JPS61284452A - Liquid jet recording head and apparatus - Google Patents

Abstract

PURPOSE:To make excellent in electrochemical reaction resistance, oxidation resistance, mechanical impact resistance and heat resistance and to further enhance heat response, by forming a heat generating resistor layer from an amorphous material having carbon atoms as a matrix and containing silicon atoms and halogen atoms. CONSTITUTION:A plurality of sets each consisting of a heat-generating resistor layer 14 and a pair of electrodes 16, 17 connected to said layer 14 are together provided on a support 12 and effective heat-generating parts 18, 18', 18'' are arranged to said support 12 at predetermined intervals. The heat-generating resistor layer 14 comprises and amorphous material based on carbon atoms and containing silicon atoms and halogen atoms and, as the halogen atoms, F and Cl are pref. Because this heat-generating resistor layer 14 has high dura bility to mechanical impact and excellent chemical stability, no protective layer is especially required. Therefore, the liquid jet recording head using this heat- generating resistor layer is improved in heat response because heat energy generated with the input of a signal is imparted to a liquid in an extremely efficient manner.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid jet recording head and a liquid jet recording apparatus equipped with the recording head.

[Prior Art] Among the various recording methods currently known, it is a non-impact recording method that generates almost no noise during recording, uses a rotating section for high-speed recording, and uses a special fixing process on plain paper. The so-called inkjet recording method, which allows recording without the need for a recording medium, is recognized as an extremely useful recording method. Regarding this inkjet recording method, various methods have been proposed so far, some of which have been improved and commercialized, and efforts are still being made to put some into practical use.

In the inkjet recording method, recording is performed by causing droplets of a recording liquid called ink to fly based on various working principles and making them adhere to a recording member such as paper.

The present applicant has also already proposed a new system related to such an inkjet recording method. This new method has been proposed in Japanese Patent Laid-Open No. 52-118798, and its basic principle is as outlined below. In other words, in this inkjet recording method, a thermal pulse is applied as an information signal to the recording liquid introduced into an action chamber that can contain the recording liquid, whereby the recording liquid generates vapor bubbles and self-contracts. In this method, the recording liquid is ejected from an ejection port communicating with the action chamber according to the action force generated in the process, and is caused to fly as small droplets, which are then attached to the recording member to perform edging.

By the way, this method can be easily adapted to high-speed recording and color recording with a high-density multi-array configuration.

Because the configuration of the implementation device is simpler than conventional ones,
Overall, the recording head needs to be made more compact.
It has advantages such as being suitable for mass production and being easily made into long lengths by fully utilizing the advantages of IC technology and micro-processing technology, which have seen remarkable technological progress and improved reliability in the semiconductor field. , is a flexible method.

1. Liquid Jet Recording Device This characteristic recording head is provided with an electric S converter as a means for ejecting liquid from an ejection port to form flying droplets.

The electrothermal converter has a discharge port that communicates with the liquid so that it is in direct contact with the liquid in order to efficiently apply the generated thermal energy to the liquid and increase the ON-OFF response speed of the thermal effect on the liquid. It is said that it is desirable to have a structure in which the heat acting part is provided in a heat-acting part.

However, since the electrothermal converter basically consists of a heating resistor that generates heat when energized and a pair of electrodes for energizing the heating resistor,
Does article 2 mean that the heating resistor is in direct contact with the liquid? 7
．． Depending on the electrical resistance value of the liquid used, electricity may flow through the liquid, the liquid itself may be electrolyzed by the flow of electricity through the liquid, or the heating resistor and liquid may interact when electricity is applied to the heating resistor. may react and cause a change in resistance value due to corrosion of the heating resistor itself, breakage or destruction of the heating resistor, and furthermore, the formation of vapor bubbles in the liquid due to the action of heat generated from the heating resistor. There have been cases where the surface of the heating resistor is damaged due to the mechanical shock accompanying the state change from generation to self-annihilation, or a portion of the heating resistor is destroyed due to cracks or the like.

For this reason, in the past, alloys such as NiCr and Zr
B2. The heating resistor is made of an inorganic material that has relatively excellent characteristics as a heating resistor material, such as metal boride such as HfB2, and 5i0 is applied on the heating resistor made of the material.
By providing a protective layer (upper layer) made of a material with excellent oxidation resistance such as No. It has been proposed to improve durability against repeated use.

However, a liquid jet recording device having a recording head equipped with an electrothermal converter having the above-mentioned configuration uses a liquid with relatively low electrical conductivity (for example, water or alcohol as a liquid medium) as a colored liquid for recording. When using recording liquids (using liquids containing 100% or more), they have excellent oxidation resistance and are satisfactory in terms of repeated use durability. When a body or electrolyte liquid is used, durability against repeated use and resistance to change over time are insufficient. Therefore, there are restrictions on the selection of the recording liquid to be used, which is particularly an obstacle when recording in multiple colors or in natural colors.

