JPS61293868A - Thermal printing head - Google Patents

Thermal printing head

Info

Publication number
JPS61293868A
JPS61293868A JP13407685A JP13407685A JPS61293868A JP S61293868 A JPS61293868 A JP S61293868A JP 13407685 A JP13407685 A JP 13407685A JP 13407685 A JP13407685 A JP 13407685A JP S61293868 A JPS61293868 A JP S61293868A
Authority
JP
Japan
Prior art keywords
heat generating
generating resistor
resistor element
layer
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13407685A
Other languages
Japanese (ja)
Inventor
Akira Yabushita
明 藪下
Yasunori Narizuka
康則 成塚
Yoshiharu Mori
森 佳治
Seiji Ikeda
池田 省二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13407685A priority Critical patent/JPS61293868A/en
Publication of JPS61293868A publication Critical patent/JPS61293868A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/345Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To improve printing quality, by flattening the area where a protective film which covers a heat generating resistor and an electric wiring conductor covers the heat generating resistor and the electric wiring conductor. CONSTITUTION:After an electrode wiring layer 4 and a heat generating resistor layer 3 are patterned, an oxidation inhibitor layer 61 is applied to the above to form a coating. The formation of the coating film over the heat generating resistor element 5 is performed in such a way as to form a concave at the heat generating resistor element 5 at the portion of th electrode wiring layer 4. Subsequently to the above, a resistor pattern is provided only at a region (l) of the heat generating resistor element, and exclusively rest of the regions are selectively removed by etching to make the region to be of the same thickness as of the film of the heat generating resistor element portion (until becoming flat). Then, an abrasion resistant layer 62 is applied for coating. Therefore, a platen roller is evenly pressure-bonded onto the protective film 6, and at the same time, a recording paper 8 also uniformly sticks onto the heat generating resistor element. In other words, the protective film surface is flattened, resulting in reduction in local accumulation of paper dusts and the quality of picture elements is remarkably improved.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は熱印字ヘッドの構造に係り、特に発熱抵抗体保
護膜の構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to the structure of a thermal printing head, and particularly to the structure of a heating resistor protective film.

〔発明の背景〕[Background of the invention]

従来技術における熱印字ヘッドの構成、特に発熱抵抗素
子部の構造は第3図に示すものが一般的である。この熱
印字ヘッドは薄膜を順次真空成膜法(例えば、蒸着、ス
パッタリング法など)で形成し、ホトリソプロセスによ
って作製される薄膜方式の例である。一般的には高抵抗
基材1(アルミナ基板など)上にグレーズガラス層2を
具備したものを基板として使用し、その上に発熱抵抗体
層3電極配線層4を順次成膜し、ホトレジストの形成さ
らにエツチングにより所望の形状にパターン化する。そ
の後、発熱抵抗素子部5(図中tで表示)を覆うように
保護膜6が形成されている。保護膜6は一般的には発熱
抵抗素子5の抵抗値の経時的な保障を目的として酸化防
止層61、及び、発熱抵抗素子5上をプラテンローラ7
によって圧接され摺動走行する記録紙8の摩耗に対する
耐摩耗層62をを積層したものである。ヘッドは通常、
両電極間にパルス状の電圧を印加して瞬時に発熱を繰り
返す発熱抵抗素子5の熱を記録紙8に与え記録を行なう
The structure of a thermal print head in the prior art, particularly the structure of a heating resistor element portion, is generally as shown in FIG. This thermal printing head is an example of a thin film method in which thin films are sequentially formed by a vacuum film forming method (for example, vapor deposition, sputtering method, etc.) and produced by a photolithography process. Generally, a high-resistance base material 1 (such as an alumina substrate) with a glaze glass layer 2 is used as the substrate, and a heating resistor layer 3 and an electrode wiring layer 4 are sequentially formed thereon, and then a photoresist layer is formed. It is patterned into a desired shape by formation and etching. Thereafter, a protective film 6 is formed to cover the heating resistor element portion 5 (indicated by t in the figure). The protective film 6 is generally coated with an oxidation prevention layer 61 and a platen roller 7 over the heat generating resistor element 5 in order to ensure the resistance value of the heat generating resistor element 5 over time.
A wear-resistant layer 62 is laminated to protect against abrasion of the recording paper 8 which is pressed into contact with the recording paper 8 and slides. The head is usually
A pulsed voltage is applied between both electrodes to apply heat from the heating resistor element 5, which repeatedly generates heat instantaneously, to the recording paper 8 for recording.

