JPS61280640A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS61280640A
JPS61280640A JP10639685A JP10639685A JPS61280640A JP S61280640 A JPS61280640 A JP S61280640A JP 10639685 A JP10639685 A JP 10639685A JP 10639685 A JP10639685 A JP 10639685A JP S61280640 A JPS61280640 A JP S61280640A
Authority
JP
Japan
Prior art keywords
resin
substrate support
film
semiconductor device
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10639685A
Other languages
Japanese (ja)
Inventor
Mamoru Ando
守 安藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP10639685A priority Critical patent/JPS61280640A/en
Publication of JPS61280640A publication Critical patent/JPS61280640A/en
Pending legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To simplify the installation of a resin film and to make the film thinner for the improvement of the heat-radiating efficiency by a method wherein the resin thin film is formed by the dip method and covers the resin section of a semiconductor device and the support for the substrate. CONSTITUTION:A heat-cured resin is caused to melt to be equipped with a prescribed viscosity and is accommodated in a container 10. A semiconductor device 1, provided with a semiconductor pellet 2 of the prescribed performance, a substrate support 3 mounted with the semiconductor pellet 2, an electrode lead 4 electrically connected to the semiconductor pellet 2, and a resin section 5 accomplishing resin-sealing with one surface of the substrate support 3 remaining exposed, is dipped in a solution 11 and is pulled out of the solution 11 at a prescribed rate. Thereafter, the resin is hardened for the formation of a resin thin film 6 covering the resin section 5 and the substrate support 3. The thickness of the resin film is dependent upon the solution viscosity, the rate of pulling up, and the conditions whereunder the hardening process is accomplished. By using this method, a resin thin film may be formed not thicker than several tens of micrometers.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 本発明は樹脂封止の半導体装置に関し、特に熱を発生す
る大中電力用樹脂封止を半導体装置に関するものである
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a resin-sealed semiconductor device, and particularly relates to a resin-sealed semiconductor device for large and medium-sized power sources that generate heat.

(ロ)従来の技術 一般に樹脂封止型半導体装置は製品のコストや加工性ま
た量産性等の点で金属封止臘半導体装置より優れて℃・
るが放熱性の点では劣っている。しかし近年大中電力用
樹脂封止型半導体装置において放熱性の良いものが考案
されている。
(b) Conventional technology In general, resin-sealed semiconductor devices are superior to metal-sealed semiconductor devices in terms of product cost, processability, mass production, etc.
However, it is inferior in terms of heat dissipation. However, in recent years, resin-sealed semiconductor devices for large and medium-sized power sources with good heat dissipation properties have been devised.

例えば第2図に示す如く放熱性を良好にするために基板
支持体−を直接露出させ薄いマイカ板等の絶縁スペーサ
(1)を介して放熱板と接続していた。
For example, as shown in FIG. 2, in order to improve heat dissipation, the substrate support is directly exposed and connected to a heat dissipation plate through an insulating spacer (1) such as a thin mica plate.

しかし取付作業上煩雑で短絡等の事故発生を起こしやす
い欠点を有していた。
However, it has the disadvantage that it is complicated to install and is prone to accidents such as short circuits.

上期の欠点を回避するために特開昭57−147260
号公報(第3図)に示す如く金型に挾持した際、基板支
持体(至)の下部に一定の間隙が生じるように挾持し、
基板支持体(至)の下側に薄く樹脂を設けていた。
In order to avoid the shortcomings of the first half, JP 57-147260
As shown in the publication (Figure 3), when the substrate is clamped in the mold, it is clamped so that a certain gap is created at the bottom of the substrate support (to),
A thin layer of resin was provided on the underside of the substrate support.

