JPS61290067A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS61290067A JPS61290067A JP13174985A JP13174985A JPS61290067A JP S61290067 A JPS61290067 A JP S61290067A JP 13174985 A JP13174985 A JP 13174985A JP 13174985 A JP13174985 A JP 13174985A JP S61290067 A JPS61290067 A JP S61290067A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide film
- layer
- thermal head
- protective layer
- insulating substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、ファクシミリやプリンター等に用いられるサ
ーマルヘッドに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thermal head used in facsimiles, printers, and the like.
第2図はサーマルヘッドの従来例を示す説明図であって
、同図(α)はサーマルヘッドの平°面図、同図(bl
はサーマルヘッドの断面図であり、1は絶盪性基板、2
は抵抗層、3は電極配線、4は保護層である。FIG. 2 is an explanatory diagram showing a conventional example of a thermal head, and FIG. 2 (α) is a plan view of the thermal head, and FIG.
is a cross-sectional view of the thermal head, 1 is an abrasive substrate, 2 is
3 is a resistance layer, 3 is an electrode wiring, and 4 is a protective layer.
同図において、絶縁性基板1上には所定の厚さの抵抗層
2が形成され、該抵抗層2上には抵抗層2の一部を臨ん
で電極配線3が形成されている。この電極配!13間に
臨む前記抵抗層2は発熱部となシ、この発熱部からの熱
を図示せぬ感熱紙して伝達するための保護層4が前記電
極配線3の全面及び抵抗層20一部上にほぼ均一厚さに
形成されている。In the figure, a resistive layer 2 having a predetermined thickness is formed on an insulating substrate 1, and an electrode wiring 3 is formed on the resistive layer 2, facing a part of the resistive layer 2. This electrode arrangement! The resistance layer 2 facing between 13 and 13 is a heat generating part, and a protective layer 4 for transmitting heat from the heat generating part by means of thermal paper (not shown) is provided on the entire surface of the electrode wiring 3 and a part of the resistance layer 20. It is formed to a nearly uniform thickness.
このため、発熱部上の保護層4は同図(blに示すよ5
に凹状に形成されている。Therefore, the protective layer 4 on the heat generating part is
It is formed in a concave shape.
しかしながら、このように構成された従来のサーマルヘ
ッドにあっては、熱伝導部である保1iJi4が凹状と
なっているため、保護層4とこれに圧接される感熱紙と
の接触が不安定となシ、印字品質が低下するという欠点
があった。この対策として、発熱部に大きな電力を供給
したシ、おるいは感熱紙をサーマルヘッドに強く押付け
る等の方法が考えられるが、前者は消費電力が増大する
という問題があり、後者は保護層4に異常摩耗が発生す
るという問題があり、いずれの方法も得策ではなかった
。そこで、かかる問題点を解消することを目的として、
第3図に示すように、保護層40表面を平坦状としたサ
ーマルヘッドや、第4図に示すように発熱部下力の絶縁
性基板1を部分的に凸状にしたサーマルヘッドが従来よ
シ提案されている(%開昭59=191’78号公報、
特開昭57=87974 号公報)。However, in the conventional thermal head configured as described above, since the heat conductive portion 1iJi4 has a concave shape, the contact between the protective layer 4 and the thermal paper pressed against it is unstable. However, there was a drawback that the print quality deteriorated. Possible countermeasures to this problem include supplying a large amount of power to the heat generating part, or strongly pressing thermal paper against the thermal head, but the former has the problem of increased power consumption, while the latter requires a protective layer. No. 4 had the problem of abnormal wear, and neither method was a good idea. Therefore, with the aim of solving such problems,
As shown in FIG. 3, there is a thermal head with a flat surface of the protective layer 40, and a thermal head with a partially convex insulating substrate 1 under the heat generation as shown in FIG. It has been proposed (% Kaisho 59 = Publication No. 191'78,
(Japanese Unexamined Patent Publication No. 87974).
