JPH05181009A - Production of color filter - Google Patents

Abstract

PURPOSE:To obtain the process for production of the color filter which can be formed to a larger film thickness and can be smoothed by forming a light shielding film simultaneously with formation of one color pattern. CONSTITUTION:A color resist 8 of the final one color is applied on a color filter substrate 6 formed with color patterns 7, 71 of at least two colors by a method, such as dyeing, pigment dispersing or electrodeposition, and is subjected to back exposing by irradiation with UV light 9; thereafter, baking 10 for smoothing and developing 11 are executed to form the light shielding film 82. The light shielding film pattern is formed as well simultaneously with the formation of the color pattern of the final one color.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a liquid crystal display device.

[0002]

2. Description of the Related Art Conventionally, when a color filter is manufactured by a method such as dyeing, pigment dispersion, electrodeposition, etc., a black mask of a light shielding film is formed by the method shown in FIG. 2 or 3. That is, in the first conventional method shown in FIG. 2, the light shielding film 2 is formed on the transparent substrate 1 such as glass by sputtering or photolithography with Cr, an organic pigment, carbon or the like,
After that, three-color (R.G.B.) patterns 3, 31, and 32 are formed.

In the second conventional method shown in FIG. 3, a black resist 2 is formed on a transparent substrate 1 such as glass on which three color (R.G.B) patterns 3, 31, 32 are formed.
1 is applied and the light-shielding film 4 is formed by backside exposure using the existing pattern as a mask.

[0004]

However, in the above-mentioned conventional technique, there is a problem that the cost is high because there is a step of forming the light-shielding film by sputtering or photolithography.

In particular, in the case of color STN compatible,
Although the smoothness of the color filter substrate is important from the viewpoint of visual characteristics, the above two methods have a problem that it is difficult to increase the thickness of the light-shielding film portion and the smoothing cannot be sufficiently performed.

Therefore, the present invention has been devised in view of the above-mentioned problems of the prior art, and an object thereof is to provide a method of manufacturing a color filter capable of thickening and smoothing a film.

[0007]

In order to achieve the above object, in the method for producing a color filter of the present invention, at least two color patterns are formed by a method such as dyeing, pigment dispersion and electrodeposition. The color filter substrate is coated with the last color resist of one color, UV light is irradiated to perform back exposure, and then a thick film and baking and smoothing for smoothing are performed to form a light-shielding film. The feature is that the light-shielding film pattern is formed at the same time when the color pattern of one color is formed.

In the above case, baking (PES) is performed after backside exposure.

Further, in the case of a color filter composed of a plurality of color patterns, one color pattern is formed in all parts other than the other color patterns.

[0010]

Since the light-shielding film can be formed in one color pattern forming process, the process can be simplified and the film can be made thicker. In particular, when baking is performed using blue as a light-shielding film, it is possible to sufficiently thicken and smooth the film.

[0011]

EXAMPLE An example will be described with reference to FIG.
In the first step a, R (red) is formed by a method such as dyeing, pigment dispersion, and electrodeposition. G (green). It is formed on the color filter substrate 6 on which the color patterns 7 and 71 of two colors of B (blue) are formed.

Further, the color filter substrate 6 has
The remaining last one color resist 8 is applied. The color resist 8 of one color applied at the end is U
It is preferable that B (blue) is used from the transmission of the V light 9 and the remaining two color patterns 7, 71 are R (red) or G (green).

In the second step b, the color filter substrate 6 is irradiated with UV light 9 from the rear surface with appropriate energy,
The last color resist 8 of the last one color applied with the other two color patterns 7 and 71 as a photomask is exposed.

In the third step c, in order to make the film thicker and smoother, the color filter substrate 6 formed in the second step b is baked at 100 ° C. for about 20 minutes (post).
Omitting the exposure bake, P. E. B)
10 is desirable.

In the fourth step d, the color filter substrate 6 formed in the third step c is developed 11 and the light shielding film 82 is formed simultaneously with the third color pattern 81.

In the case of a color filter composed of a plurality of color patterns, one color pattern is formed in all parts except the other color patterns.

In the above description, R. G. In the case of forming color patterns 7, 71, 81 of three colors of B,
The same process is performed when forming a color pattern or a color pattern of four or more colors.

The light shielding film 82 is formed of R. G. One of the colors of B can be substituted by B (blue). When black and white compensation such as film compensation is used as STN correspondence, it is difficult to obtain a uniform black level over the entire visible light wavelength range. Light loss increases at a specific wavelength. Therefore, it suffices to provide a mask that absorbs only the specific wavelength, and thus a substitute can be used.

[0019]

Since the present invention is constructed as described above, it has the following effects. A. In the conventional color filter manufacturing process, a light-shielding film forming process is required, but in the present invention, the light-shielding film can be formed also as one color pattern forming process, so that the process is simplified and the cost is reduced. It becomes possible.

B. In the conventional formation of the color filter, the light-shielding film was formed by irradiating UV light onto a spatter or a black resist, so it was difficult to increase the film thickness or smooth the color filter substrate. Since one color of the color pattern also serves as the light-shielding film, the film can be made thicker.

In particular, when baking is performed using blue as a light-shielding film, it is possible to sufficiently thicken and smooth the film.

[Brief description of drawings]

FIG. 1 is a process drawing of a color filter of the present invention.

FIG. 2 is a cross-sectional view of a conventional first color filter manufacturing method.

FIG. 3 is a cross-sectional view of a second conventional method of manufacturing a color filter.

[Explanation of symbols]

 6 substrate 7 color pattern (R or G) 71 color pattern (R or G) 8 color resist of the last one color (B) 81 color pattern (B) 82 light-shielding film 9 UV light 10 baking 11 development a first step b 2nd process c 3rd process d 4th process

Claims (1)

[Claims] 1. A final color resist of one color is applied to a color filter substrate on which a color pattern of at least two colors is formed by a method such as dyeing, pigment dispersion, and electrodeposition.
After irradiating V light to perform back exposure, a thick film and baking and development for smoothing are performed to form a light-shielding film, and a light-shielding film pattern is also formed simultaneously with the formation of the last color pattern of one color. A method for producing a color filter, characterized by