JPH05173014A - Production of color filter - Google Patents

Abstract

PURPOSE:To uniformize cell thicknesses and to prevent the unequalness of color tones and the fluctuation in threshold voltage by exposing color resists exclusive of the color filters to be first formed from the rear surface of a substrate by using prescribed photomasks. CONSTITUTION:The color resist 4 of a 1st color corresponding to green G is applied on the substrate 1 and is exposed with UV rays 3 by using a photomask 2 having prescribed patterns; thereafter, this color resist is developed. The color resist 5 of a 2nd color corresponding to red R is applied thereon and is exposed from the rear surface of the substrate 1 by using the UV rays 3 of the energy to provide the same film thickness as the film thickness of the 1st color and by using the photomask 2 having the prescribed patterns; thereafter, this color resist is developed. The color resist 6 of a 3rd color corresponding to blue B is applied therein and is exposed from the rear surface of the substrate 1 by using the UV rays 3 of the energy to provide the same film thickness as the film thickness of the 1st color and the 2nd color and by using the photomask 2 having the prescribed patterns; thereafter, this color resist is developed. As a result, the patterns 41, 51, 61 of the color resists 4, 5, 6 of the three colors R, G, B are obtd.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

[0002]

2. Description of the Related Art Conventionally, as shown in FIG. 2, a method for producing a color filter substrate using a pigment-dispersed color resist is performed in steps a to f.

In the first step a, for example, 1 corresponding to green G
A substrate 1 coated with a color resist 4 of a color using a spinner or the like is exposed to ultraviolet rays 3 using a photomask 2 having a predetermined pattern.

In the second step b, the substrate 1 formed in the first step a is developed to obtain the pattern 41 of the color resist 4 of the first color.

In the third step c, the second color resist 5 corresponding to red R, for example, is applied to the substrate 1 formed in the second step b using a spinner or the like. It is exposed to ultraviolet rays 3 by using the photomask 2 having the pattern.

In the fourth step d, the substrate 1 formed in the third step c is developed to obtain patterns 41 and 51 of color resists 4 and 5 for the first and second colors.

In the fifth step e, for example, a third color resist 6 corresponding to blue B is applied to the substrate 1 formed in the fourth step d by using a spinner or the like, and the predetermined step is performed as in the first step a. It is exposed to ultraviolet rays 3 by using the photomask 2 having the pattern.

In the sixth step f, the substrate 1 of the above fifth step e
Is developed to obtain patterns 41, 51, 61 of color resists 4, 5, 6 of RGB three colors.

[0009]

However, in the above-mentioned conventional technique, first, when the second and third color resists are applied, the color resists are also applied on the color patterns produced before that. Moreover, since the light is exposed from above, there is a problem that unevenness is generated on the surfaces of the second and third color filters.

The irregularities are usually 0.1 to 0.2 μm.
Therefore, for example, using this color filter, ST
When an N (super twist nematic liquid crystal) cell is manufactured, there is a problem in that a change in color tone and a variation in threshold voltage occur due to nonuniform cell thickness.

Further, for the above reason, there is a problem that the viewing angle characteristic is deteriorated.

Therefore, the present invention has been devised in view of the above-mentioned problems of the prior art. It is possible to manufacture a cell having a uniform cell thickness and good display quality without uneven color tone or variation in threshold voltage. It is intended to provide a method for manufacturing a color filter.

[0013]

In order to achieve the above object, in the method for producing a color filter of the present invention, a color having a color filter produced by using a pigment-dispersed color resist of at least two colors. In the method for manufacturing a liquid crystal display device, the color resist other than the color filter that is first manufactured among the color filters is exposed from the back surface of the substrate using a predetermined photomask.

In the above case, when the last applied color resist is exposed from the back side, the substrate is directly exposed without using a photomask and the color filter also serves as a light-shielding film (black mask). It is characterized by

[0015]

Since the second and third color resists are exposed from the back surface of the substrate, even if there are irregularities on the surface of the second and third color resists, the exposure amount is appropriately set and the The thickness from the substrate surface where the polymerization is completed is formed to be the same as the film thickness of the color filter of the first color, and the film thickness of all the color filters is formed uniformly.

When the last applied color resist is exposed from the back side, the substrate is directly exposed and the color filter also serves as a light-shielding film (black mask). Therefore, the photomask at the time of the last color resist exposure. The alignment of is unnecessary.