しかLながら、第3図に示す構造のサーマルヘッドでは
、保護層4を比較的厚く形成した後。However, in the thermal head having the structure shown in FIG. 3, after the protective layer 4 is formed relatively thick.
電極配線3上に位置する保護層4′を図示破線で示すよ
うにエツチング処理によって除去する工程が必要となり
、また、第4図に示す構造のサーマルヘッドでは、絶縁
性基板1をエツチング処理やグレーズ層の形成によシ部
分的に凸状とする工程が必要となシ、いずれの場合にお
いても複雑な処理工程が必要となるという問題があった
。It is necessary to remove the protective layer 4' located on the electrode wiring 3 by etching as shown by the broken line in the figure.In addition, in the thermal head having the structure shown in FIG. The formation of the layer requires a step of partially making it convex, and in either case there is a problem in that a complicated processing step is required.
本発明の目的は、上記従来技術の欠点を除き、安価で印
字品質の良好なサーマルヘッドを提供するにある。SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art described above and provide a thermal head that is inexpensive and has good print quality.
この目的を達成するために、本発明は、絶縁性基板上の
発熱部と対応する位置だポリイミド膜を形成し、この上
に抵抗層、電極配線及び保護層を順次形成するように構
成した点に特徴がある。In order to achieve this object, the present invention is configured such that a polyimide film is formed at a position corresponding to a heat generating part on an insulating substrate, and a resistive layer, an electrode wiring, and a protective layer are sequentially formed thereon. There are characteristics.
以下、本発明の実施例を図面について説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第1図は本発明の一実施例に係るサーマルヘッドの断面
図であって、5はポリイミド膜であり、第2図〜第4図
に対応する部分には同一符号を付けである。FIG. 1 is a sectional view of a thermal head according to an embodiment of the present invention, in which 5 is a polyimide film, and parts corresponding to FIGS. 2 to 4 are given the same reference numerals.
同図において、絶縁性基板1上には断面台形のポリイミ
ド膜5が形成され、これら絶縁性基板1及びポリイミド
膜5上には所定膜厚の抵抗層2が形成されている。さら
に、この抵抗層2上には前記ポリイミド膜5の上方を除
いて電極配線3が形成され、該電極配線3及び抵抗層2
上には保護層4が形成されている。この保護層40表面
は、電極配線3及び該電極配線3間に臨む抵抗層20表
面がポリイミド膜5の存在によって電極配線3の表面よ
シ僅かに突出した状態で形成されているため、凸状に形
成される。In the figure, a polyimide film 5 having a trapezoidal cross section is formed on an insulating substrate 1, and a resistive layer 2 having a predetermined thickness is formed on the insulating substrate 1 and the polyimide film 5. Furthermore, an electrode wiring 3 is formed on this resistance layer 2 except above the polyimide film 5, and the electrode wiring 3 and the resistance layer 2 are
A protective layer 4 is formed thereon. The surface of this protective layer 40 has a convex shape because the electrode wiring 3 and the surface of the resistance layer 20 facing between the electrode wirings 3 are formed in a slightly protruding state from the surface of the electrode wiring 3 due to the presence of the polyimide film 5. is formed.
このように構成されたサーマルヘッドにありては、保護
40表面が凸状に形成されているため、比較的弱い圧力
だよって感熱紙をサーマルヘッドに圧接でき、かつ、印
字品質を良好なものにすることが可能となる。In the thermal head configured in this way, since the surface of the protection 40 is formed in a convex shape, the thermal paper can be pressed against the thermal head with relatively weak pressure, and the print quality can be improved. It becomes possible to do so.
次に、上記実施例の製造工程について簡単に説明する。Next, the manufacturing process of the above embodiment will be briefly explained.
まず、絶縁性基板1上に厚さ0.5〜30μ風のポリイ
ミド膜を均一に形成し、これを一部を残して通常のフォ
トエツチング技術によ)除去し、断面台形のポリイミド
膜5を形成する。この残すべきボリイミ・ド膜5は、各
発熱部に対応して個々に凸状に形成しても良く、あるい
は連続して帯状に形成しても良い。First, a polyimide film with a thickness of 0.5 to 30 μm is uniformly formed on an insulating substrate 1, and this is removed using a normal photoetching technique (leaving only a part) to form a polyimide film 5 with a trapezoidal cross section. Form. The polyimide film 5 to be left may be formed individually in a convex shape corresponding to each heat generating portion, or may be formed continuously in a band shape.
