JPS5855901A - Production of reflecting mirror - Google Patents
Production of reflecting mirrorInfo
- Publication number
- JPS5855901A JPS5855901A JP15408781A JP15408781A JPS5855901A JP S5855901 A JPS5855901 A JP S5855901A JP 15408781 A JP15408781 A JP 15408781A JP 15408781 A JP15408781 A JP 15408781A JP S5855901 A JPS5855901 A JP S5855901A
- Authority
- JP
- Japan
- Prior art keywords
- film
- aluminum
- substrate
- vapor
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、複写機、ファクシミリ、レーザプリンタなど
夜使用される反射＠（ミラー）の製造方法に関し、さら
に詳しくは、高反射特性、高耐久性を要求される結像系
に使用されるアル建ミラーの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a reflective @ (mirror) used at night in copying machines, facsimile machines, laser printers, etc. This invention relates to a method for manufacturing an aluminum mirror used in a system.
従来、アルミミラー襄遣方法としては、真、空蒸着法に
よるｌバッチ方式と２バッチ方式が知られている。＠者
は、本板上にアルミニウムを所望の厚さに蒸着し、さら
にそのまま同じ装置内で保護膜を蒸着するものであり、
後者は、アルミニウム蒸着後、該基板を一旦装置外へ取
り出し、別の蒸着装置へ移動させて保護膜を蒸着する方
式のもので６る。Conventionally, the one-batch method and the two-batch method using the vacuum vapor deposition method are known as aluminum mirror processing methods. @Partner vapor-deposit aluminum to the desired thickness on the main board, and then vapor-deposit a protective film in the same equipment,
The latter is a method in which, after aluminum evaporation, the substrate is temporarily taken out of the apparatus, moved to another evaporation apparatus, and a protective film is deposited thereon.
しかしながら、上記の方法で製造された反射鏡は１反射
軍および膜強度が時間の経過につれて低下してゆくとい
う欠点′（ｆ−有している。これは、基板とアルミ膜、
あるいはアルミ膜と保護膜との間で徐々に化学反応が進
行し、各々の接触面の密着性が悪くなシ、膜剥がｎが起
こシ易くなること。However, the reflector manufactured by the above method has the disadvantage that the reflection force and film strength decrease over time. This is because the substrate and aluminum film,
Alternatively, a chemical reaction gradually progresses between the aluminum film and the protective film, resulting in poor adhesion between the respective contact surfaces and the film becoming more likely to peel off.
さらＫは、アルミ被膜の劣化によ多分光反射率が低下す
ることに起因するものであると考えられている。Further K is considered to be caused by a decrease in multi-spectral reflectance due to deterioration of the aluminum coating.
本発明の目的は、上述した従来のアルミミラーの欠点を
解決しようとするものであシ、高反射特性を維持し、か
つ耐久性のすぐれたアルくミラーの製造方法を提供する
ことにある。An object of the present invention is to solve the above-mentioned drawbacks of conventional aluminum mirrors, and to provide a method for manufacturing an aluminum mirror that maintains high reflection characteristics and has excellent durability.
本発明者らの研究によれば、アルミ被膜を酸化し、酸化
アルミ被膜を形成することにより、基板とアルミ膜、Ｔ
ｏるいはアルミ膜と保、ＦＩ嗅との接着面で進行すると
考えられる化学反応が抑制され、それに半って膜剥がれ
および反射率の低下が防止されうろことが見出された。According to the research of the present inventors, by oxidizing the aluminum film and forming an aluminum oxide film, the substrate and the aluminum film can be
It has been found that the chemical reaction that is thought to proceed at the bonding surface between the aluminum film and the film and the FI film is suppressed, and that this also prevents film peeling and a decrease in reflectance.
すなわち１本発明の反射鏡の製造方法は、基板上に反射
用アルミ４１膜を被着し、さらに該アルミ被膜の表面に
保護膜を被着してなる反射鏡ｔ−製造するＫあたり、ｓ
ｔｒ記アシアル膜被着後に、該アルミ被膜を酸素雰囲気
中で酸化することを特徴とするものである。That is, in the method for manufacturing a reflecting mirror of the present invention, a reflective aluminum 41 film is coated on a substrate, and a protective film is further coated on the surface of the aluminum film.
The method is characterized in that after the asial film is deposited, the aluminum film is oxidized in an oxygen atmosphere.
以下、不発明をさらに詳細に説明する。The non-invention will be explained in more detail below.
本発明の反射鏡の製造方法は以下の１株からなる。すな
わち、まず真空蒸着装置の蒸着容器内に基板を設置し、
所定の圧力まで蒸着容器を排気し死後、基板上にアルミ
ニウムを真空蒸着法、スパッタ法などにより蒸着し、ア
ルミ被膜を形成する。The method for manufacturing a reflecting mirror of the present invention consists of the following one strain. That is, first, a substrate is placed in the evaporation container of a vacuum evaporation device,
The vapor deposition container is evacuated to a predetermined pressure, and after death, aluminum is vapor-deposited onto the substrate by vacuum evaporation, sputtering, or the like to form an aluminum film.
