JPS6133000Y2 - - Google Patents
Info
- Publication number
- JPS6133000Y2 JPS6133000Y2 JP12771082U JP12771082U JPS6133000Y2 JP S6133000 Y2 JPS6133000 Y2 JP S6133000Y2 JP 12771082 U JP12771082 U JP 12771082U JP 12771082 U JP12771082 U JP 12771082U JP S6133000 Y2 JPS6133000 Y2 JP S6133000Y2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- sample
- ions
- reflected
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 31
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 24
- 150000002500 ions Chemical class 0.000 claims description 23
- 229910052786 argon Inorganic materials 0.000 claims description 19
- -1 argon ions Chemical class 0.000 claims description 14
- 238000000992 sputter etching Methods 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 9
- 239000010931 gold Substances 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229920002189 poly(glycerol 1-O-monomethacrylate) polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12771082U JPS5933765U (ja) | 1982-08-23 | 1982-08-23 | イオンミリングエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12771082U JPS5933765U (ja) | 1982-08-23 | 1982-08-23 | イオンミリングエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5933765U JPS5933765U (ja) | 1984-03-02 |
| JPS6133000Y2 true JPS6133000Y2 (enrdf_load_stackoverflow) | 1986-09-26 |
Family
ID=30289961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12771082U Granted JPS5933765U (ja) | 1982-08-23 | 1982-08-23 | イオンミリングエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5933765U (enrdf_load_stackoverflow) |
-
1982
- 1982-08-23 JP JP12771082U patent/JPS5933765U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5933765U (ja) | 1984-03-02 |
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