上記の構造を有するヘッドで記録を行なう場合保護膜6
上を摺動走行する記録紙8との密着状態は発熱抵抗素子
部5が凹状を有しているため不十分となり、かつ電極配
線4への熱放散も併せ第4図(α) 、 (A) 、 
(C)に示す如く、発熱抵抗素子(t)の長さに対して
均熱部の領域(図中t1で示す)が小さくなり、1画素
の大きさも同様に抵抗素子長さtより小さくなる。同時
に凹状溝部の隅に発色溶融した紙カスが堆積し印画品質
までも低下させる要因となる。これらの改善策として、
「特開昭53−57045号」では同様に凹状のため耐
摩耗層62の上にさらに摩耗層を設は経時的にプラテン
ローラ形状を摩耗層に転写することで密着性および紙カ
スの堆積を低減させる効果を得ているがその効果は小さ
い。また「特開昭55−128477号」では保護膜6
を構成する酸化防止層61を成膜後、発熱抵抗素子5上
を除く領域のみ選択的にエツチングによって膜厚を減少
させ、凸状とし、その上に耐摩耗層62を従来方法で積
層し凸状の保護膜6を形−成した。この方式では凹状構
成に対し、凹状隅部が取除かれたことで記録紙8の密着
性が改善され先の方式より効果が大きい。第4図Cb)
 、 Cc)に示す如く、均熱部の接触面積は見掛は広
がり、その結果1画素の大きさく図中4で示す)も大き
くなる。しかし、紙カスは記録紙8の走行大薊で記録終
端段差部に堆積するため経時的には、印画品質の低下を
招くことになる。また、プラテンローラ7で圧接さnる
段差部への圧力が集中しやすく保#ff146の信頼性
にも間融となる。
When recording with a head having the above structure, the protective film 6
The state of close contact with the recording paper 8 sliding on the recording paper 8 is insufficient because the heat-generating resistor element portion 5 has a concave shape, and the heat dissipation to the electrode wiring 4 is also insufficient, as shown in Fig. 4 (α) and (A). ),
As shown in (C), the area of the soaking part (indicated by t1 in the figure) becomes smaller than the length of the heating resistor element (t), and the size of one pixel also becomes smaller than the resistor element length t. . At the same time, colored and fused paper waste accumulates at the corners of the concave grooves, causing a deterioration in print quality. As these improvement measures,
In ``Unexamined Japanese Patent Publication No. 53-57045'', a wear layer is provided on top of the wear-resistant layer 62 due to the concave shape, and the shape of the platen roller is transferred to the wear layer over time to improve adhesion and paper waste accumulation. Although the effect of reducing this is obtained, the effect is small. Moreover, in "Unexamined Japanese Patent Publication No. 55-128477", the protective film 6
After forming the anti-oxidation layer 61 constituting the heat-generating resistor element 5, the film thickness is selectively reduced by etching only the area excluding the top of the heating resistor element 5 to form a convex shape, and the wear-resistant layer 62 is laminated thereon by a conventional method to form the convex shape. A protective film 6 was formed. In this method, since the concave corners are removed from the concave structure, the adhesion of the recording paper 8 is improved, and the effect is greater than that of the previous method. Figure 4Cb)
As shown in , Cc), the contact area of the heat soaking section apparently expands, and as a result, the size of one pixel (indicated by 4 in the figure) also increases. However, paper waste accumulates on the step portion at the end of recording when the recording paper 8 travels, resulting in deterioration of printing quality over time. In addition, pressure tends to concentrate on the stepped portion pressed by the platen roller 7, which impairs the reliability of the retainer #ff146.

〔発明の目的〕[Purpose of the invention]

本発明の目的は前記した従来技術の欠点をなくシ、印画
品質を改善するための熱印字ヘッドを提供するにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a thermal print head that eliminates the drawbacks of the prior art described above and improves print quality.

〔発明の概要〕[Summary of the invention]

本発明は上記目的にもとづき従来技術における熱印字ヘ
ッドの発熱抵抗素子部が凹状溝部の構造を有し、印画品
質の低下を招く点で不利であったのを平坦化された構造
とすることにより改善し、さらには、記録効率の向上も
得られるように改善したものである。
Based on the above-mentioned object, the present invention solves the problem of the prior art in which the heating resistor element of the thermal printing head has a concave groove structure, which is disadvantageous in that it causes a deterioration in printing quality, by changing it to a flattened structure. Furthermore, it has been improved so that recording efficiency can also be improved.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の具体的な実施例を第1図、第2図を用いて
説明する。第1図は本発明の発熱抵抗素子部の断面構造
で膜構成は基本的には従来技?41同様である。電極配
線層42発熱抵抗体。
Specific embodiments of the present invention will be described below with reference to FIGS. 1 and 2. Figure 1 shows the cross-sectional structure of the heating resistor element of the present invention, and the film structure is basically the conventional technology. 41 is the same. Electrode wiring layer 42 heating resistor.

N3をホトプロセスにより所望の形状にパターン化した
後、保護膜6を構成する酸化防止層61を高周波スパッ
タリングにより成膜した。この゛  時の形成膜厚は発
熱抵抗素子5上の膜厚で、電極配線層4の部分には第3
図従来方式の如く発熱抵抗素子5部が凹状となる形状に
成膜されている。この後発熱抵抗素子部の領域(図中t
で表示)のみレジストパターンを設け、他の領域のみ選
択的にエツチング除去し、発熱抵抗素子部の膜厚と同等
(平坦になる状態)までエツチングを行なった。この忽
・化防止層61としては実施例では酸化ケイ素(5i0
2)を使用し、この時のエツチング溶液はバッファーH
F液である。なお発熱抵抗素子上の8102層の膜厚は
約3μmである。しかる後、耐摩耗層62として五酸化
タンタル(Ta205)を膜厚3μm高周波スパッタリ
ングにより成膜し膜厚6μmの保護膜6を形成した。
After patterning N3 into a desired shape by photoprocessing, an anti-oxidation layer 61 constituting the protective film 6 was formed by high-frequency sputtering. The film thickness formed at this time is the film thickness on the heating resistor element 5, and the electrode wiring layer 4 has a third film thickness.
As in the conventional method shown in the figure, the heating resistor element 5 is formed into a concave shape. After this, the area of the heating resistor element (t in the figure)
A resist pattern was provided only for the resist pattern (indicated by ), and only the other regions were selectively etched away until the film thickness was equal to that of the heating resistor element (flat state). In the embodiment, silicon oxide (5i0
2), and the etching solution at this time was buffer H.
This is liquid F. Note that the film thickness of the 8102 layer on the heating resistor element is approximately 3 μm. Thereafter, tantalum pentoxide (Ta205) was formed as a wear-resistant layer 62 by high frequency sputtering to a thickness of 3 μm to form a protective film 6 with a thickness of 6 μm.

この平坦化保護膜の場合には、図示の如くプラテンロー
ラは保護膜6上に均等に圧接され、同時に記録紙8も発
熱抵抗素子上に均一に密着し、その面積も従来技術(「
特開昭55−128477号」)に比較し大きくなる。
In the case of this flattening protective film, as shown in the figure, the platen roller is evenly pressed onto the protective film 6, and at the same time, the recording paper 8 is also brought into uniform contact with the heating resistor element, and its area is smaller than that of the conventional technology.
JP-A No. 55-128477).

したがって電極部への熱放散の影響は残るが、1画素の
印画面積も第4図(C)に示した前記方式の場合(図中
4で示す)より大きくなることが期待される。
Therefore, although the influence of heat dissipation to the electrode portion remains, it is expected that the printing area of one pixel will be larger than in the case of the method shown in FIG. 4(C) (indicated by 4 in the figure).

上記熱印字ヘッドを使用し印画記録を行ない従来技術に
よるヘッド構造との比較を求めたものが第2図である。
FIG. 2 shows a comparison between the thermal printing head described above and the head structure of the prior art when printing and recording was performed using the thermal printing head.

印画記録は全黒印画を行ない、反射濃度で比較した。こ
の時の比較濃度は平均濃度D−1,0値(任意)である
。ヘッドの発熱抵抗素子形状は、抵抗長さ:250μm
1幅:90μm、抵抗体形成密度は8素子部wmで、記
録紙走行方向の記録密度はZ7画素/、である。
Prints were recorded in all black, and the reflection density was compared. The comparison density at this time is the average density D-1,0 value (arbitrary). The shape of the heating resistor element of the head is resistance length: 250 μm.
1 width: 90 μm, the resistor formation density is 8 element parts wm, and the recording density in the recording paper running direction is Z7 pixels/.