次いで真空容器内にＩＮ！素を導入し、上記アルミ被膜
を酸素雰囲気中に一定時間放置して少なくとも一部分酸
化する。この際基板を〜１００ｉ〜４２００４Ｃ程度に
加熱してもよい、−硬に、上記蒸？容器蒸着した後蒸着
容器を大気圧にもどして反射鏡の製造工程を完了させる
。Next, put it in the vacuum container! The aluminum film is left in an oxygen atmosphere for a certain period of time to oxidize at least a portion of the aluminum film. At this time, the substrate may be heated to about 100i to 42004C. After the container is deposited, the deposition container is returned to atmospheric pressure to complete the manufacturing process of the reflector.
上記した方法は従来の１バッチ方式Ｋａ尚するものであ
るが１本発明は２バッチ方式としても実施することがで
きる。すなわち、アルミ被膜形成後、一旦他の蒸着容器
を移動し、該アルミ被膜を酸化することも可能である。Although the above-mentioned method is a conventional one-batch method, the present invention can also be implemented as a two-batch method. That is, after forming the aluminum film, it is also possible to temporarily move the vapor deposition container to another vapor deposition container and oxidize the aluminum film.
以下、実施例１．・比較例によシ本発明をさらに具体的
に説明する６本°発明は、この実施例に限定される奄の
ではない。Below, Example 1.・The present invention will be explained more specifically using comparative examples.The present invention is not limited to these examples.
実施例
本実施例においては従来の１パッチ方式を用いた０反射
鏡の基板としては、ガラスを用い、真空蒸着法によシア
ルミニウムおよび保護膜の被着を行なう。Embodiment In this embodiment, glass is used as the substrate of a zero-reflector using the conventional one-patch system, and sialumium and a protective film are deposited by vacuum evaporation.
まず、真空蒸着装置の蒸着容器内を約１０７５Ｔｏｒｒ
の圧力まで排気し、純度９９．９９％ のアルミニウム
を蒸発させガラス基板表面に約１ｏｏｏｌのアルミ被膜
を形成する。First, the inside of the evaporation container of the vacuum evaporation equipment is set at approximately 1075 Torr.
The vacuum was evacuated to a pressure of 99.99%, and aluminum with a purity of 99.99% was evaporated to form an aluminum film of about 100 ml on the surface of the glass substrate.
次いで、該蒸着容器内に酸素ガスを約１０ Ｔｏｒｒ
の圧力まで導入し、上記アルミ被膜を酸素雰囲気中で６
分間基板を２００Ｃに保って酸化する。セしてさらに、
上記基板を加熱しながら、再び蒸着容器内を１０ Ｔ
Ｏｒｒ程度の圧力まで排気する。この−ように基板を加
熱するのは、アルミ被膜と保ｆａ膜との密着性を良くす
るためと保護膜の屈折率を一定に保つためである。Next, oxygen gas was introduced into the deposition container at a pressure of about 10 Torr.
The aluminum coating was heated in an oxygen atmosphere for 6 hours.
Hold the substrate at 200C for oxidation. and further,
While heating the above substrate, the inside of the deposition container was heated again at 10 T.
Evacuate to a pressure of about Orr. The reason for heating the substrate in this manner is to improve the adhesion between the aluminum coating and the antifa film and to keep the refractive index of the protective film constant.
基板＠度が約８００ Ｃになったら低屈折率物質である
二酸化ケイＸ （８１０’、）をＳ酸化されたアルイ被
膜上に８８０ムの厚さに蒸着する１次いでその表面に、
ｉ％ｉ屈′Ｆｒ軍物質でるる二酸化チタン（Ｔ１０□）
を５５０ムの厚さに蒸着？、＆、低屈折軍屈折として＃
１Ｓｉ０２のは力）にＭｇ１Ｆ２．ム１５！０８． Ｏ
ｅν８なども用いることができｌ屈折率物質としては、
テ１０２のほかにＺｒＯ２、Ｃ３＠０２ 、Ｐｒ６Ｏ１
１ｆｉども用いることができる。When the temperature of the substrate reaches about 800 C, a low refractive index material, silicon dioxide
Titanium dioxide (T10□)
Deposited to a thickness of 550 μm? , &, low refraction military refraction #
1Si02 force) and Mg1F2. Mu15!08. O
eν8 etc. can also be used as l refractive index material,
In addition to Te102, ZrO2, C3@02, Pr6O1
1fi can be used.
上記２ｆｆｉの保護膜が形成された後、該基板温度が約
２００Ｃまで下がった時点で蒸着容器を大気圧にもどし
てアルミミラーの製造工程が終了する。After the 2ffi protective film is formed, when the substrate temperature drops to about 200C, the deposition container is returned to atmospheric pressure and the aluminum mirror manufacturing process is completed.
