JPS6135522B2 - - Google Patents
Info
- Publication number
- JPS6135522B2 JPS6135522B2 JP56026459A JP2645981A JPS6135522B2 JP S6135522 B2 JPS6135522 B2 JP S6135522B2 JP 56026459 A JP56026459 A JP 56026459A JP 2645981 A JP2645981 A JP 2645981A JP S6135522 B2 JPS6135522 B2 JP S6135522B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- sio
- antireflection film
- deposited
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 35
- 239000004033 plastic Substances 0.000 claims description 12
- 229920003023 plastic Polymers 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 10
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 6
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 239000006117 anti-reflective coating Substances 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- -1 SiO 2 Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Description
【発明の詳細な説明】
本発明は、反射防止膜の改良に関し、更に詳細
にはプラスチツク光学部材のために反射防止膜の
改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION This invention relates to improvements in antireflection coatings, and more particularly to improvements in antireflection coatings for plastic optical components.
一般にプラスチツク光学部材は、基板が軟らか
いことや、80℃以上に加熱すると変形してしまう
ことから、反射防止膜として、300℃前後まで加
熱することが必要なホツトコードを使用すること
ができず、従つて強い反射防止膜を形成すること
が困難である。この対策として、プラスチツク光
学部材の表面にSiOまたはガラスを２μ〜10μ蒸
着し、下地の強度を高め、その上に反射防止膜を
施す方法が知られている。しかしながら、この方
法は、SiO2またはガラスの蒸着に時間がかか
り、作業性が悪く、またSiO2は上記した程度
（２μ〜10μ）になると光の吸収が大きくなつて
しまうなどの欠点がある。 In general, plastic optical components have a soft substrate and deform when heated above 80°C, so hot cords, which require heating to around 300°C, cannot be used as anti-reflection coatings. It is difficult to form a strong antireflection film. As a countermeasure against this problem, a method is known in which 2 to 10 microns of SiO or glass is vapor-deposited on the surface of a plastic optical member to increase the strength of the base, and an antireflection film is applied thereon. However, this method has the disadvantage that it takes time to deposit SiO 2 or glass, has poor workability, and that when SiO 2 reaches the above-mentioned level (2 μ to 10 μ), light absorption increases.
また、基盤上に高屈折率を有する物質を先ず蒸
着し、この高屈折率層上に更に低屈折率を有する
物質を蒸着し、反射防止膜を２層膜構成とすれば
特定波長の反射率を特に下げることができること
が知られている。しかしながら、基盤を高温にす
ることができれば種々の物質を用いて上記２層膜
を形成することができるが、前述のようにプラス
チツクはほぼ常温において反射防止膜の蒸着を行
なう必要があるため、特に高屈折率層の選択が難
しいという問題がある。また、前述のガラスや
SiO2を高屈折率層として用いることは、ガラス
の場合には屈折率が不足であり、またSiO2の場
合には光の吸収が大きくなつてしまうという問題
があるため適当でない。 In addition, if a substance with a high refractive index is first deposited on the substrate, and then a substance with a low refractive index is further deposited on this high refractive index layer, and the antireflection film is formed into a two-layer film structure, the reflectance at a specific wavelength can be improved. It is known that it can particularly reduce However, if the substrate can be heated to a high temperature, the above-mentioned two-layer film can be formed using various materials, but as mentioned above, the anti-reflection film must be deposited on plastics at approximately room temperature, so There is a problem in that it is difficult to select a high refractive index layer. In addition, the above-mentioned glass
It is not appropriate to use SiO 2 as a high refractive index layer because glass has an insufficient refractive index and SiO 2 has the problem of increased light absorption.
そこで本発明は、プラスチツク光学部材に上記
のような表面強化処理をしないで直接施すことが
でき、しかも特定の波長の反射率を特に高めるこ
とのできる層構成を有する反射防止膜を提供する
ことを目的とするものである。 Therefore, the present invention aims to provide an antireflection coating that can be applied directly to plastic optical members without the above-mentioned surface strengthening treatment, and that has a layer structure that can particularly increase the reflectance of specific wavelengths. This is the purpose.
本発明によるプラスチツク部材の反射防止膜
は、プラスチツク光学部材上に酸化ジルコニウム
ZrO2を1/8λ〜1/2λ蒸着してなる第１層、およ
びこの第１層上に一酸化硅素SiOを酸化させなが
ら約1/4λ蒸着してなる第２層のみからなること
を特徴とするものである。 The antireflection coating for a plastic member according to the present invention comprises a zirconium oxide coating on a plastic optical member.
It is characterized by consisting only of a first layer formed by evaporating ZrO 2 from 1/8λ to 1/2λ, and a second layer formed by evaporating silicon monoxide (SiO) about 1/4λ while oxidizing it on the first layer. That is.
