JPS61290067A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS61290067A
JPS61290067A JP13174985A JP13174985A JPS61290067A JP S61290067 A JPS61290067 A JP S61290067A JP 13174985 A JP13174985 A JP 13174985A JP 13174985 A JP13174985 A JP 13174985A JP S61290067 A JPS61290067 A JP S61290067A
Authority
JP
Japan
Prior art keywords
polyimide film
layer
thermal head
protective layer
insulating substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13174985A
Other languages
Japanese (ja)
Inventor
Yoshiharu Mori
森 佳治
Yasunori Narizuka
康則 成塚
Seiji Ikeda
池田 省二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13174985A priority Critical patent/JPS61290067A/en
Publication of JPS61290067A publication Critical patent/JPS61290067A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads

Abstract

PURPOSE:To contrive inexpensively a higher printing quality, by a method wherein a polyimide film is provided on an insulating substrate at a position corresponding to a heating part, and a resistor layer, an electrode wiring and a protective layer are sequentially provided thereon. CONSTITUTION:The polyimide film 5 trapezoid in cross section is formed on the insulating substrate 1, and the resistor layer 2 having a predetermined film thickness is formed on the substrate 1 and the film 5. Further, the electrode wiring 3 is formed on the resistor layer 2 except the part corresponding to the polyimide film 5, and the protective layer 4 is formed on the wiring 3 and the layer 2. Since the surface of the resistor layer 2 between the wirings 3 is slightly protruded upward from the level of the surfaces of the wirings 3 due to the presence of the polyimide film 5, the surface of the protective layer 4 is protuberant, so that a thermal recording paper can be thereby pressed against the thermal head while exerting a relatively low pressure. In addition, since the polyimide film can be easily patterned and has a favorable heat- accumulating effect, favorable printing quality can be obtained inexpensively.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、ファクシミリやプリンター等に用いられるサ
ーマルヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thermal head used in facsimiles, printers, and the like.

〔発明の背景〕[Background of the invention]

第2図はサーマルヘッドの従来例を示す説明図であって
、同図(α)はサーマルヘッドの平°面図、同図(bl
はサーマルヘッドの断面図であり、1は絶盪性基板、2
は抵抗層、3は電極配線、4は保護層である。
FIG. 2 is an explanatory diagram showing a conventional example of a thermal head, and FIG. 2 (α) is a plan view of the thermal head, and FIG.
is a cross-sectional view of the thermal head, 1 is an abrasive substrate, 2 is
3 is a resistance layer, 3 is an electrode wiring, and 4 is a protective layer.

同図において、絶縁性基板1上には所定の厚さの抵抗層
2が形成され、該抵抗層2上には抵抗層2の一部を臨ん
で電極配線3が形成されている。この電極配!13間に
臨む前記抵抗層2は発熱部となシ、この発熱部からの熱
を図示せぬ感熱紙して伝達するための保護層4が前記電
極配線3の全面及び抵抗層20一部上にほぼ均一厚さに
形成されている。
In the figure, a resistive layer 2 having a predetermined thickness is formed on an insulating substrate 1, and an electrode wiring 3 is formed on the resistive layer 2, facing a part of the resistive layer 2. This electrode arrangement! The resistance layer 2 facing between 13 and 13 is a heat generating part, and a protective layer 4 for transmitting heat from the heat generating part by means of thermal paper (not shown) is provided on the entire surface of the electrode wiring 3 and a part of the resistance layer 20. It is formed to a nearly uniform thickness.

このため、発熱部上の保護層4は同図(blに示すよ5
に凹状に形成されている。
Therefore, the protective layer 4 on the heat generating part is
It is formed in a concave shape.

