JPS61295057A - Thermal head and its preparation - Google Patents

Thermal head and its preparation

Info

Publication number
JPS61295057A
JPS61295057A JP13607785A JP13607785A JPS61295057A JP S61295057 A JPS61295057 A JP S61295057A JP 13607785 A JP13607785 A JP 13607785A JP 13607785 A JP13607785 A JP 13607785A JP S61295057 A JPS61295057 A JP S61295057A
Authority
JP
Japan
Prior art keywords
insulating substrate
film
heating resistor
flexible insulating
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13607785A
Other languages
Japanese (ja)
Inventor
Shozo Takeno
武野 尚三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP13607785A priority Critical patent/JPS61295057A/en
Publication of JPS61295057A publication Critical patent/JPS61295057A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/345Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To attain miniaturization and the extension of life and to enable high grade recording, by forming a second heat generating resistor having a length corresponding to that of the heat generating resistor row on the other surface of a flexible insulating substrate at a position except said heat generating resistor row. CONSTITUTION:A heat resistant org. film, for example, a polyimide film 11 is used as a flexible insulating substrate and a membrane resistor film 12 is adhered to one surface of said film 11 and leads 13 are laminated and adhered to said resistor film 13 by vacuum vapor deposition. Patterns are formed by photoetching to form a heat generating resistor row 14 and an abrasion protective film 15 is adhered thereto. Next, a resistor film is adhered to the other surface of the polyimide film 11 and a strip like heat generating resistor 16 is formed by photoetching so as to make the length thereof almost equal to that of the resistor row and to be almost parallel to said resistor row in the inlet side of recording paper. Lead electrodes 17 are provided to both terminals of the resistor film and insulated by coating an insulating resin 18 except the take-out parts thereof. Next, the insulating substrate is adhered to a heat dissipating plate 20 comprising a metal having good heat conductivity.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明はrif撓性基板1−に発熱抵抗体列を形成した
サーマルヘッドお6i:びその製造方a;に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a thermal head 6i in which a row of heating resistors is formed on a RIF flexible substrate 1-, and a method for manufacturing the same.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

−リーマルプリン1へヘットはファクシミリやその他の
記録装置に組込まれるもので、感熱紙や感熱インクリボ
ンにλ字や画像情報を熱64号として供給し、感熱紙面
に記録するものである。すなオ)ち、す・−フルプリン
1〜ヘツドは絶M支持板面に、両端にリートを接続した
発熱抵抗体を並列させ、ライン状に多数、並べた構造を
有し、ラインに直角なJJ向から感熱紙を給送I7熱接
触させるものである。
-Remal Print 1 The head is installed in a facsimile or other recording device, and supplies λ characters and image information to thermal paper or a thermal ink ribbon as heat No. 64, and records the information on the surface of the thermal paper. The head has a structure in which a large number of heating resistors with wires connected to both ends are arranged in parallel on the surface of the absolute M support plate, arranged in a line shape, and the head is perpendicular to the line. Thermal paper is fed from the JJ direction and brought into thermal contact with I7.

従来・般にサーマルヘッドの絶縁基板は固いアルミナな
どのセラミック板でできており、このため、この板面1
−に形成される発熱抵抗体に対して感熱紙の接触が1°
−5)でなく、高品位の文字再現が難しい。このため、
発熱抵抗体の部分を絶縁基板から突出さけたり、絶縁基
板をかまぼこ状(円孤状)に形成する試みがなされてい
るが、ilZ面性がわるいために、癲九法などで形成す
る発熱抵抗体側やり−1(線群のパターン形成が難しく
なるという製造1ユの不都合が生じ実用的でないという
欠点があった。
Conventionally, the insulating substrate of a thermal head is generally made of a hard ceramic plate such as alumina.
The contact of the thermal paper with the heating resistor formed at - is 1°.
-5), making it difficult to reproduce high-quality characters. For this reason,
Attempts have been made to make the heating resistor part protrude from the insulating substrate or to form the insulating substrate into a semicylindrical shape (circular shape), but due to the poor ilZ surface properties, the heating resistor formed by the method such as Body side spear-1 (It had the drawback that it was not practical because it was difficult to form a pattern of line groups, which caused problems in manufacturing.