本発明の反射防止膜においては、第１層として
常温で蒸着された場合にも十分な強度を有し、光
の吸収も少なく第２層との合性もよい酸化ジルコ
ニウムを用いたことにより、この酸化ジルコニウ
〓〓〓
ムにより、プラスチツク部材に適した、効果的な
高屈折率層を形成することができる。また第２層
は一酸化硅素SiOを酸化させながら約1/4λ蒸着
したものであるが、この第２層は単にSiO2のみ
からなるものではなく酸化されなかつたSiO、あ
るいは不完全酸化状態であるSi2O3等が混在して
形成されたものであり、実験によればこの第２層
によつて従来の表面強化処理した場合と同等のあ
るいはそれ以上の強度を呈することがわかつた。
また、反射防止効果は、この第２層の屈折率を
SiOの酸化の程度によつて所定の範囲内で調整で
きるので、従来の反射防止膜と同等以上の効果を
得ることができる。 In the antireflection film of the present invention, by using zirconium oxide as the first layer, which has sufficient strength even when deposited at room temperature, absorbs little light, and has good compatibility with the second layer. This zirconium oxide
This makes it possible to form effective high refractive index layers suitable for plastic parts. The second layer is silicon monoxide (SiO) deposited by evaporation of approximately 1/4λ while oxidizing it, but this second layer is not simply made of SiO 2 but is made of unoxidized SiO or incompletely oxidized SiO. It is formed by a mixture of certain Si 2 O 3 and the like, and experiments have shown that this second layer exhibits strength equal to or greater than conventional surface strengthening treatment.
In addition, the antireflection effect depends on the refractive index of this second layer.
Since it can be adjusted within a predetermined range depending on the degree of oxidation of SiO, it is possible to obtain effects equal to or greater than those of conventional antireflection films.
以下添付図面を参照しつつ本発明の反射防止膜
の好ましい実施例について説明する。 Preferred embodiments of the antireflection film of the present invention will be described below with reference to the accompanying drawings.
第１図は、本発明の反射防止膜１の断面図であ
る。 FIG. 1 is a cross-sectional view of an antireflection film 1 of the present invention.
第１図において、符号２はPMMA等のプラス
チツク光学部材であり、反射防止膜１はこの光学
部材２上に被覆される。この反射防止膜１は、光
学部材２に近い順に酸化ジルコニウムZrO2を蒸
着してなる第１層３、およびこの第１層３上に一
酸化硅素を酸化させながら蒸着してなる第２層か
らなつている。第１層３の厚さは、1/2λ〜1/8λ
から透過させるべき光の波長に応じた厚さに選択
される。この第１層３の厚さは、通常は1/4λに
選択される。第２層４の厚さは、1/4λを選択す
るのが望ましい。 In FIG. 1, reference numeral 2 denotes a plastic optical member such as PMMA, and the antireflection film 1 is coated on this optical member 2. As shown in FIG. This antireflection film 1 consists of a first layer 3 formed by vapor-depositing zirconium oxide ZrO 2 in order of proximity to the optical member 2, and a second layer formed by vapor-depositing silicon monoxide while oxidizing it on this first layer 3. It's summery. The thickness of the first layer 3 is 1/2λ to 1/8λ
The thickness is selected according to the wavelength of light to be transmitted. The thickness of this first layer 3 is usually selected to be 1/4λ. The thickness of the second layer 4 is desirably selected to be 1/4λ.
なお、上記第２層４を形成する際の、一酸化硅
素の酸化しながらの蒸着は次のようにして行なわ
れる。 Incidentally, when forming the second layer 4, silicon monoxide is vapor-deposited while being oxidized as follows.
蒸着槽を１×10-5torr程度の高真空に排気して
から、O2ガスを上記蒸着槽内部が１×10-4torr程
度の真空度となるように導入し、このO2ガス
一酸化硅素をゆつくり（３〜10分）蒸着させて蒸
着し、これによつて第２層４を形成する。 After evacuating the vapor deposition tank to a high vacuum of about 1×10 -5 torr, O 2 gas is introduced so that the inside of the vapor deposition tank has a vacuum of about 1×10 -4 torr, and this O 2 gas
Silicon monoxide is deposited slowly (3 to 10 minutes) to form the second layer 4.
次に実験例によつて本発明を更に詳細に説明す
る。 Next, the present invention will be explained in more detail using experimental examples.
実験例
加熱せずに、アクリル基板上に第１層３として
酸化ジルコニウムZrO2を125ｍμ蒸着した。次に
このように形成した第１層３上に、第２層４とし
て一酸化硅素SiOを酸化させながら125ｍμ蒸着
させた。このときの第２層４の組成は、SiO、
SiO2、Si2O3、その他SiOxの硅素酸化物の混合体
であると考えられる。この混合体の屈折率は、
1.50であつた。またZrO2の屈折率は、1.89であつ
た。Experimental Example Zirconium oxide ZrO 2 was deposited at 125 mμ as the first layer 3 on an acrylic substrate without heating. Next, on the first layer 3 thus formed, a silicon monoxide (SiO) of 125 mμ was deposited as a second layer 4 while being oxidized. The composition of the second layer 4 at this time is SiO,
It is thought to be a mixture of silicon oxides such as SiO 2 , Si 2 O 3 , and other SiOx. The refractive index of this mixture is
It was 1.50. Moreover, the refractive index of ZrO 2 was 1.89.