In addition, even when a protective layer is provided on the heating resistor as described above, it is possible to virtually completely prevent liquid from entering into the heating resistor side due to defects in the protective layer itself that occur during layer formation, for example. It is extremely difficult in terms of performance and mass production. Furthermore, a liquid flow path (nozzle) having a high density and a large number of heat acting parts as part of its structure is provided. In the case of so-called high-density multi-orifice technology, it is necessary to provide at least as many electrothermal converters as the number of liquid flow channels at once, so the impact of failure due to defects in the protective layer on the manufacturing yield of electrothermal converters is limited. This is a big problem, including in terms of manufacturing costs. Furthermore, there is also the problem that thermal responsiveness is sacrificed due to the presence of the protective layer. Furthermore, the presence of the protective layer sacrifices heat generation responsiveness to a given electrical signal. Therefore, even when there is no YJ layer and the heat generating resistor is in direct contact with the recording liquid, it has excellent heat resistance, oxidation resistance, mechanical shock resistance, electrochemical reaction resistance, and thermal response. The development of a liquid jet recording device equipped with an excellent electrothermal converter is widely desired.

[Object of the invention] The present invention has been made in view of the above points, and
The main object of the present invention is to provide an excellent liquid jet recording head that solves the conventional problems described above, and a liquid jet recording apparatus equipped with the recording head.

Another object of the present invention is to have particularly high chemical stability, excellent electrochemical reaction resistance, and oxidation resistance, as well as excellent mechanical impact resistance and heat resistance, and furthermore, by eliminating the protective layer, thermal response is improved. An object of the present invention is to provide a liquid jet recording head equipped with a heating resistor that can improve performance, and a liquid jet recording apparatus equipped with the recording head.

[Summary of the Invention] According to the present invention, the above-mentioned object includes an ejection port provided for ejecting a liquid to form flying droplets, and a heat utilized for forming the flying droplets. In a liquid jet recording head equipped with an electrothermal transducer that generates energy, the heat generating resistive layer constituting the electrothermal transducer is a non-heating resistor layer made of carbon atoms as a matrix and containing silicon atoms, halogen atoms, and hydrogen atoms. This is achieved by a liquid jet recording head characterized by being made of a crystalline material, and a liquid jet recording apparatus equipped with the liquid jet recording head.

Hereinafter, the present invention will be specifically explained with reference to the drawings.

FIG. 1 is a partial plan view showing the configuration of an embodiment of the liquid jet recording head of the present invention, and FIG. 2 is a sectional view taken along line nn.

In the figure, 12 is a support body on which an electrothermal converter is provided, 14 is a heating resistance layer constituting the electrothermal converter, and 18 and 17 are paired electrodes constituting the electrothermal converter. As shown in FIG. 1, a plurality of pairs of one heat generating resistor layer 14 and a pair of electrodes 16 and 17 connected to the heat generating resistor layer 14 are provided side by side, thereby creating an effective heat generating section 18.
18'ia'', numbers -, are arranged at predetermined intervals.In this embodiment, one electrode 16 is a common electrode in which a plurality of electrodes are grouped together. .Each heating part 18.18", 18".

A 4A signal is applied to the heat generating resistor layer 14 constituting .

As shown in FIG. 2, a top plate 20 in which a groove is formed on the side of the heat generating portion of the support 12 is bonded to a substrate having the support 12, the heat generating resistance layer 14, and the electrodes 16,17. A sectional view taken along the line ■-■ in FIG. 2 is shown in FIG. 3. As shown in FIGS.
'',... in the positions corresponding to IT- in Fig. 1, respectively.
Grooves 22, 22', 22'', . . ., are formed along the 11 directions.
A space for accommodating the recording liquid is formed between the two. These spaces have heat acting portions 24 that apply thermal energy to the recording liquid.

On the left side in FIG. 2, the space opens to the outside, and this opening becomes a liquid discharge port 26. The space is connected to a recording liquid supply source on the right side in FIG. When thermal energy is generated from a heat generating part in the space based on the recording signal and acts on the recording liquid in the space, vapor bubbles are generated in the recording liquid, and the pressure at that time causes the recording liquid near the discharge port 26 to Discharge in the direction of.

As can be seen from the above explanation, in Fig. 1, the top plate 2
The illustration of 0 is omitted.

In the present invention, there is no particular restriction on the material of the support 12, but in practice C::, the heat generated when forming the heat generating resistor layer 14 formed on its surface and the heat generated by the heat generating resistor layer 14 during use. A material having good durability against generated heat is preferably used. Further, it is preferable that the support 12 has a higher electrical resistance than the heat generating resistor layer 14 formed on the surface of the support 12.
If an insulating layer is interposed between the support 1 and the
2 may be made of a material having an electrical resistance smaller than that of the heating resistance layer 14. Furthermore, in the present invention, the support layer 14 may be made of a material having a small or large thermal conductivity depending on the usage conditions of the liquid jet recording head. body 12 can be used.