次に、上記絶縁性基板1及びポリイミド膜の上に抵抗層
2となるCr −Si −0系抵抗体をスパッタリング
法によ)500〜5ooo、7形成し、さらに、その上
に電極配線3となるアルミニウムを15〜2μm スパ
ッタリング法にょシ形成する。Next, on the insulating substrate 1 and the polyimide film, a Cr-Si-0 series resistor, which will become the resistive layer 2, is formed by sputtering. A 15 to 2 μm thick layer of aluminum is formed using a sputtering method.
次に、フォトエツチング技術により抵抗層2をいくつか
の部分に分離するとともだ1発熱部となる抵抗層2が露
出するように電極配線3を部分的に除去する。最後に、
この上に保護層4を形成すると、ポリイミド膜5上方の
保護層4が部分的に突出し、第1図に示すごとき凸状構
造のサーマルヘッドができる。Next, the resistive layer 2 is separated into several parts by photoetching, and the electrode wiring 3 is partially removed so that the resistive layer 2, which will become a heat generating part, is exposed. lastly,
When the protective layer 4 is formed on this, the protective layer 4 above the polyimide film 5 partially protrudes, forming a thermal head having a convex structure as shown in FIG.
上記一実施例で示すように、絶縁性基板1上に部分的に
ポリイミド膜5を形成することは、絶縁性基板をグレー
ズ層の形成にょシロ状とする従来技術に比べ、その製造
工程を容易にできるばかシでなく、熱伝導率が従来のグ
レーズガラスの2〜3.6X10−Ca17cm −E
Cに対シテ本発明のポリイミドは0.8 X 10−’
Caケ’cm−5Cと小さい材料であるため、蓄熱効
果が大きく、同じ蓄熱効果を得るのに薄い膜厚ですむと
いう利点がある。As shown in the above embodiment, forming the polyimide film 5 partially on the insulating substrate 1 simplifies the manufacturing process compared to the conventional technique in which the insulating substrate is shaped like a glaze layer. Thermal conductivity is 2 to 3.6X10-Ca17cm-E than that of conventional glazed glass.
The polyimide of the present invention is 0.8 x 10-'
Since it is a material as small as Ca cm-5C, it has a large heat storage effect, and has the advantage that a thin film is required to obtain the same heat storage effect.
なお、上記一実施例では、絶縁性基板1上に部分的にポ
リイミド膜5を形成する場合について示し念ので、該ポ
リイミド膜5に蓄熱効果をもたせるためには数10μm
の膜厚が必要であ2しかしながら、凸状効果のみを期待
するのでをれば、絶縁性基板上の全面に均一に数10μ
”11のポリイミド膜を形成し、この上に部分的に」記
実施例と同様のポリイミド膜を形成しても濃い。この場
合は、電極配線3の厚さよす0.1〜数10μ簿厚くポ
リイミド膜を形成することによシ、その上に形成される
保護層4が凸状形状となる。In the above embodiment, the polyimide film 5 is formed partially on the insulating substrate 1, so that the polyimide film 5 has a thickness of several tens of μm in order to have a heat storage effect.
However, since only a convex effect is expected, it is necessary to have a film thickness of several tens of microns over the entire surface of the insulating substrate.
Even if the polyimide film 11 is formed and a polyimide film similar to that in the embodiment described above is partially formed on the polyimide film, the density is high. In this case, by forming a polyimide film that is 0.1 to several tens of microns thicker than the electrode wiring 3, the protective layer 4 formed thereon has a convex shape.
さらに、本発明において使用される絶縁性導板1は上記
実施例に限定されず、その表面に増−厚のグレーズ層を
形成した絶縁性基板を用いることも可能である。Further, the insulating conductive plate 1 used in the present invention is not limited to the above embodiment, and an insulating substrate having a thicker glaze layer formed on its surface may also be used.