これを解決したのが可撓性絶縁基板の採用である(特開
昭57−131576号参照)。すなわち、発熱抵抗体
列およびリート線群のパターン形成に対しては、可撓性
絶縁基板を111面状としておき、実際のヘッドとして
使用するときは、円筒または円形支持体に基板を沿わせ
て撓ませ発熱抵抗体列を頂面に位置させる構造である。
The solution to this problem was the use of a flexible insulating substrate (see Japanese Patent Laid-Open No. 131576/1983). That is, for patterning the heating resistor array and the wire group, the flexible insulating substrate is made into a 111-plane shape, and when used as an actual head, the substrate is placed along a cylindrical or circular support. It has a structure in which a row of deflectable heating resistors is located on the top surface.

しかして耐熱可撓性絶縁基板としてはポリイミドなどの
有機性フィル12があるが、合成樹脂であるために、耐
熱性が区く、発熱抵抗体のピーク温度に耐えられないこ
と、発熱抵抗体が高密度になるようにしたが非ql面か
I〕)のリード線の取出しが困難になるという不都合が
ある。
However, as a heat-resistant flexible insulating substrate, there is an organic film 12 such as polyimide, but since it is a synthetic resin, its heat resistance is different, and it cannot withstand the peak temperature of the heating resistor. Although it is made to have a high density, there is an inconvenience that it becomes difficult to take out the lead wire of the non-ql surface (I).

〔発明の[1的] 本発明は−1−記を考慮してなされたもので、小形化、
長寿命化しかも高品位記録を行なうことができるサーマ
ルヘッドおよびその製造方法を得るものである。
[Object 1 of the invention] The present invention has been made in consideration of -1-.
The present invention provides a thermal head that has a long life and can perform high quality recording, and a method for manufacturing the same.

〔発明の概要〕[Summary of the invention]

本発明は耐熱性有機フィルムでなる可撓性絶縁基板の面
に発熱抵抗体列とこれらに接続されたり−トとを形成す
るサーマルヘッドにおいて、可撓性絶縁基板の他方の面
の発熱抵抗体列の直下を除く位置に発熱抵抗体列に対応
する長さの第2の発熱抵抗体を形成したサーマルヘッド
にある。
The present invention provides a thermal head in which a heat-generating resistor array is formed on the surface of a flexible insulating substrate made of a heat-resistant organic film, and a heat-generating resistor is connected to the heat-generating resistors on the other surface of the flexible insulating substrate. The thermal head is provided with a second heat generating resistor having a length corresponding to the heat generating resistor row at a position other than directly below the row.

サーマルヘッドに給送する感熱紙や感熱インクリボンに
対して発熱抵抗体列よりも入口側にこの抵抗体列と並列
して第2の発熱抵抗体を位置させることによって、予熱
源としての機能に生じる。
By positioning a second heating resistor in parallel with this resistor array on the inlet side of the heating resistor array for the thermal paper or thermal ink ribbon that is fed to the thermal head, it can function as a preheating source. arise.

さらに1本発明は耐熱性有機フィルムでなる可撓性絶縁
基板の一表面に蒸着またはスパッタにより抵抗体膜を形
成し、この膜上にリード材料を積層した後、発熱抵抗体
列のパターンを形成する工程と、前記可撓性絶縁基板の
他の面に抵抗体膜をイ・1着し前記発熱抵抗体列のパタ
ーンに対応した帯状の第2の発熱抵抗体を発熱抵抗体列
の直下を除=4− く、隣接位置に形成する工程と、得られる可撓性絶縁基
板の前記第2の発熱抵抗体側の面を支持体に接着する工
程とを具備することを特徴とするサーマルヘッドの製造
方法にある。
Furthermore, in the present invention, a resistor film is formed on one surface of a flexible insulating substrate made of a heat-resistant organic film by vapor deposition or sputtering, and after a lead material is laminated on this film, a pattern of heat generating resistor arrays is formed. A step of attaching a resistor film to the other surface of the flexible insulating substrate and placing a second band-shaped heating resistor corresponding to the pattern of the heating resistor row immediately below the heating resistor row. A thermal head characterized in that it comprises the steps of: forming a substrate at an adjacent position; and bonding a surface of the obtained flexible insulating substrate on the side of the second heating resistor to a support. It's in the manufacturing method.

〔発明の実施例〕[Embodiments of the invention]

第1図乃至第3図は本発明の第1の実施例を示す。 1 to 3 show a first embodiment of the present invention.