The support 12 used in the present invention is glass,
Examples include those made of inorganic materials such as ceramics, silicon, and metals, and those made of organic materials such as polyamide resin and polyimide resin.

In the present invention, the first heating resistance layer 14 is made of an amorphous material having carbon atoms as its base material and containing silicon atoms, halogen atoms, and hydrogen atoms. F, C as halogen atoms
I, Br, ■, etc. can be used, and these may be used alone or in combination.As the halogen atoms, F, C, etc. can be used.
I is preferred, and F is especially preferred.

The content of silicon atoms in the heating resistor layer 14 is appropriately selected depending on the purpose of use so as to obtain desired characteristics, but is preferably o,ooot to 40 atomic %, more preferably 0.0005 to 40 atomic %. It is 20 atomic %, preferably o, ooi to 10 atomic %.

The content of halogen atoms in the heating resistance layer 14 is
It is selected as appropriate to obtain the desired characteristics depending on the purpose of use, but preferably o,ooot to 30 atomic %, more preferably 0.0005 to 20) q %, preferably 0. 001-10 atomic %.

The content of hydrogen atoms in the heating resistor layer 14 is selected as appropriate to obtain desired characteristics depending on the purpose of use.
Preferably o, oooi to 30 atom %, more preferably 0.0005 to 20 atom %, preferably 0.0005 to 20 atom %.
001 to 10 atomic %.

The sum of the silicon atom content, halogen atom content, and hydrogen atom content in the heating resistor layer 14 is appropriately selected so as to obtain desired characteristics depending on the purpose of use.
Preferably it is o,ooot to 40 atomic %, more preferably 0.0005 to 30 atomic %, and preferably 0.0005 to 30 atomic %.
001 to 20 atomic %.

Further, there is no particular restriction on the thickness of one heating resistance layer 14.

In the recording head of the present invention, an amorphous material (hereinafter referred to as ra-C: Si: (X)) made of carbon as a matrix and containing silicon atoms, halogen atoms, and hydrogen atoms.

It is sometimes abbreviated as "H)". The heat-generating resistive layer 14 made of (herein, halogen atoms) is formed by, for example, a plasma CVD method such as a glow discharge method, or a vacuum deposition method such as a sputtering method.

For example, a-C:Si:(X,
In order to form the resistance layer 14 made of H), basically the support 12 is placed in a deposition chamber under reduced pressure, and a raw material gas for C supply that can supply carbon (C) into the deposition chamber is used. A raw material gas for Si supply that can supply silicon atoms (St), a raw material gas for X supply that can supply halogen atoms (X), and a raw material gas for H supply that can supply hydrogen atoms (H). A-C:
A layer consisting of S i :(X, H) may be formed.

In addition, a-C:Si:(X,
In order to form the resistance layer 14 made of H), basically the support 12 is placed in a deposition chamber under reduced pressure, and an inert gas such as Ar, He, etc. or a base gas of these gases is injected in the deposition chamber. When sputtering a target made of C in a mixed gas atmosphere, a source gas for supplying Si, a source gas for supplying X, and a source gas for supplying H may be introduced into the deposition chamber.

In the above method, as the raw material gas for C supply, the raw material gas for Si supply, the raw material gas for X supply, and the raw material gas for H supply, in addition to gaseous materials at room temperature and normal pressure, substances that can be gasified under reduced pressure are used. can be used.

Examples of raw materials for C supply include saturated hydrocarbons having 1 to 5 carbon atoms, ethylene hydrocarbons having 2 to 5 carbon atoms, acetylenic hydrocarbons having 2 to 4 carbon atoms, aromatic hydrocarbons, etc. The saturated hydrocarbons include methane (CH4), ethane (C2H6), propane (C3Ha), n-buta7
(n-C4HIG), pentane (C5Hl2), ethylene hydrocarbons include ethylene (C2H4), propylene (C3Ha), butene-1 (04HI3)
, butene-2 (C4Ha), isobutylene (C4
Examples of acetylene hydrocarbons include acetylene (C2H2), methylacetylene (C3H4), and butyne (C4HG), and examples of aromatic hydrocarbons include benzene (C6Ha).

As a raw material for supplying Si, for example, 5tH4,5i2
Silicon hydride (silanes) such as Ha, 5i3Ha, 5iaHto, S i F4, (SiF2)5, (S i
F2)s, (SiF2)4.

Si2F6, Si3FB, SiHF3, Si
H2F2,5iC14 (SiC12)5,5tBr4,
(SiBr2)5. Si2 C16,5i2C13F3
Examples of raw materials for supplying X include halogens, halides, interhalogen compounds, halogen-substituted hydrocarbon derivatives, etc. As for F2. C12, Br2
．． I2. Halides include HF, HCl, HB
r, Hl, BrF, CIF as interhalogen compounds
, ClF3, BrF5, BrF3. IF3, IF
7, IC1, IBr, halogen-substituted hydrocarbon derivatives include CF4, CHF3, CH2F2, CH3F
, CC14, CHC13, CH2C12, CH2Cl,
CBr4. CHBr3, CH2Br2.

