JPS6130154Y2 - - Google Patents
Info
- Publication number
- JPS6130154Y2 JPS6130154Y2 JP12283783U JP12283783U JPS6130154Y2 JP S6130154 Y2 JPS6130154 Y2 JP S6130154Y2 JP 12283783 U JP12283783 U JP 12283783U JP 12283783 U JP12283783 U JP 12283783U JP S6130154 Y2 JPS6130154 Y2 JP S6130154Y2
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- opening
- door
- container
- glass plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 29
- 238000010438 heat treatment Methods 0.000 claims description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000011109 contamination Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
Landscapes
- Vertical, Hearth, Or Arc Furnaces (AREA)
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12283783U JPS6031000U (ja) | 1983-08-09 | 1983-08-09 | 光照射炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12283783U JPS6031000U (ja) | 1983-08-09 | 1983-08-09 | 光照射炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6031000U JPS6031000U (ja) | 1985-03-02 |
| JPS6130154Y2 true JPS6130154Y2 (enrdf_load_html_response) | 1986-09-04 |
Family
ID=30280624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12283783U Granted JPS6031000U (ja) | 1983-08-09 | 1983-08-09 | 光照射炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6031000U (enrdf_load_html_response) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0530352Y2 (enrdf_load_html_response) * | 1985-11-28 | 1993-08-03 | ||
| JPH0539798Y2 (enrdf_load_html_response) * | 1987-02-17 | 1993-10-08 | ||
| JP3972379B2 (ja) * | 1995-12-14 | 2007-09-05 | 信越半導体株式会社 | 加熱炉 |
| KR20030025146A (ko) * | 2001-09-19 | 2003-03-28 | 권영해 | 반도체소자 제조용 급속 열처리 설비 및 급속 열처리 화학증착 설비의 가열장치. |
| KR100446695B1 (ko) * | 2001-10-17 | 2004-09-04 | 김병주 | 도가니형 저항전기로 |
| TWI783857B (zh) * | 2017-12-27 | 2022-11-11 | 日商米倉製作所股份有限公司 | 紅外線燒製裝置及使用此裝置之電子部件燒製方法 |
| JP6767028B2 (ja) * | 2018-12-25 | 2020-10-14 | 株式会社米倉製作所 | 赤外線焼成装置及びこれを用いた電子部品の焼成方法 |
-
1983
- 1983-08-09 JP JP12283783U patent/JPS6031000U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6031000U (ja) | 1985-03-02 |