JPS6129453B2 - - Google Patents

Info

Publication number
JPS6129453B2
JPS6129453B2 JP51045521A JP4552176A JPS6129453B2 JP S6129453 B2 JPS6129453 B2 JP S6129453B2 JP 51045521 A JP51045521 A JP 51045521A JP 4552176 A JP4552176 A JP 4552176A JP S6129453 B2 JPS6129453 B2 JP S6129453B2
Authority
JP
Japan
Prior art keywords
light
transparent object
defects
lens
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51045521A
Other languages
Japanese (ja)
Other versions
JPS52129582A (en
Inventor
Katsumi Takami
Noriaki Pponma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4552176A priority Critical patent/JPS52129582A/en
Publication of JPS52129582A publication Critical patent/JPS52129582A/en
Publication of JPS6129453B2 publication Critical patent/JPS6129453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details

Description

【発明の詳細な説明】 この発明は透明体の表裏面の欠陥を識別する光
学的な欠陥検出装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an optical defect detection device for identifying defects on the front and back surfaces of a transparent body.

鋼板などの不透明体の表面欠陥を光の散乱、反
射等によつて検出する手法は公知である。しかる
に、ガラス、アクリル樹脂、その他の透明体では
表面、あるいは裏面に疵、ダストの付着等による
欠陥があつても、これらによる光散乱、反射の乱
れをとらえて表面の欠陥か、裏面の欠陥かを識別
することは難かしい。
BACKGROUND ART Techniques for detecting surface defects in opaque bodies such as steel plates by light scattering, reflection, etc. are known. However, even if glass, acrylic resin, or other transparent materials have defects such as scratches or adhesion of dust on the front or back surface, the scattering of light and disturbances in reflection caused by these can be detected to determine whether it is a defect on the front surface or the back surface. is difficult to identify.

透明被検体において、一方の面だけの欠陥を検
出すればよい場合として、電子デバイスの基板と
なるGGG結晶の電子デバイス形成が行なわれる
面のみの欠陥検査をする場合や、片側の面に細か
い凹凸があり、光の散乱が強く、他方の鏡面側の
欠陥検査が困難な片面磨りガラスの検査をする場
合、あるいは多層構造になつている透明体の各境
界面の欠陥検査をする場合等がある。このような
場合に、検出したい面のみの欠陥を明確に検出で
きる欠陥検査装置が望まれていた。本発明は、上
述のように、透明被検体の表又は裏面の欠陥のみ
を簡易に検出できる欠陥検出装置を提供すること
を目的としているのである。
In a transparent specimen, it is necessary to detect defects on only one side, such as when inspecting only the side where electronic devices are formed of a GGG crystal that is the substrate of an electronic device, or when detecting fine irregularities on one side. There are cases when inspecting single-sided frosted glass, where light scatters strongly and it is difficult to inspect for defects on the other mirror side, or when inspecting defects at each interface of a transparent body with a multilayer structure. . In such cases, a defect inspection apparatus that can clearly detect defects only on the desired surface has been desired. As described above, an object of the present invention is to provide a defect detection device that can easily detect only defects on the front or back surface of a transparent object.

本発明の原理を第1図Aによつて説明する。1
は表裏面に欠陥を持つ透明被検体(ガラス、アク
リル樹脂)、2は透明被検体1の表面をななめ照
射する照射光、3はレンズで、その焦点深度は透
明被検体1の厚さより浅く選んである。そして、
その焦点は透明被検体1の表面に合わせられる。
4はピンホールで、その位置はレンズ3の結像点
に設定される。5は光電変換器である。なお、レ
ンズ3の焦点距離fに相当する位置を表面に合わ
せたときは第1図Bのようにコンデンサレンズ
3′を追加して平行光をコンデンサレンズ3′で絞
ればよい。
The principle of the present invention will be explained with reference to FIG. 1A. 1
is a transparent specimen (glass, acrylic resin) with defects on the front and back surfaces, 2 is an irradiation light that irradiates the surface of the transparent specimen 1 diagonally, and 3 is a lens whose depth of focus is selected to be shallower than the thickness of the transparent specimen 1. It is. and,
Its focus is set on the surface of the transparent object 1.
4 is a pinhole whose position is set at the imaging point of the lens 3. 5 is a photoelectric converter. Note that when the position corresponding to the focal length f of the lens 3 is aligned with the surface, a condenser lens 3' may be added as shown in FIG. 1B, and the parallel light may be condensed by the condenser lens 3'.

