JPS61295507A - Production of color filter - Google Patents
Production of color filterInfo
- Publication number
- JPS61295507A JPS61295507A JP60138289A JP13828985A JPS61295507A JP S61295507 A JPS61295507 A JP S61295507A JP 60138289 A JP60138289 A JP 60138289A JP 13828985 A JP13828985 A JP 13828985A JP S61295507 A JPS61295507 A JP S61295507A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photoresist
- substrate
- dyeing
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明はカラーテレビなどの表示装置に用いられるカ
ラーフィルタの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a color filter used in a display device such as a color television.
[従来の技術]
従来のカラーフィルタの製造方法として知られているも
のを説明する“(特開昭57−190912)。混色を
防ぐために、第6図示のようにガラス基板11に光遮蔽
用の金属膜12を形成し、その上に感光性染色膜13を
形成し、これを基板の反対の方向より光を照射すること
により、金属膜の上の感光性染色膜のみを除去する(第
7図〉。[Prior Art] A known method for producing a conventional color filter will be explained (Japanese Patent Laid-Open No. 57-190912). In order to prevent color mixture, a light shielding layer is provided on the glass substrate 11 as shown in FIG. A metal film 12 is formed, a photosensitive dyed film 13 is formed thereon, and only the photosensitive dyed film on the metal film is removed by irradiating this with light from the opposite direction of the substrate (7th step). figure>.
ついで、フォトレジスト14を塗布して、フォトマスク
15を用いて露光させ(第8図)、現像して、除去した
部分の染色膜13を染色する(第9図)。そして残った
フォトレジスト14を剥離して、以後同じような部分的
染色処理をくり返し施して赤R1緑G1青Bの三色によ
るカラーフィルタをつくっている。Next, a photoresist 14 is applied, exposed using a photomask 15 (FIG. 8), and developed to dye the removed portion of the dyed film 13 (FIG. 9). Then, the remaining photoresist 14 is peeled off, and the same partial dyeing process is repeated thereafter to create a color filter with three colors of red, R, green, G, and blue.
[発明が解決しようとする問題点]
上述の従来例において、光遮蔽用の金属膜は極めて薄い
ものであるのに対し、染色膜は1〜3μm程度の厚さが
おるので、段差16が生じる。この段差のため、このカ
ラーフィルタの上に後工程で透明電極を付ける際に断線
の原因になったり、抵抗値のバラツキの原因になってい
た。また液晶のセルに用いる際に液晶の配向を乱すとい
う欠点もある。[Problems to be solved by the invention] In the conventional example described above, the metal film for light shielding is extremely thin, whereas the dyed film has a thickness of about 1 to 3 μm, so a step 16 occurs. . This difference in level causes disconnection when attaching transparent electrodes on top of the color filter in a subsequent process, and causes variations in resistance values. Another disadvantage is that when used in a liquid crystal cell, it disturbs the alignment of the liquid crystal.
[問題点を解決するための手段°]
この発明は上記従来技術にあ【プる欠点を解決するもの
で、基板に光遮蔽膜を設け、その上に染色膜、およびネ
ガ型のフォトレジストを塗布し、基板の裏側より露光さ
せ、現像して上記光遮蔽膜上のフォトレジストを除去し
て光遮蔽膜上の染色膜に防染処理を施しておき、ついで
上記フォトレジストの残りの部分を除去した後、上記染
色膜への部分的染色処理をくり返すようにしたものであ
る。[Means for Solving the Problems] This invention solves the drawbacks of the above-mentioned prior art, and involves providing a light shielding film on a substrate, and coating a dyed film and a negative photoresist thereon. The photoresist on the light shielding film is coated, exposed to light from the back side of the substrate, developed to remove the photoresist on the light shielding film, and the dyed film on the light shielding film is subjected to anti-staining treatment, and then the remaining part of the photoresist is removed. After removal, the above-mentioned partial staining process on the dyed film is repeated.
[実施例]
第1図においてガラスなどの透明な基板1上にストライ
プ状に光遮蔽膜2を形成する。光遮蔽膜2の材料として
は微細なパターンを形成するために一般には金属または
金属酸化物が用いられる。[Example] In FIG. 1, a light shielding film 2 is formed in a stripe shape on a transparent substrate 1 such as glass. As a material for the light shielding film 2, metal or metal oxide is generally used to form a fine pattern.
この上にゼラチンなどの染色膜3を形成し、さらにその
上にネガ型のフォトレジスト4を塗布する。A dyed film 3 made of gelatin or the like is formed on this, and a negative photoresist 4 is further applied thereon.