(ハ)発明が解決しようとする問題点 上述の如き構造に於て、基板支持体(ホ)(至)の下側
に設ける樹脂(ホ)(至)は放熱性を良くするために薄
く形成する必要があり、また絶縁性を良好にするには膜
にピンホール等が生じてはならない。更に放熱特性のバ
ラツキを無くすには樹脂部(至)を均一に形成しなくて
はならない。従ってこの様な特性を得る膜構造を得るに
は金をを使用した方法では限界があった。
(c) Problems to be solved by the invention In the structure as described above, the resin (E) (X) provided under the substrate support (E) (X) is formed thin in order to improve heat dissipation. In addition, to ensure good insulation, the film must not have pinholes or the like. Furthermore, in order to eliminate variations in heat dissipation characteristics, the resin portion must be formed uniformly. Therefore, there is a limit to the method using gold in obtaining a membrane structure with such characteristics.

に)問題点を解決するための手段 本発明は斯る欠点を鑑みてなされ、少なくとも前記樹脂
部(5)と前記基板支持体(3)との回りに樹脂薄膜(
6)を浸漬法により形成することで解決するものである
Means for Solving the Problems The present invention has been made in view of these drawbacks, and includes a thin resin film (
6) can be solved by forming it by a dipping method.

(ホ)作用 樹脂を有機溶媒等により所定の粘度に溶解し、第4図の
如く浸漬法にて少なくとも前記樹脂部(5)と前記基板
支持体(3)との回りに樹脂薄膜(6)を形成する。溶
液の粘度と浸漬した際に半導体装置(1)を溶液より引
き上げる速度または硬化条件等を制御することで前記樹
脂薄膜(6)の膜厚を制御することが可能である。
(e) Working resin is dissolved to a predetermined viscosity with an organic solvent or the like, and a thin resin film (6) is formed around at least the resin portion (5) and the substrate support (3) by dipping as shown in FIG. form. The thickness of the resin thin film (6) can be controlled by controlling the viscosity of the solution, the speed at which the semiconductor device (1) is lifted out of the solution during immersion, the curing conditions, etc.

(へ)実施例 以下に本発明の一実施例を第1図および第4図を参照し
ながら説明する。
(F) Example An example of the present invention will be described below with reference to FIGS. 1 and 4.

第1図の如く所定の機能を有した半導体ペレット(2)
と、該半導体ペレット(2)がマウントされた基板支持
体(3)と、前記半導体ペレット(2)と電気的に接続
された電極リード(4)、例えば金線やアルミニウム線
と、前記基板支持体(3)の一方の表面が露出計て、少
なくとも前記樹脂部(5)と前記基板支持体(3)との
回りに樹脂薄膜(6)を浸漬法により形成する。
Semiconductor pellet (2) with a predetermined function as shown in Figure 1
, a substrate support (3) on which the semiconductor pellet (2) is mounted, an electrode lead (4) electrically connected to the semiconductor pellet (2), such as a gold wire or aluminum wire, and the substrate support. One surface of the body (3) is exposed and a thin resin film (6) is formed around at least the resin part (5) and the substrate support (3) by a dipping method.

本発明の特徴とするところは前記浸漬法により形成する
樹脂薄膜(6)にある。ここで浸漬法は熱硬化性樹脂等
を使用し耐湿性や絶縁性等の特性の良好なものを使用す
る必要がある。この樹脂を有機溶媒等で溶解し所定の粘
度に設定し、例えば第4図の如く所定の容器翰に入れて
おく。そして前記半導体装置(1)を溶液(6)中に浸
漬し所定の速度で引き上げる。その後紫外線の照射や熱
処理を施して樹脂を硬化させる。ここで粘度や引き上げ
速度また硬化条件等を考慮することで樹脂の膜厚を決定
できる。
The feature of the present invention lies in the resin thin film (6) formed by the above-mentioned dipping method. Here, in the dipping method, it is necessary to use a thermosetting resin with good properties such as moisture resistance and insulation. This resin is dissolved with an organic solvent or the like to set a predetermined viscosity, and the resin is placed in a predetermined container as shown in FIG. 4, for example. Then, the semiconductor device (1) is immersed in the solution (6) and pulled up at a predetermined speed. The resin is then cured by UV irradiation and heat treatment. Here, the film thickness of the resin can be determined by considering the viscosity, pulling speed, curing conditions, etc.

