JPS6130154Y2 - - Google Patents

Description

[Detailed explanation of the idea] The present invention relates to a light irradiation furnace.

Among the devices generally used for heat treatment, the light irradiation furnace, which irradiates the workpiece with synchrotron radiation from an incandescent light bulb, has various features, so it can be used for heat treatment and drying of steel materials, plastic molding, thermal property testing equipment, etc. It is widely used. Especially recently,
Processes that require heating in the manufacture of semiconductors,
For example, an impurity diffusion process, a chemical vapor deposition process, a process for recovering crystal defects in the ion implantation layer, a heat treatment process for electrical activation, and a heat treatment process for nitriding or oxidizing the surface layer of the silicon wafer. In place of the conventionally used electric furnace, high frequency furnace, etc., as a heating furnace for
The use of a light irradiation furnace is being considered. This is because light irradiation furnaces do not contaminate the objects to be treated or have any negative electrical effects, and consume less power. In addition, conventional heating furnaces can uniformly process large areas of objects. This is because it cannot be heated and cannot respond to the recent increase in the area of semiconductors.

By the way, when the object to be processed is a silicon wafer that must be kept as much as possible from contamination from the furnace body, it is often possible to place a quartz glass container in the heating space of the light irradiation furnace and perform heat treatment inside the container. . However, since this container is made of quartz glass, it is very difficult to provide a door to open and close the opening of the container each time the object to be processed is taken out or taken out. Therefore, conventionally, for example, without providing a door for the container, the opening was made as flat as possible to reduce the opening area, following the shape of a silicon wafer, or the container itself was divided into two parts, and the joints were overlapped. I kept it in good condition and used it. However, all of these have problems such as difficulty in manufacturing containers and complicated handling for stacking.

Therefore, the purpose of the present invention is to provide a light irradiation furnace that is easy to manufacture and can be easily handled to open and close the opening of the quartz glass container. Surrounded by parts,
The opening of the quartz glass container, which is placed in this heating space at a distance from the light reflecting member, is provided in the direction of the entrance/exit of the object to be processed provided in the furnace body, and the inner surface of the door for opening/closing the entrance/exit is mirror-finished. A quartz glass plate is stacked on a mirror surface, and when the door is closed, this quartz glass plate approaches the opening of the quartz glass container and closes the entrance and exit at the same time.

The present invention will be specifically described below based on embodiments shown in the drawings.

1 to 3 show the first embodiment. Long halogen lamps 2 are closely arranged in parallel on the upper and lower surfaces of the interior of the furnace body 1, and the back surface of the lamps is mirror-treated. The lamp 2
The heating space 5 is irradiated with more light. The main reflecting member 3 and the sub-reflecting member 4 are provided with cooling channels (not shown) and are water-cooled. A quartz glass container 6 is disposed in the heating space 5, and the quartz glass container 6 has a simple shape of a rectangular cylinder with an opening 6a at one end and is easy to manufacture.
An inlet/outlet 1a for the object to be processed is provided on one side of the furnace body 1, and the opening 6a faces the inlet/outlet 1a. A support 8 made of quartz glass is connected to a door 7 that opens and closes the entrance 1a, and a silicon wafer 9, which is an object to be processed, is supported by this support 8 and subjected to heat treatment. The inner surface of the door 7 is mirror-finished, and a quartz glass plate 10 having an area equal to or slightly larger than the opening 6a is superimposed thereon.
When the door 7 is driven by a drive device (not shown) and closes the entrance 1a, the silicon wafer 9
is located at a predetermined heat treatment position within the container 6, and the quartz glass plate 10 is close to the opening 6a. Therefore, since the silicon wafer 9 is located in a nearly closed space surrounded by quartz glass, there is no risk of contamination, and since the inner surface of the door is also mirror-finished, it is heated efficiently and uniformly.

Next, FIG. 4 shows a second embodiment, in which the basic structure of the furnace body 1 is the same as that in the first embodiment, except that two entrances and exits 1a are provided on both sides. The quartz glass container 6 also has openings 6a at both ends.
are provided, and both match. And supports 8 are attached to the two doors 7A and 7B, respectively.
A and 8B are arranged in series, the inner surfaces of which are mirror-finished, and a quartz glass plate 10 is superimposed thereon. Further, a shutter 11A is installed at the entrance 1a,
11B are arranged to be movable up and down, and their inner surfaces are also mirror-finished and a quartz glass plate 10 is superimposed on them, so that they have the same function as the doors 7A and 7B. . Thus, the doors 7A and 7B are reciprocated by a drive device (not shown), and when the door 7B closes the doorway 1a, the shutter 11A descends to close the other doorway 1a. Therefore, the openings 6 at both ends of the container 6
a, 6a are closed with a quartz glass plate 10, and the silicon wafer 9 is heat-treated in a closed space surrounded by quartz glass. When the heat treatment is completed, door 7
As the shutter B moves backward, the shutter 11A rises, and then as the door 7A moves forward, the shutter 11B descends, and the unprocessed silicon wafer 9 enters the container 6 and is heat-treated. Therefore, the waiting time is short and the heat treatment is performed efficiently, but also in this embodiment, the silicon wafer 9 is uniformly heated without being contaminated.

In this way, the present invention has a mirror surface on the inner surface of the door that opens and closes the entrance and exit of the heat-treated material, and a quartz glass plate is superimposed on the mirror surface so that the quartz glass plate approaches the opening of the quartz glass container when the door is closed. So,
First, the quartz glass container has a simple shape and is very easy to manufacture. Since the opening of the container is closed at the same time as the door is closed, the operation is simple and there is no risk of contamination of the object to be processed. Further, the mirror surface of the door enables uniform heating, and therefore, according to the present invention, it is possible to provide a light irradiation furnace that is easy to manufacture and can open and close the opening of a quartz glass container with easy handling. .

[Brief explanation of drawings]

1 and 2 are plan sectional views of the embodiment of the present invention,
FIG. 3 is a front sectional view, and FIG. 4 is a front sectional view of another embodiment. 1... Furnace body, 1a... Entrance/exit, 2... Lamp,
3... Main reflecting member, 4... Sub-reflecting member, 5... Heating space, 6... Quartz glass container, 6a... Opening,
7...Door, 9...Processed object (silicon wafer)
10...Quartz glass plate, 11A, 11B...Shutter.

Claims (1)

[Scope of utility model registration request] A heating space where the light of the lamp is emitted is surrounded by a light reflecting member, and the opening of a quartz glass container placed in this heating space apart from the light reflecting member is directed toward the entrance and exit of the workpiece provided in the furnace body. The inner surface of the door that opens and closes the doorway is made into a mirror surface, and a quartz glass plate is superimposed on the mirror surface, so that when the door is closed, the quartz glass plate comes close to the opening of the quartz glass container and connects the doorway and the opening. A light irradiation furnace characterized by being closed at the same time.