しかしながら、このように構成された従来のサーマルヘ
ッドにあっては、熱伝導部である保1iJi4が凹状と
なっているため、保護層4とこれに圧接される感熱紙と
の接触が不安定となシ、印字品質が低下するという欠点
があった。この対策として、発熱部に大きな電力を供給
したシ、おるいは感熱紙をサーマルヘッドに強く押付け
る等の方法が考えられるが、前者は消費電力が増大する
という問題があり、後者は保護層4に異常摩耗が発生す
るという問題があり、いずれの方法も得策ではなかった
。そこで、かかる問題点を解消することを目的として、
第3図に示すように、保護層40表面を平坦状としたサ
ーマルヘッドや、第4図に示すように発熱部下力の絶縁
性基板1を部分的に凸状にしたサーマルヘッドが従来よ
シ提案されている(%開昭59=191’78号公報、
特開昭57=87974 号公報)。
However, in the conventional thermal head configured as described above, since the heat conductive portion 1iJi4 has a concave shape, the contact between the protective layer 4 and the thermal paper pressed against it is unstable. However, there was a drawback that the print quality deteriorated. Possible countermeasures to this problem include supplying a large amount of power to the heat generating part, or strongly pressing thermal paper against the thermal head, but the former has the problem of increased power consumption, while the latter requires a protective layer. No. 4 had the problem of abnormal wear, and neither method was a good idea. Therefore, with the aim of solving such problems,
As shown in FIG. 3, there is a thermal head with a flat surface of the protective layer 40, and a thermal head with a partially convex insulating substrate 1 under the heat generation as shown in FIG. It has been proposed (% Kaisho 59 = Publication No. 191'78,
(Japanese Unexamined Patent Publication No. 87974).

しかLながら、第3図に示す構造のサーマルヘッドでは
、保護層4を比較的厚く形成した後。
However, in the thermal head having the structure shown in FIG. 3, after the protective layer 4 is formed relatively thick.

電極配線3上に位置する保護層4′を図示破線で示すよ
うにエツチング処理によって除去する工程が必要となり
、また、第4図に示す構造のサーマルヘッドでは、絶縁
性基板1をエツチング処理やグレーズ層の形成によシ部
分的に凸状とする工程が必要となシ、いずれの場合にお
いても複雑な処理工程が必要となるという問題があった
It is necessary to remove the protective layer 4' located on the electrode wiring 3 by etching as shown by the broken line in the figure.In addition, in the thermal head having the structure shown in FIG. The formation of the layer requires a step of partially making it convex, and in either case there is a problem in that a complicated processing step is required.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上記従来技術の欠点を除き、安価で印
字品質の良好なサーマルヘッドを提供するにある。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art described above and provide a thermal head that is inexpensive and has good print quality.

〔発明の概要〕[Summary of the invention]

この目的を達成するために、本発明は、絶縁性基板上の
発熱部と対応する位置だポリイミド膜を形成し、この上
に抵抗層、電極配線及び保護層を順次形成するように構
成した点に特徴がある。
In order to achieve this object, the present invention is configured such that a polyimide film is formed at a position corresponding to a heat generating part on an insulating substrate, and a resistive layer, an electrode wiring, and a protective layer are sequentially formed thereon. There are characteristics.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例を図面について説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例に係るサーマルヘッドの断面
図であって、5はポリイミド膜であり、第2図〜第4図
に対応する部分には同一符号を付けである。
FIG. 1 is a sectional view of a thermal head according to an embodiment of the present invention, in which 5 is a polyimide film, and parts corresponding to FIGS. 2 to 4 are given the same reference numerals.

同図において、絶縁性基板1上には断面台形のポリイミ
ド膜5が形成され、これら絶縁性基板1及びポリイミド
膜5上には所定膜厚の抵抗層2が形成されている。さら
に、この抵抗層2上には前記ポリイミド膜5の上方を除
いて電極配線3が形成され、該電極配線3及び抵抗層2
上には保護層4が形成されている。この保護層40表面
は、電極配線3及び該電極配線3間に臨む抵抗層20表
面がポリイミド膜5の存在によって電極配線3の表面よ
シ僅かに突出した状態で形成されているため、凸状に形
成される。
In the figure, a polyimide film 5 having a trapezoidal cross section is formed on an insulating substrate 1, and a resistive layer 2 having a predetermined thickness is formed on the insulating substrate 1 and the polyimide film 5. Furthermore, an electrode wiring 3 is formed on this resistance layer 2 except above the polyimide film 5, and the electrode wiring 3 and the resistance layer 2 are
A protective layer 4 is formed thereon. The surface of this protective layer 40 has a convex shape because the electrode wiring 3 and the surface of the resistance layer 20 facing between the electrode wirings 3 are formed in a slightly protruding state from the surface of the electrode wiring 3 due to the presence of the polyimide film 5. is formed.