まず第1図において、耐熱性有機フィルム例えばポリイ
ミドフィルム(11)を可撓を可撓性絶縁基板として用
いる。その一方の表面に薄膜抵抗体膜(12)を付着す
る。抵抗膜材料は、高速熱ストレスに強いことが要求さ
れ例えば、Ta−8in□スパツタ膜等が適している。
First, in FIG. 1, a heat-resistant organic film such as a polyimide film (11) is used as a flexible insulating substrate. A thin film resistor film (12) is attached to one surface thereof. The resistive film material is required to be resistant to high-speed thermal stress, and for example, a Ta-8in□ sputtered film is suitable.

その」二にリード(13)となるリード材料例えば、C
r/Au/Ti等を真空蒸着等により積層付着する。ホ
トエツチング等の微細加工技術により8本/m、16本
/薗等の所望の解像度に従ったパターン形成を行ない、
第2図のように発熱抵抗体列(14)の形成を終了させ
たのちに、その上から発熱抵抗体近傍に耐摩耗保護膜(
15)を付着する。
The second lead material (13) is C.
r/Au/Ti etc. are laminated and deposited by vacuum evaporation or the like. Forming a pattern according to a desired resolution such as 8 lines/m, 16 lines/meter, etc. using microfabrication technology such as photoetching,
After completing the formation of the heating resistor array (14) as shown in Fig. 2, a wear-resistant protective film (
15) Attach.

次にポリイミドフィルム(11)のもう一方の表面に、
抵抗膜を付着し、ポ1へエツチングにより帯状の発熱抵
抗体(1(: )を形成する。
Next, on the other surface of the polyimide film (11),
A resistive film is attached and etched to form a band-shaped heating resistor (1 (: )).

長さは、前Ali発熱抵抗体列と対応するはゾ同等の長
さどし5、発熱抵抗体列(14)に関して、d[i録紙
人11側でかつけり平行に形成する。抵抗膜の両端にリ
ート電極(17)を設け、とり出し部を除いて、絶縁樹
脂(18)の塗布等により絶縁する。
The length is the same length as the previous Ali heating resistor row (5), and the heating resistor row (14) is formed parallel to the d[i recorder 11 side. Reed electrodes (17) are provided at both ends of the resistive film, and the parts except for the lead-out portions are insulated by coating with insulating resin (18) or the like.

次に、第3図に示すように熱伝導性の良い金属例えばA
1からなる放熱板(2(4)に絶縁基板を接着する。ポ
リイミド基板の端の方向には、前記の主発熱抵抗体ホ1
へエツチングの際、同時に形成されたリード配線(13
a)があり、その配線パターンに従って、駆動IC(1
:l)を取りつけ、ワイアボンディング(22)の接続
がなされる。それらを保護するためカバー(23)がか
けられて完成する。
Next, as shown in Figure 3, a metal with good thermal conductivity such as A
An insulating substrate is glued to the heat dissipation plate (2 (4)) consisting of the polyimide substrate.
During etching, the lead wiring (13
a), and according to its wiring pattern, drive IC (1
:l) and the wire bonding (22) connection is made. A cover (23) is placed over them to protect them.

第4図および第5図は本発明の第2の実施例を示す。こ
こで第1図ど同一符号の部分は同様の部分を示す。
4 and 5 show a second embodiment of the invention. Here, parts with the same reference numerals as in FIG. 1 indicate similar parts.

第4図は、その途中工程におけるサーマルヘッドの断面
図を示している。まず金属基板(1o)を用意する。材
料は熱伝導が良く、薄くても変形しにくく、エツチング
液に関して、ポリイミドと相反対の性質を有し、安価に
得られるものから選ばれる。実施例では、Feを用いた
。厚さは、後にエツチング除去が容易な厚さでかつ平板
基板として形状変形のおこらない厚さが選ばれ、0.0
5〜1.0+n+aが良い。実施例では0 、 I m
m t;とした。
FIG. 4 shows a sectional view of the thermal head in an intermediate step. First, a metal substrate (1o) is prepared. The material is selected from among those that have good thermal conductivity, are resistant to deformation even when thin, have opposite properties to polyimide with respect to etching solutions, and can be obtained at low cost. In the example, Fe was used. The thickness was selected so that it could be easily removed by etching later and the thickness would not cause deformation as a flat substrate.
5 to 1.0+n+a is good. In the example, 0, I m
m t;