CH3Br, CI4, CHI3, CH2I2, CH
Examples include 3I.

Examples of raw materials for supplying H include hydrogen gas and hydrocarbons such as saturated hydrocarbons, ethylene hydrocarbons, acetylene hydrocarbons, and aromatic hydrocarbons, which are also the raw materials for supplying C.

These raw materials may be used alone or in combination.

In the heat generating resistance layer forming method as described above, in order to control the amount of silicon atoms, the amount of halogen atoms, the amount of hydrogen atoms contained in the resistance layer 14 to be formed, and the characteristics of the resistance layer 14, it is necessary to , the supply amount of raw material gas, the discharge power, the pressure inside the deposition chamber, etc. are set appropriately.

The support temperature is preferably selected from 20 to 1500°C, more preferably 30 to 1200°C, and optimally 50 to 1100°C.

The supply amount of the raw material gas is determined as appropriate depending on the intended heating resistance layer property and the targeted film formation rate.

The discharge power is preferably 0.001 to 20 W/c, more preferably 0.01 to 15 W/c, and optimally 0.05
~IOW/crn'.

The pressure inside the deposition chamber is preferably 10-4 to 10 Torr.
, more preferably 10-2 to 5 Torr.

The resistive layer of the recording head of the present invention obtained using the heat generating resistive layer forming method as described above has characteristics close to those of diamond.

That is, for example, one having a Vickers hardness of 1,800 to 5,000 can be obtained. In addition, since it contains silicon atoms, halogen atoms, and hydrogen atoms, it has particularly good mechanical strength.

The heat generating resistive layer of the present invention has high durability against mechanical shock and excellent chemical stability, and therefore does not require a special protective layer. The liquid jet recording head has good thermal responsiveness because thermal energy generated in response to signal input is applied to the liquid extremely efficiently. This also leads to improved ejection responsiveness of flying droplets that are formed in response to signals input to the liquid jet recording head.

However, as long as the desired responsiveness is exhibited, a protective layer may be formed on the heating resistor layer as described above.

Furthermore, when the recording liquid is conductive, a protective layer is necessary to prevent short circuits between electrodes.

In the embodiments described above, an example is shown in which the heating resistance layer and the electrode are provided on the support in this order, but in the recording head of the present invention, the electrode and the heating resistance layer may be provided in this order on the support. , FIG. 4 is a partial cross-sectional view of a substrate having an electrothermal transducer of such a recording head.

In the above embodiment, the support body 12 is a single body, but the support body 12 in the present invention may be a composite body. is shown in FIG. 5, that is, the support 12 is composed of a composite body of a base 12a and a surface layer 12b, and the support material described in connection with FIGS. 1 to 3 above, for example, can be used as the base 12a. The surface layer 12b may be made of a material that has better adhesion to the resistor M14 formed thereon. It is composed of oxides etc. Such a surface layer 12b can be obtained by depositing an appropriate raw material on the base 12a by a method similar to the above-described method for forming the heating resistor layer. In addition, the surface layer 12b
may be a normal glassy glaze layer, or if the base 12a is metal, it may be an oxide layer formed by oxidizing its surface.

The electrodes 16 and 17 in the recording head of the present invention may be made of any material having a predetermined conductivity, such as Au or Cu.
, A1. It consists of metals such as Ag and Ml.

Next, the outline of the method for manufacturing the recording head of the present invention will be explained.

FIG. 6 is a schematic explanatory diagram showing an example of a deposition apparatus used when forming a heat generating resistive layer on the surface of a support. 11
01 is a deposition chamber, 1102-1106 are gas cylinders, 1107-1111 are bus flow controllers, 1112-1116 are inflow valves, 11
17-1121 are outflow valves, 1122-112
6 is the gas cylinder valve, 1127 to 1131
1132 is an auxiliary valve;
1133 is a lever, 1134 is a main valve, 1135 is a leak valve, 1136 is a vacuum gauge, 1137 is a support material for forming a substrate with an electrothermal converter to be manufactured, 113B is a heater, 1139 is a support means, 1140
is a high voltage power supply, 1141 is an electrode, and 1142
is the shutter. Note that 1142-1 is a target attached to the electrode 1141 when performing the sputtering method.

For example, 1102 is sealed with CF4 gas (purity of 99.9% or more) diluted with Ar gas, and 1103
02F6 gas (purity 99.9) diluted with Ar gas
% or more) is sealed, 1104 is sealed with SiH4 gas (purity of 99.9% or more) diluted with Ar gas, and 1105 is sealed with Si2H gas diluted with Ar gas.
6 gas (419 degrees 99.95 or higher) is sealed. Before allowing the gas in these cylinders to flow into the deposition chamber 1101, it is confirmed that the gas cylinders 1102 to 1106 (7), the valves 1122 to 112B, and the leak valve 1135 are closed, and the inflow valves 1112 to 1135 are closed.
116. After confirming that the outflow valves 1117 to 1121 and the auxiliary valve 1132 are open, the main valve 1134 is first opened to exhaust the inside of the deposition chamber 1101 and the gas pipe.