[0017]

EXAMPLE An example will be described with reference to FIG. As the code, a code common to the code used in the conventional technique is used.

The present invention uses a predetermined photomask 2 when exposing a color resist other than the first color,
The exposure is performed from the back surface of the substrate 1 such as glass. The photomask 2 need not be used when exposing the last color resist. The details of the manufacturing method will be described below for three colors of R (red), G (green), and B (blue).

In the first step a, for example, 1 corresponding to green G
A substrate 1 coated with a color resist 4 of a color using a spinner or the like is exposed to ultraviolet rays 3 using a photomask 2 having a predetermined pattern.

In the second step b, the pattern 1 of the color resist 4 of the first color is obtained by developing the substrate 1 formed in the first step a.

In the third step c, for example, a second color resist 5 corresponding to red R is applied to the substrate 1 formed in the second step b using a spinner or the like, and the predetermined step is performed as in the first step a. Using a photomask 2 having a pattern of
Exposure is performed from the back surface of the substrate 1 by using ultraviolet rays 3 having the same energy as the film thickness of the second color filter. It is desirable that the second color resist 5 is applied thicker than the film thickness of the first color filter.

In the fourth step d, the substrate 1 formed in the third step c is developed to obtain the patterns 41 and 51 of the color resists 4 and 5 of the first and second colors.

In the fifth step e, the substrate 1 of the above-mentioned fourth step d
Then, for example, a third color resist 6 corresponding to blue B is applied using a spinner or the like, and a photomask 2 having a predetermined pattern is used as in the first step a, and the film thickness of the third color filter is applied. Is exposed from the back surface of the substrate 1 by using ultraviolet rays 3 having the same energy as the film thicknesses of the first and second color filters. The third color resist 6 is preferably applied thicker than the film thickness of the first and second color filters.

In the sixth step f, the substrate 1 formed in the fifth step e is developed to obtain patterns 41, 51, 61 of color resists 4, 5, 6 of RGB three colors.

Further, the present invention also includes the following invention relating to the method for producing the color resist 6 of the third color or the color resist to be applied last in cases other than the third color.

In a color filter structure such as the structure shown in the sixth step f, a gap A is formed between the color filters, and a black mask is generally provided in order to prevent a reduction in contrast due to light leakage from the gap A. Are known.

However, considering the light shielding property, it is not always necessary to provide a black mask, and it is conceivable that any one of the color filters formed on the substrate 1 may be used instead.

In this case, if the manufacturing method of the present invention is used,
It is not necessary to use the photomask 2 when exposing the third color resist 6.

In the above embodiment, the case of three colors of RGB has been described, but the same applies to the case of two colors or four or more colors.

[0030]

Since the present invention is constructed as described above, it has the following effects. A. Since the second and third color resists are exposed from the back surface of the substrate, even if there are irregularities on the surfaces of the second and third color resists, the exposure amount is set to an appropriate value and the color resist is polymerized. If the thickness from the surface of the substrate at which the process ends is set to be the same as the thickness of the color filter of the first color, the thickness of all color filters can be formed uniformly. Therefore, when an STN cell is manufactured using this color filter, the cell thickness can be made uniform, so that a cell with good display quality without uneven color tone or variation in threshold voltage can be manufactured. Therefore, it is possible to eliminate the conventional defect that the viewing angle characteristics are deteriorated due to the nonuniform cell thickness.

B. Since it is not necessary to align the photomask at the time of exposing the last color resist, which is conventionally performed, the process can be simplified.

[Brief description of drawings]

FIG. 1 is a process drawing of a color filter of the present invention.

FIG. 2 is a manufacturing process diagram of a conventional color filter.

[Explanation of symbols]

 1 Substrate 2 Photomask 3 Ultraviolet 4 Color 1st Color 41 Pattern 5 Color 2nd Color 51 Pattern 6 Color 3rd Color 61 Pattern A Gap a 1st step b 2nd step c 3rd step d 4th step e Fifth step f Sixth step

Claims (1)

[Claims] 1. A method for producing a color liquid crystal display device having a color filter produced using at least two or more pigment dispersion type color resists, wherein a color other than the first color filter produced among the color filters. The method of manufacturing a color filter, wherein the exposure of the resist is performed from the back surface of the substrate using a predetermined photomask.