以上説明したように、本発明によれば、発情部を構成す
る抵抗層の下部に、パターン形成力容易で、かつ蓄熱効
果の良いポリイミド膜を形成したため、安価で印字品質
の良好なサーマルヘッドを提供できる。As explained above, according to the present invention, a polyimide film that is easy to form a pattern and has a good heat storage effect is formed under the resistive layer that constitutes the estrous area, so that a thermal head that is inexpensive and has good printing quality can be realized. Can be provided.
第1図は本発明による丈−マルヘッドの一実施例上水す
要部断面図、第2図は従来のサーマルヘッドを示し、第
2図(α)はその平面図、第2図[blはその断面図で
あり、第3図、第4図はサーマルヘッドの他の従来例を
示す断面図である。
1・・・絶縁性基板 2・・・抵抗層3・・・
電極配線 4山保膜層5・・・ポリイミド膜
「
廟 1 図
第2図
(σ)
(メ〕
第3図
第4図Fig. 1 is a sectional view of a main part of an embodiment of the length-round head according to the present invention, Fig. 2 shows a conventional thermal head, Fig. 2 (α) is a plan view thereof, and Fig. 2 [bl is 3 and 4 are cross-sectional views showing other conventional examples of thermal heads. 1... Insulating substrate 2... Resistance layer 3...
Electrode wiring 4-layer protective layer 5...Polyimide film 1 Figure 2 (σ) (Me) Figure 3 Figure 4
Claims (1)
層してなるサーマルヘッドにおいて、前記絶縁性基板を
前記抵抗層との間にポリイミド膜を介設し、該ポリイミ
ド膜により前記抵抗層を部分的に凸状としたことを特徴
とするサーマルヘッド。In a thermal head formed by sequentially laminating a resistive layer, electrode wiring, and a protective layer on an insulating substrate, a polyimide film is interposed between the insulating substrate and the resistive layer, and the resistive layer is covered by the polyimide film. A thermal head characterized by a partially convex shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13174985A JPS61290067A (en) | 1985-06-19 | 1985-06-19 | Thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13174985A JPS61290067A (en) | 1985-06-19 | 1985-06-19 | Thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61290067A true JPS61290067A (en) | 1986-12-20 |
Family
ID=15065290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13174985A Pending JPS61290067A (en) | 1985-06-19 | 1985-06-19 | Thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61290067A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0605190A2 (en) * | 1992-12-23 | 1994-07-06 | Ngk Insulators, Ltd. | Thermal head |
US5444475A (en) * | 1992-07-03 | 1995-08-22 | Hitachi Koki Co., Ltd. | Thermal recording head |
CN102649368A (en) * | 2011-02-23 | 2012-08-29 | 精工电子有限公司 | Thermal head and method of manufacturing the same, and printer |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58124676A (en) * | 1982-01-20 | 1983-07-25 | Seiko Epson Corp | Thermal head |
JPS60104348A (en) * | 1983-11-11 | 1985-06-08 | Canon Inc | Thermal head |
-
1985
- 1985-06-19 JP JP13174985A patent/JPS61290067A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58124676A (en) * | 1982-01-20 | 1983-07-25 | Seiko Epson Corp | Thermal head |
JPS60104348A (en) * | 1983-11-11 | 1985-06-08 | Canon Inc | Thermal head |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5444475A (en) * | 1992-07-03 | 1995-08-22 | Hitachi Koki Co., Ltd. | Thermal recording head |
EP0605190A2 (en) * | 1992-12-23 | 1994-07-06 | Ngk Insulators, Ltd. | Thermal head |
EP0605190A3 (en) * | 1992-12-23 | 1994-11-23 | Ngk Insulators Ltd | Thermal head. |
CN102649368A (en) * | 2011-02-23 | 2012-08-29 | 精工电子有限公司 | Thermal head and method of manufacturing the same, and printer |
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