0 、1 mu tのFe基板の表面にC,rを真空蒸
着等により500〜1000人程度薄く付着する。これ
は、その−1−に付着するポリイミド膜の可撓性絶縁基
板(11)と金属基板(1(4)の付着力を強くする作
用をする。耐熱性有機材料としては、ポリイミド樹脂ユ
ーピレックスーエス(UPIIIEX−3) (宇部興
産製商品名)を使用した。この樹脂は熱分解開始温度6
00℃と優れている。
C and r are deposited in a thin layer of about 500 to 1000 on the surface of an Fe substrate of 0.0,1 mut by vacuum evaporation or the like. This acts to strengthen the adhesion between the flexible insulating substrate (11) of the polyimide film attached to the -1- and the metal substrate (1 (4)).As the heat-resistant organic material, polyimide resin UPIIIEX-3 (trade name manufactured by Ube Industries) was used.This resin has a thermal decomposition onset temperature of 6.
00℃, which is excellent.

このワニス状のものを前記したFe基板(1(4)l−
のCr膜の−1−に例えば、スピンナ法にて塗布して、
100℃250℃とステップ4温で数10分ずつ保持し
ながら最終的に450°(:まで加熱すれば、完全にイ
ミド化し、耐熱性のすぐれた有機膜が形成される。
This varnish-like material was applied to the Fe substrate (1(4)l-
For example, by applying it to -1- of the Cr film using a spinner method,
By holding the step 4 temperature at 100° C. and 250° C. for several tens of minutes and finally heating it to 450° (:), complete imidization occurs and an organic film with excellent heat resistance is formed.

実施例においては20μmの均一な膜が得られた。In the example, a uniform film of 20 μm was obtained.

このポリイミド膜の表面を酸素雰囲気中においてプラズ
マ放電にさらし微細な表面エツチングを行なうことによ
り、表面積が大きくなり、次に付着される膜の付着力が
強くなる。このように前処理をおこなったポリイミド製
可撓性絶縁基板(11)の表面に抵抗膜を付着する。こ
れは例えばTa−3in□のスパッタリング膜である。
By exposing the surface of this polyimide film to plasma discharge in an oxygen atmosphere and performing fine surface etching, the surface area becomes larger and the adhesion of the next film to be applied becomes stronger. A resistive film is attached to the surface of the polyimide flexible insulating substrate (11) that has been pretreated in this way. This is, for example, a Ta-3in□ sputtering film.

以下第1の実施例と同じ工程を経て耐摩耗保護膜(15
)まで付着を終える。さて、次に裏面のFe基板に対し
てホトエツチングにより、符号(25)の位置のFe材
を除去する。この実施例における材料の組み合わせでは
、Feは塩化第2鉄でエツチングされるが、ポリイミド
はほとんどおがされないので、好都合である。Feが除
去されて、露出したポリイミドの裏面に抵抗材料が膜状
に形成される。これは前記同様、RFスパッタリング等
によっても付着が可能である。ポリイミド基板(11)
の表面に形成さオシた発熱抵抗体列(14)の近傍でか
っ、並行に、はり同等の長さにポリイミドの絶縁基板の
裏面に抵抗膜(16)が形成されたことになる。リード
層(17)の真空蒸着等による付着とホトエツチングに
より、抵抗体(16)が完成し、取出し電極以外を絶縁
性保護膜(18)で覆い完成する。
Hereinafter, the wear-resistant protective film (15
) to finish adhesion. Next, the Fe material at the position (25) is removed by photo-etching the Fe substrate on the back side. The combination of materials in this example is advantageous because while the Fe is etched with ferric chloride, the polyimide is hardly etched. After Fe is removed, a resistive material is formed in the form of a film on the exposed back surface of the polyimide. As described above, this can also be deposited by RF sputtering or the like. Polyimide substrate (11)
This means that a resistive film (16) is formed on the back surface of the polyimide insulating substrate, close to and parallel to the heating resistor array (14) formed on the surface of the polyimide insulating substrate and having the same length as the beam. The resistor (16) is completed by adhering the lead layer (17) by vacuum evaporation or the like and photoetching, and the resistor (16) is completed by covering the parts other than the lead-out electrode with an insulating protective film (18).