Next, the vacuum gauge 1136 reads approximately 1.5XlO-6Tor.
When the temperature reaches r, the auxiliary valve 1132° inflow valve 1
112-111B and outlet valves 1117-1121 are closed. Thereafter, a valve of a gas pipe connected to a cylinder of gas to be introduced into the deposition chamber 1101 is opened to introduce a desired gas into the deposition chamber 1101.

Next, an example of the procedure for forming the resistive layer of the recording head of the present invention by the glow discharge method using the above-described apparatus will be described. Open the valve 1122 and turn on the gas pump 110
Let the CF4/A,r gas flow out from valve 1
124 and SiH4/Ar from the gas pump 1104.
Let the gas flow out and adjust the pressure at outlet pressure gauges 1127.1129 to 1 kg/C, then inlet valve 1112.
1114 gradually opens the mass flow controller 110.
7. Let the cF4/Ar gas and SiH4/Ar gas flow into the deposition chamber 1 by gradually opening the outflow valves 1117 and 1119 and the auxiliary valve 1132.
Introduce it into toi. At this time, the mass flow controllers 1107 and 1109 are operated so that the ratio of the flow rate of CF4/Ar gas and the flow rate of Si H4/Ar gas becomes a desired value.
while checking the reading on the vacuum gauge 1136 so that the pressure inside the deposition chamber 1iot reaches the desired value.
Adjust the opening degree of 1-34. The support 113 supported by the support means 1139 in the deposition chamber 1101
After heating the deposition chamber 1101 with the heater 113B so that the temperature of the deposition chamber 1101 becomes the desired temperature, the shutter 1142 is opened.
A glow discharge is generated within the chamber.

Next, an example of the procedure for forming the resistive layer of the recording head of the present invention by sputtering using the above-described apparatus will be described. High-purity graphite 11 is preliminarily placed on the electrode 1141 to which a high voltage is applied by the high-voltage power supply 1140.
Set up 42-1 as a target, and use the same method as in the case of the Pro 2-discharge method to remove the CF from the gas pump 1102.
4/Ar gas from gas pump 1104 5fH4/At
Each gas is introduced into the deposition chamber 1101 at a desired flow rate. The shutter 1142 is opened and the high voltage power supply 1140
The target 1142-1 is sputtered by supplying the target 1142-1. At this time, the support body 1137 is heated to a desired temperature by the heater 1138, and the main valve 1134 is heated.
In the same way as in the glow discharge method, a desired pressure can be achieved in the deposition chamber ttoi by adjusting the opening degree of the deposition chamber ttoi.

In the case of a substrate having an electrothermal transducer of a liquid jet recording head as shown in FIGS. 1 to 3, after forming a heat generating resistor layer on the support as described above, a layer is formed on the heat generating resistor layer. A conductive layer (for example, an Au layer, an A1 layer) for forming an electrode is formed, and then a conductive layer and a heat-generating resistive layer are patterned using photolithography, and if necessary, the layer is made of an insulating material, etc. A protective layer may be laminated.

In addition, in the case of a substrate having an electrothermal converter for a liquid jet recording head as shown in FIG. 4, a conductive layer is formed on the support in advance, and the conductive layer is patterned using photolithography technology. After doing it, you will see a glow like above,
The heating resistance layer is formed by a discharge method or a sputtering method.

The grooved top plate may be made of the same material as the above-mentioned support, for example, by mechanical cutting with a microcutter, chemical etching, etc., or if the top plate is made of photosensitive glass, the desired shape can be formed. It is possible to use a material in which grooves are formed by pattern exposure and development.

The substrate having the electrothermal transducer and the top plate can be bonded after sufficient alignment, for example, by bonding with an adhesive or by thermal fusion depending on the material of the top plate.

In the embodiment described above, a liquid jet recording head of the type shown in a partial perspective view in FIG.
Although the head 6 has been described as opening in the direction of the groove 22 formed in the top plate 20, in the present invention, the liquid discharge port 26 is provided directly in the top plate 20 as shown in FIG. In the head of the type shown in FIG. 8, the opening at the end of the groove 22 formed in the top plate 20 is used as a recording liquid inlet, and the recording liquid is discharged from the discharge port 26 in the direction of arrow Y. Of course, one end of the groove 2z may be closed, and the recording liquid may be introduced from at least one opening.

Next, a modification of the liquid jet recording head of the present invention will be described.

FIG. 9 is a sectional view taken along line IX-IX in FIG. 8.

In this case, the portion of the top plate 20 other than the groove 22 is in close contact with the substrate having the electrothermal converter. Therefore, 6 of the top plate 20
Each heat acting part 24 formed corresponding to the groove 22 is connected to the support body 1.
They are separated from each other by a barrier portion 30 that is in close contact with the two. In addition, in FIG. 9, each heat generating part 18 is provided corresponding to each discharge port 26.