以上の構成において、透明被検体1の表面が無
欠陥であるときは、照射光2は表面で正反射する
成分と、透明被検体1の内部へ屈折透過して行く
成分とに分かれ、光電検出器5へ入射する光はほ
ぼゼロに近い。
In the above configuration, when the surface of the transparent object 1 is defect-free, the irradiated light 2 is divided into a component that is specularly reflected on the surface and a component that is refracted and transmitted into the transparent object 1, and is detected by photoelectric detection. The light incident on the vessel 5 is almost zero.

もし、透明被検体1の表面に欠陥(疵、ダスト
の付着など)があるときは、照射光2はその部分
で散乱、回折を起す。レンズ3は表面に焦点合せ
され、かつ、その結像点がピンホール4に対応し
ているので、表面での散乱光はそのまま光電検出
器5へ入射する。
If there is a defect (flaw, adhesion of dust, etc.) on the surface of the transparent object 1, the irradiated light 2 will be scattered and diffracted at that portion. Since the lens 3 is focused on the surface and its imaging point corresponds to the pinhole 4, the scattered light on the surface enters the photodetector 5 as it is.

表面でない部分、たとえば裏面、あるいは、レ
ンズ3の焦点深度の範囲を越える部分に欠陥があ
るときは、たとえ散乱を起こしてもその光は結像
点でのピンホール4を通過することができない。
If there is a defect in a portion other than the front surface, such as the back surface or a portion beyond the depth of focus of the lens 3, the light will not be able to pass through the pinhole 4 at the imaging point even if it is scattered.

したがつて、表面のみの欠陥が検出され、裏面
の欠陥は除去されることになる。
Therefore, defects only on the front surface will be detected, and defects on the back surface will be removed.

第2図は照射光2を透明被検体1に垂直に照射
した例を示したもので、この場合は、光学系3,
4,5は斜目方向への散乱光をとらえるように設
定される。そして、その動作原理は第1図A,B
の場合と同様である。
FIG. 2 shows an example in which the irradiation light 2 is perpendicularly irradiated onto the transparent object 1. In this case, the optical system 3,
4 and 5 are set so as to capture scattered light in the diagonal direction. The operating principle is shown in Figure 1 A and B.
The same is true for .

さて、本発明を実施する場合、透明被検体の二
次面的な欠陥を検出するために第3図のような構
成を採る。ここで、1は透明被検体で、矢印の方
向へ移動する。6は透明被検体1の表面を照射す
る面状照射光である。7はかまぼこ形レンズで、
その焦点は透明被検体1の表面に合せる。8はス
リツトで、かまぼこ形レンズ7の結像面に設定す
る。そして、スリツト8のスリツト幅は検出しよ
うとする欠陥の閾値に対応して自由に調整できる
ようにする。また、その位置もかまぼこ形レンズ
7の軸方向に調整可能にする。散乱光は図示され
ていない光電検出器によつてとらえられる。
Now, when carrying out the present invention, a configuration as shown in FIG. 3 is adopted in order to detect a secondary surface defect in a transparent object. Here, 1 is a transparent object, which moves in the direction of the arrow. Reference numeral 6 denotes planar irradiation light that irradiates the surface of the transparent object 1 . 7 is a semi-cylindrical lens,
Its focus is set on the surface of the transparent object 1. A slit 8 is set on the imaging plane of the semicylindrical lens 7. The slit width of the slit 8 can be freely adjusted in accordance with the threshold value of the defect to be detected. Further, its position can also be adjusted in the axial direction of the semicylindrical lens 7. The scattered light is captured by a photoelectric detector (not shown).

その動作は第1図A,Bおよび第2図と同様で
あり、本実施例では二次元的に欠陥検出を行なう
ところが異なるのみである。
The operation is similar to that in FIGS. 1A and 1B and FIG. 2, and the only difference is that defect detection is performed two-dimensionally in this embodiment.