このように構成されたサーマルヘッドにありては、保護
40表面が凸状に形成されているため、比較的弱い圧力
だよって感熱紙をサーマルヘッドに圧接でき、かつ、印
字品質を良好なものにすることが可能となる。
In the thermal head configured in this way, since the surface of the protection 40 is formed in a convex shape, the thermal paper can be pressed against the thermal head with relatively weak pressure, and the print quality can be improved. It becomes possible to do so.

次に、上記実施例の製造工程について簡単に説明する。Next, the manufacturing process of the above embodiment will be briefly explained.

まず、絶縁性基板1上に厚さ0.5〜30μ風のポリイ
ミド膜を均一に形成し、これを一部を残して通常のフォ
トエツチング技術によ)除去し、断面台形のポリイミド
膜5を形成する。この残すべきボリイミ・ド膜5は、各
発熱部に対応して個々に凸状に形成しても良く、あるい
は連続して帯状に形成しても良い。
First, a polyimide film with a thickness of 0.5 to 30 μm is uniformly formed on an insulating substrate 1, and this is removed using a normal photoetching technique (leaving only a part) to form a polyimide film 5 with a trapezoidal cross section. Form. The polyimide film 5 to be left may be formed individually in a convex shape corresponding to each heat generating portion, or may be formed continuously in a band shape.

次に、上記絶縁性基板1及びポリイミド膜の上に抵抗層
2となるCr −Si −0系抵抗体をスパッタリング
法によ)500〜5ooo、7形成し、さらに、その上
に電極配線3となるアルミニウムを15〜2μm スパ
ッタリング法にょシ形成する。
Next, on the insulating substrate 1 and the polyimide film, a Cr-Si-0 series resistor, which will become the resistive layer 2, is formed by sputtering. A 15 to 2 μm thick layer of aluminum is formed using a sputtering method.

次に、フォトエツチング技術により抵抗層2をいくつか
の部分に分離するとともだ1発熱部となる抵抗層2が露
出するように電極配線3を部分的に除去する。最後に、
この上に保護層4を形成すると、ポリイミド膜5上方の
保護層4が部分的に突出し、第1図に示すごとき凸状構
造のサーマルヘッドができる。
Next, the resistive layer 2 is separated into several parts by photoetching, and the electrode wiring 3 is partially removed so that the resistive layer 2, which will become a heat generating part, is exposed. lastly,
When the protective layer 4 is formed on this, the protective layer 4 above the polyimide film 5 partially protrudes, forming a thermal head having a convex structure as shown in FIG.

上記一実施例で示すように、絶縁性基板1上に部分的に
ポリイミド膜5を形成することは、絶縁性基板をグレー
ズ層の形成にょシロ状とする従来技術に比べ、その製造
工程を容易にできるばかシでなく、熱伝導率が従来のグ
レーズガラスの2〜3.6X10−Ca17cm −E
Cに対シテ本発明のポリイミドは0.8 X 10−’
 Caケ’cm−5Cと小さい材料であるため、蓄熱効
果が大きく、同じ蓄熱効果を得るのに薄い膜厚ですむと
いう利点がある。
As shown in the above embodiment, forming the polyimide film 5 partially on the insulating substrate 1 simplifies the manufacturing process compared to the conventional technique in which the insulating substrate is shaped like a glaze layer. Thermal conductivity is 2 to 3.6X10-Ca17cm-E than that of conventional glazed glass.
The polyimide of the present invention is 0.8 x 10-'
Since it is a material as small as Ca cm-5C, it has a large heat storage effect, and has the advantage that a thin film is required to obtain the same heat storage effect.

なお、上記一実施例では、絶縁性基板1上に部分的にポ
リイミド膜5を形成する場合について示し念ので、該ポ
リイミド膜5に蓄熱効果をもたせるためには数10μm
の膜厚が必要であ2しかしながら、凸状効果のみを期待
するのでをれば、絶縁性基板上の全面に均一に数10μ
”11のポリイミド膜を形成し、この上に部分的に」記
実施例と同様のポリイミド膜を形成しても濃い。この場
合は、電極配線3の厚さよす0.1〜数10μ簿厚くポ
リイミド膜を形成することによシ、その上に形成される
保護層4が凸状形状となる。
In the above embodiment, the polyimide film 5 is formed partially on the insulating substrate 1, so that the polyimide film 5 has a thickness of several tens of μm in order to have a heat storage effect.
However, since only a convex effect is expected, it is necessary to have a film thickness of several tens of microns over the entire surface of the insulating substrate.
Even if the polyimide film 11 is formed and a polyimide film similar to that in the embodiment described above is partially formed on the polyimide film, the density is high. In this case, by forming a polyimide film that is 0.1 to several tens of microns thicker than the electrode wiring 3, the protective layer 4 formed thereon has a convex shape.