10-12 are sectional views corresponding to FIG. 9 showing other examples.

In the case of FIG. 10, the barrier part 30 is not in complete contact with the support body 12, and the heat acting parts 24 corresponding to each heat generating part 18 are in communication with each other.

In the case of FIG. TI, the barrier section 30 is formed not on the top plate 20 but on the substrate, and the heat acting sections 24 corresponding to the six heat generating sections 18 communicate with each other as in the case of FIG. 1O.

In the case of FIG. 12, no barrier portion is formed as in the cases of FIGS. 9 to 11.

Although FIGS. 9 to 12 above relate to the liquid jet recording head of the type shown in FIG. 8, the same applies to the type of liquid jet recording head shown in FIG.

The barrier portion (wall) 30 does not necessarily have to be provided as described above, but it depends on the ejection direction and ejection speed of the liquid ejected from the adjacent ejection ports.

Also, even if it affects the ejection amount, it is not necessary to provide a barrier section unless there is an error exceeding the permissible range in the landing point of the flying droplet on the recording member. It is preferable to provide a barrier part in order to reduce energy consumption and improve energy efficiency (liquid ejection efficiency).Also, the barrier part may be formed integrally with the top plate, or only the barrier part may be formed as a separate member. Of course, it may be done. The flat top plate may be made of the same material as the grooved top plate. Moreover, a photosensitive resin can also be used for the barrier part and the top plate.

Specific examples of the liquid jet recording head of the present invention will be shown below.

[Example] First, a substrate having an electrothermal converter used in the following Examples and Comparative Examples was prepared in the following manner.

As a support, #7059 glass manufactured by Corning Co., Ltd.
An St plate provided with a thermally oxidized 5i02 heat storage layer (thickness: 5 gm) as a surface layer was used.

A heating resistance layer, an electrode, and optionally a protective layer are formed on the support. The layer configurations of the heating resistor layer, electrode, and protective layer were of the following three types: A, B, and C.

A heating resistor layer was formed on the Type A support using the deposition apparatus shown in FIG. The conditions during the deposition are as shown in Tables 1 and 2, respectively. The Examples listed in Table 1 were carried out by the glow discharge method, and the Examples and Comparative Examples listed in Table 2 were carried out by the sputtering method. Graphite (99,99%) was used as a target during sputtering except for the comparative example, and the comparative example was HfB2.
was used.

During the deposition, the flow rate of each gas and other conditions were maintained as shown in Tables 1 and 2, respectively, and the heat generation resistance layer was formed with the thickness shown in Table 3. An At layer was formed on the resistance layer by an electron beam method, a resist pattern was formed by a photolithography technique, and the A1 layer was etched into a desired shape to form a plurality of pairs of electrodes. Subsequently, a resist pattern was formed by photolithography, and predetermined portions of the heating resistor layer were removed using an HF-based etching solution. As an example,
A heat generating resistor element was formed in which the above electrode was attached to a heat generating portion consisting of a heat generating resistor layer portion of 40#Lm x 200 lumens. The heat generating parts were arranged at a pitch of 8 pieces/mm.

Next, a photosensitive polyimide (trade name: Photonice) is spin-coded. Then, prebaked at 80℃ for 1 hour,
After exposure with an aligner, it is developed and the heat-generating part has a structure with a window opening. Then, heat to 400°C for 30 minutes at 140°C.
Post-baking is performed for 1 hour to complete a substrate having an electrothermal converter.

The resistance of each heat generating part of the electrothermal converter thus obtained was as shown in Table 3.

Note that the photosensitive polyimide is used to prevent electrolysis in the ink of the At electrode.

13 is a schematic perspective view of a completed substrate having an electrothermal converter, and FIG. 14 is a schematic cross-sectional view thereof. In FIG. 0, 28 is a polyimide layer.

Type B A heating resistance layer was formed on the support in the same manner as in Type A. The deposition conditions are as shown in Tables 1 and 2, respectively. During the deposition, the flow rate of each gas and other conditions were maintained as shown in Tables 1 and 2, respectively, and the heating resistor layer with the thickness shown in Table 3 was formed. An Au layer was formed on the heating resistor layer by an electron beam method, a resist pattern was formed by photolithography, and the Au layer was etched into a desired shape to form a plurality of pairs of electrodes. Next, a resist pattern is formed using photolithography technology and HF is applied.
Predetermined portions of the heat generating resistor layer were removed using an etching solution. As an example, a heat generating resistor element was formed in which the above electrode was attached to a heat generating portion consisting of a portion of a heat generating resistor layer measuring 407 mm x 200 ILm. The heat generating parts were arranged at a pitch of 8 pieces/mm. In this way, a substrate having an electrothermal transducer is completed.