第5図において、熱電導の良好な金属からなる放熱板(
26)を用意して、その端面(27)に発熱抵抗体列(
14)と裏面の帯状抵抗体(16)が載り、端面に隣り
合う主平面に発熱抵抗体列(14)のリード線(13)
が基板」1を延在して配線されるように完成した基板が
接着される。
In Figure 5, a heat sink (
26) is prepared, and a heating resistor array (
14) and the strip resistor (16) on the back surface, and the lead wire (13) of the heating resistor row (14) is placed on the main plane adjacent to the end surface.
The completed substrate is bonded so that the wires extend through the substrate 1.

このとき裏面のFe材をエツチング除去した部分(25
)は、ポリイミド基板のみで支持されて可撓性、弾力性
があり、なめらかに折り曲げることによりリード断線も
なくリード(13)を板面まで導びくことかできる。
At this time, the part where the Fe material on the back side was etched away (25
) is supported only by a polyimide substrate and is flexible and elastic, and by bending smoothly, the leads (13) can be guided to the plate surface without lead breakage.

金属放熱板(26)の板面において、次のような相克て
を行なう。あらかじめ用意されたドライバ回路基板(2
8)があり、その所定の場所に駆動用I C(29)を
接着固定する。IC(29)のついたドライバ回路基板
(28)を放熱板(26)の板面に接着固定する。
The following conflicts occur on the surface of the metal heat sink (26). Driver circuit board prepared in advance (2
8), and a driving IC (29) is adhesively fixed to that predetermined location. The driver circuit board (28) with the IC (29) attached is adhesively fixed to the surface of the heat sink (26).

基板(11)のリード端子(13a)と駆!11 I 
C(29)、駆動TC(29)とドライバ回路基板(2
8)取出し端子(3(4)の間をワイアボンディング(
31)等により接続し、保護カバー(32)を取りつけ
て完成する。
The lead terminal (13a) of the board (11) and the drive! 11 I
C (29), drive TC (29) and driver circuit board (2
8) Wire bonding between the extraction terminals (3 and 4)
31) etc., and attach the protective cover (32) to complete the process.

本実施例のサーマルヘッドによれば、金属放熱板(26
)端面(27)に発熱抵抗体列(14)が設けられるか
ら、第6図に示すように、感熱紙(33)がプラテン(
34)によって押圧されて熱接触がよく、発熱抵抗体列
(14)の熱信号を感熱紙(33)に効率よく伝達する
ことができる。しかも、第2の発熱抵抗体(16)が端
面(27)、1−1感熱紙の給送入I+(35)側に配
置されているから、この発熱が発熱抵抗体列(14)に
至る前の感熱紙(33)部分を感熱レベルすなわち発色
レベル以ドに昇温する。すなわち、予熱源として作用す
る。有機フ、イルムでできた可撓性絶縁」ん板(12)
は、発熱抵抗体列の非発熱時と発熱時との温度差が大き
いと、耐熱性が劣化し易く、また抵抗体剥離等を生じる
。しかし本実施例の第2の発熱抵抗体(1G)による基
板裏面からの感熱紙の予ηU加熱により、発熱抵抗体列
の熱エネルギを著しく緩和することができるから、有機
樹脂基板の耐熱性が損われず長寿命のサーマルヘッドを
製造することが可能になる。また、周囲温度が低い場合
における記録にも有効である。
According to the thermal head of this embodiment, the metal heat sink (26
) Since the heating resistor array (14) is provided on the end face (27), the thermal paper (33) is placed on the platen (
34) to make good thermal contact, and the thermal signal from the heating resistor array (14) can be efficiently transmitted to the thermal paper (33). Moreover, since the second heating resistor (16) is arranged on the end surface (27), on the 1-1 thermal paper feed/input I+ (35) side, this heat generation reaches the heating resistor row (14). The temperature of the previous thermal paper (33) is raised to a temperature higher than the heat-sensitive level, that is, the color development level. That is, it acts as a preheat source. Flexible insulation board made of organic film (12)
If there is a large temperature difference between the heat-generating resistor array when it is not generating heat and when it is generating heat, the heat resistance is likely to deteriorate and the resistors may peel off. However, by preheating the thermal paper from the back surface of the substrate by the second heating resistor (1G) in this embodiment, the thermal energy of the heating resistor array can be significantly alleviated, so that the heat resistance of the organic resin substrate is improved. It becomes possible to manufacture a thermal head that is not damaged and has a long life. It is also effective for recording when the ambient temperature is low.

