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JPS61289345A - Resist for lithography - Google Patents

Resist for lithography

Info

Publication number
JPS61289345A
JPS61289345A JP12241386A JP12241386A JPS61289345A JP S61289345 A JPS61289345 A JP S61289345A JP 12241386 A JP12241386 A JP 12241386A JP 12241386 A JP12241386 A JP 12241386A JP S61289345 A JPS61289345 A JP S61289345A
Authority
JP
JAPAN
Prior art keywords
lithography
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12241386A
Inventor
Daburiyuu Kongu Ranii
Esu Sachidebu Haabansu
Ganjii Sachidebu Kurishiyuna
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US73965885A priority Critical
Application filed by Ibm filed Critical Ibm
Publication of JPS61289345A publication Critical patent/JPS61289345A/en
Application status is Pending legal-status Critical

Links

JP12241386A 1985-05-31 1986-05-29 Resist for lithography Pending JPS61289345A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US73965885A true 1985-05-31 1985-05-31

Publications (1)

Publication Number Publication Date
JPS61289345A true JPS61289345A (en) 1986-12-19

Family

ID=24973262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12241386A Pending JPS61289345A (en) 1985-05-31 1986-05-29 Resist for lithography

Country Status (1)

Country Link
JP (1) JPS61289345A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03137649A (en) * 1989-10-24 1991-06-12 Matsushita Electric Ind Co Ltd Fine pattern forming material and pattern forming method
JPH0429149A (en) * 1990-05-24 1992-01-31 Matsushita Electric Ind Co Ltd Pattern forming material and formation of pattern
US7026099B2 (en) 2002-04-24 2006-04-11 Kabushiki Kaisha Toshiba Pattern forming method and method for manufacturing semiconductor device
JP2014216477A (en) * 2013-04-25 2014-11-17 株式会社デンソー Organic semiconductor device manufacturing method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179851A (en) * 1981-04-30 1982-11-05 Tokyo Ohka Kogyo Co Ltd Formation of pattern
JPS59152A (en) * 1982-06-25 1984-01-05 Hitachi Chem Co Ltd Image forming resin composition
JPS5968735A (en) * 1982-10-13 1984-04-18 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS60191245A (en) * 1984-03-12 1985-09-28 Fujitsu Ltd Resist film material and formation of resist pattern
JPS613139A (en) * 1984-06-15 1986-01-09 Hitachi Ltd Radiation sensitive composition and formation of pattern by using it
JPS61144639A (en) * 1984-12-19 1986-07-02 Hitachi Ltd Radiation sensitive composition and pattern forming method using its composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179851A (en) * 1981-04-30 1982-11-05 Tokyo Ohka Kogyo Co Ltd Formation of pattern
JPS59152A (en) * 1982-06-25 1984-01-05 Hitachi Chem Co Ltd Image forming resin composition
JPS5968735A (en) * 1982-10-13 1984-04-18 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS60191245A (en) * 1984-03-12 1985-09-28 Fujitsu Ltd Resist film material and formation of resist pattern
JPS613139A (en) * 1984-06-15 1986-01-09 Hitachi Ltd Radiation sensitive composition and formation of pattern by using it
JPS61144639A (en) * 1984-12-19 1986-07-02 Hitachi Ltd Radiation sensitive composition and pattern forming method using its composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03137649A (en) * 1989-10-24 1991-06-12 Matsushita Electric Ind Co Ltd Fine pattern forming material and pattern forming method
JPH0429149A (en) * 1990-05-24 1992-01-31 Matsushita Electric Ind Co Ltd Pattern forming material and formation of pattern
US7026099B2 (en) 2002-04-24 2006-04-11 Kabushiki Kaisha Toshiba Pattern forming method and method for manufacturing semiconductor device
JP2014216477A (en) * 2013-04-25 2014-11-17 株式会社デンソー Organic semiconductor device manufacturing method

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