比較例
上記例の手順を、アルミ被膜の酸化工程を除いて繰り返
した。すなわち、本比較例においては。Comparative Example The procedure of the above example was repeated except for the oxidation step of the aluminum coating. That is, in this comparative example.
上記例と同一の条件にて、まず、ガラス基板上にアルミ
被膜を形成した後、続いて、腹アル建被膜上に保護膜と
してＳｉＯおよびＴｉＯ２を蒸着しアルミ＜２−を得た
。Under the same conditions as in the above example, an aluminum film was first formed on a glass substrate, and then SiO and TiO2 were deposited as a protective film on the aluminum alloy film to obtain aluminum<2-.
かくして得られたアルミミラーについて１反剖率および
膜強度の経時変化を測定する。得られた結果を第２図お
よび第８図に示す、第２図の結果を見れば、不発明によ
るアルミミラー（実施例）′２）従来（７）７／ｌ ｆ
２− （比較例）と比較して・反射率の経時的低下が
少ないことが６かる。ｉ九、第８図に示すように、［強
度についても本発明のアルミミラー（実施例）は、従来
のアルミミラー（比較例）にくらべその低下が普しく少
ない。For the aluminum mirror thus obtained, the rate of autopsy and changes over time in film strength are measured. The obtained results are shown in FIGS. 2 and 8. Looking at the results in FIG.
2- Compared to (comparative example), it can be seen that the decrease in reflectance over time is small. As shown in FIG. 8, the aluminum mirror of the present invention (example) generally exhibits less decrease in strength than the conventional aluminum mirror (comparative example).
以上の笑施例、比較例から明らかなように、本発明によ
るアルミミラーは１反射軍および膜強度の経時的低下が
少なく、高反射特！！：、高耐久性を維持することがで
きる。As is clear from the above Examples and Comparative Examples, the aluminum mirror according to the present invention exhibits low reflectance and film strength over time, and has high reflective properties! ! : High durability can be maintained.
第１図（ａ）は、従来の方法によシ製造されたアル＜ミ
ラーの断面図、第１図（ｂ）および（０）は、本発明の
方法により襄遺された断面図である。第２図は反射率の
経時的変化を示すグラフでめシ、第８図は膜強度の経時
的変化を示すグラフである。
１・・・基板、２ａ・・・アルミ膜、２１）・・・酸化
アルミ膜、８・・・低屈折率物質層、４・・・高屈折率
物質層。
出顯人代理人 猪 股 清FIG. 1(a) is a sectional view of an aluminum mirror manufactured by the conventional method, and FIGS. 1(b) and 1(0) are sectional views of the aluminum mirror manufactured by the method of the present invention. FIG. 2 is a graph showing changes in reflectance over time, and FIG. 8 is a graph showing changes in film strength over time. DESCRIPTION OF SYMBOLS 1... Substrate, 2a... Aluminum film, 21)... Aluminum oxide film, 8... Low refractive index material layer, 4... High refractive index material layer. Representative Kiyoshi Inomata
Claims (1)
被膜の表面に保護膜を被着してなる反射鏡を製造するＫ
め暫り、前記アルミ被膜被層後Ｋ。 該アル建被膜を酸素雰囲気中で酸化することを特徴とす
る反射鏡の製造方法。[Claims] A reflective mirror manufactured by depositing a reflective aluminum coating on a substrate and further coating a protective film on the surface of the aluminum coating.
For a while, after coating with the aluminum film. A method for manufacturing a reflecting mirror, comprising oxidizing the aluminum coating in an oxygen atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15408781A JPS5855901A (en) | 1981-09-29 | 1981-09-29 | Production of reflecting mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15408781A JPS5855901A (en) | 1981-09-29 | 1981-09-29 | Production of reflecting mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5855901A true JPS5855901A (en) | 1983-04-02 |
Family
ID=15576605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15408781A Pending JPS5855901A (en) | 1981-09-29 | 1981-09-29 | Production of reflecting mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5855901A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0312036A (en) * | 1989-06-07 | 1991-01-21 | Asahi Chem Ind Co Ltd | Optical recording medium |
| JP2009003063A (en) * | 2007-06-20 | 2009-01-08 | Central Glass Co Ltd | Front surface mirror |
| CN108330449A (en) * | 2018-01-04 | 2018-07-27 | 苏州市唯嘉光学有限公司 | High diffusing reflection aluminium film on frosting and preparation method thereof |
-
1981
- 1981-09-29 JP JP15408781A patent/JPS5855901A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0312036A (en) * | 1989-06-07 | 1991-01-21 | Asahi Chem Ind Co Ltd | Optical recording medium |
| JP2009003063A (en) * | 2007-06-20 | 2009-01-08 | Central Glass Co Ltd | Front surface mirror |
| CN108330449A (en) * | 2018-01-04 | 2018-07-27 | 苏州市唯嘉光学有限公司 | High diffusing reflection aluminium film on frosting and preparation method thereof |
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