第4図は他の実施例を示す。この場合は、照射
光9は図に示すようにビームの形で入射し、ガル
バノメーター式振動鏡10によつて一次元走査を
行ない、レンズ11で平行照射光12に変換して
透明被検体1の表面上を一次元走査するように構
成される。この実施例では照射光がビーム照射で
あるので検出のS/N比が増大するという利点が
ある。
FIG. 4 shows another embodiment. In this case, the irradiation light 9 enters in the form of a beam as shown in the figure, is scanned one-dimensionally by a galvanometer type vibrating mirror 10, is converted into parallel irradiation light 12 by a lens 11, and is applied to the transparent object to be examined. is configured to perform one-dimensional scanning over the surface of In this embodiment, since the irradiation light is beam irradiation, there is an advantage that the detection S/N ratio increases.

第5図はさらに他の実施例を挙げたもので、照
射ビーム12は裏面から入射させ、表面での散乱
を信号としてとらえる構成になつている。
FIG. 5 shows still another embodiment, in which the irradiation beam 12 is made to enter from the back surface and the scattering on the front surface is detected as a signal.

第6図ではレンズ7の焦点を裏面に合せた実施
例について例示してある。この場合、レンズ7を
調整せず、スリツト8の位置調整をするだけで簡
単に焦点合せが得られる。
FIG. 6 shows an example in which the lens 7 is focused on the back surface. In this case, focusing can be easily achieved by simply adjusting the position of the slit 8 without adjusting the lens 7.

第7図は本発明のさらに他の実施例を示したも
のである。この場合は表面の結像点にスリツト8
を設けるのは前述のと同じであるが、この実施例
では裏面の結像点に対応する位置にさらにスリツ
ト13を設ける。照射ビーム12を斜方向から入
射させれば、透明被検体1の表、裏面の結像点は
異なつた場所に対応し、スリツト8,13の配置
関係は明確に表裏別を識別可能にする。ここで、
5,5′は表面、裏面を別個に検出するための光
電変換器である。
FIG. 7 shows still another embodiment of the present invention. In this case, there is a slit 8 at the imaging point on the surface.
However, in this embodiment, a slit 13 is further provided at a position corresponding to the imaging point on the back surface. When the irradiation beam 12 is incident from an oblique direction, the image points on the front and back surfaces of the transparent object 1 correspond to different locations, and the arrangement of the slits 8 and 13 makes it possible to clearly distinguish between the front and back surfaces. here,
5 and 5' are photoelectric converters for separately detecting the front and back surfaces.

もし、表と裏面の両面の欠陥のみを検出する必
要があるとすれば、透明被検体の内部の欠陥から
生ずる散乱光を排除すればよい。そのために、光
電変換器5,5′を共通の光電変換器でカバーで
きるようにし、かつ、スリツト8,13のスリツ
ト幅を表面での欠陥検出の閾値(検出精度)と裏
面の閾値とに相当するように選んでおけば、表・
裏面の識別は不能であつても、一挙に表裏面の欠
陥を同一光電変換器でとらえられるようになる。
If it is necessary to detect only defects on both the front and back surfaces, it is sufficient to eliminate scattered light generated from defects inside the transparent object. For this purpose, the photoelectric converters 5 and 5' can be covered by a common photoelectric converter, and the slit width of the slits 8 and 13 is made to correspond to the threshold for defect detection on the front surface (detection accuracy) and the threshold value on the back surface. If you choose to do so, the table/
Even if it is impossible to identify the back side, defects on the front and back sides can be detected all at once using the same photoelectric converter.

