of this ampoule is set to a high vacuum [2] In and P
are baked in a baking furnace 4 to a predetermined temperature to sufficiently volatilize impurities, the vapor pressure of P is kept constant, and after baking, the cap 1 and ampoule 13 are placed in a bath while maintaining the above vacuum level. The ampoule is sealed and used as a raw material for the next InP synthesis process.1 Problems to be Solved by the Invention By the way, in the past, a cap was used as a cap to seal the ampoule 13 after baking was completed, as shown in Figures 3(a) and (b). ) was used, the cap 1 having a smooth cylindrical side wall.

上記有底長円筒状の石英アンプル13と、この内部に挿
入された有底短円筒状のキャンプ1とを溶着する場合、
アンプル13の外周より加熱すると、加熱部分が軟化し
、内部の真空によってキャップ1の外周に溶着するが、
第グ図に示すように、一部にしわ2が発生し、とのしわ
2部分に微細孔3が形成され、これを完全に閉塞するの
に時間がかかシ、或は極微のピンホールが残存して、内
部真壁が破壊され、大気中の不純物を吸着して次の工程
に使用出来ないものとなる欠点があった。
When welding the bottomed long cylindrical quartz ampoule 13 and the bottomed short cylindrical camp 1 inserted therein,
When the ampoule 13 is heated from the outer periphery, the heated part softens and is welded to the outer periphery of the cap 1 due to the internal vacuum.
As shown in Figure 2, wrinkles 2 are formed in some areas, and micropores 3 are formed in the wrinkles 2, and it takes time to completely close the holes, or microscopic pinholes are formed. remains, destroying the inner wall, adsorbing impurities in the atmosphere, and making it unusable for the next process.

また、従来は第2図に示すごとく、ベーキング炉4の外
部に存する石英アンプル13内にキャンプ1を配置して
いたため原料Inよシ蒸発した不純物およびIn蒸気が
キャップに蒸着してInP多結多結忙中入する丸め、高
純度のInP多結晶か得られない欠点があった。
Furthermore, as shown in FIG. 2, in the past, since the camp 1 was placed in a quartz ampoule 13 located outside the baking furnace 4, impurities evaporated from the raw material In and In vapor were deposited on the cap, resulting in InP condensation. There was a drawback that high purity InP polycrystals could not be obtained due to the rounding process.

問題を解決するための手段    ゛ 本発明は上記の事情に鑑み、短時間で確実に制御された
ベーキングを容易に行なうことが出来る高純度InP多
結晶合成の前処理方法およびベーキング後のアンプルの
密封が容易で、アンプルの真壁破壊の発生のない治具を
提供することを目的とするもので、その要旨は、インジ
ウムメタルを真空中で加熱してベーキングするに際し、
有底円筒状の石英アンプルと、的記アンプルに内接して
挿入可能な直径を有する有底短筒状でおって、外周面に
長さ方向に沿った複数の凹溝が設けられた石英キャンプ
とを使用し、かつ前記石英キャンプとインジウムメタル
とを実質的に同一温度に保持するインジウムメタルの前
処理方法およびその治具にある。すなわち、長さ方向の
軸線に沿って移動自在な管状ベーキング炉内に、上記軸
線に沿って有底長円筒状の石英アンプルを挿入するとと
もに、このアンプルに対して上記ベーキング炉か移動自
在にアンプルを支持し、アンプルの底部にPを配置し、
中間部にInの入った石英ボートを配置し、ボートとア
ンプル開口部との間に、外周に長さ方向の複数の凹溝が
設けられた有底短筒状の石英キャンプを挿入し、上記ア
ンプル内をアンプル開口部より所定の真空度に真空引き
し、上記石英キャップとインジウムメタルを実質的に同
一温度に保持しかつ上記InおよびPをそれぞれ所定の
温度でベーキングし、た後、上記ベーキング炉をアンプ
ルの底部方向に移動させ、上記キャップ部分をアンプル
外周よ如加熱して、アンプル内を所定の真空度に保持し
たまま、キャンプとアンプルとを溶着し、アンプルを密
封する。
Means for Solving the Problems ゛In view of the above circumstances, the present invention provides a pretreatment method for synthesizing high-purity InP polycrystals that can easily perform controlled baking in a short time, and sealing of ampules after baking. The purpose is to provide a jig that is easy to use and does not cause wall damage to the ampoule, and its gist is that when baking indium metal in a vacuum,
A cylindrical quartz ampoule with a bottom, and a short cylindrical bottom with a diameter that can be inserted into the ampoule, and a quartz camp with a plurality of grooves along the length on the outer circumferential surface. The present invention provides an indium metal pretreatment method and a jig therefor, which uses the quartz camp and the indium metal and maintains the quartz camp and the indium metal at substantially the same temperature. That is, a quartz ampoule in the shape of a long cylinder with a bottom is inserted along the axis into a tubular baking furnace that is movable along the longitudinal axis, and the baking furnace is movably connected to the ampoule. supporting and placing P at the bottom of the ampoule,
A quartz boat containing In is placed in the middle, and a short cylindrical quartz camp with a bottom and a plurality of grooves in the length direction on the outer periphery is inserted between the boat and the ampoule opening. The inside of the ampoule is evacuated to a predetermined degree of vacuum from the ampoule opening, the quartz cap and the indium metal are held at substantially the same temperature, and the In and P are baked at a predetermined temperature. The furnace is moved toward the bottom of the ampoule, and the cap portion is heated to the same extent as the outer periphery of the ampoule, and while the inside of the ampoule is maintained at a predetermined degree of vacuum, the camp and the ampoule are welded and the ampoule is sealed.