The resistance of each heat generating part of the electrothermal converter thus obtained was as shown in Table 3.

A schematic perspective view of a completed substrate having an electrothermal converter is shown in FIG. 15, and a schematic cross-sectional view is shown in FIG. 16.

Type C: A1 layer is formed on the support by electron beam method, and a resist pattern is formed by photolithography.
After etching the layer into a desired shape to form a plurality of pairs of electrodes, a heating resistor layer was formed on the patterned A1 layer.

The heating resistance layer was formed in the same manner as in the case of type A.

The deposition conditions were maintained as shown in Tables 1 and 2, respectively, and heat generating resistive layers having the thicknesses shown in Table 3 were formed. Subsequently, a resist pattern was formed using photolithography technology, and predetermined portions of the heating resistor layer were removed using an HF-based etching solution. - As an example, 40B
A heat generating resistor element was formed in which the above electrode was attached to a heat generating portion consisting of a heat generating resistor layer of m×200 pm.

The heat generating parts were arranged at a pitch of 8 pieces/mm. Furthermore, A
Since the t-electrode is protected by this heating resistance layer, there is no need to form a protective film. Thus.

A substrate having an electrothermal transducer is completed.

The resistance of each heat generating part of the electrothermal converter thus obtained was as shown in Table 3.

A schematic perspective view of a completed substrate having an electrothermal converter is shown in FIG. 17, and a schematic cross-sectional view is shown in FIG. 18.

A liquid jet recording head is manufactured using the substrate having the electrothermal converter completed as described above. The heads to be created include the type shown in FIG. 7 (hereinafter referred to as type I) and the type 8 shown in FIG. The type shown in the figure (hereinafter referred to as type 2
).

Type 1 was created using two methods, and Type 2 was created using one method. The method for creating them will be described below.

Type 1-1 First, as shown in the schematic perspective view of FIG.
A grooved top plate 20 is prepared by cutting a plurality of grooves 22 (width: 40 m, depth: 40 pm) and a groove 42 serving as a common ink chamber in a micro-cutter.

Next, the substrate completed above and the top plate 20 are connected to the heat generating part and the groove 2.
2 and then joined together, and furthermore, as shown in the schematic perspective view of FIG. 20, an ink introduction pipe 44 for introducing ink from an ink supply section (not shown) to the common ink chamber is connected. The recording head 46 was completed in one piece.

Type 1-2 A photosensitive film 50 (trade name: Odile, Tokyo Ohka) is laminated on the substrate completed above. Then, it is exposed to light using an aligner and developed to create a desired pattern shape. Next, a glass plate 54 laminated with a photosensitive resin film 52 (trade name Odile, Tokyo Ohka) is laminated and bonded onto the patterned film.

Then, this joined body is shaped by machining such as dicing to form the discharge port 26, and an ink introduction pipe 44 is connected from an ink supply section (not shown) to the common ink chamber, as shown in the schematic diagram of FIG. A recording head 56 as shown in the perspective view was integrally completed.

Type 2 First, the top plate 20 in which the discharge port 26 is formed is created. The top plate 20 is created by forming a pattern of photosensitive film (trade name: PHT-145FT-50, Hitachi Chemical) on a stainless steel plate with grooves formed by etching, etc., and then electroforming with Nf plating on top of the pattern. . The portion where the hole is formed as the discharge port 26 is where the pattern of the photosensitive film is located. The top plate 20 created in this way and the substrate completed above are aligned with the heat generating parts and the discharge ports 26 corresponding thereto, and then bonded with adhesive. The board is machined to make holes so that ink can be supplied into the top plate 20. Next, a hole is made by machining so that ink can be introduced into the common ink chamber from an ink supply section (not shown) on the back side of the joined board. The introduction pipe 60 of the second
A recording pad 62 as shown in the schematic perspective view of FIG. 2 was integrally completed. Note that 64 is a recessed portion of the top plate 20 and constitutes a rebarrier portion.

Type A, Type B, and Type C of the layer structure of the substrate having an electrothermal converter and the head manufacturing method Type 1-1. Although there are combinations of type 1-2 and type 2, a combination of type A and type 1-1 was used in the following durability experiment.

Hereinafter, an experiment regarding the durability of the produced recording head will be described.

The recording head created above has electrode leads (individual electrode leads and common electrode leads: not shown) connected to the individual electrodes 17 for each heat generating part and the common electrode 816 for each heat generating part. The recording head unit was completed.

Using these recording head units, a liquid jet recording apparatus as shown in a schematic perspective view in FIG. 23 was constructed.

In FIG. 23, 70 is a recording head unit;
72 is a carriage on which the recording head unit 70 is placed, and 74 is a guide member for reciprocating the carriage 72. Also, 76 is a platen,
Reference numeral 78 indicates a recording member, such as paper, held on the platen 76.

