JPS6031000U - light irradiation furnace - Google Patents
light irradiation furnaceInfo
- Publication number
- JPS6031000U JPS6031000U JP12283783U JP12283783U JPS6031000U JP S6031000 U JPS6031000 U JP S6031000U JP 12283783 U JP12283783 U JP 12283783U JP 12283783 U JP12283783 U JP 12283783U JP S6031000 U JPS6031000 U JP S6031000U
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- light irradiation
- opening
- irradiation furnace
- entrance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Furnace Details (AREA)
- Vertical, Hearth, Or Arc Furnaces (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図、第2図は本考案実施例の平面断面図、第3図は
同じく正面断面図、第4図は他の実施例の正面断面図で
ある。
1・・・・・・炉体、1a・・・・・・出入口、2・・
・・・・ランプ、3・・・・・・主反射部材、4・・・
・・・副反射部材、5・・・・・・加 ′□熱空間
、6・・・・・・石英ガラス容器、6a・・・・・・開
口、7・・・・・・扉、9・・・・・・被処理物(シリ
マンウェハー)、10・・・・・・石英ガラス板、II
A、IIB・・・・・・シャッター。
第2図
第3図1 and 2 are plan sectional views of an embodiment of the present invention, FIG. 3 is a front sectional view of the same, and FIG. 4 is a front sectional view of another embodiment. 1...Furnace body, 1a...Entrance/exit, 2...
...Lamp, 3...Main reflecting member, 4...
... Sub-reflection member, 5 ... Heat space, 6 ... Quartz glass container, 6a ... Opening, 7 ... Door, 9 ...Processed object (Siliman wafer), 10... Quartz glass plate, II
A, IIB...Shutter. Figure 2 Figure 3
Claims (1)
ラス容器の対開口を炉体に設げられた被処理物の出入口
の方向に設け、該出入口を開閉する扉の内面を鏡面とし
、その鏡面の上に石英ガラス板を重ね合せ、閉扉時にこ
の石英ガラス板が該石英ガラス容器の開口に近接するこ
とを特徴とする光照射炉。A counter opening of a quartz glass container disposed in a heating space irradiated with lamp light is provided in the direction of an entrance/exit of the object to be processed provided in the furnace body, and the inner surface of the door for opening/closing the entrance/exit is mirror-finished; A light irradiation furnace characterized in that a quartz glass plate is superimposed on the mirror surface, and the quartz glass plate comes close to the opening of the quartz glass container when the door is closed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12283783U JPS6031000U (en) | 1983-08-09 | 1983-08-09 | light irradiation furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12283783U JPS6031000U (en) | 1983-08-09 | 1983-08-09 | light irradiation furnace |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6031000U true JPS6031000U (en) | 1985-03-02 |
JPS6130154Y2 JPS6130154Y2 (en) | 1986-09-04 |
Family
ID=30280624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12283783U Granted JPS6031000U (en) | 1983-08-09 | 1983-08-09 | light irradiation furnace |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6031000U (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6291433U (en) * | 1985-11-28 | 1987-06-11 | ||
JPS63133844U (en) * | 1987-02-17 | 1988-09-01 | ||
JPH09167742A (en) * | 1995-12-14 | 1997-06-24 | Shin Etsu Handotai Co Ltd | Heating furnace |
KR20030025146A (en) * | 2001-09-19 | 2003-03-28 | 권영해 | Heating apparatus of rapid thermal annealer and rapid thermal chemical vapor deposition for semiconductor device manufacturing |
KR100446695B1 (en) * | 2001-10-17 | 2004-09-04 | 김병주 | crucible type electrical resistance furnace |
WO2019131791A1 (en) * | 2017-12-27 | 2019-07-04 | 株式会社米倉製作所 | Infrared baking device and electronic component baking method using same |
JP2019120487A (en) * | 2018-12-25 | 2019-07-22 | 株式会社米倉製作所 | Infrared firing device, and method for firing electronic component using the same |
-
1983
- 1983-08-09 JP JP12283783U patent/JPS6031000U/en active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6291433U (en) * | 1985-11-28 | 1987-06-11 | ||
JPS63133844U (en) * | 1987-02-17 | 1988-09-01 | ||
JPH0539798Y2 (en) * | 1987-02-17 | 1993-10-08 | ||
JPH09167742A (en) * | 1995-12-14 | 1997-06-24 | Shin Etsu Handotai Co Ltd | Heating furnace |
KR20030025146A (en) * | 2001-09-19 | 2003-03-28 | 권영해 | Heating apparatus of rapid thermal annealer and rapid thermal chemical vapor deposition for semiconductor device manufacturing |
KR100446695B1 (en) * | 2001-10-17 | 2004-09-04 | 김병주 | crucible type electrical resistance furnace |
WO2019131791A1 (en) * | 2017-12-27 | 2019-07-04 | 株式会社米倉製作所 | Infrared baking device and electronic component baking method using same |
TWI757166B (en) * | 2017-12-27 | 2022-03-01 | 日商米倉製作所股份有限公司 | Infrared baking device and baking method of electronic part using the same |
JP2019120487A (en) * | 2018-12-25 | 2019-07-22 | 株式会社米倉製作所 | Infrared firing device, and method for firing electronic component using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6130154Y2 (en) | 1986-09-04 |
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