第7図により、本発明の第3の実施例について説明する
。途中−r程までは第2の実施例と全く同一なので説明
を消略する。なお、同一符号の部分は同様部分を示す。
A third embodiment of the present invention will be described with reference to FIG. The middle part up to -r is completely the same as the second embodiment, so the explanation will be omitted. Note that parts with the same reference numerals indicate similar parts.

本実施例が第2の実施例と異なる主なところは、放熱板
(36)の形状にある。
The main difference between this embodiment and the second embodiment lies in the shape of the heat sink (36).

熱伝導の良い金属からなる放熱板(36)におい′C端
面と、それに連なるが板面の境界の角をおとして、斜面
(37)を形成し、その斜面に発熱抵抗体列(14)お
よび裏面の第2の発熱抵抗体(16)が載るように接着
固定される。斜面l二に発熱部分が取りつけられるため
、記録装置の狭い空間にサーマルヘッドを組込むことが
でき、装置を小形化することができる。
The end face of the heat dissipating plate (36) made of a metal with good thermal conductivity and the corner of the boundary between the board surfaces connected to the end face are cut to form a slope (37), and a row of heating resistors (14) and a slope (37) are formed on the slope. The second heat generating resistor (16) on the back surface is adhesively fixed so as to be placed thereon. Since the heat generating portion is attached to the slope l2, the thermal head can be incorporated into a narrow space of the recording apparatus, and the apparatus can be made smaller.

〔発明の効果〕〔Effect of the invention〕

本発明による効果は次の通りである。 The effects of the present invention are as follows.

■)予め記録紙およびその周辺を温めることができる。(2) The recording paper and its surroundings can be warmed in advance.

2)  を発熱抵抗体列のピーク温度を下げることがで
きる。
2) The peak temperature of the heating resistor array can be lowered.

:3)ト発熱抵抗体列の寿命を長くすることができる。:3) The life of the heating resistor array can be extended.

4)周囲温度に影響されず良い記録品質が得られる。4) Good recording quality can be obtained without being affected by ambient temperature.

5) 主発熱抵抗体のピーク温度が低く押えることがで
きるので、有機樹脂を発熱体の下地として用いることが
できる。
5) Since the peak temperature of the main heating resistor can be kept low, an organic resin can be used as a base for the heating element.

6) このため垂直形、あるいは斜面形の特に非平面形
サーマルヘッドの形成が容易となる。
6) Therefore, it is easy to form a vertical or inclined thermal head, especially a non-planar thermal head.

7) このため、記録装置が小形にできる。7) Therefore, the recording device can be made smaller.

8)ホトエツチングによる製造が容易となり、16本/
I等の垂直形高精細サーマルヘッドが可能となる。
8) Manufacture by photoetching becomes easy, and 16 pieces/
Vertical high-definition thermal heads such as I are possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第3図は本発明の第1の実施例を示す模式図
、第4図乃至第5図は本発明の第2の実施例を示す模式
図、第6図は第4図乃至第5図に示した本発明の第2の
実施例による効果に説明するための説明簡略図、第7図
は本発明の第;3の実施例を示す模式図である。 (11)・・・可撓性絶縁基板、(13)・・・リード
、(+3a)・・・リード配線、  (14)・・・発
熱抵抗体列、(15)・・・耐摩耗保護膜、 (16)
・・・発熱抵抗体。 (18)・・・絶縁性保護膜。 代理人 弁理士 則 近 憲 佑 (ほか1名)
1 to 3 are schematic diagrams showing a first embodiment of the present invention, FIGS. 4 to 5 are schematic diagrams showing a second embodiment of the present invention, and FIG. 6 is a schematic diagram showing a second embodiment of the present invention. FIG. 5 is a simplified explanatory diagram for explaining the effects of the second embodiment of the present invention, and FIG. 7 is a schematic diagram showing the third embodiment of the present invention. (11)...Flexible insulating substrate, (13)...Lead, (+3a)...Lead wiring, (14)...Heating resistor array, (15)...Wear-resistant protective film , (16)
...heating resistor. (18)...Insulating protective film. Agent: Patent attorney Kensuke Chika (and 1 other person)

Claims (7)