(ト) 発明の効果 上述の如く本発明は浸漬法にて少なくとも前記樹脂部(
5)と前記基板支持体(3)との回りに樹脂薄膜(6)
を形成することで、金製では樹脂膜厚は数百μmht限
界であったが、本発明では数十μm以下まで形成ができ
るようになる。
(G) Effects of the Invention As mentioned above, the present invention provides at least the resin portion (
5) and the resin thin film (6) around the substrate support (3).
By forming the resin film, the thickness of the resin film was limited to several hundred μm when made of gold, but with the present invention, it is possible to form the resin film to a thickness of several tens of μm or less.

また樹脂(6)が全体を覆うような形となるため例えば
基板支持体(3)と樹脂部(5)の界面等への湿度の浸
入を防止できる。
Further, since the resin (6) is shaped to cover the entire surface, it is possible to prevent moisture from entering, for example, the interface between the substrate support (3) and the resin portion (5).

またマイカ板等の絶縁板を装着する必要が無くなり、コ
ストの低減が可能となり、かつ装着を簡単にすることが
できる。
Furthermore, there is no need to mount an insulating plate such as a mica plate, making it possible to reduce costs and simplify mounting.

更に樹脂(6)厚膜を薄くできるため放熱性も改善でき
る。
Furthermore, since the resin (6) thick film can be made thinner, heat dissipation can also be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例である半導体装置の断面図、
第2図および第3図は従来の半導体装置の断面図、第4
図は本発明の半導体装置を浸漬する時の概略図である。 主な図番の説明 (1)は半導体装置、 (2)は半導体ペレット、 (
3)は基板支持体、 (4)は電極リード、 (5)は
樹脂、(6)は樹脂薄膜である。 第1図 第2図 第3図
FIG. 1 is a cross-sectional view of a semiconductor device which is an embodiment of the present invention.
Figures 2 and 3 are cross-sectional views of conventional semiconductor devices;
The figure is a schematic diagram when the semiconductor device of the present invention is immersed. Explanation of main figure numbers (1) is semiconductor device, (2) is semiconductor pellet, (
3) is a substrate support, (4) is an electrode lead, (5) is a resin, and (6) is a resin thin film. Figure 1 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] (1)半導体ペレットと該半導体ペレットがマウントさ
れた基板支持体と前記半導体ペレットと電気的に接続さ
れた電極リードと前記基板支持体の一方の表面が露出す
るように樹脂封止する樹脂部とを具備する半導体装置に
於て、少なくとも前記樹脂部と前記基板支持体との回り
に樹脂薄膜を浸漬法により形成することを特徴とした半
導体装置。
(1) A semiconductor pellet, a substrate support on which the semiconductor pellet is mounted, an electrode lead electrically connected to the semiconductor pellet, and a resin part sealed with resin so that one surface of the substrate support is exposed. 1. A semiconductor device comprising: a thin resin film formed at least around the resin portion and the substrate support by a dipping method.
JP10639685A 1985-05-17 1985-05-17 Semiconductor device Pending JPS61280640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10639685A JPS61280640A (en) 1985-05-17 1985-05-17 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10639685A JPS61280640A (en) 1985-05-17 1985-05-17 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS61280640A true JPS61280640A (en) 1986-12-11

Family

ID=14432527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10639685A Pending JPS61280640A (en) 1985-05-17 1985-05-17 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS61280640A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5886400A (en) * 1995-08-31 1999-03-23 Motorola, Inc. Semiconductor device having an insulating layer and method for making

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5886400A (en) * 1995-08-31 1999-03-23 Motorola, Inc. Semiconductor device having an insulating layer and method for making

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