そして基板1の反対側から光を照射する。現像して光遮
蔽膜2の上のフ、t t”レジストを除去し、モして防
染処理を施こしてこの部分を防染部分5とする(第2図
)。防染処理としてtよ、クロムミョウバン水溶液など
による処理をおこない、ついで、タンニン酸含有酸性水
溶液および酒石酸アンチモニルカリウム水溶液などによ
る処理をほどこす。Then, light is irradiated from the opposite side of the substrate 1. The resist on the light shielding film 2 is removed by development, and resist dyeing is applied to this area to form the resist dyeing area 5 (Fig. 2). First, treatment is performed using an aqueous chromium alum solution, and then treatment is performed using an acidic aqueous solution containing tannic acid and an aqueous antimonyl potassium tartrate solution.
つぎに残ったフォトレジスト4を除去し、新たにフォト
レジスト6を塗布し、フ第1〜マスク7を用いて露光さ
せ(第3図)、現像して、−色目の色、たとえば赤色の
染料で染色して赤色のカラーフィルタパターンRを形成
する(第4図)。以後同じような部分的染色処理をくり
返し施して、赤R1緑G1青Bのそれぞれのカラーフィ
ルタパターンを形成する(第5図)。Next, the remaining photoresist 4 is removed, a new photoresist 6 is applied, exposed using masks 1 to 7 (FIG. 3), developed, and dyed with a different color, for example, red. to form a red color filter pattern R (FIG. 4). Thereafter, the same partial dyeing process is repeated to form respective color filter patterns of red R1 green G1 blue B (FIG. 5).
[発明の効果]
本発明によれば、カラーフィルタの表面が平坦化され、
また光遮蔽膜上の染色膜の防染に際し、その上のフォト
レジストの穴おけがセルフアライメントにできるので染
色膜の防染処理が正確な位置になされ、混色や色のにじ
みなどを防止することができ、さらに染色膜上のフォト
レジストを均一な厚みに塗布できる。[Effect of the invention] According to the invention, the surface of the color filter is flattened,
In addition, when resist-staining the dyed film on the light-shielding film, the holes in the photoresist above it can be self-aligned, so the resist-staining process on the dyed film can be done in the correct position, preventing color mixing and color bleeding. Furthermore, the photoresist on the dyed film can be coated to a uniform thickness.
第1図〜第5図は本発明の実施例を工程順に示す断面説
明図、第6図〜第10図は従来例を工程順に示す断面説
明図である。
1・・・・・・基板
2・・・・・・光遮蔽膜
3・・・・・・染色膜
4・・・・・・ネガ型のフォトレジスト。
以上FIGS. 1 to 5 are cross-sectional explanatory views showing an embodiment of the present invention in order of process, and FIGS. 6 to 10 are explanatory cross-sectional views showing a conventional example in order of process. 1...Substrate 2...Light shielding film 3...Dyeing film 4...Negative photoresist. that's all
Claims (1)
設けた基板面上に染色膜、さらにその上にネガ型のフォ
トレジストを塗布し、基板の反対側より露光させ、現像
して上記光遮蔽膜上の上記フォトレジストを除去してこ
の部分の染色膜に防染処理を施し、ついで上記フォトレ
ジストの残りの部分を除去した後上記染色膜への部分的
染色処理をくり返すことを特徴とするカラーフィルタの
製造方法。A light-shielding film is partially provided on a transparent substrate, a dyed film is applied on the surface of the substrate on which the light-shielding film is provided, and a negative photoresist is applied on top of that, exposed to light from the opposite side of the substrate, and developed. The photoresist on the light shielding film is removed and the dyed film in this area is subjected to anti-staining treatment, and then the remaining part of the photoresist is removed and the partial dyeing process to the dyed film is repeated. A method for producing a color filter, characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60138289A JPS61295507A (en) | 1985-06-25 | 1985-06-25 | Production of color filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60138289A JPS61295507A (en) | 1985-06-25 | 1985-06-25 | Production of color filter |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61295507A true JPS61295507A (en) | 1986-12-26 |
Family
ID=15218411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60138289A Pending JPS61295507A (en) | 1985-06-25 | 1985-06-25 | Production of color filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61295507A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63243902A (en) * | 1987-03-30 | 1988-10-11 | Toppan Printing Co Ltd | Color filter for display device |
-
1985
- 1985-06-25 JP JP60138289A patent/JPS61295507A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63243902A (en) * | 1987-03-30 | 1988-10-11 | Toppan Printing Co Ltd | Color filter for display device |
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