【特許請求の範囲】[Claims] (1)耐熱性有機フィルムでなる可撓性絶縁基板と、こ
の可撓性絶縁基板面に形成された発熱抵抗体列と、この
発熱抵抗体列から可撓性絶縁基板上に延在するリードと
、この可撓性絶縁基板を支持する支持体とを有してなる
サーマルヘッドにおいて、前記可撓性絶縁基板の発熱抵
抗体列が形成された面と反対側の面に発熱抵抗体列に対
応する位置からずれた位置でこの発熱低抗体列に対応し
た長さの第2の発熱抵抗体が形成されてなることを特徴
とするサーマルヘッド
(1) A flexible insulating substrate made of a heat-resistant organic film, a heating resistor array formed on the surface of the flexible insulating substrate, and a lead extending from the heating resistor array onto the flexible insulating substrate. and a support for supporting the flexible insulating substrate, wherein the flexible insulating substrate has a heating resistor array on a surface opposite to the surface on which the heating resistor array is formed. A thermal head characterized in that a second heat generating resistor having a length corresponding to the heat generating low antibody array is formed at a position shifted from the corresponding position.
(2)第2の発熱抵抗体が帯状の一体形成でなる特許請
求の範囲第1項記載のサーマルヘッド
(2) The thermal head according to claim 1, wherein the second heating resistor is integrally formed in a band shape.
(3)可撓性絶縁基板上の第2の発熱抵抗体が給送され
る感熱記録媒体の入口側に配置され感熱記録媒体を予熱
することを特徴とする特許請求の範囲第1項記載のサー
マルヘッド
(3) The second heating resistor on the flexible insulating substrate is arranged on the inlet side of the fed thermosensitive recording medium to preheat the thermosensitive recording medium. thermal head
(4)支持体が良熱伝導体である特許請求の範囲第1項
記載のサーマルヘッド
(4) The thermal head according to claim 1, wherein the support is a good thermal conductor.
(5)支持体が金属板の端面であり端面に可撓性絶縁基
板および第2の発熱抵抗体が並列してなる特許請求の範
囲第4項記載のサーマルヘッド
(5) The thermal head according to claim 4, wherein the support is an end face of a metal plate, and the flexible insulating substrate and the second heating resistor are arranged in parallel on the end face.
(6)金属板の端面が板面に対して斜面をなしこの斜面
の端面に可撓性絶縁基板が接着されてなる特許請求の範
囲第5項記載のサーマルヘッド
(6) The thermal head according to claim 5, wherein the end surface of the metal plate is sloped with respect to the plate surface, and a flexible insulating substrate is adhered to the sloped end surface.
(7)耐熱性有機フィルムでなる可撓性絶縁基板の一表
面に蒸着またはスパッタにより抵抗体膜を形成し、この
膜上にリード材料を積層した後、発熱抵抗体列のパター
ンを形成する工程と、前記可撓性絶縁基板の他の面に抵
抗体膜を付着し前記発熱抵抗体列のパターンに対応した
帯状の第2の発熱抵抗体を発熱抵抗体列の直下を除く、
隣接位置に形成する工程と、得られる可撓性絶縁基板の
前記第2の発熱抵抗体側の面を支持体に接着する工程と
を具備することを特徴とするサーマルヘッドの製造方法
(7) A step of forming a resistor film on one surface of a flexible insulating substrate made of a heat-resistant organic film by vapor deposition or sputtering, laminating a lead material on this film, and then forming a pattern of heat-generating resistor arrays. and a resistor film is attached to the other surface of the flexible insulating substrate, and a band-shaped second heating resistor corresponding to the pattern of the heating resistor row is attached except for the part immediately below the heating resistor row.
A method for manufacturing a thermal head, comprising the steps of: forming the substrate at an adjacent position; and bonding the surface of the obtained flexible insulating substrate on the side of the second heating resistor to a support.
JP13607785A 1985-06-24 1985-06-24 Thermal head and its preparation Pending JPS61295057A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13607785A JPS61295057A (en) 1985-06-24 1985-06-24 Thermal head and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13607785A JPS61295057A (en) 1985-06-24 1985-06-24 Thermal head and its preparation

Publications (1)

Publication Number Publication Date
JPS61295057A true JPS61295057A (en) 1986-12-25

Family

ID=15166695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13607785A Pending JPS61295057A (en) 1985-06-24 1985-06-24 Thermal head and its preparation

Country Status (1)

Country Link
JP (1) JPS61295057A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63189255A (en) * 1987-01-31 1988-08-04 Toshiba Corp Thermal head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63189255A (en) * 1987-01-31 1988-08-04 Toshiba Corp Thermal head

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