JPS61295508A - Production of color filter - Google Patents

Abstract

PURPOSE:To prevent the inferiority of a peeling due to a difference of sticking forces of the dyeing resin film 4 against a glass substrate and a metallic film respectively by laminating the metallic film, the protective film and the dyeing resin film in order on the substrate. CONSTITUTION:The striped photomasking metallic film 2 is provided on the surface of a transparent substrate 1 followed by coating it with the protective film 3. The dyeing resin film 4 is formed on the protective film 3. After coating the dyeing resin film 4 with the photoresist 5, the prescribed film 4 is pattern- exposed using the photomask 6. After developing the film 4, the exposed part of the film 4 is dyed with a dyestuff such as the red dyestuff to form the red colored color filter 7, and then, the unexposed prescribed photoresist 5 is removed. By repeating selective dyeing steps in which the photoresist is wholly coated on the dyeing resin film 4, and is pattern-exposed, developed and dyed, the colored filter having the three colors such as the red, the green, and the blue colors is obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing color filters used in display devices such as color televisions.

[Prior Art] As a conventional method for manufacturing color filters, a metal film such as Or or A is formed on a glass substrate for light shielding, a resin film for dyeing is provided on top of the metal film, and a 7-layer film is roughly coated on top of the metal film for coloring. A method is known in which a color filter is constructed by repeating the steps of applying photoresist, exposing it to pattern light, developing it, and dyeing the exposed portion of the resin film (Japanese Unexamined Patent Publication No. 57-1909).
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[Problems to be Solved by the Invention] In the above-mentioned conventional technology, when a metal film is provided on a glass substrate for light shielding, when a resin film for dyeing is directly formed on the metal film, the adhesion of the resin film is lower than that of the glass substrate. Since the substrate and the metal film are different, defective peeling of the resin film has occurred in the development step after pattern exposure of the photoresist.

[Means for Solving the Problems] In order to prevent defective peeling of the dyeing resin film due to the difference in adhesion between the glass substrate and the metal film, after forming the metal film on the glass substrate, A protective film is formed thereon, and a dyeing resin film is formed thereon.

[Example] In FIG. 1, a light-shielding metal film 2 is provided in stripes on a transparent substrate 1 made of glass or the like.

Next, this is covered with a protective film 3. The material for the protective film 3 must be transparent and have good adhesion to the substrate 1, metal film 2, and dyeing resin film; for example, silicon oxide 5i02 is used. A dyeing resin film 4 is formed on this (FIG. 2). Gelatin or the like is used as the material for the dyeing resin film 4. Then, as shown in the third figure, pattern exposure is performed using a photomask 6 coated with a photoresist 5. After development, the exposed portion of the dyeing resin film 4 is dyed with a dye, for example, a red dye, as shown in FIG. 4, to form a red color filter portion 7.

Next, the remaining photoresist 5 is removed, photoresist is applied to the entire surface again, and the selective dyeing process of pattern exposure, development, and dyeing is repeated to form a color filter with three colors of red, green, and blue. to make.

[Effects of the Invention] According to the present invention, the formation of the protective film eliminates the difference in adhesion between the dyeing resin films, thereby reducing peeling defects.

[Brief explanation of drawings]

is. 1... Board 2...Metal film 3...Protective film 4...Resin film for dyeing 5...Photoresist that's all

Claims (1)

[Claims] A light-shielding metal film is provided on the substrate, a protective film is formed on top of the protective film, and a dyeing resin film is formed on top of that, and a photoresist is coated on the dyeing resin film, pattern exposure is performed, development is performed, and dyeing is performed. A method for producing a color filter, characterized by repeating a selective dyeing process.