また電極間に印加するパルス電圧は、周期10m5゜パ
ル誠幅:1町である。特性図の結果より、第3図に示し
た構造の従来ヘッドでは濃度り−to値を得る電力は0
.55 W/dOt (図中11曲線)であり、これに
対し、第5図に示した従来ヘツドでは約10%の電力が
低減され0.49 w/dot (中W2曲its>で
あった。さらに本実施例のヘッドでは約5%の電力が低
減され約0.47 vrldo t (図中13曲11
[)である。この結果から一定の印画濃度(例えばD=
tO値)を得るに必要な電力は、画素面積の最も大きく
なる本実施例の場合が最も低い電力であり、これは連続
で稼動される熱印字ヘッドの抵抗値安定性に著しい効果
を与える。また、発色溶融した紙カスの堆積は、従来ヘ
ッド(「特開昭55−128477号」)に比べ保護膜
面が平坦化されたため、紙カスが局部的な部位へ堆積す
ることが低減し、印画に及ぼす障害も低減され、画素の
品質も著しく向上した。
The pulse voltage applied between the electrodes had a period of 10 m5° and a pulse width of 1 town. From the results of the characteristic diagram, it can be seen that in the conventional head with the structure shown in Figure 3, the power required to obtain the density -to value is 0.
.. 55 W/dot (curve 11 in the figure), whereas in the conventional head shown in FIG. 5, the power was reduced by about 10% to 0.49 w/dot (in the middle W2). Furthermore, in the head of this example, the power is reduced by about 5%, and the power is reduced by about 0.47 vrldot (13 songs 11 in the figure).
[). From this result, a certain print density (for example, D=
The power required to obtain the tO value is the lowest in this embodiment, which has the largest pixel area, and this has a significant effect on the resistance value stability of the continuously operated thermal print head. In addition, because the protective film surface is flatter compared to the conventional head (Japanese Patent Application Laid-open No. 55-128477), the accumulation of colored and melted paper waste in localized areas is reduced. The interference with printing has also been reduced, and the quality of pixels has been significantly improved.

〔発明の効果〕〔Effect of the invention〕

上記の如く、本発明による構造を有する熱印字ヘッドは
、ヘッド性能として低電力化に伴なう記録効率の改善;
画素の高品質化が計れヘッドの耐パルス寿命(抵抗値安
定性)の向上が達成される。
As described above, the thermal printing head having the structure according to the present invention has improved recording efficiency due to lower power consumption as head performance;
The quality of pixels can be improved, and the pulse resistance life (resistance value stability) of the head can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例によるヘッドの断面構造図、第
2図はヘッドの印画特性を示す特性比較図、第3図は従
来の熱印字ヘッドの断面構造図、第4図(α)は、発熱
抵抗素子部の平面図、<b)は素子部領域の温度分布を
示す模式図、(C)は画素の大きさを示す模式図、第5
図は「特開昭55−128477号」におけるヘッドの
断面構造図である。 1:アルミナ基板、 2:グレーズガラス層、 3:発熱抵抗体層、 4:[極配線層、 7:プラテンローラ、 8:記録紙。 発2目 +1)77c@刀 (w/ctot )第jIj!ll
Fig. 1 is a cross-sectional structural diagram of a head according to an embodiment of the present invention, Fig. 2 is a characteristic comparison diagram showing printing characteristics of the head, Fig. 3 is a cross-sectional structural diagram of a conventional thermal printing head, and Fig. 4 (α). is a plan view of the heating resistor element section, <b) is a schematic diagram showing the temperature distribution in the element region, (C) is a schematic diagram showing the size of the pixel,
The figure is a cross-sectional structural view of the head in ``Japanese Patent Application Laid-Open No. 55-128477''. 1: Alumina substrate, 2: Glaze glass layer, 3: Heat generating resistor layer, 4: Polar wiring layer, 7: Platen roller, 8: Recording paper. 2nd shot + 1) 77c @ Katana (w/ctot) No. jIj! ll

Claims (1)

【特許請求の範囲】[Claims] 1、高抵抗基材上に発熱抵抗体、これに電力を供給する
ための電気配線導体、前記発熱抵抗体と電気配線導体を
覆うように形成された保護膜より成る熱印字ヘッドにお
いて、該保護膜が発熱抵抗体、電気配線導体を覆う領域
において平坦化されたことを特徴とする熱印字ヘッド。
1. A thermal printing head comprising a heating resistor on a high-resistance base material, an electrical wiring conductor for supplying power to the heating resistor, and a protective film formed to cover the heating resistor and the electrical wiring conductor. A thermal printing head characterized in that the film is flattened in a region covering a heating resistor and an electrical wiring conductor.
JP13407685A 1985-06-21 1985-06-21 Thermal printing head Pending JPS61293868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13407685A JPS61293868A (en) 1985-06-21 1985-06-21 Thermal printing head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13407685A JPS61293868A (en) 1985-06-21 1985-06-21 Thermal printing head

Publications (1)

Publication Number Publication Date
JPS61293868A true JPS61293868A (en) 1986-12-24

Family

ID=15119832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13407685A Pending JPS61293868A (en) 1985-06-21 1985-06-21 Thermal printing head

Country Status (1)

Country Link
JP (1) JPS61293868A (en)

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