さらに、本発明において使用される絶縁性導板1は上記
実施例に限定されず、その表面に増−厚のグレーズ層を
形成した絶縁性基板を用いることも可能である。
Further, the insulating conductive plate 1 used in the present invention is not limited to the above embodiment, and an insulating substrate having a thicker glaze layer formed on its surface may also be used.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、発情部を構成す
る抵抗層の下部に、パターン形成力容易で、かつ蓄熱効
果の良いポリイミド膜を形成したため、安価で印字品質
の良好なサーマルヘッドを提供できる。
As explained above, according to the present invention, a polyimide film that is easy to form a pattern and has a good heat storage effect is formed under the resistive layer that constitutes the estrous area, so that a thermal head that is inexpensive and has good printing quality can be realized. Can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による丈−マルヘッドの一実施例上水す
要部断面図、第2図は従来のサーマルヘッドを示し、第
2図(α)はその平面図、第2図[blはその断面図で
あり、第3図、第4図はサーマルヘッドの他の従来例を
示す断面図である。 1・・・絶縁性基板     2・・・抵抗層3・・・
電極配線      4山保膜層5・・・ポリイミド膜 「 廟 1 図 第2図 (σ) (メ〕 第3図 第4図
Fig. 1 is a sectional view of a main part of an embodiment of the length-round head according to the present invention, Fig. 2 shows a conventional thermal head, Fig. 2 (α) is a plan view thereof, and Fig. 2 [bl is 3 and 4 are cross-sectional views showing other conventional examples of thermal heads. 1... Insulating substrate 2... Resistance layer 3...
Electrode wiring 4-layer protective layer 5...Polyimide film 1 Figure 2 (σ) (Me) Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 絶縁性基板上に抵抗層、電極配線および保護層を順次積
層してなるサーマルヘッドにおいて、前記絶縁性基板を
前記抵抗層との間にポリイミド膜を介設し、該ポリイミ
ド膜により前記抵抗層を部分的に凸状としたことを特徴
とするサーマルヘッド。
In a thermal head formed by sequentially laminating a resistive layer, electrode wiring, and a protective layer on an insulating substrate, a polyimide film is interposed between the insulating substrate and the resistive layer, and the resistive layer is covered by the polyimide film. A thermal head characterized by a partially convex shape.
JP13174985A 1985-06-19 1985-06-19 Thermal head Pending JPS61290067A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13174985A JPS61290067A (en) 1985-06-19 1985-06-19 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13174985A JPS61290067A (en) 1985-06-19 1985-06-19 Thermal head

Publications (1)

Publication Number Publication Date
JPS61290067A true JPS61290067A (en) 1986-12-20

Family

ID=15065290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13174985A Pending JPS61290067A (en) 1985-06-19 1985-06-19 Thermal head

Country Status (1)

Country Link
JP (1) JPS61290067A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0605190A2 (en) * 1992-12-23 1994-07-06 Ngk Insulators, Ltd. Thermal head
US5444475A (en) * 1992-07-03 1995-08-22 Hitachi Koki Co., Ltd. Thermal recording head
CN102649368A (en) * 2011-02-23 2012-08-29 精工电子有限公司 Thermal head and method of manufacturing the same, and printer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124676A (en) * 1982-01-20 1983-07-25 Seiko Epson Corp Thermal head
JPS60104348A (en) * 1983-11-11 1985-06-08 Canon Inc Thermal head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124676A (en) * 1982-01-20 1983-07-25 Seiko Epson Corp Thermal head
JPS60104348A (en) * 1983-11-11 1985-06-08 Canon Inc Thermal head

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5444475A (en) * 1992-07-03 1995-08-22 Hitachi Koki Co., Ltd. Thermal recording head
EP0605190A2 (en) * 1992-12-23 1994-07-06 Ngk Insulators, Ltd. Thermal head
EP0605190A3 (en) * 1992-12-23 1994-11-23 Ngk Insulators Ltd Thermal head.
CN102649368A (en) * 2011-02-23 2012-08-29 精工电子有限公司 Thermal head and method of manufacturing the same, and printer

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