第2図(a)(b)(c)は、本発明に係る高純度In
P多結晶の合成前処理方法を実施する装置の一例および
この方法において使用する治具の一実施例を示すもので
、第1図(a)は装置の縦断面図である。図中符号11
は、管状ベーキング炉で、このベーキング炉11には車
輪11&か取付けられている。
FIGS. 2(a), (b), and (c) show high-purity In according to the present invention.
This figure shows an example of an apparatus for carrying out a method for pre-synthesis of P polycrystals and an embodiment of a jig used in this method, and FIG. 1(a) is a longitudinal cross-sectional view of the apparatus. Code 11 in the figure
is a tubular baking oven, and wheels 11& are attached to this baking oven 11.

この車輪11aは、レール12上に乗せられ、ベーキン
グ炉11は長さ方向の軸線に沿って移動自在となってい
る。このベーキング炉11の中心孔11bには、有底長
円筒状の石英アンプル1.3か挿入されている。このア
ンプル13は、支持具14によって、上記ベーキング炉
11かアンプル13に邪魔されることなく移動自在とな
るように支持されている。
The wheels 11a are placed on rails 12, and the baking oven 11 is movable along the longitudinal axis. A quartz ampoule 1.3 in the shape of an elongated cylinder with a bottom is inserted into the center hole 11b of the baking furnace 11. The ampoule 13 is supported by a support 14 so as to be movable without being obstructed by the baking oven 11 or the ampoule 13.

このアンプル13の底部13aにはPが直接載置され、
中間部13eには石英ボート15に入れられたInが載
置されている。このボー)15とアンプル13の開口部
13bとの間にはボー)15に近接して、石英キャップ
16か挿入され、上記ベーキング炉11をアンプル13
に対して所定の位置とした場合、キャンプ16およびボ
ート15か+r00−900℃の帯域、底部13&が約
ノo。
P is placed directly on the bottom 13a of this ampoule 13,
In is placed in a quartz boat 15 in the intermediate portion 13e. A quartz cap 16 is inserted between the bow 15 and the opening 13b of the ampoule 13 in the vicinity of the bow 15, and the baking furnace 11 is connected to the ampoule 13.
If the camp 16 and the boat 15 are in the +r00-900°C zone, the bottom 13&gt;

℃〜ノj0℃の帯域となるように構成されている。It is configured to have a band of 0°C to 0°C.

また、アンプル開口部13bには、アンプル内を真空引
きするための水冷アタッチメント17が取付けられてい
る。
Further, a water cooling attachment 17 for evacuating the inside of the ampoule is attached to the ampoule opening 13b.

また、石英キャップ16は、第2図(b)(C)に示す
ように、アンプル13に挿入可能な有底短筒状体で、外
周には長さ方向の凹溝16Bが等間隔に設けられ横断面
は、なめらか規則的波形で、この波形の凸部16b先端
に外接する円の直径は、アンプル13の内径よυやや小
さくなっておシ、開口端16cをアンプル開口部13b
と同一方向としてアンプル13に挿入されている。
The quartz cap 16 is a short cylindrical body with a bottom that can be inserted into the ampoule 13, as shown in FIGS. The cross section of the ampule 16 has a smooth regular waveform, and the diameter of the circle circumscribing the tip of the convex portion 16b of this waveform is slightly smaller than the inner diameter of the ampoule 13, and the opening end 16c is connected to the ampoule opening 13b.
It is inserted into the ampoule 13 in the same direction.

作用 先ずアンプル16の所定位置にP1ボー)(In)15
、およびキャップ16を配置し、ベーキング炉11の中
心孔11bに挿通するとともに1支持具14によって支
持する。次いでベーキング炉11を移動させ、温度帯域
がアンプル13に対して所定の位置となるように調整す
る。次いで真全アタッチメント17より真空引きし、ア
ンプル13内を/ 0−5 ’porr K保持すると
ともにベーキングを行ない、ボート内のIn およびP
に付着する不純物な揮散除去させる。この場合キャンプ
16とボート15を同じ温度域とするのは、キャップ1
6部分の温度が低いとボート15よシ蒸発した不純物お
よびIn蒸気かキャンプ16に蒸着し、アンプルを溶封
する場合の妨げとなったシ合成されたInP多結晶中に
不純物が混入するのを防止するためである。また、上記
キャンプ16は凹溝16aか設けられているので、真空
引きする場合のコンダクタンスか大きく、短時間で真空
を達成することかできるばかりでなく蒸着物の付着も抑
制される。またベーキング終了後溶封に際しても容易に
キャップをアンプルに密着させることか可能となる。
Action First, place P1 bow) (In) 15 in the predetermined position of ampoule 16.
, and a cap 16 are placed, inserted into the center hole 11b of the baking oven 11, and supported by one support 14. Next, the baking oven 11 is moved and adjusted so that the temperature range is at a predetermined position with respect to the ampoule 13. Next, vacuum is drawn from the true attachment 17, the inside of the ampoule 13 is held at /0-5'porr K, and baking is performed to remove In and P in the boat.
Impurities attached to the surface are removed by volatilization. In this case, cap 1 makes camp 16 and boat 15 in the same temperature range.
If the temperature of part 6 is low, impurities evaporated from boat 15 and In vapor will be deposited on camp 16, preventing impurities from being mixed into the synthesized InP polycrystal, which will prevent the ampoule from being melt-sealed. This is to prevent this. In addition, since the camp 16 is provided with the groove 16a, the conductance during evacuation is large, and not only can a vacuum be achieved in a short time, but also the adhesion of vapor deposits is suppressed. Furthermore, it is possible to easily bring the cap into close contact with the ampoule during sealing after completion of baking.

上記帯域を所定温度として、j−r時間ベーキングし、
次いでベーキング炉13を移動させ、キャップ16部分
をアンプル13の外周側よ如水素炎バーナ(図示せず)
で加熱する。この場合アンプル13内は/ 0−5 ’
l’orrに保持されているので、容易に押しつぶされ
て、第2図(e)に示すアンプル13の内面は、キャン
プ外周に浴着するか、キャップ16の外周面はなめらか
な波形となっており、アンプル13は引延ばされる状態
で、キャンプ16外周に押圧されるので、微細孔を生ず
ることなく、溶着され、アンプル13は、確実、かつ容
易に密封される。
Baking the above zone at a predetermined temperature for j-r hours,
Next, the baking furnace 13 is moved, and the cap 16 is moved to the outer circumferential side of the ampoule 13 using a hydrogen flame burner (not shown).
Heat it up. In this case, the inside of ampoule 13 is /0-5'
Since the ampoule 13 is held in the l'orr position, it is easily crushed, and the inner surface of the ampoule 13 shown in FIG. Since the ampoule 13 is pressed against the outer periphery of the camp 16 in a stretched state, the ampoule 13 is welded without creating micropores, and the ampoule 13 is reliably and easily sealed.

なお、上記説明ではキャンプの横断面を規則的な波形と
したが、なめらかな波形で、その凸部先端がアンプル内
周に近接していれば、波形に大小があっても差支えない
In the above description, the cross section of the camp has a regular waveform, but the waveform may be large or small as long as it is a smooth waveform and the tip of the convex portion is close to the inner circumference of the ampoule.

実施例、比較例 上記ベーキング炉を用いて、容易に所定のベーキングか
可能となるか、アンプルを密封する場合溶着かスムース
に行なわれる凹溝が設けられたキャンプを用い九治具と
、従来の有底短円筒状キャンプを用いた治具との優劣を
合成インゴットのキャリヤ濃度によって比較する。
EXAMPLES AND COMPARATIVE EXAMPLES Using the above-mentioned baking furnace, it is possible to easily carry out the prescribed baking process, and when sealing ampules, welding can be carried out smoothly. The advantages and disadvantages of the jig using a short cylindrical camp with a bottom are compared based on the carrier concentration of the synthetic ingot.

前処理条件は、真空度二ノ0−5’porr、  I 
nベーキング温度:♂10℃、Pベーキング温度:io
o℃、純度6−NのIn:200f、純度+−NのP 
f+ ’θVを用いて実験を行ない、一定の合成条件下
でInとPよシ合成した1、Pの物性を測定した。結果
を第2表に示す。
The pretreatment conditions were vacuum degree 2, 0-5'porr, I
n baking temperature: ♂10℃, P baking temperature: io
o°C, In of purity 6-N: 200f, P of purity +-N
Experiments were conducted using f+ 'θV to measure the physical properties of 1, P synthesized with In and P under certain synthesis conditions. The results are shown in Table 2.

第    ノ    表 第2表から明らかなごとく、本発明による治具を使用し
た場合は短時間のベーキンク処理でも低いキャリア濃度
に到達することかわかる。まえ、石英キャップ部を低温
にした場合は長時間ベーキングしても純度は上がらない
As is clear from Table 2, it can be seen that when the jig according to the present invention is used, a low carrier concentration can be achieved even in a short baking process. First, if the quartz cap part is kept at a low temperature, the purity will not increase even if it is baked for a long time.

以上のように凹溝の設けられたキャップを用い九治具が
格段に優れていることかわかる。
As described above, it can be seen that the 9 jigs using the caps provided with the grooves are significantly superior.

本発明の効果 以上述べたように本発明に係る方法および治具は、ベー
キング炉かアンプルに対して移動自在となっているので
、操作が容易となシ、また凹#1か設けられたキャップ
を用いているのでアンプルの密封が短時間で確実に行う
ことが出来、高純度InP多結晶を常に高真空中に保つ
ことかできるので酸化物や窒化物の生成がなく合成前処
理法およびその治具として優れたものである。
Effects of the present invention As described above, the method and jig according to the present invention are movable relative to the baking oven or the ampoule, so they are easy to operate. , the ampoule can be reliably sealed in a short time, and the high-purity InP polycrystal can be kept in a high vacuum at all times, so there is no generation of oxides or nitrides, and the synthesis pretreatment method and its It is an excellent jig.

【図面の簡単な説明】[Brief explanation of drawings]