以上の様に、本発明は、透明被検体の表又は裏
面の欠陥のみを簡易に検出できるという効果があ
る。従来では、検出したい面以外の箇所からの散
乱光を検出し、透明被検体を欠陥と誤つて判断し
てしまうという問題があつたが、本発明によれ
ば、このような問題はなく、透明被検体における
欠陥検査の精度を高めることができる。
As described above, the present invention has the effect of easily detecting defects only on the front or back surface of a transparent object. In the past, there was a problem in which scattered light from a surface other than the surface to be detected was detected and a transparent object was mistakenly judged as a defect, but according to the present invention, there is no such problem and transparent The accuracy of defect inspection on a test object can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図A,B、第2図は本発明の原理を説明す
るための構成図、第3図、第4図、第5図、第6
図、第7図はそれぞれ本発明の実施例を示す構成
図である。 1:透明被検体、2,6,9,12:照射光、
3,11:レンズ、4:ピンホール、5,5′:
光電変換器、7:かまぼこ形レンズ、8,13:
スリツト、10:ガルバノメーター式振動鏡。
Figures 1A and B and Figure 2 are configuration diagrams for explaining the principle of the present invention, Figures 3, 4, 5, and 6.
7 are configuration diagrams showing embodiments of the present invention, respectively. 1: Transparent object, 2, 6, 9, 12: Irradiation light,
3, 11: Lens, 4: Pinhole, 5, 5':
Photoelectric converter, 7: Kamaboko-shaped lens, 8, 13:
Slit, 10: Galvanometer type vibrating mirror.

Claims (1)

【特許請求の範囲】[Claims] 1 透明被検体の表面、あるいは裏面に焦点が合
せられ、かつ、上記透明被検体の厚さより浅い焦
点深度を有するレンズ系と、上記焦点部を照明す
る光源と、上記レンズ系の結像面に設けられ、欠
陥の閾値に対応して幅と上記レンズ系との位置を
調整でき、上記焦点部からの散乱光若しくは回折
光を透過させるスリツトと、上記スリツトを透過
した上記散乱光若しくは回折光を検出する光電変
換器とより成ることを特徴とする欠陥検出装置。
1. A lens system that is focused on the front or back surface of the transparent object and has a depth of focus shallower than the thickness of the transparent object, a light source that illuminates the focal point, and an imaging plane of the lens system. A slit is provided, whose width and position with respect to the lens system can be adjusted in accordance with a defect threshold, and which transmits the scattered light or diffracted light from the focal point, and which transmits the scattered light or diffracted light transmitted through the slit. A defect detection device comprising a photoelectric converter for detection.
JP4552176A 1976-04-23 1976-04-23 Flaw detector Granted JPS52129582A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4552176A JPS52129582A (en) 1976-04-23 1976-04-23 Flaw detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4552176A JPS52129582A (en) 1976-04-23 1976-04-23 Flaw detector

Publications (2)

Publication Number Publication Date
JPS52129582A JPS52129582A (en) 1977-10-31
JPS6129453B2 true JPS6129453B2 (en) 1986-07-07

Family

ID=12721707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4552176A Granted JPS52129582A (en) 1976-04-23 1976-04-23 Flaw detector

Country Status (1)

Country Link
JP (1) JPS52129582A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643539A (en) * 1979-09-19 1981-04-22 Hitachi Ltd Defect inspection device of face plate
JPS58162038A (en) * 1982-03-23 1983-09-26 Canon Inc Pattern defect detection apparatus
JPS5982727A (en) * 1982-11-04 1984-05-12 Hitachi Ltd Method and apparatus for detecting foreign matter
US4886975A (en) * 1986-02-14 1989-12-12 Canon Kabushiki Kaisha Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces
JPH02245642A (en) * 1989-03-20 1990-10-01 Toshiba Corp Attached matter detector
JPH079407B2 (en) * 1991-10-28 1995-02-01 株式会社日立製作所 Foreign matter inspection method
JP5596925B2 (en) * 2009-01-20 2014-09-24 株式会社山梨技術工房 Foreign object inspection apparatus and inspection method
JP5532792B2 (en) * 2009-09-28 2014-06-25 富士通株式会社 Surface inspection apparatus and surface inspection method
TWI485392B (en) * 2010-02-08 2015-05-21 Ygk Corp Foreign body inspection device and inspection method
JP2013140061A (en) * 2012-01-02 2013-07-18 Yamanashi Gijutsu Kobo:Kk Method for detecting foreign substance on front and back sides of transparent flat substrate, and foreign substance inspection device using the method

Also Published As

Publication number Publication date
JPS52129582A (en) 1977-10-31

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