The recording liquid ejection ports of the recording head unit 70 are oriented in the direction of arrow Z, and the recording liquid is ejected in the form of droplets in the direction of the arrow, and is deposited in the form of dots on the recording member 78 on the platen 76. . Main scanning is performed by moving the recording head unit 70 along the guide member 74 by an appropriate driving means, and sub-scanning is performed by rotating the platen 76 around a rotation axis 77 by an appropriate driving means. As a result, recording is performed on the recording member 78.

The experimental conditions were as follows.

10 psec pulse width in the heat generating part, 20011. Sec
A rectangular pulse with a voltage 1.2 times the minimum bubbling voltage (the voltage at which bubbling begins in the ink) (for example, 24 cm if the minimum bubbling voltage is 20 V) was applied with a pulse input period of . The composition of the ink used was as follows.

Water: 68 parts by weight DE0: 30 parts by weight Black dye: 2 parts by weight When an ink droplet ejection experiment was conducted using the above experimental conditions and ink, durability evaluations as shown in Table 3 were obtained.

The durability of these Examples and Comparative Examples was evaluated based on the number of times electrical pulses could be repeatedly applied as follows. In other words, "
"○" and "x" indicate the number of times the electrical pulse was repeatedly applied as shown below.

From the results of 0 1010 times or more x 10 6 times or more, it can be seen that in the examples of the present invention, recording heads with significantly superior durability compared to the comparative examples were obtained. Furthermore, in one example of the present invention, the recording performance was also excellent.

In the above durability experiment, the above type A and type 1-1 were used.
Similar results were obtained with other combinations.

Table 3 Next, FIG. 24 shows a partially cutaway perspective view of an embodiment of the liquid jet recording apparatus of the present invention.

In this embodiment, two recording head units 7
0 are held in parallel by the carriage 72 by the holding member 71.
It is fixed and placed on. Recording head unit 70
is a so-called disposable type, and contains recording liquid. The movement of the carriage 72 along the guide member 74 is achieved by fixing a part of the wire 82 wound between the pulleys 80 and 81 to the carriage 72, and moving the carriage 72 along the guide member 74 using the motor 84.
This is done by driving and rotating the pulley 81.

On the other hand, the rotating shaft 77 of the platen 76 is driven and rotated by a motor 86 and a gear mechanism 88, thereby feeding the recording member 78.

90 connects the recording head unit 70 via the gear ridge 72
This is a flexible wiring board connected to the carriage 72 in order to supply an electric signal for ejecting recording liquid in the Z direction.

[Effects of the Invention] According to the present invention as described above, chemical It has high physical stability, excellent electrochemical reactivity resistance, and oxidation resistance.
The present invention provides a liquid jet recording head and a liquid jet recording device that have an electrothermal converter that has excellent mechanical impact resistance and heat resistance, and therefore has extremely good thermal response and durability in use. According to this method, an electrothermal converter having particularly excellent mechanical strength can be obtained.

Therefore, according to the present invention, it is possible to realize liquid jet recording with high frequency response and high reliability.

[Brief explanation of the drawing]

FIG. 1 is a partial plan view of the recording head of the present invention, FIG. 2 is a sectional view taken along line 1--2, and FIG. 3 is a sectional view taken along line mm in FIG. 4 and 5 are partial cross-sectional views of a substrate having an electrothermal transducer of the recording head of the present invention. FIG. 6 is a schematic illustration of the deposition apparatus. 7 and 8 are partial perspective views of the recording head of the present invention. 9 to 12 are partial cross-sectional views of the recording head of the present invention. 13, 15, and 17 are perspective views of a substrate having an electrothermal transducer of the recording head of the present invention, and FIG. 14,
FIGS. 16 and 18 are sectional views thereof, respectively. FIG. 19 is a perspective view of the top plate of the recording head of the present invention. 20, 21, and 22 are perspective views of the recording head of the present invention. FIG. 23 is a perspective view of the recording apparatus of the present invention. FIG. 24 is a partially cutaway perspective view of the recording apparatus of the present invention. 12: Support 24: Heat generating resistance layer 16. 17: Electrode 18: Heat generating part 20: Top plate 24: Heat acting part 26: Discharge port Figure 3 Figure 4 Figure 5 Figure 7 Figure 8 Figure 9 Figure 15 Figure 16 Figure 23

Claims (2)

[Claims] (1) A liquid comprising an ejection port provided for ejecting a liquid to form flying droplets, and an electrothermal converter that generates thermal energy used to form the flying droplets. In the jet recording head, the heating resistance layer constituting the electrothermal converter is made of an amorphous material having carbon atoms as a matrix and containing silicon atoms, halogen atoms, and hydrogen atoms. recording head. (2) A liquid comprising an ejection port provided for ejecting liquid to form flying droplets, and an electrothermal converter that generates thermal energy used to form the flying droplets. In a liquid jet recording device equipped with a jet recording head, the heating resistance layer constituting the electrothermal converter is made of an amorphous material having carbon atoms as a matrix and containing silicon atoms, halogen atoms, and hydrogen atoms. A liquid jet recording device characterized by: