JPS6127690A - Magnetoresistance element - Google Patents

Magnetoresistance element

Info

Publication number
JPS6127690A
JPS6127690A JP14753784A JP14753784A JPS6127690A JP S6127690 A JPS6127690 A JP S6127690A JP 14753784 A JP14753784 A JP 14753784A JP 14753784 A JP14753784 A JP 14753784A JP S6127690 A JPS6127690 A JP S6127690A
Authority
JP
Japan
Prior art keywords
film
layer
wiring
conductive film
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14753784A
Other languages
Japanese (ja)
Inventor
Katsuyoshi Tamura
勝義 田村
Nobuo Konishi
信夫 小西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Consumer Electronics Co Ltd
Japan Display Inc
Original Assignee
Hitachi Device Engineering Co Ltd
Hitachi Ltd
Hitachi Consumer Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Device Engineering Co Ltd, Hitachi Ltd, Hitachi Consumer Electronics Co Ltd filed Critical Hitachi Device Engineering Co Ltd
Priority to JP14753784A priority Critical patent/JPS6127690A/en
Publication of JPS6127690A publication Critical patent/JPS6127690A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices

Abstract

PURPOSE:To shorten the manufacturing process while improving the reliability and to lower the cost, by forming a first conduction film on a substrate only of a material having magnetoresistance effect except for the portion of a junction terminal with the outside. CONSTITUTION:A first conduction layer, unlike conventional two-layer wired magnetoresistance element, is composed only of a permalloy film 2 having magnetoresistance effect, without any wiring layer. A part of the role that wiring layers in conventional elements have taken is performed by a wiring pattern with relatively low resistance which is formed on the permalloy film 2 in a thick and short area. A second conduction film 5 is extended beyond an interlayer insulation film 4 to a region where the insulation film 4 is not provided, and is directly contacted with the glass substrate 1 to form a junction terminal 5a with the outside.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、多数の磁性センサ・パターンを有し、その間
の複雑な配線を必要とする2層配線磁気抵抗素子の、製
造工程を単純化して歩留りを向上させたものに関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention simplifies the manufacturing process of a two-layer wiring magnetoresistive element that has a large number of magnetic sensor patterns and requires complicated wiring between them. Regarding products with improved yield.

〔発明の背景〕[Background of the invention]

同転体に取り付けた磁気ドラム又は磁気ディスク表面の
磁気パターンを読み取って、回転体の回転状態(回転体
の基準点や基準点からの絶対的な回転角度位置や此の回
転角度の増加の仕方すなわち回転速度など)を検出する
磁性センサ用の磁気抵抗素子は、上記各検出項目に対す
る高い精度が要求されるのに伴い、実際に磁気パターン
を読み取るための磁性センサ・パターンの種類が増え、
その形状、配置、密度、パターン間の配線なども次第に
複雑となって来た。
The magnetic pattern on the surface of the magnetic drum or magnetic disk attached to the rotating body is read, and the rotation state of the rotating body (the reference point of the rotating body, the absolute rotation angle position from the reference point, and the method of increasing this rotation angle) Magnetoresistive elements for magnetic sensors that detect rotational speed, etc., are required to have high accuracy for each of the detection items mentioned above, and the types of magnetic sensor patterns used to actually read magnetic patterns are increasing.
Their shape, arrangement, density, wiring between patterns, etc. have gradually become more complex.

半導体集積素子の先例にも見られるように、磁気抵抗素
子も上記のように複雑になって来ると、磁性センサ・パ
ターンの端子数は非常に多(なり、その間の配線数も極
めて多くなり、配線を1層の導電性膜だけで行おうとす
ると、無接触で配線の交差が出来ないため、磁気抵抗素
子全体の大きさが非常に大きくなり、信頼性や原価の面
から非実用的なものになってしまう。そのために従来か
ら、中間に層間絶縁膜を挟む2層の導電層配線膜を設け
、交差配線可能な2M配線が行われるようになり、磁気
抵抗素子の小形化や外部との接続端子数を低減すること
などに役立っていた。
As seen in the precedent of semiconductor integrated devices, as magnetoresistive elements become more complex as described above, the number of terminals in the magnetic sensor pattern becomes extremely large (and the number of wires between them also becomes extremely large). If wiring is attempted using only one layer of conductive film, the wiring cannot cross without contact, and the overall size of the magnetoresistive element becomes extremely large, making it impractical in terms of reliability and cost. For this reason, conventionally, two layers of conductive layer wiring films with an interlayer insulating film sandwiched between them have been used to create 2M wiring, which allows for cross wiring. This was useful in reducing the number of connection terminals.

しかし、従来の2N配線磁気抵抗素子は、基板上に最初
に形成さ杵る第1層導電膜が、磁気抵抗効果を有する物
質で作られた磁性センサ・パターンの部分と、高導電率
物質たとえばアルミニウム、銅などで作られた配線パタ
ーン部分とよりなり、しかも、両部分間の接続も確実に
行われなければならず、製造工程が長くなり、歩留りが
余り良好ではなく、信頼性も警<ないなどの問題が生じ
ていた。
However, in the conventional 2N wiring magnetoresistive element, the first layer conductive film, which is first formed on the substrate, has a magnetic sensor pattern portion made of a material having a magnetoresistive effect, and a high conductivity material such as a first layer conductive film. The wiring pattern is made of aluminum, copper, etc., and the connection between the two parts must be made reliably, making the manufacturing process long, yields low, and reliability poor. There were problems such as not having one.

なお、磁気抵抗素子配線部の材料をセンサ部と異ならし
め、高導電率のものとすることが特開昭58−1401
1号公報に、アブソリュート磁気センサについては特開
昭54−118259号公報に論じられている。
It should be noted that Japanese Patent Laid-Open No. 58-1401 discloses that the material of the magnetoresistive element wiring section is made different from that of the sensor section and has high conductivity.
The absolute magnetic sensor is discussed in Japanese Patent Application Laid-open No. 118259/1983.

第2図(a)は従来の2iii配線磁気抵抗素子の上面
図、第2図(b)この素子内の磁性センサ・パターンの
接続図、第3図は従来素子の側断面図を示している。図
中、1はガラス基板、2は磁性センサ・パターンR1、
R2,、R3、R4をなすパーマロイ膜、3はセンサ・
パターン間の配線を一部行うガラスに直接接して良くな
じむクローム膜と其の上に形成させたやや幅が狭く導電
性の良いアルミニウム膜とよりなる配線膜、3aは配線
膜3の上の層間絶縁膜が除去されている外部との接続端
子、4は5iO2IIli!と其の上に積層したポリイ
ミド樹脂膜よりなる層間絶縁層、5は此の場合、スルー
ホール内を通って第1層導電膜と第2N導電膜との接続
作用をも行っているクローム膜とアルミニウム膜とを積
層した配線パターンよりなる第2層導電膜、6はSlへ
膜と其の上に積層したポリイミド樹脂膜よりなる耐候性
保護膜、×印7はスルーホールである。なお、5■、O
vは直流電源接続用の、■t ’ %zは磁界検出出力
信号用の、外部との接続端子3aである。配線膜をクロ
ームとアルミニウムの積層膜とするのは、クロームでま
ず下地との密着性を確保し、アルミニウムで十分良好な
導電性を得るためである。また、層間絶縁膜や耐候性保
護膜などをSi%膜とポリイミド樹脂膜を積層したもの
にしたのは、5102膜に時として生じるクランクを有
機樹脂膜で埋めて、絶縁性や耐候性を確保するためであ
る。このように信頼性向上に注意しても、前記のような
複数種類の物質のパターン膜よりなり長く複雑な製造工
程を必要とする第1層導電膜形成のために、十分な信頼
性が得られないという問題が残っていた。
Figure 2 (a) shows a top view of a conventional 2III wiring magnetoresistive element, Figure 2 (b) shows a connection diagram of the magnetic sensor pattern in this element, and Figure 3 shows a side sectional view of the conventional element. . In the figure, 1 is a glass substrate, 2 is a magnetic sensor pattern R1,
Permalloy film forming R2, R3, R4, 3 is sensor.
3a is the interlayer on top of the wiring film 3, which is made up of a chrome film that fits well in direct contact with the glass that performs part of the wiring between patterns, and an aluminum film with a slightly narrow width and good conductivity formed on top of the chrome film. The external connection terminal from which the insulating film has been removed, 4 is 5iO2IIli! and an interlayer insulating layer 5 made of a polyimide resin film laminated thereon, in this case, a chrome film that passes through the through hole and also connects the first layer conductive film and the second N conductive film. A second layer conductive film is made of a wiring pattern laminated with an aluminum film, 6 is a weather-resistant protective film made of an Sl film and a polyimide resin film laminated thereon, and 7 is a through hole. In addition, 5■, O
v is an external connection terminal 3a for connecting a DC power supply, and ■t'%z is for a magnetic field detection output signal. The reason why the wiring film is a laminated film of chrome and aluminum is that the chrome first ensures adhesion to the base, and the aluminum provides sufficiently good conductivity. In addition, the interlayer insulating film and weatherproof protective film are made by laminating a Si% film and a polyimide resin film.The reason is that the cracks that sometimes occur in the 5102 film are filled with an organic resin film to ensure insulation and weather resistance. This is to do so. Even if attention is paid to improving reliability in this way, sufficient reliability cannot be obtained for forming the first layer conductive film, which requires a longer and more complicated manufacturing process than the patterned film made of multiple types of materials as described above. The problem remained that it could not be done.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上記従来の2層配線磁気抵抗素子のよ
うな問題点がなく、製造工程が簡単で短く、信頼性が高
く、従って歩留りも高い磁気抵抗素子を提供することに
ある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a magnetoresistive element that does not have the problems of the conventional two-layer wiring magnetoresistive element, has a simple and short manufacturing process, is highly reliable, and has a high yield.

〔発明の概要〕[Summary of the invention]

上記目的を達成するために本発明においては、基板上に
最初に形成させる第1層導電膜を、第2層導電膜をなす
主たる配線パターンが基板上に直接形成される外部との
接続端子部分を除いて、細長(比較的高抵抗のセンサ・
パターン部分及び太短く比較的低抵抗の配線パターン部
分の何れをも、全て磁気抵抗効果を有する物質の膜だけ
で形成することとした。このようにすることによって、
従来、製造工程が長かった第1層導電膜の工程が短縮さ
れ、歩留りや信頼性が向上し、それに伴って原価も低減
される。
In order to achieve the above object, in the present invention, the first layer conductive film is first formed on the substrate, and the main wiring pattern forming the second layer conductive film is formed directly on the substrate at the connection terminal portion with the outside. (relatively high-resistance sensor)
Both the pattern portion and the thick, short, relatively low resistance wiring pattern portion are formed entirely from a film of a substance having a magnetoresistive effect. By doing this,
The process of forming the first layer conductive film, which conventionally required a long manufacturing process, is shortened, yield and reliability are improved, and the cost is reduced accordingly.

(発明の実施例〕 第1図(a)は本発明−実施例の上面図、第1111F
 (b)は其のセンサ・パターンの接続図、第1図(c
)は同実施例の側断面図である。図中の符号は第2図、
第3図の場合と同様で、第1図(C)から判るように、
従来の2層配線磁気抵抗素子と異なり、第1層導電膜は
磁気抵抗効果を有するパーマロイ膜2だけで形成されて
おり、配線膜3が無い。従来の素子の場合に配線膜3が
受は持っていた役割の一部は、パーマロイ膜2に太短く
抵抗の比較的低い配線パターン部分を作って補わせてい
る。その代わり、第2層導電膜5は、層間絶縁膜4を越
えて此の膜が形成されていない個所に延び、ガラス基板
1に直接接して外部との接続端子5aを形成している。
(Embodiment of the invention) FIG. 1(a) is a top view of the embodiment of the present invention, No. 1111F
(b) is the connection diagram of the sensor pattern, and Fig. 1 (c) is the connection diagram of the sensor pattern.
) is a side sectional view of the same embodiment. The symbols in the figure are from Figure 2.
As in the case of Figure 3, as can be seen from Figure 1 (C),
Unlike the conventional two-layer wiring magnetoresistive element, the first layer conductive film is formed only of a permalloy film 2 having a magnetoresistive effect, and there is no wiring film 3. Part of the role played by the wiring film 3 in the case of conventional elements is compensated for by creating thick, short wiring pattern portions with relatively low resistance in the permalloy film 2. Instead, the second layer conductive film 5 extends beyond the interlayer insulating film 4 to a portion where this film is not formed, and directly contacts the glass substrate 1 to form a connection terminal 5a with the outside.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、製造工程が簡単に
なり、信頼性や歩留りが向上し、原価も低減する。
As explained above, according to the present invention, the manufacturing process is simplified, the reliability and yield are improved, and the cost is reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)は本発明一実施例の上面図、図(b)はセ
ンサ・パターンの接続図、図(C)は同実施例の側断面
図、第2図(a)は従来の磁気抵抗素子の上面図、図(
b)はセンサ・パターンの接続図、第3図は同素子の側
断面図である。 2−・バーマロン膜、3・・−第1層導電膜の一部をな
す配線膜、4・一層間絶縁膜、5−第2層導電膜、5a
・−・接続端子、6・・−耐候性保護膜、7−  スル
第   IF21 (C)
FIG. 1(a) is a top view of one embodiment of the present invention, FIG. 1(b) is a connection diagram of the sensor pattern, FIG. 1(C) is a side sectional view of the same embodiment, and FIG. Top view of magnetoresistive element, figure (
b) is a connection diagram of the sensor pattern, and FIG. 3 is a side sectional view of the same element. 2- Vermalon film, 3...- wiring film forming part of the first layer conductive film, 4- first interlayer insulating film, 5- second layer conductive film, 5a
・-・Connection terminal, 6...-Weather-resistant protective film, 7-Thru No. IF21 (C)

Claims (1)

【特許請求の範囲】[Claims]  基板の上に、磁界の有無を検出する多数の磁性センサ
・パターン及びこれらのセンサ・パターンに接続する配
線パターンよりなる第1層導電膜と、その上を被覆しス
ルーホールのある層間絶縁膜と、更にその上を被覆し配
線パターンよりなる第2層導電膜とを順次形成させ、前
記第1層導電膜と第2層導電膜の間をスルーホールを通
って形成された導電膜で接続することによりセンサ・パ
ターン間配線を所期の如く完結する2層配線磁気抵抗素
子において、第1層導電膜を、第2層導電膜をなす配線
パターンが基板上に直接形成される外部との接続端子部
分を除いて、細長く比較的高抵抗のセンサ・パターン部
分及び太短く比較的低抵抗の配線パターン部分の何れを
も、全て磁気抵抗効果を有する物質の膜だけで形成した
ことを特徴とする磁気抵抗素子。
On the substrate, a first layer conductive film consisting of a number of magnetic sensor patterns for detecting the presence or absence of a magnetic field and wiring patterns connected to these sensor patterns, and an interlayer insulating film covering the first layer and having through holes. Further, a second conductive layer consisting of a wiring pattern is sequentially formed to cover the top of the conductive layer, and the conductive layer formed through the through hole connects the first conductive layer and the second conductive layer. In a two-layer wiring magnetoresistive element in which the wiring between the sensor and the pattern is completed as expected, the first layer conductive film is connected to the outside where the wiring pattern forming the second layer conductive film is formed directly on the substrate. Except for the terminal portion, both the elongated, relatively high-resistance sensor pattern portion and the thick, short, relatively low-resistance wiring pattern portion are all formed of only a film of a substance having a magnetoresistive effect. Magnetoresistive element.
JP14753784A 1984-07-18 1984-07-18 Magnetoresistance element Pending JPS6127690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14753784A JPS6127690A (en) 1984-07-18 1984-07-18 Magnetoresistance element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14753784A JPS6127690A (en) 1984-07-18 1984-07-18 Magnetoresistance element

Publications (1)

Publication Number Publication Date
JPS6127690A true JPS6127690A (en) 1986-02-07

Family

ID=15432554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14753784A Pending JPS6127690A (en) 1984-07-18 1984-07-18 Magnetoresistance element

Country Status (1)

Country Link
JP (1) JPS6127690A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01154657U (en) * 1988-04-18 1989-10-24

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01154657U (en) * 1988-04-18 1989-10-24

Similar Documents

Publication Publication Date Title
US9423472B2 (en) Magnetoresistive sensor module on the planar surface
US7405560B2 (en) GMR angle sensor for vehicles
EP0953849A3 (en) Spin tunnel magneto-resistance effect type magnetic sensor and production method thereof
FR2750769A1 (en) THIN FILM MAGNETIC FIELD SENSOR
JPH0434713A (en) Magneto-resistance effect type thin film head
US5784772A (en) Method of simultaneously forming MR sensors in a dual element MR head
CN101512367A (en) Magnetism detector and its manufacturing method
JP4689516B2 (en) Magnetic detector
JPH0510979A (en) Micro current sensor
JPS6127690A (en) Magnetoresistance element
US6204662B1 (en) Magnetic field sensing element with processing circuit and input and output side resistors formed from same metal film
US6103545A (en) Process for making a magnetoresistive magnetic sensor and sensor obtained using this process
US6002554A (en) Multitrack coupled element read head with support structure to eliminate shorting and method for manufacturing same
JPS63193866U (en)
US4801881A (en) Magnetoresistive sensor having protective dummy elements
CN210639269U (en) Electric connection structure of MEMS magnetic sensor and MEMS magnetic sensor
JP3218837B2 (en) Magnetoresistive sensor
JPH06232478A (en) Semiconductor device
JP2834674B2 (en) MR type magnetic head and method of manufacturing the same
JP2002084015A (en) Magneto-electric conversion element and magnetic sensor using the same
JP2002107433A (en) Magnetic sensor and method of manufacturing the same, and encoder
JP2001119083A (en) Semiconductor magnetism detection element
JPH032580A (en) Sensor element
JP2651808B2 (en) Magnetic sensor
JPH11330586A (en) Magnetoelectric transducer, magnetic sensor using the transducer, and manufacture of the magnetoelectric transducer