以上のようにして形成した反射防止膜１の分光
反射率特性を第２図のグラフに示す。 The spectral reflectance characteristics of the antireflection film 1 formed as described above are shown in the graph of FIG.
この第２図のグラフから分かるように、本発明
による反射防止膜１は、十分に透過できる波長の
バンドが若干狭くなつているが十分な反射防止効
果を有するものである。また第２層として硅素酸
化物の混合体を蒸着したことにより、反射防止膜
全体としての強度が向上し、溶剤に対する耐久性
も向上した。更に第２層の不完全酸化硅素すなわ
ちSiO、Si2O3等の作用により、帯電防止の効果
も認められた。 As can be seen from the graph in FIG. 2, the antireflection film 1 according to the present invention has a sufficient antireflection effect, although the wavelength band that can be sufficiently transmitted is slightly narrower. Further, by depositing a silicon oxide mixture as the second layer, the strength of the antireflection film as a whole was improved, and its durability against solvents was also improved. Furthermore, an antistatic effect was observed due to the action of incomplete silicon oxide, ie, SiO, Si 2 O 3 , etc. in the second layer.
なお、第１層３としてZrO2を用いたものを説
明したが、TiO2またはTi2O3でも反射特性や膜の
強度に差は出なかつた。従つて、第１層として
は、TiO2またはTi2O3を使用することもできる。 Note that although ZrO 2 was used as the first layer 3 in the explanation, there was no difference in reflection characteristics or film strength even if TiO 2 or Ti 2 O 3 was used. Therefore, TiO 2 or Ti 2 O 3 can also be used as the first layer.
第１図は、本発明の反射防止膜の断面図、第２
図は、第１図に示した反射防止膜の反射率特性を
示すグラフである。
１……反射防止膜、２……プラスチツク光学部
材、３……第１層、４……第２層。
〓〓〓
FIG. 1 is a cross-sectional view of the antireflection film of the present invention, and FIG.
The figure is a graph showing the reflectance characteristics of the antireflection film shown in FIG. 1. DESCRIPTION OF SYMBOLS 1... Antireflection film, 2... Plastic optical member, 3... First layer, 4... Second layer. 〓〓〓
Claims (1)
ZrO2を1/8λ〜1/2λ蒸着してなる第１層、およ
びこの第１層上に一酸化硅素SiOを酸化させなが
ら約1/4λ蒸着してなる第２層のみからなるプラ
スチツク部材の反射防止膜。1 Zirconium oxide on plastic optical member
A plastic member consisting only of a first layer formed by evaporating ZrO 2 from 1/8λ to 1/2λ, and a second layer formed by evaporating silicon monoxide (SiO) about 1/4λ while oxidizing the first layer. Anti-reflective coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56026459A JPS57139702A (en) | 1981-02-25 | 1981-02-25 | Reflection preventing film of plastic optical member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56026459A JPS57139702A (en) | 1981-02-25 | 1981-02-25 | Reflection preventing film of plastic optical member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57139702A JPS57139702A (en) | 1982-08-28 |
| JPS6135522B2 true JPS6135522B2 (en) | 1986-08-13 |
Family
ID=12194085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56026459A Granted JPS57139702A (en) | 1981-02-25 | 1981-02-25 | Reflection preventing film of plastic optical member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57139702A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2590133B2 (en) * | 1987-09-10 | 1997-03-12 | 日本板硝子株式会社 | Transparent plate having conductive anti-reflective coating |
| US6958748B1 (en) | 1999-04-20 | 2005-10-25 | Matsushita Electric Industrial Co., Ltd. | Transparent board with conductive multi-layer antireflection films, transparent touch panel using this transparent board with multi-layer antireflection films, and electronic equipment with this transparent touch panel |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53306A (en) * | 1976-06-25 | 1978-01-05 | Mitsubishi Motors Corp | Fuel ejection system rare air combustion engine |
| JPS56102801A (en) * | 1980-01-19 | 1981-08-17 | Minolta Camera Co Ltd | Reflection preventing film |
-
1981
- 1981-02-25 JP JP56026459A patent/JPS57139702A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53306A (en) * | 1976-06-25 | 1978-01-05 | Mitsubishi Motors Corp | Fuel ejection system rare air combustion engine |
| JPS56102801A (en) * | 1980-01-19 | 1981-08-17 | Minolta Camera Co Ltd | Reflection preventing film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57139702A (en) | 1982-08-28 |
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