第2図(a)(b)(c)は、本発明に係る方法に使用
する装置の一例およびそれに使用する治具の一実施例を
示すもので、第2図(a)は装置の縦断面図、第2図(
b)はアンプルに挿入し光キャップの斜視図、第2図(
C)は第2図(b)のI−1線矢視図、第2図は従来の
装置の縦断面図、第3図(a)(b)および第を図は従
来の治具の図で、第3図(a)はキャップをアンプルに
挿入した斜視図、第3図(b)は第3図(a)の1lI
−■線視図、第参図はキャンプとアンプルを溶着した正
面図でおる。 11・・・・・・管状ベーキング炉、11a・・・・・
・車輪、11b・・・・・・中心孔、13・・・・・・
有底円筒状石英アンプル(アンプル)、13a・・・・
・・底部:  tab・・・・・・開口部、13C・・
・・・・中間部、14・・・・・・支持具、15・・・
・・・石英ボート、16・・・・・・外周面に長さ方向
の凹溝のある石英キャップ、16a・・・・・・凹溝、
16b・・・・・・凸部、16C・・・・・・開口端。
2(a), 2(b), and 2(c) show an example of the apparatus used in the method of the present invention and an embodiment of the jig used therein. Front view, Figure 2 (
b) is a perspective view of the optical cap inserted into the ampoule, Figure 2 (
C) is a view taken along the line I-1 in FIG. 2(b), FIG. 2 is a vertical sectional view of the conventional device, and FIGS. 3(a), (b), and 3 are views of the conventional jig. Fig. 3(a) is a perspective view of the cap inserted into the ampoule, and Fig. 3(b) is a perspective view of the ampule shown in Fig. 3(a).
-■ Linear view and reference figure are front views of the camp and ampoule welded together. 11...Tubular baking oven, 11a...
・Wheel, 11b... Center hole, 13...
Bottomed cylindrical quartz ampoule (ampule), 13a...
...Bottom: tab...opening, 13C...
...Middle part, 14...Support, 15...
...Quartz boat, 16...Quartz cap with longitudinal grooves on the outer circumferential surface, 16a...Concave grooves,
16b... Convex portion, 16C... Open end.

Claims (2)

【特許請求の範囲】[Claims] (1)インジウムメタルを真空中で加熱してベーキング
するに際し、有底長円筒状の石英アンプルと、前記アン
プルに内接して挿入可能な直径を有する有底短筒状であ
つて、外周面に長さ方向に沿つた複数の凹溝が設けられ
た石英キャップとを使用し、かつ前記石英キャップとイ
ンジウムメタルとを実質的に同一温度に保持することを
特徴とするインジウムメタルの前処理方法。
(1) When indium metal is heated and baked in a vacuum, a quartz ampoule with a long cylindrical shape with a bottom and a short cylindrical shape with a bottom with a diameter that can be inserted inscribed in the ampoule are used. 1. A method for pretreatment of indium metal, comprising using a quartz cap provided with a plurality of grooves along its length, and maintaining the quartz cap and indium metal at substantially the same temperature.
(2)有底長円筒状の石英アンプルと、上記アンプルに
内接して挿入可能な直径を有する有底短筒状体であつて
、外周面に長さ方向に沿つた複数の凹溝が設けられた石
英キャップとよりなるインジウムメタルの前処理用治具
(2) A long cylindrical quartz ampoule with a bottom, and a short cylindrical body with a bottom having a diameter that can be inserted into the ampoule, with a plurality of concave grooves along the length direction on the outer peripheral surface. A jig for pre-treatment of indium metal, consisting of a quartz cap.
JP15666784A 1984-07-27 1984-07-27 Method of pretreatment of indium metal and its jig Pending JPS6136108A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15666784A JPS6136108A (en) 1984-07-27 1984-07-27 Method of pretreatment of indium metal and its jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15666784A JPS6136108A (en) 1984-07-27 1984-07-27 Method of pretreatment of indium metal and its jig

Publications (1)

Publication Number Publication Date
JPS6136108A true JPS6136108A (en) 1986-02-20

Family

ID=15632668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15666784A Pending JPS6136108A (en) 1984-07-27 1984-07-27 Method of pretreatment of indium metal and its jig

Country Status (1)

Country Link
JP (1) JPS6136108A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63250428A (en) * 1987-04-06 1988-10-18 Shin Etsu Handotai Co Ltd Method for purifying indium
JPH01246447A (en) * 1988-03-22 1989-10-02 Ootsu Keori Kk Pile knitted fabric and production thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63250428A (en) * 1987-04-06 1988-10-18 Shin Etsu Handotai Co Ltd Method for purifying indium
JPH039173B2 (en) * 1987-04-06 1991-02-07 Shinetsu Handotai Kk
JPH01246447A (en) * 1988-03-22 1989-10-02 Ootsu Keori Kk Pile knitted fabric and production thereof
JPH0346576B2 (en) * 1988-03-22 1991-07-16 Ootsu Keori Kk

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